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    • 9. 发明授权
    • Integrated optical devices utilizing magnetostrictively,
electrostrictively or photostrictively induced stress
    • 集成光学器件利用磁致伸缩,电致伸缩或光致伸缩诱发应力
    • US5502781A
    • 1996-03-26
    • US378162
    • 1995-01-25
    • Yuan P. LiRaymond Wolfe
    • Yuan P. LiRaymond Wolfe
    • G01D5/353G01R33/032G02F1/01G02F1/313G02F1/295G01B9/02G02B6/26
    • G02F1/0134G01D5/35329G01R33/0327G02F1/3132G02F1/3136
    • Integrated optical devices which utilize a magnetostrictively, electrostrictively or photostrictively induced stress to alter the optical properties of one or more waveguides in the device are disclosed. The integrated optical devices consist of at least one pair of optical waveguides preferably fabricated in a cladding material formed on a substrate. A stress applying material, which may be a magnetostrictive, electrostrictive or photostrictive material, is affixed to the upper surface of the cladding material near at least one of the optical waveguides. When the appropriate magnetic, electric or photonic field is applied to the stress applying material, a dimensional change tends to be induced in the stress applying material. The constrained state of the stress applying material, however, caused by its adhesion to the cladding material, causes regions of tensile and compressive stress, as well as any associated strains, to be created in the integrated optical device. By positioning one or more optical waveguides in a region of the device which will be subjected to a tensile or compressive stress, the optical properties of the stressed waveguide may be varied to achieve switching and modulation. Latchable integrated optical devices are achieved by utilizing a controlled induced stress to "tune" one or more waveguides in an integrated optical device to a desired refractive index or birefringence, which will be retained after the field is removed.
    • 公开了利用磁致伸缩,电致伸缩或光致诱导应力改变器件中一个或多个波导的光学特性的集成光学器件。 集成的光学器件由至少一对光波导构成,优选以形成在衬底上的覆层材料制造。 应力施加材料可以是磁致伸缩的,电致伸缩的或光致伸缩的材料,附着在至少一个光波导附近的包层材料的上表面。 当将适当的磁,电或光子场施加到应力施加材料时,在应力施加材料中倾向于引起尺寸变化。 然而,应力施加材料的约束状态由其与包层材料的粘附性引起,导致在集成光学装置中产生拉伸和压缩应力的区域以及任何相关的应变。 通过将一个或多个光波导放置在将受到拉伸或压缩应力的装置的区域中,可以改变应力波导的光学特性以实现切换和调制。 可锁定的集成光学器件通过利用受控诱导应力来将集成光学器件中的一个或多个波导“调谐”到期望的折射率或双折射来实现,其将在场被去除之后被保留。
    • 10. 发明授权
    • Method of shaping polycrystalline diamond
    • 多晶金刚石成型方法
    • US5500157A
    • 1996-03-19
    • US368581
    • 1995-01-04
    • John E. GraebnerSungho JinRaymond Wolfe
    • John E. GraebnerSungho JinRaymond Wolfe
    • C30B29/04B24D3/00C30B33/00G02B1/02G02B3/00B29D11/00
    • G02B1/02B24D3/00
    • A technique that involves selective removal of material from a surface of a polycrystalline diamond (polyD) film such that a non-planar surface results. Exemplarily the technique is used to form polyD optical elements, e.g., convex or concave lenses, or Fresnel lenses, including arrays of such lenses. The technique involves maintaining on appropriately shaped hot template body in intimate contact with a polyD surface for a time (e.g., in the range 1-1000 hours) sufficient to result in formation of the desired feature in the polyD surface. The template body involves a rare earth metal (La and Ce are preferred), Mn and/or Fe, and the temperature is below the melting temperature of the template body. Removal of "spent" template material by, e.g., chemical etching and finishing of the polyD feature, e.g., by laser ablation and/or polishing, are contemplated.
    • 涉及从多晶金刚石(polyD)膜的表面选择性地去除材料从而形成非平面表面的技术。 示例性地,该技术用于形成多晶光学元件,例如凸透镜或凹透镜,或菲涅尔透镜,包括这种透镜的阵列。 该技术涉及将适当形状的热模板主体与polyD表面紧密接触一段时间(例如,在1-1000小时内),足以导致在polyD表面中形成所需特征。 模板体包括稀土金属(优选La和Ce),Mn和/或Fe,温度低于模板体的熔融温度。 考虑通过例如通过激光烧蚀和/或抛光的polyD特征的化学蚀刻和整理来去除“已用”模板材料。