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1. 发明授权

US10940230B2 Chitosan-based hemostatic member for cervix and method of manufacturing the same 有权
公开(公告)号：US10940230B2
公开(公告)日：2021-03-09
申请号：US15771230
申请日：2017-11-14
申请人： ENDOVISION CO., LTD. , Min Ho Jung
发明人： Min Ho Jung
IPC分类号： A61L15/28 , A61F13/36 , A61B17/12 , A61F13/00 , A61L24/00 , A61L24/08 , A61B90/00 , A61B17/00 , A61B17/42
摘要： This invention relates to a hemostatic member using chitosan having superior hemostatic activity, and more particularly to a chitosan-based hemostatic member for the cervix, suitable for use through insertion into an affected part upon cervical biopsy or surgery, configured to include a hemostatic pack having a projection at an upper end thereof through tying with a thread so as to form a spherical shape using chitosan nonwoven fabrics having a hemostatic function, wherein the thread contains an X-ray-sensitive material, thereby realizing effective hemostasis of the affected part upon cervical biopsy or surgery.

2. 发明申请

US20190099512A1 CHITOSAN-BASED HEMOSTATIC MEMBER FOR CERVIX AND METHOD OF MANUFACTURING THE SAME 审中-公开
公开(公告)号：US20190099512A1
公开(公告)日：2019-04-04
申请号：US15771230
申请日：2017-11-14
申请人： Min Ho JUNG , ENDOVISION CO., LTD.
发明人： Min Ho JUNG
IPC分类号： A61L15/28 , A61B17/12 , A61F13/36
摘要： This invention relates to a hemostatic member using chitosan having superior hemostatic activity, and more particularly to a chitosan-based hemostatic member for the cervix, suitable for use through insertion into an affected part upon cervical biopsy or surgery, configured to include a hemostatic pack having a projection at an upper end thereof through tying with a thread so as to form a spherical shape using chitosan nonwoven fabrics having a hemostatic function, wherein the thread contains an X-ray-sensitive material, thereby realizing effective hemostasis of the affected part upon cervical biopsy or surgery.

3. 发明申请

US20110199010A1 CONTROL DEVICE, LED LIGHT EMITTING DEVICE INCLUDING THE SAME, AND CONTROL METHOD 有权
标题翻译：控制装置，包括其的LED发光装置和控制方法
公开(公告)号：US20110199010A1
公开(公告)日：2011-08-18
申请号：US13028628
申请日：2011-02-16
申请人： Gye-Hyun CHO , Min-ho JUNG , Sung-Yun PARK , Dong-Hwan KIM
发明人： Gye-Hyun CHO , Min-ho JUNG , Sung-Yun PARK , Dong-Hwan KIM
IPC分类号： H05B37/02 , H02M7/217
CPC分类号： H02M1/083 , H05B33/0818 , Y02B20/346 , Y02B20/348
摘要： The present invention relates to a switching operation control device of a power switch, an LED light emitting device including the same, and a control method thereof. The control device detects a zero crossing time when a voltage at an input end of the power switch becomes a zero voltage, generates a reference signal that is synchronized with the voltage at the input end of the power switch by using the detected zero crossing time, and compensates the generated reference signal with a first voltage that is greater than the zero voltage during a blocking period corresponding to the zero crossing time.
摘要翻译：本发明涉及一种电源开关的开关操作控制装置，包括该开关操作控制装置的LED发光装置及其控制方法。当电源开关输入端的电压变为零电压时，控制装置检测过零时间，通过使用检测到的过零时间产生与电源开关输入端的电压同步的参考信号，并且在对应于过零时间的阻塞期间内用大于零电压的第一电压来补偿所产生的参考信号。

