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1. 发明授权

US08582114B2 Overlay metrology by pupil phase analysis 有权
标题翻译：通过瞳孔相位分析覆盖度量
公开(公告)号：US08582114B2
公开(公告)日：2013-11-12
申请号：US13209778
申请日：2011-08-15
申请人： Amnon Manassen , Daniel Kandel , Moshe Baruch , Vladimir Levinski , Noam Sapiens , Joel Seligson , Andy Hill , Ohad Bachar , Daria Negri , Ofer Zaharan
发明人： Amnon Manassen , Daniel Kandel , Moshe Baruch , Vladimir Levinski , Noam Sapiens , Joel Seligson , Andy Hill , Ohad Bachar , Daria Negri , Ofer Zaharan
IPC分类号： G01B11/02
CPC分类号： G03F7/70633
摘要： The present invention may include measuring a first phase distribution across a pupil plane of a portion of illumination reflected from a first overlay target of a semiconductor wafer, wherein the first overlay target is fabricated to have a first intentional overlay, measuring a second phase distribution across the pupil plane of a portion of illumination reflected from a second overlay target, wherein the second overlay target is fabricated to have a second intentional overlay in a direction opposite to and having the same magnitude as the first intentional overlay, determining a first phase tilt associated with a sum of the first and second phase distributions, determining a second phase tilt associated with a difference between the first and second phase distributions, calibrating a set of phase tilt data, and determining a test overlay value associated with the first and second overlay target.
摘要翻译：本发明可以包括测量跨越从半导体晶片的第一覆盖目标反射的照明部分的光瞳平面的第一相分布，其中第一覆盖目标被制造为具有第一有意覆盖，测量第二相位分布从第二覆盖目标反射的照明部分的光瞳平面，其中第二覆盖目标被制造为具有与第一有意重叠相反并具有相同幅度的方向的第二有意覆盖，确定相关联的第一相位倾斜具有第一和第二相位分布的总和，确定与第一和第二相位分布之间的差相关联的第二相位倾斜，校准一组相位倾斜数据，以及确定与第一和第二覆盖目标相关联的测试覆盖值。

2. 发明申请

US20130066951A1 COMMUNICATION SYSTEM AND METHOD FOR MANAGING DATA TRANSFER THROUGH A COMMUNICATION NETWORK 审中-公开
标题翻译：用于通过通信网络管理数据传输的通信系统和方法
公开(公告)号：US20130066951A1
公开(公告)日：2013-03-14
申请号：US13510101
申请日：2010-11-18
申请人： Aharon Agranat , Larry Rudolph , Noam Sapiens
发明人： Aharon Agranat , Larry Rudolph , Noam Sapiens
IPC分类号： G06F15/16
CPC分类号： H04L67/1097 , H04J14/0212 , H04J14/0227 , H04J14/0257 , H04J14/0267 , H04J14/0283 , H04L67/327
摘要： A communication system is presented for managing data transfer via a communication network. The communication system comprises a server system connected to a plurality of client systems via a first management network of said communication network. Such first management network may for example be operable as multi-hops network. The server system is configured and operable to be responsive to data pieces from the client systems via said first management network, to selectively switch between first and second modes of operation. In the first operational mode, the server system manages and executes data transfer to and from the client systems through the first management network. In the second operational mode, the server system operates to manage direct data transfer between the client systems via a second data network of said communication network connecting the client systems between them. The second data network may for example be operable as ad-hoc circuits.
摘要翻译：提出了一种用于通过通信网络管理数据传输的通信系统。通信系统包括经由所述通信网络的第一管理网络连接到多个客户端系统的服务器系统。这样的第一管理网络例如可以用作多跳网络。服务器系统被配置和操作以响应于来自客户端系统的经由所述第一管理网络的数据片段，以选择性地在第一和第二操作模式之间切换。在第一个操作模式下，服务器系统通过第一个管理网络管理和执行与客户端系统的数据传输。在第二操作模式中，服务器系统操作以经由连接其间的客户端系统的所述通信网络的第二数据网络来管理客户端系统之间的直接数据传输。第二数据网络例如可以作为自组织电路来操作。

