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    • 3. 发明授权
    • Dual port memory cell with reduced coupling capacitance and small cell size
    • 具有减小的耦合电容和小单元尺寸的双端口存储单元
    • US07286438B2
    • 2007-10-23
    • US11403370
    • 2006-04-12
    • Chuen-Der LienPao-Lu Louis Huang
    • Chuen-Der LienPao-Lu Louis Huang
    • G11C8/00
    • G11C8/16G11C5/063G11C7/02G11C7/1075G11C7/18
    • A dual or multi port memory device including a first group of bit lines associated with the first port a second group of bit lines associated with the second port, wherein the bit lines are arranged in different metalization layers and separated horizontally to reduce one or both of stray and coupling capacitance associated with the bit lines. In one exemplary embodiment, the bit lines from each port that are in closer proximity to the bit lines of the other (or another) port are disposed in different metallization layers to reduce coupling capacitance therebetween. One or more further embodiments can include VSS or VDD line(s) located horizontally between the bit lines and metal to substrate contacts for the bit lines can be formed in opposite corners of the memory device to further reduce capacitance.
    • 一种双端口或多端口存储器件,包括与第一端口相关联的与第二端口相关联的第二组位线的第一组位线,其中位线布置在不同的金属化层中并且水平分开以减少一个或两个 与位线相关的杂散和耦合电容。 在一个示例性实施例中,来自更接近另一(或另一)端口的位线的每个端口的位线被布置在不同的金属化层中以减小它们之间的耦合电容。 一个或多个另外的实施例可以包括水平位于位线和用于位线的金属到衬底触点之间的V SS或V DD线,可以形成为相反的 存储器件的角落,以进一步降低电容。