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1. 发明申请

US20100290023A1 METHOD FOR DETECTING SUBSTRATE POSITION OF CHARGED PARTICLE BEAM PHOTOLITHOGRAPHY APPARATUS AND CHARGED PARTICLE BEAM PHOTOLITHOGRAPHY APPARATUS 有权
标题翻译：用于检测充电颗粒光束照相装置和充电颗粒光栅照相装置的基板位置的方法
公开(公告)号：US20100290023A1
公开(公告)日：2010-11-18
申请号：US12778472
申请日：2010-05-12
申请人： Kota FUJIWARA , Yoshiro Yamanaka , Michihiro Kawaguchi , Kazuhiro Shiba
发明人： Kota FUJIWARA , Yoshiro Yamanaka , Michihiro Kawaguchi , Kazuhiro Shiba
IPC分类号： G03B27/58
CPC分类号： G03B27/58 , B82Y10/00 , B82Y40/00 , H01J37/3045 , H01J37/3174 , H01J2237/20221 , H01J2237/2482
摘要： One aspect of the invention provides a substrate position detecting method for charged particle beam photolithography apparatus in order to be able to measure accurately and simply a substrate position on a stage. The substrate position detecting method for charged particle beam photolithography apparatus includes placing a substrate on a stage that can be moved in an X-direction and a Y-direction; measuring a position in the X-direction of the stage while moving the stage in the X-direction, and illuminating obliquely an upper surface of the substrate with a laser beam to receive light reflected from the substrate with a position sensing device; computing a barycentric position of the reflected light when the stage is moved in the X-direction; measuring a position in the Y-direction of the stage while moving the stage in the Y-direction, and illuminating obliquely the upper surface of the substrate with the laser beam to receive light reflected from the substrate with the position sensing device; computing a barycentric position of the reflected light when the stage is moved in the Y-direction; and computing the positions of the substrate from the position measurement results of the stage and the computed barycentric position.
摘要翻译：本发明的一个方面提供一种用于带电粒子束光刻设备的基板位置检测方法，以便能够准确且简单地测量台上的基板位置。用于带电粒子束光刻设备的基片位置检测方法包括将基片放置在能沿X方向和Y方向移动的台上; 在X方向移动载物台的同时测量载物台的X方向上的位置，用激光束倾斜地照射基板的上表面，以利用位置检测装置接收从基板反射的光; 当所述台沿X方向移动时计算反射光的重心位置; 同时沿着Y方向移动台，测量台的Y方向的位置，并用激光束倾斜地照射基板的上表面，以利用位置感测装置接收从基板反射的光; 当所述载物台沿Y方向移动时计算反射光的重心位置; 以及从所述台的位置测量结果和所计算的重心位置计算所述基板的位置。

2. 发明授权

US07632783B2 3-(dihydro(tetrahydro)isoquinolin-1-yl)quinoline compound 有权
标题翻译：（二氢（四氢）异喹啉-1-基）喹啉化合物
公开(公告)号：US07632783B2
公开(公告)日：2009-12-15
申请号：US10587100
申请日：2005-01-21
申请人： Hiroyuki Ito , Kota Fujiwara , Munetsugu Morimoto , Harukazu Tanaka , Yasushi Tamagawa , Hiroyuki Komai
发明人： Hiroyuki Ito , Kota Fujiwara , Munetsugu Morimoto , Harukazu Tanaka , Yasushi Tamagawa , Hiroyuki Komai
IPC分类号： A01N43/42 , C07D215/36
CPC分类号： C07D215/04 , A01N43/42 , A01N43/90 , C07D401/04 , C07D405/04 , C07D405/14 , C07D409/14 , C07D413/14 , C07D498/04
摘要： The invention provides compounds which exert excellent fungicidal activities against various plant diseases and are useful as active ingredients of pesticides permitting the control of rice blast and so on even in low dosages. Compounds represented by the general formulae (1a) to (1d) or salts thereof: (1a) (1b) (1c) (or) (1d) wherein R1 and R2 are each C1-6 alkyl or the like; R3 and R4 are each hydrogen, halogeno, or the like; R5 is hydrogen, C1-6 alkyl, or the like; X is halogeno, C1-6 alkyl, or the like; Y is halogeno, C1-6 alkyl, or the like; n is an integer of 0 to 4; and m is an integer of 0 to 6.
摘要翻译：本发明提供对各种植物病害具有优异杀真菌活性的化合物，并且即使在低剂量下也可用作允许控制稻瘟病等的农药的活性成分。由通式（1a）至（1d）表示的化合物或其盐：（1a）（1b）（1c）（或）（1d）其中R1和R2各自为C1-6烷基等; R 3和R 4各自为氢，卤素等; R5是氢，C1-6烷基等; X是卤素，C 1-6烷基等; Y为卤素，C 1-6烷基等; n为0〜4的整数。 m为0〜6的整数。