3. 发明申请

US20120120396A1 ANGLE-RESOLVED ANTISYMMETRIC SCATTEROMETRY 有权
标题翻译：角解决的反对称散射测量
公开(公告)号：US20120120396A1
公开(公告)日：2012-05-17
申请号：US13386524
申请日：2010-07-21
申请人： Daniel Kandel , Vladimir Levinski , Noam Sapiens
发明人： Daniel Kandel , Vladimir Levinski , Noam Sapiens
IPC分类号： G01B11/00
CPC分类号： G01N21/95607 , G01B11/14 , G01B11/24 , G01B2210/56 , G03F7/70633
摘要： A method for determining an overlay offset may include, but is not limited to: obtaining a first anti-symmetric differential signal (ΔS1) associated with a first scatterometry cell; obtaining a second anti-symmetric differential signal (ΔS2) associated with a second scatterometry cell and computing an overlay offset from the first anti-symmetric differential (ΔS1) signal associated with the first scatterometry cell and the second anti-symmetric differential signal (ΔS2) associated with the second scatterometry cell.
摘要翻译：用于确定覆盖偏移的方法可以包括但不限于：获得与第一散射测量单元相关联的第一反对称差分信号（＆Dgr; S1）; 获得与第二散射测量单元相关联的第二反对称差分信号（＆Dgr; S2），并计算与第一散射测量单元和第二反对称差分相关联的第一反对称差分（＆Dgr; S1）信号的叠加偏移与第二散射测量单元相关联的信号（＆Dgr; S2）。

4. 发明授权

US11484195B2 Automated personal vision tracker 有权
公开(公告)号：US11484195B2
公开(公告)日：2022-11-01
申请号：US16685017
申请日：2019-11-15
申请人： John Serri , Yue Wang , Noam Sapiens
发明人： John Serri , Yue Wang , Noam Sapiens
IPC分类号： A61B3/032 , A61B3/00 , A61B3/14 , A61B3/103
摘要： Disclosed embodiments may include a device, system and method for providing a low cost device that can measure refractive errors very accurately via attachment to a smart phone. A disclosed device may use ambient light or a light source in simulating the cross cylinder procedure that optometrists use by utilizing the inverse Shack-Hartman technique. Using an optical device, in conjunction with a smart phone, the user first changes the angle of the axis until he/she sees a cross pattern (the vertical and horizontal lines are equally spaced). The user adjusts the display, using motorized controls on the on the optical device, to make the lines come together and overlap, which corresponds to bringing the view into sharp focus, thus determining the appropriate optical prescription for the user.

5. 发明申请

US20200170500A1 Method and Apparatus for Modeling an Eye 审中-公开
公开(公告)号：US20200170500A1
公开(公告)日：2020-06-04
申请号：US16699396
申请日：2019-11-29
申请人： Noam Sapiens
发明人： Noam Sapiens
IPC分类号： A61B3/00
摘要： The invention may include a fixed lens (perhaps to simulate a cornea), a pair of Stokes lenses, an iris, deformable lens and an array detector. The implementation or construction of the disclosed embodiments follow and/or simulate the anatomy and geometry of an eye. Several optical and practical constraints were overcome by creating equivalent systems.

