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    • 1. 发明授权
    • Insulated gate field effect transistor with source field shield
extending over multiple region channel
    • 绝缘栅场效应晶体管,源场屏蔽延伸到多个区域通道
    • US4172260A
    • 1979-10-23
    • US853548
    • 1977-11-21
    • Takeaki OkabeIsao YoshidaShikayuki OchiHidefumi ItohMasatomo FurumiToru ToyabeMineo KatsuedaYukio Shirota
    • Takeaki OkabeIsao YoshidaShikayuki OchiHidefumi ItohMasatomo FurumiToru ToyabeMineo KatsuedaYukio Shirota
    • H01L21/331H01L29/06H01L29/40H01L29/41H01L29/73H01L29/78
    • H01L29/404H01L29/7835
    • In an insulated gate field effect transistor having a source region and a drain region of the P-conductivity type which are disposed in surface portions of a semiconductor substrate of the N-conductivity type in a manner to be spaced apart from each other, a gate electrode being disposed through an insulating film on the substrate between the source region and the drain region, an insulated gate field effect transistor wherein said drain region is disposed apart from said gate electrode, two regions of an intermediate region and a high resistance region which are of the P-conductivity type and which successively extend from said drain region towards the side of said gate electrode are disposed in surface portions of the substrate situated between said drain region and said gate electrode, said intermediate region having an impurity concentration lower than that of said drain region, said high resistance region having an impurity concentration lower than that of said intermediate region, and a source electrode extends over and beyond said gate electrode and said high resistance region through said insulating film and terminates over said intermediate region.
    • 在绝缘栅场效应晶体管中,具有P导电类型的源区和漏区,它们以相互间隔开的方式设置在N-导电类型的半导体衬底的表面部分中,栅极 电极通过源极区域和漏极区域之间的衬底上的绝缘膜设置,绝缘栅极场效应晶体管,其中所述漏极区域与所述栅电极隔开,中间区域和高电阻区域的两个区域是 的P导电类型并且从所述漏极区域朝向所述栅电极的侧面依次延伸设置在位于所述漏极区域和所述栅电极之间的衬底的表面部分中,所述中间区域的杂质浓度低于 所述漏极区,所述高电阻区的杂质浓度低于所述中间区的杂质浓度 并且源电极通过所述绝缘膜延伸超过所述栅电极和所述高电阻区域,并且终止于所述中间区域上。