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    • 1. 发明授权
    • A1-Mg-Si based alloy sheet
    • A1-Mg-Si基合金板
    • US06334916B1
    • 2002-01-01
    • US09569043
    • 2000-05-10
    • Katsushi MatsumotoYasuaki SugizakiMasahiro YanagawaYuichi Seki
    • Katsushi MatsumotoYasuaki SugizakiMasahiro YanagawaYuichi Seki
    • C22C2108
    • C22C21/06C22C21/02C22C21/08C22F1/05
    • The present invention provides an Al—Mg—Si based alloy sheet whose press-formability (particularly, deep-drawing formability, stretch-formability and bendability) is made higher than conventional Al—Mg—Si based alloy sheets of JIS 6000 series. For texture of the Al—Mg—Si based alloy sheet, orientation density of at least Cube orientation is controlled in accordance with a sort of press forming, so that press-formability improved to match with the press forming is provided. For example, to improve deep-drawing formability of an Al—Mg—Si based alloy sheet, the ratio of orientation density of Goss orientation to the orientation density of the Cube orientation (Goss/Cube) is set to 0.3 or less, and a grain size is set to 80 &mgr;m or less.
    • 本发明提供一种Al-Mg-Si系合金板,其压制成形性(特别是深冲成形性,拉伸成形性和弯曲性)比JIS 6000系列的常规Al-Mg-Si系合金板高。 对于Al-Mg-Si基合金板的织构,根据一种压制成型来控制至少Cube取向的取向密度,从而提高了冲压成形性以适应冲压成形。 例如,为了提高Al-Mg-Si系合金板的深冲压成形性,将高斯取向的取向密度与立方体取向(Goss / Cube)的取向密度的比例设定为0.3以下, 粒径设定为80μm以下。
    • 9. 发明授权
    • Vacuum chamber made of aluminum or its alloys, and surface treatment and
material for the vacuum chamber
    • 由铝或其合金制成的真空室,以及用于真空室的表面处理和材料
    • US6027629A
    • 2000-02-22
    • US836469
    • 1997-05-16
    • Jun HisamotoKoji WadaKoki IkedaMasahiro Yanagawa
    • Jun HisamotoKoji WadaKoki IkedaMasahiro Yanagawa
    • B01J3/00B01J19/02C23C16/44C25D11/04C25D11/12
    • C23C16/4404B01J19/02B01J3/006C25D11/045C25D11/12B01J2219/024Y10T428/249953Y10T428/249954Y10T428/249956
    • The present invention relates to a vacuum chamber and chamber parts made of aluminum or its alloys which exhibit excellent corrosion resistance to a corrosive gas or plasma introduced into the vacuum chamber, the surface treatment, and material for the vacuum chamber. The vacuum chamber has a porous layer with a structure in which a pore diameter at the top thereof is small, while a pore diameter at the bottom thereof is large. In order to give such a structure to the porous layer, a final anodizing voltage is set to be higher than an initial anodizing voltage when the surface of the base material is anodized. After the porous-type anodizing is completed, non-porous type anodizing may be conducted so as to grow a barrier layer. Furthermore, the base material made of aluminum alloy preferably has particles such as precipitates and/or deposits with a diameter of 10 .mu.m or less in average, and the precipitates and/or deposits are arranged in parallel with a largest surface of the base material.
    • PCT No.PCT / JP95 / 02263 Sec。 371日期:1997年5月16日 102(e)日期1997年5月16日PCT提交1995年11月6日PCT公布。 公开号WO96 / 15295 日期1996年5月23日本发明涉及一种由铝或其合金制成的真空室和室部件,其对被引入真空室的腐蚀性气体或等离子体,表面处理和真空室的材料表现出优异的耐腐蚀性。 真空室具有其顶部的孔径小的多孔层,底部的孔径大。 为了将这种结构赋予多孔层,当阳极氧化基底材料的表面时,最终的阳极氧化电压被设定为高于初始阳极氧化电压。 在多孔型阳极氧化完成之后,可以进行无孔型阳极氧化以便生长阻挡层。 此外,由铝合金制成的基材优选具有平均直径为10μm以下的析出物和/或沉积物的粒子,并且析出物和/或沉积物与基材的最大表面平行地排列 。