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    • 4. 发明申请
    • DIAGNOSIS SUPPORTING SYSTEM
    • 诊断支持系统
    • US20090070045A1
    • 2009-03-12
    • US12263147
    • 2008-10-31
    • Wataru HATTORIToru SanoMasakazu BabaKazuhiro IidaHisao KawauraNoriyuki IguchiHiroko Someya
    • Wataru HATTORIToru SanoMasakazu BabaKazuhiro IidaHisao KawauraNoriyuki IguchiHiroko Someya
    • G06F19/00G06F17/18
    • G01N27/44717G16H10/60G16H15/00
    • A diagnosis supporting system (10) includes a diagnosis data obtaining unit (20) that obtains diagnosis data in which a movement parameter reflecting a movement speed of each component in separating a sample collected from a test subject into plural components with a chip (12) and a character of each component is in correspondence, a parameter storing unit (34) that stores the movement parameter of a characteristic component showing a state of suffering from a specific disease in correspondence with the disease, a relationship data storing unit (35) that stores relationship data showing a relationship between the character of the characteristic component and a possibility of suffering from a specific disease, a detecting unit (21) that detects the characteristic component from the diagnosis data based on the movement parameter of the characteristic component and the movement parameter of the diagnosis data by making reference to the parameter storing unit (34), and an inference processing unit (22) that infers the possibility that the test subject is suffering by making reference to the relationship data storing unit (35) based on the character of the detected characteristic component.
    • 诊断支持系统(10)包括诊断数据获取单元(20),该诊断数据获取单元(20)获取诊断数据,其中,用芯片(12)将反映从测试对象收集的样本的每个组件的移动速度反映成多个组件的移动参数, 并且每个部件的字符相对应,存储与疾病相对应地显示出患有特定疾病的状态的特征部件的移动参数的参数存储部(34),关系数据存储部(35),其中, 存储表示特征成分的特征与患有特定疾病的可能性之间的关系的关系数据,根据特征成分的移动参数和运动来检测来自诊断数据的特征成分的检测部(21) 参考存储单元(34)的诊断数据的参数以及推断处理 (22),其基于检测到的特征分量的特性,参考关系数据存储单元(35)推测测试对象遭受的可能性。
    • 8. 发明授权
    • Method of patterning a substrate with an atomic mask
    • 原子掩模和用原子掩模图案化衬底的方法
    • US06331238B1
    • 2001-12-18
    • US09602061
    • 2000-06-23
    • Takashi YokoyamaMasakazu Baba
    • Takashi YokoyamaMasakazu Baba
    • C25D502
    • B32B27/20Y10T428/24917Y10T428/24926Y10T428/265Y10T428/31678
    • There is provided a method of patterning a substrate with an atomic mask having a mask substrate and first atoms adsorbed on the mask substrate, the first atoms forming a mask pattern having a one-atomic thickness, including the steps, in sequence, of (a) depositing adatoms over a surface of a substrate to be patterned, the adatoms having low reactivity with second atoms of which the substrate is composed, and (b) putting the atomic mask close to the substrate in such a distance that the first atoms make a chemical bond with the adatoms, so that adatoms located nearest to the first atoms are desorbed out of the substrate to form a pattern on the substrate, the pattern being defined as an area where none of the adatoms exists. In accordance with the above mentioned method, it is possible to form a pattern on the sub-nanometer or nanometer order with high accuracy and in a short period of time, and it is also possible to repeatedly form the same pattern by using the atomic mask.
    • 提供了一种利用具有掩模衬底的原子掩模和吸附在掩模衬底上的第一原子的原子掩模图案化衬底的方法,第一原子形成具有一个原子厚度的掩模图案,其包括以下步骤:(a )在待图案化的衬底的表面上沉积吸附原子,所述原子与所述衬底的第二原子具有低反应性,和(b)将所述原子掩模放置在所述衬底附近,使得所述第一原子形成 与吸附原子的化学键,使得位于最靠近第一原子的吸附原子从衬底中解吸出来,以在衬底上形成图案,该图案被定义为不存在吸收原子的区域。 根据上述方法,可以以高精度和短时间在亚纳米或纳米级上形成图案,并且还可以通过使用原子掩模重复形成相同的图案 。