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1. 发明申请

US20080311401A1 Nanoparticle of a Spin Transition Compound 审中-公开
标题翻译：自旋过渡化合物的纳米粒子
公开(公告)号：US20080311401A1
公开(公告)日：2008-12-18
申请号：US12096746
申请日：2006-12-05
申请人： Jean-Francois Letard , Olivier Nguyen , Nathalie Daro
发明人： Jean-Francois Letard , Olivier Nguyen , Nathalie Daro
IPC分类号： B32B5/16 , C07F15/02
CPC分类号： C07F15/025 , C09K9/02 , C09K2211/187 , Y10T428/2982 , Y10T428/2993 , Y10T428/2995
摘要： The invention relates to a material composed of nanoparticles essentially comprising a spin transition compound.The compound corresponds to the formula [(Fe1-yMyL3)wL3][X2/x(1-z/x′)Y2z/x′]w in which L represents a 1,2,4-triazole ligand carrying an R substituent on the nitrogen in the 4 position; X is an anion having the valency x, 1≦x≦2; Y is an anion other than X having the valency x′, 1≦x′≦2; R is an alkyl group or an R1R2N— group in which R1 and R2 represent, each independently of the other, H or an alkyl radical; M is a metal having a 3d4, 3d5, 3d6 or 3d7 configuration, other than Fe; 0≦y≦1; 0≦z≦2; 3≦w≦1500.Applications: thermochromic pigment, data storage, optical limiters, contrast agent.
摘要翻译：本发明涉及由基本上包含自旋转移化合物的纳米颗粒组成的材料。该化合物对应于式[（Fe1-yMyL3）wL3] [X2 / x（1-z / x'）Y2z / x'] w，其中L表示带有R取代基的1,2,4-三唑配体氮位于4位; X是具有化合价x，1 <= x <= 2的阴离子; Y是具有化合价x'，1 <= x'<= 2的X以外的阴离子; R为烷基或R1R2N-基团，其中R1和R2各自独立地为H或烷基; M是除Fe以外具有3d4，3d5，3d6或3d7结构的金属; 0 <= y <= 1; 0 <= z <= 2; 3 <= w <= 1500。应用：热变色颜料，数据存储，光学限制器，造影剂。

2. 发明授权

US09317477B1 Method for transferring 16-bit data through 8-bit devices 有权
标题翻译：通过8位设备传输16位数据的方法
公开(公告)号：US09317477B1
公开(公告)日：2016-04-19
申请号：US13445248
申请日：2012-04-12
申请人： Lloyd D. Khuc , Barry Schwartz , Jason Cahayla , Triet La , Robert P. Bryan , John Geaney , Olivier Nguyen
发明人： Lloyd D. Khuc , Barry Schwartz , Jason Cahayla , Triet La , Robert P. Bryan , John Geaney , Olivier Nguyen
IPC分类号： G06F17/10
CPC分类号： H03M7/24 , F42C17/04
摘要： A computer program product corrects a detonation time from a ballistic table, based on the actual velocity of a projectile measured upon exit of the projectile from the gun tube. The computer program product transfers a 16-bit data stream, through a 16-bit to an 8-bit encoder, to a fuze controller implemented as an 8-bit platform, to provide precise timing adjustment to a fuze controller. The computer program product significantly improves the accuracy of detonation times for air burst mode. The encoder calculates the absolute truncated, square rooted, X, of the input time delay number, as well as the error correction number, Y. The encoder then transmits both numbers X and Y as an 8-bit data stream, optionally along with the parity data to the fuze controller.
摘要翻译：计算机程序产品根据弹丸从枪管出射时测得的弹丸的实际速度，从弹道台校正爆震时间。计算机程序产品将16位数据流通过16位传输到8位编码器，传送到实现为8位平台的引信控制器，为引信控制器提供精确的时序调整。计算机程序产品显着提高了爆炸模式的爆震时间精度。编码器计算输入时间延迟数字的绝对截断，平方根X，以及纠错编号Y.编码器随后将数字X和Y作为8位数据流传输，可选地与奇偶校验数据到引信控制器。