6. 发明授权

US09164397B2 Optics symmetrization for metrology 有权
标题翻译：计量学的光学对称性
公开(公告)号：US09164397B2
公开(公告)日：2015-10-20
申请号：US13188623
申请日：2011-07-22
申请人： Amnon Manassen , Daniel Kandel , Moshe Baruch , Joel L. Seligson , Alexander Svizher , Guy Cohen , Efraim Rotem , Ohad Bachar , Daria Negri , Noam Sapiens
发明人： Amnon Manassen , Daniel Kandel , Moshe Baruch , Joel L. Seligson , Alexander Svizher , Guy Cohen , Efraim Rotem , Ohad Bachar , Daria Negri , Noam Sapiens
IPC分类号： G01B9/02 , G03F7/20 , G01N21/55
CPC分类号： G03F7/70633 , G01N21/55 , G03F7/70616
摘要： The present invention includes an illumination source, at least one illumination symmetrization module (ISM) configured to symmetrize at least a portion of light emanating from the illumination source, a first beam splitter configured to direct a first portion of light processed by the ISM along an object path to a surface of one or more specimens and a second portion of light processed by the ISM along a reference path, and a detector disposed along a primary optical axis, wherein the detector is configured to collect a portion of light reflected from the surface of the one or more specimens.
摘要翻译：本发明包括照明源，至少一个照明对称化模块（ISM），被配置为对来自照明源发出的光的至少一部分进行对称;第一分束器，被配置为将由ISM处理的光的第一部分沿着一个或多个样本的表面的物体路径和沿着基准路径由ISM处理的光的第二部分以及沿着主光轴布置的检测器，其中检测器被配置为收集从表面反射的光的一部分的一个或多个标本。

7. 发明申请

US20150157199A1 METHOD AND APPARATUS FOR SCATTEROMETRIC MEASUREMENT OF HUMAN TISSUE 审中-公开
标题翻译：人体组织计量测量方法与装置
公开(公告)号：US20150157199A1
公开(公告)日：2015-06-11
申请号：US14099701
申请日：2013-12-06
申请人： Noam Sapiens
发明人： Noam Sapiens
IPC分类号： A61B3/00 , A61B3/103 , A61B3/10
CPC分类号： A61B3/0025 , A61B3/0008 , A61B3/1025 , A61B3/103 , A61B3/14 , A61B5/0059 , G02B27/0927
摘要： A scatterometric measurement system for measuring an object under test is disclosed. The scatterometric measurement system generates a beam of light from a light source sending the generated beam to illumination optics for transforming the beam and sending this transformed beam to a beam splitter. The beam splitter redirects the transformed beam to a first detector while deflecting the transformed light beam to the object under test which produces scattered light. Collection optics then receives this scattered light from the object under test and processes and sends the scattered light to a second detector through the beam splitter. The second detector generates a signal based on this processed scattered light and sends this result to a computation unit that calculates using the second detectors signal a desired output according to an algorithm for a given measurement for the object under test.
摘要翻译：公开了一种用于测量被测物体的散射测量系统。散射测量系统产生来自光源的光束，其将所产生的光束发送到照明光学器件，用于变换光束并将该变换的光束发送到分束器。分束器将变换的光束重定向到第一检测器，同时将经变换的光束偏转到产生散射光的被测物体。收集光学器件接收来自待测物体的这种散射光，并且通过分束器将散射光发射到第二检测器。第二检测器基于该经处理的散射光产生信号，并将该结果发送到计算单元，该计算单元根据针对被测对象的给定测量的算法，使用第二检测器信号计算期望的输出。

8. 发明申请

US20130035888A1 METHOD AND SYSTEM FOR PROVIDING A QUALITY METRIC FOR IMPROVED PROCESS CONTROL 审中-公开
标题翻译：提供改进过程控制质量标准的方法和系统
公开(公告)号：US20130035888A1
公开(公告)日：2013-02-07
申请号：US13508495
申请日：2012-04-04
申请人： Daniel Kandel , Guy Cohen , Dana Klein , Vladimir Levinski , Noam Sapiens , Alex Shulman , Vladimir Kamenetsky , Eran Amit , Irina Vakshtein
发明人： Daniel Kandel , Guy Cohen , Dana Klein , Vladimir Levinski , Noam Sapiens , Alex Shulman , Vladimir Kamenetsky , Eran Amit , Irina Vakshtein
IPC分类号： G01N37/00 , G06F19/00
摘要： The present invention may include acquiring a plurality of overlay metrology measurement signals from a plurality of metrology targets distributed across one or more fields of a wafer of a lot of wafers, determining a plurality of overlay estimates for each of the plurality of overlay metrology measurement signals using a plurality of overlay algorithms, generating a plurality of overlay estimate distributions, and generating a first plurality of quality metrics utilizing the generated plurality of overlay estimate distributions, wherein each quality metric corresponds with one overlay estimate distribution of the generated plurality of overlay estimate distributions, each quality metric a function of a width of a corresponding generated overlay estimate distribution, each quality metric further being a function of asymmetry present in an overlay metrology measurement signal from an associated metrology target.
摘要翻译：本发明可以包括从分布在许多晶片的晶片的一个或多个场上的多个测量目标获取多个覆盖度量测量信号，为多个覆盖度量测量信号中的每一个确定多个重叠估计使用多个覆盖算法，生成多个覆盖估计分布，以及利用所生成的多个覆盖估计分布来生成第一多个质量度量，其中每个质量度量对应于所生成的多个覆盖估计分布的一个覆盖估计分布每个质量度量是对应的生成的重叠估计分布的宽度的函数，每个质量度量还是来自相关度量目标的覆盖度量测量信号中存在的不对称的函数。

