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1. 发明授权

US09378988B2 Substrate processing apparatus and substrate processing method using processing solution 有权
标题翻译：基板处理装置和基板处理方法采用处理方案
公开(公告)号：US09378988B2
公开(公告)日：2016-06-28
申请号：US13539626
申请日：2012-07-02
申请人： Naoyuki Osada , Kentaro Sugimoto
发明人： Naoyuki Osada , Kentaro Sugimoto
IPC分类号： B08B3/02 , B08B3/04 , B08B9/023 , H01L21/67
CPC分类号： H01L21/67051 , B08B3/022 , B08B3/041 , B08B9/023 , H01L21/67028 , H01L21/67034
摘要： Nozzle arms for holding discharge heads are caused by a pivotal driving part to move between a processing position above a substrate and a standby position outside a processing cup surrounding a substrate. When the nozzle arms having cleaned a substrate is placed at the standby position, a cleaning solution is ejected from a shower nozzle toward the nozzle arms arranged obliquely downward of the shower nozzle. The three nozzle arms are caused to move up and down such that the nozzle arms cut across a jet of a cleaning solution discharged obliquely downward, thereby cleaning the three nozzle arms in order. Then, a nitrogen gas is ejected from a drying gas nozzle and sprayed on the nozzle arms to remove the cleaning solution attached to the nozzle arms, thereby drying the nozzle arms.
摘要翻译：用于保持排出头的喷嘴臂由枢转驱动部分引起，以在基板上方的处理位置和围绕基板的加工杯外部的待机位置之间移动。当清洗了基板的喷嘴臂被放置在待机位置时，清洗液从淋浴喷嘴朝向淋浴喷嘴的斜下方布置的喷嘴臂喷射。使三个喷嘴臂上下移动，使得喷嘴臂横切清洁溶液的喷射流向下倾斜地排出，从而依次清洁三个喷嘴臂。然后，将氮气从干燥气体喷嘴喷出并喷射到喷嘴臂上，以除去附着在喷嘴臂上的清洗液，从而干燥喷嘴臂。

2. 发明申请

US20120273011A1 METHOD OF CLEANING SUBSTRATE PROCESSING APPARATUS 有权
标题翻译：清洗基板加工装置的方法
公开(公告)号：US20120273011A1
公开(公告)日：2012-11-01
申请号：US13450654
申请日：2012-04-19
申请人： Naoyuki OSADA , Kentaro SUGIMOTO
发明人： Naoyuki OSADA , Kentaro SUGIMOTO
IPC分类号： B08B7/04 , B08B5/02 , B08B3/02
CPC分类号： B08B3/02 , H01L21/02002 , H01L21/02082 , H01L21/67051
摘要： A spin base is caused to rotate at a number of revolutions of from 250 rmp to 350 rpm (first number of revolutions), and at the same time, a cleaning solution is supplied to a holding surface of a spin base while the upper end of a processing cup is placed below the holding surface. Thus, an outer upper surface of the processing cup is cleaned with the cleaning solution scattered from the holding surface. Then, the spin base is caused to rotate at a number of revolutions of from 350 rpm to 450 rpm (second number of revolutions) higher than the first number of revolutions, and at the same time, a cleaning solution is supplied onto the holding surface. Thus, a partition plate outside the processing cup is cleaned with the cleaning solution scattered from the rotating holding surface.
摘要翻译：使旋转基座以250rmp至350rpm的转数（第一转数）旋转，同时将清洗液供给到旋转基材的保持表面，同时，处理杯放置在保持表面下方。因此，处理杯的外部上表面被从保持表面散射的清洁溶液清洁。然后，旋转基座以比第一转数高350rpm至450rpm（第二转数）的转数旋转，同时将清洗液供给到保持面。因此，从旋转的保持面散开的清洗液清洗处理杯外部的隔板。