3. 发明申请

US20080275242A1 3-(Dihydro(Tetrahydro)Isoquinolin-1-Yl)Quinoline Compound 有权
标题翻译： 3-（二氢（四氢）异喹啉-1-基）喹啉化合物
公开(公告)号：US20080275242A1
公开(公告)日：2008-11-06
申请号：US10587100
申请日：2005-01-21
申请人： Hiroyuki Ito , Kota Fujiwara , Munetsugu Morimoto , Harukazu Tanaka , Yasushi Tamagawa , Hiroyuki Komai
发明人： Hiroyuki Ito , Kota Fujiwara , Munetsugu Morimoto , Harukazu Tanaka , Yasushi Tamagawa , Hiroyuki Komai
IPC分类号： C07D401/04
CPC分类号： C07D215/04 , A01N43/42 , A01N43/90 , C07D401/04 , C07D405/04 , C07D405/14 , C07D409/14 , C07D413/14 , C07D498/04
摘要： The invention provides compounds which exert excellent fungicidal activities against various plant diseases and are useful as active ingredients of pesticides permitting the control of rice blast and so on even in low dosages. Compounds represented by the general formulae (1a) to (1d) or salts thereof: (1a) (1b) (1c) (or) (1d) wherein R1 and R2 are each C1-6 alkyl or the like; R3 and R4 are each hydrogen, halogeno, or the like; R5 is hydrogen, C1-6 alkyl, or the like; X is halogeno, C1-6 alkyl, or the like; Y is halogeno, C1-6 alkyl, or the like; n is an integer of 0 to 4; and m is an integer of 0 to 6.
摘要翻译：本发明提供对各种植物病害具有优异杀真菌活性的化合物，并且即使在低剂量下也可用作允许控制稻瘟病等的农药的活性成分。由通式（1a）至（1d）表示的化合物或其盐：（1a）（1b）（1c）（或）（1d）其中R 1和R 2， SUP>各自为C 1-6烷基等; R 3和R 4各自为氢，卤素等; R 5是氢，C 1-6烷基等; X是卤素，C 1-6烷基等; Y是卤素，C 1-6烷基等; n为0〜4的整数。 m为0〜6的整数。

4. 发明授权

US08237139B2 Method for detecting substrate position of charged particle beam photolithography apparatus and charged particle beam photolithography apparatus 有权
标题翻译：用于检测带电粒子束光刻装置和带电粒子束光刻装置的基板位置的方法
公开(公告)号：US08237139B2
公开(公告)日：2012-08-07
申请号：US12778472
申请日：2010-05-12
申请人： Kota Fujiwara , Yoshiro Yamanaka , Michihiro Kawaguchi , Kazuhiro Shiba
发明人： Kota Fujiwara , Yoshiro Yamanaka , Michihiro Kawaguchi , Kazuhiro Shiba
IPC分类号： G01N21/86 , G01V8/00
CPC分类号： G03B27/58 , B82Y10/00 , B82Y40/00 , H01J37/3045 , H01J37/3174 , H01J2237/20221 , H01J2237/2482
摘要： One aspect of the invention provides a substrate position detecting method for charged particle beam photolithography apparatus in order to be able to measure accurately and simply a substrate position on a stage. The substrate position detecting method for charged particle beam photolithography apparatus includes placing a substrate on a stage that can be moved in an X-direction and a Y-direction; measuring a position in the X-direction of the stage while moving the stage in the X-direction, and illuminating obliquely an upper surface of the substrate with a laser beam to receive light reflected from the substrate with a position sensing device; computing a barycentric position of the reflected light when the stage is moved in the X-direction; measuring a position in the Y-direction of the stage while moving the stage in the Y-direction, and illuminating obliquely the upper surface of the substrate with the laser beam to receive light reflected from the substrate with the position sensing device; computing a barycentric position of the reflected light when the stage is moved in the Y-direction; and computing the positions of the substrate from the position measurement results of the stage and the computed barycentric position.
摘要翻译：本发明的一个方面提供一种用于带电粒子束光刻设备的基板位置检测方法，以便能够准确且简单地测量台上的基板位置。用于带电粒子束光刻设备的基片位置检测方法包括将基片放置在能沿X方向和Y方向移动的台上; 在X方向移动载物台的同时测量载物台的X方向上的位置，用激光束倾斜地照射基板的上表面，以利用位置检测装置接收从基板反射的光; 当所述台沿X方向移动时计算反射光的重心位置; 同时沿着Y方向移动台，测量台的Y方向的位置，并用激光束倾斜地照射基板的上表面，以利用位置感测装置接收从基板反射的光; 当所述载物台沿Y方向移动时计算反射光的重心位置; 以及从所述台的位置测量结果和所计算的重心位置计算所述基板的位置。

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