4. 发明申请

US20100019809A1 Switch Controller, Switch Control Method, And Converter Using The Same 有权
标题翻译：开关控制器，开关控制方法和使用它的转换器
公开(公告)号：US20100019809A1
公开(公告)日：2010-01-28
申请号：US12509013
申请日：2009-07-24
申请人： Jong-Tae Hwang , Moon-Sang Jung , Jin-Sung Kim , Dae-Ho Kim , Min-Ho Jung
发明人： Jong-Tae Hwang , Moon-Sang Jung , Jin-Sung Kim , Dae-Ho Kim , Min-Ho Jung
IPC分类号： H03B28/00
CPC分类号： H02M1/4208 , Y02B70/126
摘要： Disclosed are a switch controller, a switch control method, and a converter based thereon. The switch controller generates an input sensing voltage corresponding to the input voltage of the converter, and compares the input sensing voltage with a predetermined first reference value. The switch controller generates a zero cross detection signal with a first level or a second level depending upon the comparison result, and generates a reference clock signal varying in frequency in accordance with one cycle of the zero cross detection signal. The switch controller generates digital signals by using the reference clock signal and the zero cross detection signal. The digital signals synchronize with the zero cross detection signal, and increase in accordance with the reference clock signal during a half of one cycle of the zero cross detection signal, while decreasing in accordance with the reference clock signal during the other half cycle of the zero cross detection signal. The switch controller generates a reference signal with a voltage level corresponding to the digital signal.
摘要翻译：公开了一种开关控制器，开关控制方法和基于其的转换器。开关控制器产生与转换器的输入电压相对应的输入感测电压，并将输入感测电压与预定的第一参考值进行比较。开关控制器根据比较结果产生具有第一电平或第二电平的零交叉检测信号，并且根据过零检测信号的一个周期产生频率变化的参考时钟信号。开关控制器通过使用参考时钟信号和过零检测信号来产生数字信号。数字信号与零交叉检测信号同步，并且在零交叉检测信号的一个周期的一半期间根据参考时钟信号增加，而在零的另一半周期期间根据参考时钟信号减小交叉检测信号。开关控制器产生具有与数字信号对应的电压电平的参考信号。

5. 发明申请

US20090067111A1 Flexible soft x-ray ionizer 有权
标题翻译：柔性软X射线电离器
公开(公告)号：US20090067111A1
公开(公告)日：2009-03-12
申请号：US11918832
申请日：2005-10-18
申请人： Yong-Chul Jung , Byung-Soo Lee , Min-Ho Jung , Chung Han Shim
发明人： Yong-Chul Jung , Byung-Soo Lee , Min-Ho Jung , Chung Han Shim
IPC分类号： H05F3/04
CPC分类号： H01J35/18 , H01J35/16 , H01J2235/166 , H01J2235/168 , H01J2235/186 , H05F3/06
摘要： A flexible ionizer uses soft X-ray and has a head unit generating soft X-ray whose wavelength is 1.2˜1.5 Å, a soft X-ray protect unit shielding the leak of the soft X-ray from the head unit, and a power control unit supplying a control signal and control voltage to the head unit. The head unit is positioned outside of the soft X-ray protect unit with the flexible ionizer further having a flexible tube protecting a high voltage cable that connects the head unit and power control unit from external impact or vibration and letting the user bend the head of the head unit at an arbitrary angle toward a charged body if necessary, a connecting device letting the ions generated at the window positioned inside of the body of the ionizer emit toward the charged body by connecting one end of the flexible tube and the head unit, and a connecting device connecting the other end of the flexible tube and the body of the ionizer. The high voltage power lines in the flexible tube are molded to prevent short circuits occurring at a near distance between the high voltage power lines and mutual induction voltages occurring. The short circuit and the mutual induction voltage are caused by the mutual influence of the high voltage lines.
摘要翻译：柔性电离器使用软X射线，并具有头部单元，其产生波长为1.2〜1.5的软X射线，该软X射线保护单元屏蔽来自头单元的软X射线的泄漏，以及功率控制单元向头单元提供控制信号和控制电压。头单元位于软X射线保护单元的外部，柔性电离器还具有柔性管，保护连接头单元和电源控制单元的高压电缆免受外部冲击或振动，并使用户弯曲头部如果需要，头单元以任意角度朝向带电体，通过连接柔性管和头单元的一端，使位于离子发生器的主体内部的窗处产生的离子朝向带电体发射的连接装置，以及将柔性管的另一端和离子发生器的主体连接的连接装置。柔性管中的高压电力线被模制以防止在高压电力线之间的近距离处发生短路并且产生相互感应电压。短路和互感电压是由高压线相互影响引起的。

