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    • 1. 发明授权
    • Apparatus for wet treatment of wafer materials
    • 用于湿处理晶片材料的设备
    • US4388140A
    • 1983-06-14
    • US279314
    • 1981-07-01
    • Yasuaki NakazatoYasushi MiyazakiMakoto OsugaMasao Kodaira
    • Yasuaki NakazatoYasushi MiyazakiMakoto OsugaMasao Kodaira
    • C23F1/08H01L21/00H01L21/306B44C1/22C03C15/00C03C25/06
    • H01L21/67086H01L21/67075
    • The invention provides a novel apparatus for the wet treatment, e.g. chemical etching treatment, of a plural number of wafer materials such as wafers of high purity silicon semiconductors. The apparatus comprises a liquid tub for containing the treatment liquid, e.g. etching solution, a pair of screw shafts horizontally held in the liquid tub in parallel with each other to be rotatable in the same direction at the same velocity to serve as a kind of screw conveyor and a traveling drum carriage mounted on the screw shafts as engaged with the threads of the shafts at the circular end plates so as to be rotated and transferred in the treatment liquid simultaneously as the screw shafts rotate. The traveling drum carriage holds a wafer basket containing a plural number of the wafer materials perpendicularly to the axis so that the wafer materials are also rotated together with the rotation of the carriage and the surfaces of them are always in contact with the treatment liquid during traveling from one end of the screw shafts to the other.
    • 本发明提供了用于湿处理的新颖设备,例如, 化学蚀刻处理,多个晶片材料,例如高纯度硅半导体的晶片。 该装置包括用于容纳处理液体的液体桶。 水平地保持在液槽中的一对螺杆轴彼此平行地以相同的速度在相同的方向上旋转,以用作一种螺旋输送机和安装在螺杆轴上的行进滚筒架,作为啮合 轴的螺纹在圆形端板处,以便当螺杆轴旋转时同时旋转并转移到处理液中。 移动滚筒架保持包含垂直于轴线的多个晶片材料的晶片篮,使得晶片材料也随着滑架的旋转而一起旋转,并且它们的表面在行进期间总是与处理液体接触 从螺杆轴的一端到另一端。