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1. 发明授权

US5609989A Acid scavengers for use in chemically amplified photoresists 失效
公开(公告)号：US5609989A
公开(公告)日：1997-03-11
申请号：US466568
申请日：1995-06-06
申请人： Nageshwer R. Bantu , William R. Brunsvold , George J. Hefferon , Wu-Song Huang , Ahmad D. Katnani , Mahmoud M. Khojasteh , Ratnam Sooriyakumaran , Dominic C. Yang
发明人： Nageshwer R. Bantu , William R. Brunsvold , George J. Hefferon , Wu-Song Huang , Ahmad D. Katnani , Mahmoud M. Khojasteh , Ratnam Sooriyakumaran , Dominic C. Yang
IPC分类号： G03F7/004 , G03F7/039
CPC分类号： G03F7/039 , G03F7/0045
摘要： Proton sponge, berberine, and cetyltrimethyl ammonium hydroxide base compounds are used as additives to chemically amplified photoresists based on modified polyhydroxystyrene (PHS). The base additives scavenge free acids from the photoresist in order to preserve the acid labile moieties on the modified PHS polymer. The base additives are well suited to industrial processing conditions, do not react with the photoacid compounds in the photoresist composition to form byproducts which would hinder photoresist performance, and extend the shelf-life of the photoresist composition. In addition, the proton sponge and berberine base additives have a different absorption spectra than the modified PHS polymer, therefore, the quantity of base additive within the photoresist can be easily assayed and controlled.

2. 发明授权

US5281723A Propylene carbonate recovery process 失效
标题翻译：碳酸亚丙酯回收工艺
公开(公告)号：US5281723A
公开(公告)日：1994-01-25
申请号：US925349
申请日：1992-08-04
申请人： Nageshwer R. Bantu , Anilkumar C. Bhatt , Ross W. Keesler , Konstantinos Papathomas , Terry D. Sinclair , Jerome J. Wagner
发明人： Nageshwer R. Bantu , Anilkumar C. Bhatt , Ross W. Keesler , Konstantinos Papathomas , Terry D. Sinclair , Jerome J. Wagner
IPC分类号： B01D3/00 , C07D317/36 , G03F7/30 , G03F7/42 , H01L21/02 , H01L21/027 , H01L21/30 , C07D317/08
CPC分类号： C07D317/36
摘要： Disclosed is a method of recovering a cyclic alkylene carbonate, such as propylene carbonate, from an effluent stream of a process in which the cyclic alkylene carbonate removes an organic photoresist material from a substrate. The effluent is a cyclic alkylene carbonate effluent, e.g., a propylene carbonate effluent, of the carbonate, water, and polymeric solids. In the recovery process the cyclic alkylene carbonate effluent is fed to a heat exchanger, and separated into (i) water and volatiles, and (ii) cyclic carbonate. This lowers the concentration of water in the cyclic alkylene carbonate to a level that is low enough to substantially avoid hydrolysis of cyclic alkylene carbonate to the corresponding glycol. The dewatered cyclic alkylene carbonate is evaporated to separate the cyclic alkylene carbonate from high boiling materials and polymeric solids. The dewatered cyclic alkylene carbonate is separated into (i) a cyclic alkylene carbonate fraction, and (ii) a photoresist solids fraction. The photoresist materials fractions contains photoresist material in the alkylene carbonate. The cyclic alkylene carbonate fraction is further separated in a fractionation means into a higher vapor pressure alkylene glycol fraction, and a lower vapor pressure alkylene carbonate fraction.
摘要翻译：公开了从循环碳酸亚烃酯从底物去除有机光致抗蚀剂材料的方法的流出物流中回收碳酸亚环己基碳酸酯的方法。流出物是碳酸酯，水和聚合物固体的环状碳酸亚烃酯流出物，例如碳酸亚丙酯流出物。在回收过程中，将环状碳酸亚烃酯流出物进料到热交换器中，并分离成（i）水和挥发物，和（ii）环状碳酸酯。这将环状碳酸亚烃酯中的水的浓度降低至足以基本上避免环状亚烷基碳酸酯水解成相应的二醇的水平。将脱水的环状碳酸亚烃酯蒸发以从环烷烃碳酸酯与高沸点物质和聚合物固体分离。将脱水的环状碳酸亚烃酯分离成（i）环状碳酸亚烷基酯馏分，（ii）光致抗蚀剂固体分数。光致抗蚀剂材料部分在碳酸亚烷基酯中含有光致抗蚀剂材料。环状亚烷基碳酸酯部分在分馏装置中进一步分离成较高蒸气压亚烷基二醇馏分和较低蒸气压的碳酸亚烃酯馏分。

3. 发明授权

US5268260A Photoresist develop and strip solvent compositions and method for their use 失效
标题翻译：光刻胶开发和剥离其使用的溶剂组合物和方法
公开(公告)号：US5268260A
公开(公告)日：1993-12-07
申请号：US781542
申请日：1991-10-22
申请人： Nageshwer R. Bantu , Anilkumar C. Bhatt , Ashwinkumar C. Bhatt , Joseph A. Kotylo , Gerald W. Jones , Robert J. Owen , Kostas Papathomas , Anaya K. Vardya
发明人： Nageshwer R. Bantu , Anilkumar C. Bhatt , Ashwinkumar C. Bhatt , Joseph A. Kotylo , Gerald W. Jones , Robert J. Owen , Kostas Papathomas , Anaya K. Vardya
IPC分类号： G03F7/32 , G03F7/42 , H05K3/06 , G03F7/30
CPC分类号： G03F7/422 , G03F7/325
摘要： Simple, environmentally friendly developers and strippers are disclosed for free radical-initiated, addition polymerizable resists, cationically cured resists and solder masks and Vacrel photoresists. In all cases both the developers and the strippers include gamma butyrolactone, propylene carbonate and benzyl alcohol, optionally also including a minor amount of methanol, ethanol, isopropyl alcohol, propylene glycol monomethylacetate, ethylene glycol monomethyl ether, formamide, nitromethane, propylene oxide, or methyl ethyl ketone, acetone and water.
摘要翻译：公开了简单的，环保的显影剂和剥离剂，用于自由基引发的可加聚合的抗蚀剂，阳离子固化的抗蚀剂和焊接掩模以及Vacrel光致抗蚀剂。在所有情况下，显影剂和剥离剂都包括γ-丁内酯，碳酸亚丙酯和苄醇，任选地还包括少量甲醇，乙醇，异丙醇，丙二醇单甲基乙酸酯，乙二醇单甲醚，甲酰胺，硝基甲烷，环氧丙烷或甲基乙基酮，丙酮和水。

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