6. 发明授权

US06984482B2 Top-coating composition for photoresist and process for forming fine pattern using the same 失效
标题翻译：用于光致抗蚀剂的顶涂组合物和使用其形成精细图案的方法
公开(公告)号：US06984482B2
公开(公告)日：2006-01-10
申请号：US10174497
申请日：2002-06-17
申请人： Jae Chang Jung , Keun Kyu Kong , Hyeong Soo Kim , Jin Soo Kim , Cha Won Koh , Sung Eun Hong , Geun Su Lee , Min Ho Jung , Ki Ho Baik
发明人： Jae Chang Jung , Keun Kyu Kong , Hyeong Soo Kim , Jin Soo Kim , Cha Won Koh , Sung Eun Hong , Geun Su Lee , Min Ho Jung , Ki Ho Baik
IPC分类号： G03F7/11 , G03F7/09 , G03F7/00
CPC分类号： G03F7/11 , G03F7/0045
摘要： The present invention provides an over-coating composition comprising a basic compound for coating a photoresist composition to provide a vertical photoresist pattern.
摘要翻译：本发明提供一种包覆组合物，其包含用于涂覆光致抗蚀剂组合物以提供垂直光致抗蚀剂图案的碱性化合物。

7. 发明授权

US06858371B2 Maleimide-photoresist monomers containing halogen, polymers thereof and photoresist compositions comprising the same 失效
标题翻译：含有卤素的马来酰亚胺 - 光致抗蚀剂单体，其聚合物和包含其的光致抗蚀剂组合物
公开(公告)号：US06858371B2
公开(公告)日：2005-02-22
申请号：US10080335
申请日：2002-02-21
申请人： Geun Su Lee , Jae Chang Jung , Min Ho Jung , Cha Won Koh , Ki Soo Shin
发明人： Geun Su Lee , Jae Chang Jung , Min Ho Jung , Cha Won Koh , Ki Soo Shin
IPC分类号： G03F7/033 , C08F210/04 , C08F220/10 , C08F222/40 , C08F232/08 , G03F7/004 , G03F7/039 , H01L21/027 , C08F26/06
CPC分类号： G03F7/0046 , G03F7/0395 , Y10S430/106 , Y10S430/108
摘要： Photoresist monomers, photoresist polymers prepared thereof, and photoresist compositions using the polymer are disclosed. More specifically, photoresist polymers comprising maleimide monomer represented by Formula 1, and a composition comprising the polymer thereof are disclosed. The photoresist composition has excellent etching resistance, heat resistance and adhesiveness, and can be developed in an aqueous tetramethylammonium hydroxide (TMAH) solution. As the composition has low light absorbance at 193 nm and 157 nm wavelength, and it is suitable for a process using ultraviolet light source such as VUV (157 nm) wherein, X1, X2, R1, R2 and R3 are defined in the specification.
摘要翻译：公开了光致抗蚀剂单体，其制备的光致抗蚀剂聚合物和使用该聚合物的光致抗蚀剂组合物。更具体地，公开了包含由式1表示的马来酰亚胺单体的光致抗蚀剂聚合物和包含其聚合物的组合物。光致抗蚀剂组合物具有优异的耐蚀刻性，耐热性和粘合性，并且可以在四甲基氢氧化铵（TMAH）水溶液中显影。由于组合物在193nm和157nm波长处具有低吸光度，并且适用于使用紫外光源如VUV（157nm）的方法，其中X1，X2，R1，R2和R3在本说明书中定义。

8. 发明授权

US06770414B2 Additive for photoresist composition for resist flow process 失效
标题翻译：光刻胶组合物用于抗蚀剂流程的添加剂
公开(公告)号：US06770414B2
公开(公告)日：2004-08-03
申请号：US09878803
申请日：2001-06-11
申请人： Min Ho Jung , Sung Eun Hong , Jae Chang Jung , Geun Su Lee , Ki Ho Baik
发明人： Min Ho Jung , Sung Eun Hong , Jae Chang Jung , Geun Su Lee , Ki Ho Baik
IPC分类号： G03F700
CPC分类号： G03F7/0395 , C07J9/00 , G03F7/0045 , Y10S430/106 , Y10S430/111 , Y10S430/115 , Y10T428/24802
摘要： The present invention provides an additive for a photoresist composition for a resist flow process. A compound of following Formula 1 having low glass transition temperature is added to a photoresist composition containing a polymer which is not suitable for the resist flow process due to its high glass transition temperature, thus improving a flow property of the photoresist composition. As a result, the photoresist composition comprising an additive of Formula 1 can be used for the resist flow process. wherein, A, B, R and R′ are as defined in the specification of the invention.
摘要翻译：本发明提供了用于抗蚀剂流动方法的光致抗蚀剂组合物的添加剂。将具有低玻璃化转变温度的下述式1化合物加入含有聚合物的光致抗蚀剂组合物中，该聚合物由于其玻璃化转变温度高而不适于抗蚀剂流动过程，从而改善光致抗蚀剂组合物的流动性能。结果，包含式1的添加剂的光致抗蚀剂组合物可用于抗蚀剂流动过程。其中A，B，R和R'如本发明的说明书中所定义。