3. 发明授权

US09027577B2 Nozzle and a substrate processing apparatus including the same 有权
标题翻译：喷嘴和包括该喷嘴的基板处理装置
公开(公告)号：US09027577B2
公开(公告)日：2015-05-12
申请号：US11871595
申请日：2007-10-12
申请人： Naoyuki Osada , Masashi Sawamura , Koji Hasegawa
发明人： Naoyuki Osada , Masashi Sawamura , Koji Hasegawa
IPC分类号： B08B3/12 , H01L21/67
CPC分类号： H01L21/67051 , H01L21/6708
摘要： A nozzle of a nozzle device includes an arm pipe that extends in a horizontal direction and a downstream pipe formed so as to curve downward from one end of the arm pipe. In the nozzle, a metallic pipe is provided inside a second resin pipe. Moreover, a first resin pipe is provided inside the metallic pipe. A boss is attached to the tip of the metallic pipe between the first resin pipe and the second resin pipe. At the tip of the nozzle, an outer peripheral surface of the first resin pipe, an end surface of the second resin pipe and an end surface of the boss are welded by welding resin. In this way, the metallic pipe is reliably coated with the first resin pipe, the second resin pipe, the boss and the welding resin.
摘要翻译：喷嘴装置的喷嘴包括沿水平方向延伸的臂管和形成为从臂管的一端向下弯曲的下游管。在喷嘴中，金属管设置在第二树脂管的内部。此外，第一树脂管设置在金属管内。在第一树脂管和第二树脂管之间的金属管的末端附接有凸台。在喷嘴的尖端，通过焊接树脂焊接第一树脂管的外周面，第二树脂管的端面和凸台的端面。以这种方式，金属管可靠地涂覆有第一树脂管，第二树脂管，凸台和焊接树脂。

4. 发明申请

US20080251107A1 NOZZLE AND A SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME 有权
标题翻译：喷嘴和基板加工装置，包括它们
公开(公告)号：US20080251107A1
公开(公告)日：2008-10-16
申请号：US11871595
申请日：2007-10-12
申请人： Naoyuki OSADA , Masashi SAWAMURA , Koji HASEGAWA
发明人： Naoyuki OSADA , Masashi SAWAMURA , Koji HASEGAWA
IPC分类号： B08B13/00
CPC分类号： H01L21/67051 , H01L21/6708
摘要： A nozzle of a nozzle device includes an arm pipe that extends in a horizontal direction and a downstream pipe formed so as to curve downward from one end of the arm pipe. In the nozzle, a metallic pipe is provided inside a second resin pipe. Moreover, a first resin pipe is provided inside the metallic pipe. A boss is attached to the tip of the metallic pipe between the first resin pipe and the second resin pipe. At the tip of the nozzle, an outer peripheral surface of the first resin pipe, an end surface of the second resin pipe and an end surface of the boss are welded by welding resin. In this way, the metallic pipe is reliably coated with the first resin pipe, the second resin pipe, the boss and the welding resin.
摘要翻译：喷嘴装置的喷嘴包括沿水平方向延伸的臂管和形成为从臂管的一端向下弯曲的下游管。在喷嘴中，金属管设置在第二树脂管的内部。此外，第一树脂管设置在金属管内。在第一树脂管和第二树脂管之间的金属管的末端附接有凸台。在喷嘴的尖端，通过焊接树脂焊接第一树脂管的外周面，第二树脂管的端面和凸台的端面。以这种方式，金属管可靠地涂覆有第一树脂管，第二树脂管，凸台和焊接树脂。

5. 发明授权

US5962070A Substrate treating method and apparatus 有权
标题翻译：基板处理方法及装置
公开(公告)号：US5962070A
公开(公告)日：1999-10-05
申请号：US149438
申请日：1998-09-08
申请人： Tsuyoshi Mitsuhashi , Takuya Wada , Koji Hashimoto , Naoyuki Osada
发明人： Tsuyoshi Mitsuhashi , Takuya Wada , Koji Hashimoto , Naoyuki Osada
IPC分类号： G03F7/30 , H01L21/00 , B05D3/12 , B05C11/02 , B08B7/00
CPC分类号： H01L21/6715 , G03F7/3021
摘要： A substrate treating method and apparatus for treating a substrate by supplying a developing solution thereto while spinning the substrate. A nozzle having a plurality of discharge openings for discharging the developer is disposed such that the discharge openings are at different distances from the spin center of the substrate. The developer is discharged from the nozzle while the latter is moved radially of the substrate. The discharge openings then describe loci not overlapping one another over the substrate. The developer is evenly supplied over the substrate to promote the uniformity of development on the substrate surface.
摘要翻译：一种基板处理方法和装置，用于在旋转基板的同时通过向其提供显影溶液来处理基板。具有用于排出显影剂的多个排出口的喷嘴被设置成使得排出开口处于与基板的旋转中心不同的距离处。显影剂从喷嘴排出，而后者则从衬底的径向移动。然后，排出口描述在衬底上彼此不重叠的位点。显影剂被均匀地供应到基底上以促进基底表面上的显影的均匀性。

