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1. 发明授权

US4690887A Method for forming micro-patterns by development 失效
标题翻译：通过开发形成微观图案的方法
公开(公告)号：US4690887A
公开(公告)日：1987-09-01
申请号：US800100
申请日：1985-11-22
申请人： Mitsutoshi Fukuda , Makoto Fukutomi , Osamu Kogure , Kazunori Miyoshi
发明人： Mitsutoshi Fukuda , Makoto Fukutomi , Osamu Kogure , Kazunori Miyoshi
IPC分类号： G03F7/26 , G03F7/016 , G03F7/038 , G03F7/32 , G03C5/00
CPC分类号： G03F7/038 , G03F7/325
摘要： Disclosed is a method for forming micro-patterns on base plates such as for semiconductor integrated circuits, particularly by development, wherein a radiation sensitive negative resist film is formed on the base plate and irradiated according to pattern designs, and the non-irradiated portions of the film is dissolved by a liquid developer comprising a mixture of a good solvent selected from the group of alkyl esters of acetic acid, having an alkyl group containing 1 to 5 carbon atoms, and a poor solvent selected from the group consisting of alicyclic compounds and alkyl ethers of ethyleneglycol having an alkyl group containing 1 to 5 carbon atoms. The method can minimize swelling of irradiated portions of the resist film and can accelerate dissolution of non-irradiated portions of the resist film, so that desired micro-patterns with excellent edge shape quality can be obtained.
摘要翻译：公开了一种在半导体集成电路，特别是用于半导体集成电路的基板上形成微图形的方法，其中在基板上形成辐射敏感的负型抗蚀剂膜并根据图案设计照射，并且未照射部分该膜由液体显影剂溶解，该液体显影剂包括选自乙酸的烷基酯，具有1至5个碳原子的烷基的良溶剂和选自脂环族化合物和具有1〜5个碳原子的烷基的乙二醇的烷基醚。该方法可以使抗蚀剂膜的照射部分的溶胀最小化，并且可以加速抗蚀剂膜的未照射部分的溶解，从而可以获得具有优异的边缘形状质量的期望的微图案。

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