3. 发明授权

US08753743B2 Nanoparticles of a spin transition compound 有权
标题翻译：自旋过渡化合物的纳米颗粒
公开(公告)号：US08753743B2
公开(公告)日：2014-06-17
申请号：US13619187
申请日：2012-09-14
申请人： Jean-Francois Letard , Olivier Nguyen , Nathalie Daro
发明人： Jean-Francois Letard , Olivier Nguyen , Nathalie Daro
IPC分类号： C07F15/02 , C07F19/00 , B32B5/16 , B32B9/04 , B82Y15/00 , B82Y10/00 , B82Y20/00 , B82Y40/00
CPC分类号： C07F15/025 , C09K9/02 , C09K2211/187 , Y10T428/2982 , Y10T428/2993 , Y10T428/2995
摘要： The invention relates to a material composed of nanoparticles essentially comprising a spin transition compound. The compound corresponds to the formula [ ( Fe 1 - y ⁢ M y ⁢ L 3 ) w ⁢ L 3 ] [ X 2 x ⁢ ( 1 - z x ′ ) ⁢ Y 2 ⁢ ⁢ z x ′ ] w in which L represents a 1,2,4-triazole ligand carrying an R substituent on the nitrogen in the 4 position; X is an anion having the valency x, 1≦x≦2; Y is an anion other than X having the valency x′, 1≦x′≦2; R is an alkyl group or an R1R2N— group in which R1 and R2 represent, each independently of the other, H or an alkyl radical; M is a metal having a 3d4, 3d5, 3d6 or 3d7 configuration, other than Fe; 0≦y≦1; 0≦z≦2; 3≦w≦1500. Applications: thermochromic pigment, data storage, optical limiters, contrast agent.
摘要翻译：本发明涉及由基本上包含自旋转移化合物的纳米颗粒组成的材料。该化合物对应于其中L表示1的式[（Fe 1-y M y L 3）w L 3] [X 2 x（1-zx'）Y 2·保护zx'] w ，在4位氮上带有R取代基的2,4-三唑配体; X是具有化合价x，1＆nlE; x＆lt; 1; 2; Y是具有化合价x'，1＆nlE; x'和nlE; 2的X以外的阴离子; R为烷基或R1R2N-基团，其中R1和R2各自独立地为H或烷基; M是除Fe以外具有3d4，3d5，3d6或3d7结构的金属; 0＆nlE; y＆nlE; 1; 0＆nlE; z＆nlE; 2; 3＆nlE; w＆nlE; 1500。应用：热变色颜料，数据存储，光学限制器，造影剂。

4. 发明申请

US20130011680A1 NANOPARTICLES OF A SPIN TRANSITION COMPOUND 有权
标题翻译：旋转化合物的纳米颗粒
公开(公告)号：US20130011680A1
公开(公告)日：2013-01-10
申请号：US13619187
申请日：2012-09-14
申请人： Jean-François LETARD , Olivier NGUYEN , Nathalie DARO
发明人： Jean-François LETARD , Olivier NGUYEN , Nathalie DARO
IPC分类号： C07F15/02 , B32B5/16 , C07F19/00 , B32B9/04 , B82Y40/00 , B82Y15/00 , B82Y10/00 , B82Y20/00
CPC分类号： C07F15/025 , C09K9/02 , C09K2211/187 , Y10T428/2982 , Y10T428/2993 , Y10T428/2995
摘要： The invention relates to a material composed of nanoparticles essentially comprising a spin transition compound. The compound corresponds to the formula [ ( Fe 1 - y  M y  L 3 ) w  L 3 ] [ X 2 x  ( 1 - z x ′ )  Y 2   z x ′ ] w in which L represents a 1,2,4-triazole ligand carrying an R substituent on the nitrogen in the 4 position; X is an anion having the valency x, 1≦x≦2; Y is an anion other than X having the valency x′, 1≦x′≦2; R is an alkyl group or an R1R2N— group in which R1 and R2 represent, each independently of the other, H or an alkyl radical; M is a metal having a 3d4, 3d5, 3d6 or 3d7 configuration, other than Fe; 0≦y≦1; 0≦z≦2; 3≦w≦1500. Applications: thermochromic pigment, data storage, optical limiters, contrast agent.
摘要翻译：本发明涉及由基本上包含自旋转移化合物的纳米颗粒组成的材料。该化合物对应于其中L表示1的式[（Fe 1-y M y L 3））L 3] [X 2 x（1-z x'）Y 2] ，在4位氮上带有R取代基的2,4-三唑配体; X是具有化合价x，1＆nlE; x＆lt; 1; 2; Y是具有化合价x'，1＆nlE; x'和nlE; 2的X以外的阴离子; R为烷基或R1R2N-基团，其中R1和R2各自独立地为H或烷基; M是除Fe以外具有3d4，3d5，3d6或3d7结构的金属; 0＆nlE; y＆nlE; 1; 0＆nlE; z＆nlE; 2; 3＆nlE; w＆nlE; 1500。应用：热变色颜料，数据存储，光学限制器，造影剂。