6. 发明授权

US09190300B2 Method of cleaning substrate processing apparatus 有权
标题翻译：清洗基板处理装置的方法
公开(公告)号：US09190300B2
公开(公告)日：2015-11-17
申请号：US13450654
申请日：2012-04-19
申请人： Naoyuki Osada , Kentaro Sugimoto
发明人： Naoyuki Osada , Kentaro Sugimoto
IPC分类号： B08B7/00 , H01L21/67
CPC分类号： B08B3/02 , H01L21/02002 , H01L21/02082 , H01L21/67051
摘要： A spin base is caused to rotate at a number of revolutions of from 250 rmp to 350 rpm (first number of revolutions), and at the same time, a cleaning solution is supplied to a holding surface of a spin base while the upper end of a processing cup is placed below the holding surface. Thus, an outer upper surface of the processing cup is cleaned with the cleaning solution scattered from the holding surface. Then, the spin base is caused to rotate at a number of revolutions of from 350 rpm to 450 rpm (second number of revolutions) higher than the first number of revolutions, and at the same time, a cleaning solution is supplied onto the holding surface. Thus, a partition plate outside the processing cup is cleaned with the cleaning solution scattered from the rotating holding surface.
摘要翻译：使旋转基座以250rmp至350rpm的转数（第一转数）旋转，同时将清洗液供给到旋转基材的保持表面，同时，处理杯放置在保持表面下方。因此，处理杯的外部上表面被从保持表面散射的清洁溶液清洁。然后，旋转基座以比第一转数高350rpm至450rpm（第二转数）的转数旋转，同时将清洗液供给到保持面。因此，从旋转的保持面散开的清洗液清洗处理杯外部的隔板。

7. 发明申请

US20130020284A1 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USING PROCESSING SOLUTION 有权
标题翻译：基板处理装置和基板处理方法
公开(公告)号：US20130020284A1
公开(公告)日：2013-01-24
申请号：US13539626
申请日：2012-07-02
申请人： Naoyuki OSADA , Kentaro SUGIMOTO
发明人： Naoyuki OSADA , Kentaro SUGIMOTO
IPC分类号： B05B15/00 , B44C1/22 , B05B1/18
CPC分类号： H01L21/67051 , B08B3/022 , B08B3/041 , B08B9/023 , H01L21/67028 , H01L21/67034
摘要： Nozzle arms for holding discharge heads are caused by a pivotal driving part to move between a processing position above a substrate and a standby position outside a processing cup surrounding a substrate. When the nozzle arms having cleaned a substrate is placed at the standby position, a cleaning solution is ejected from a shower nozzle toward the nozzle arms arranged obliquely downward of the shower nozzle. The three nozzle arms are caused to move up and down such that the nozzle arms cut across a jet of a cleaning solution discharged obliquely downward, thereby cleaning the three nozzle arms in order. Then, a nitrogen gas is ejected from a drying gas nozzle and sprayed on the nozzle arms to remove the cleaning solution attached to the nozzle arms, thereby drying the nozzle arms.
摘要翻译：用于保持排出头的喷嘴臂由枢转驱动部分引起，以在基板上方的处理位置和围绕基板的加工杯外部的待机位置之间移动。当清洗了基板的喷嘴臂被放置在待机位置时，清洗液从淋浴喷嘴朝向淋浴喷嘴的斜下方布置的喷嘴臂喷射。使三个喷嘴臂上下移动，使得喷嘴臂横切清洁溶液的喷射流向下倾斜地排出，从而依次清洁三个喷嘴臂。然后，将氮气从干燥气体喷嘴喷出并喷射到喷嘴臂上，以除去附着在喷嘴臂上的清洗液，从而干燥喷嘴臂。

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