9. 发明授权

US06602650B2 Organic anti-reflective coating polymer, anti-reflective coating composition comprising the same and methods of preparation thereof 有权
标题翻译：有机抗反射涂层聚合物，包含其的抗反射涂料组合物及其制备方法
公开(公告)号：US06602650B2
公开(公告)日：2003-08-05
申请号：US10099295
申请日：2002-03-13
申请人： Sung-eun Hong , Min-ho Jung , Jae-chang Jung , Geun-su Lee , Ki-ho Baik
发明人： Sung-eun Hong , Min-ho Jung , Jae-chang Jung , Geun-su Lee , Ki-ho Baik
IPC分类号： G03C176
CPC分类号： C08F220/36 , C07C251/54 , C08F220/40 , G03F7/091 , Y10S430/111 , C08F2220/281 , C08F216/38
摘要： A compound of Formula 10, an organic anti-reflective polymer having the structure of Formula 1 synthesized from the compound of Formula 1 and a preparation method thereof. An anti-reflective coating composition including the above organic anti-reflective polymer, as well as a preparation method of an anti-reflective coating. The anti-reflective coating comprising the disclosed polymer eliminates standing waves caused by the optical properties of lower layers on the wafer and by the changes in the thickness of the photoresist, prevents back reflection and also solves the problem of CD alteration cause by the diffracted and reflected light from such lower layers. Such advantages enable the formation of stable ultrafine patterns suitable for 64M, 256M, 1G, 4G, and 16G DRAM semiconductor devices and an increase of the production yields. Further, it is also possible to control the k value
摘要翻译：式10的化合物，由式1化合物合成的具有结构式1的有机抗反射聚合物及其制备方法。包含上述有机抗反射聚合物的抗反射涂料组合物以及抗反射涂层的制备方法。包含所公开的聚合物的抗反射涂层消除了由晶片上的下层的光学性质引起的驻波以及光致抗蚀剂的厚度变化，防止背反射，并且还解决了衍射和来自这种较低层的反射光。这样的优点使得能够形成适合于64M，256M，1G，4G和16G DRAM半导体器件的稳定的超细格局，并且提高了产量。此外，还可以控制k值

10. 发明授权

US06599678B2 Organic anti-reflective coating polymer, anti-reflective coating composition comprising the same and method of preparation thereof 有权
公开(公告)号：US06599678B2
公开(公告)日：2003-07-29
申请号：US09888829
申请日：2001-06-25
申请人： Sung-eun Hong , Min-ho Jung , Jae-chang Jung , Geun-su Lee , Ki-ho Baik
发明人： Sung-eun Hong , Min-ho Jung , Jae-chang Jung , Geun-su Lee , Ki-ho Baik
IPC分类号： G03C176
CPC分类号： G03F7/091 , C08F220/36 , Y10S430/106 , Y10S430/111
摘要： An organic anti-reflective polymer having the following Formula 1, its preparation method, an anti-reflective coating composition comprising the said organic anti-reflective polymer and a preparation method of an anti-reflective coating made therefrom. The anti-reflective coating comprising the disclosed polymer eliminates standing waves caused by the optical properties of lower layers on the wafer and by the thickness changes of the photoresist, prevents back reflection and CD alteration caused by the diffracted and reflected light from such lower layers. Such advantages enable the formation of stable ultrafine patterns suitable for 64M, 256M, 1G, 4G, and 16G DRAM semiconductor devices and improve the production yields. Further, it is also possible to control the k value and the increased hydrophobicity facilitates EBR (Edge Bead Removal).

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