5. 发明申请

US20070218693A1 HIGH SELECTIVITY SLURRY COMPOSITIONS FOR CHEMICAL MECHANICAL POLISHING 审中-公开
标题翻译：高选择性浆料组合物化学机械抛光
公开(公告)号：US20070218693A1
公开(公告)日：2007-09-20
申请号：US11750897
申请日：2007-05-18
申请人： Benjamin Bonner , Anand Iyer , Olivier Nguyen , Donald Chua , Christopher Lee , Shijian Li
发明人： Benjamin Bonner , Anand Iyer , Olivier Nguyen , Donald Chua , Christopher Lee , Shijian Li
IPC分类号： C09G1/00
CPC分类号： H01L21/31053 , C09G1/02 , C09K3/1463
摘要： A chemical-mechanical polishing composition that includes less than about 1% wt. abrasive, an additive, and water, where a weigh percent of the additive is greater than a weight percent of the abrasive. Also, a method of polishing a semiconductor substrate in a shallow trench isolation process, the method including contacting the substrate with a polishing pad of a polishing apparatus while applying a high selectivity slurry to the polishing pad, where the slurry comprises less than about 1% wt. abrasive, an additive, and water, and where a weigh percent of the additive is greater than a weight percent of the abrasive. Also, a method of making a chemical-mechanical polishing slurry composition, the method including adding together an abrasive, an additive and water to form the slurry, where a weigh percent of the additive is greater than a weight percent of the abrasive, and the abrasive and additive together comprise less than 2% by wt. of the slurry.
摘要翻译：化学机械抛光组合物，其包含小于约1重量％研磨剂，添加剂和水，其中添加剂的重量百分比大于研磨剂的重量百分比。此外，在浅沟槽隔离工艺中抛光半导体衬底的方法，该方法包括使衬底与抛光装置的抛光垫接触，同时向抛光垫施加高选择性浆料，其中浆料包含小于约1％重量研磨剂，添加剂和水，并且其中添加剂的重量百分比大于研磨剂的重量百分比。另外，制备化学 - 机械抛光浆料组合物的方法，该方法包括将研磨剂，添加剂和水相加以形成浆料，其中添加剂的重量百分比大于磨料的重量百分数，并且研磨剂和添加剂一起包含小于2重量％。的浆料。

6. 发明申请

US20060097219A1 High selectivity slurry compositions for chemical mechanical polishing 审中-公开
标题翻译：用于化学机械抛光的高选择性浆料组合物
公开(公告)号：US20060097219A1
公开(公告)日：2006-05-11
申请号：US11258466
申请日：2005-10-24
申请人： Benjamin Bonner , Anand Iyer , Olivier Nguyen , Donald Chua , Christopher Lee , Shijian Li
发明人： Benjamin Bonner , Anand Iyer , Olivier Nguyen , Donald Chua , Christopher Lee , Shijian Li
IPC分类号： C09K13/00 , H01L21/461
CPC分类号： H01L21/31053 , C09G1/02 , C09K3/1463
摘要： A chemical-mechanical polishing composition that includes less than about 1% wt. abrasive, an additive, and water, where a weigh percent of the additive is greater than a weight percent of the abrasive. Also, a method of polishing a semiconductor substrate in a shallow trench isolation process, the method including contacting the substrate with a polishing pad of a polishing apparatus while applying a high selectivity slurry to the polishing pad, where the slurry comprises less than about 1% wt. abrasive, an additive, and water, and where a weigh percent of the additive is greater than a weight percent of the abrasive. Also, a method of making a chemical-mechanical polishing slurry composition, the method including adding together an abrasive, an additive and water to form the slurry, where a weigh percent of the additive is greater than a weight percent of the abrasive, and the abrasive and additive together comprise less than 2% by wt. of the slurry.
摘要翻译：化学机械抛光组合物，其包含小于约1重量％研磨剂，添加剂和水，其中添加剂的重量百分比大于研磨剂的重量百分比。此外，在浅沟槽隔离工艺中抛光半导体衬底的方法，该方法包括使衬底与抛光装置的抛光垫接触，同时向抛光垫施加高选择性浆料，其中浆料包含小于约1％重量研磨剂，添加剂和水，并且其中添加剂的重量百分比大于研磨剂的重量百分比。另外，制备化学 - 机械抛光浆料组合物的方法，该方法包括将研磨剂，添加剂和水相加以形成浆料，其中添加剂的重量百分比大于磨料的重量百分数，并且研磨剂和添加剂一起包含小于2重量％。的浆料。

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