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1. 发明授权

US5240878A Method for forming patterned films on a substrate 失效
标题翻译：在基板上形成图案化膜的方法
公开(公告)号：US5240878A
公开(公告)日：1993-08-31
申请号：US691951
申请日：1991-04-26
申请人： John A. Fitzsimmons , Janos Havas , Margaret J. Lawson , Edward J. Leonard , Bryan N. Rhoads
发明人： John A. Fitzsimmons , Janos Havas , Margaret J. Lawson , Edward J. Leonard , Bryan N. Rhoads
IPC分类号： G03F7/11 , G03F7/09 , G03F7/26 , H01L21/027 , H01L21/30 , H01L21/312
CPC分类号： G03F7/094 , H01L21/0272 , Y10S148/10 , Y10S438/95 , Y10S438/951
摘要： A method of forming patterned films on a semiconductor substrate 10 includes the steps of depositing a hardened photo resist underlay 30 onto the substrate, then depositing a polyether sulfone release layer 32, then depositing a photo sensitive resist layer 34 and exposing an etching a metallization pattern 36, 38 to the substrate 10. The structure is then blanket deposited with a conductive layer 40 to thereby create a conductive contact stud 42. The film layer 40 and resist layer 34 are removed by dissolving the polyether sulfone layer 32 in an NMP solution and the photo resist underlayer 30 is then removed using a selective photo resist stripper composition.
摘要翻译：在半导体衬底10上形成图案化膜的方法包括以下步骤：将硬化的光致抗蚀剂衬底30沉积到衬底上，然后沉积聚醚砜释放层32，然后沉积光敏抗蚀剂层34并暴露蚀刻金属化图案然后将该结构用导电层40进行覆盖沉积，从而形成导电接触柱42.通过将聚醚砜层32溶解在NMP溶液中来除去膜层40和抗蚀层34，然后使用选择性抗蚀剂剥离剂组合物除去光致抗蚀剂底层30。

2. 发明授权

US5209815A Method for forming patterned films on a substrate 失效
标题翻译：在基板上形成图案化膜的方法
公开(公告)号：US5209815A
公开(公告)日：1993-05-11
申请号：US711224
申请日：1991-06-06
申请人： Robert J. Fleming , Margaret J. Lawson , Edward J. Leonard , Bryan N. Rhoads
发明人： Robert J. Fleming , Margaret J. Lawson , Edward J. Leonard , Bryan N. Rhoads
IPC分类号： H01L21/31 , H01L21/027 , H01L21/3205 , H01L21/768 , H01L23/52 , H05K3/04
CPC分类号： H01L21/7688 , H01L21/0272 , H05K3/048
摘要： A method of forming patterned film onto a substrate includes the steps of: depositing a polyether sulfone release layer 50; depositing a photoresist underlayer 52; patterning a predetermined film pattern through the underlayer 52 and the polyether sulfone layer 50; depositing a film layer 60 onto the wafer, thereby forming a patterned film 62 on the substrate 10; weakening the mechanical bonding strength to the polyether sulfone release layer 50 by immersing it in NMP; stripping off layers 54 and 60 by applying an adhesive backed tape 64 to the top of the film layer and applying a pulling force; and, removing the polyether sulfone release layer 50 by immersing the wafer in a NMP bath.
摘要翻译：在基板上形成图案化膜的方法包括以下步骤：沉积聚醚砜脱模层50; 沉积光致抗蚀剂底层52; 通过底层52和聚醚砜层50图案化预定的膜图案; 将薄膜层60沉积在晶片上，从而在基板10上形成图案化的薄膜62; 通过将其浸入NMP中而使聚醚砜脱模层50的机械结合强度降低; 通过将粘合剂背衬的带64施加到膜层的顶部并施加拉力来剥离层54和60; 并通过将晶片浸入NMP浴中除去聚醚砜释放层50。

3. 发明授权

US5454390A Vapor rinse-vapor dry process tool 失效
标题翻译：蒸汽冲洗蒸汽干燥工具
公开(公告)号：US5454390A
公开(公告)日：1995-10-03
申请号：US242912
申请日：1994-05-16
申请人： Margaret J. Lawson , Edward J. Leonard , Jon H. Nansen
发明人： Margaret J. Lawson , Edward J. Leonard , Jon H. Nansen
IPC分类号： B08B3/08 , H01L21/00 , H01L21/304 , B08B3/10
CPC分类号： H01L21/67057 , B08B3/08
摘要： A cleaning apparatus for cleaning chemically processed articles between chemical processing steps. The cleaning apparatus includes a sealable pressurization vessel. After a chemical process step, an article, such as a semiconductor wafer is placed in the vessel. The vessel is sealed. Vessel pressure is adjusted. Solvent in the vessel is heated to a boil forming a vapor. Solvent vapor is recondensed by a primary condensing coil. Condensed solvent rains onto the article, washing it. After the article is clean, it is dried when a secondary condensing coil condenses the solvent vapor, causing the distilled solvent to rain into and be collected by a collection tray. Collected solvent is channelled into a storage reservoir. The storage reservoir is sealed after all of the solvent is collected. The vessel is opened to remove the cleaned article.
摘要翻译：一种用于在化学处理步骤之间清洁化学处理制品的清洁装置。清洁装置包括可密封的加压容器。在化学处理步骤之后，将诸如半导体晶片的物品放置在容器中。船舶密封。容器压力调整。将容器中的溶剂加热至沸腾形成蒸汽。溶剂蒸气由初级冷凝盘管重新凝结。冷凝的溶剂下雨到物品上，洗涤。物品清洁后，当二次冷凝盘管冷凝溶剂蒸气时，干燥，使蒸馏溶剂下降并收集收集盘。收集的溶剂引入储存容器。在收集所有溶剂后，储存容器被密封。打开容器以除去清洁的物品。

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