9. 发明授权

US11372340B2 Method and system for providing a quality metric for improved process control 有权
公开(公告)号：US11372340B2
公开(公告)日：2022-06-28
申请号：US13508495
申请日：2012-04-04
申请人： Daniel Kandel , Guy Cohen , Dana Klein , Vladimir Levinski , Noam Sapiens , Alex Shulman , Vladimir Kamenetsky , Eran Amit , Irina Vakshtein
发明人： Daniel Kandel , Guy Cohen , Dana Klein , Vladimir Levinski , Noam Sapiens , Alex Shulman , Vladimir Kamenetsky , Eran Amit , Irina Vakshtein
IPC分类号： G03F7/20 , G03F1/48
摘要： The present invention may include acquiring a plurality of overlay metrology measurement signals from a plurality of metrology targets distributed across one or more fields of a wafer of a lot of wafers, determining a plurality of overlay estimates for each of the plurality of overlay metrology measurement signals using a plurality of overlay algorithms, generating a plurality of overlay estimate distributions, and generating a first plurality of quality metrics utilizing the generated plurality of overlay estimate distributions, wherein each quality metric corresponds with one overlay estimate distribution of the generated plurality of overlay estimate distributions, each quality metric a function of a width of a corresponding generated overlay estimate distribution, each quality metric further being a function of asymmetry present in an overlay metrology measurement signal from an associated metrology target.

10. 发明授权

US08848186B2 Angle-resolved antisymmetric scatterometry 有权
标题翻译：角分辨反对称散射法
公开(公告)号：US08848186B2
公开(公告)日：2014-09-30
申请号：US13386524
申请日：2010-07-21
申请人： Daniel Kandel , Vladimir Levinski , Noam Sapiens
发明人： Daniel Kandel , Vladimir Levinski , Noam Sapiens
IPC分类号： G01B11/00 , G01J4/00 , G03F7/20 , G01B11/24 , G01N21/956
CPC分类号： G01N21/95607 , G01B11/14 , G01B11/24 , G01B2210/56 , G03F7/70633
摘要： A method for determining an overlay offset may include, but is not limited to: obtaining a first anti-symmetric differential signal (ΔS1) associated with a first scatterometry cell; obtaining a second anti-symmetric differential signal (ΔS2) associated with a second scatterometry cell and computing an overlay offset from the first anti-symmetric differential (ΔS1) signal associated with the first scatterometry cell and the second anti-symmetric differential signal (ΔS2) associated with the second scatterometry cell.
摘要翻译：用于确定覆盖偏移的方法可以包括但不限于：获得与第一散射测量单元相关联的第一反对称差分信号（＆Dgr; S1）; 获得与第二散射测量单元相关联的第二反对称差分信号（＆Dgr; S2），并计算与第一散射测量单元和第二反对称差分相关联的第一反对称差分（＆Dgr; S1）信号的叠加偏移与第二散射测量单元相关联的信号（＆Dgr; S2）。

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