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1. 发明申请

US20110062028A1 PROCESS AND APPARATUS FOR ELECTROPLATING SUBSTRATES 审中-公开
标题翻译：电镀基板的工艺和装置
公开(公告)号：US20110062028A1
公开(公告)日：2011-03-17
申请号：US12883551
申请日：2010-09-16
申请人： Lothar Lippert , Stefan Dauwe
发明人： Lothar Lippert , Stefan Dauwe
IPC分类号： C25D5/18 , C25B9/06
CPC分类号： C25D5/18 , C25D5/00 , C25D5/006 , C25D5/08 , C25D7/126 , C25D17/001 , C25D21/12 , H01L31/022425 , Y02E10/50
摘要： An apparatus for electroplating one or more surfaces (2,3) on one or more substrates (1), especially solar cells (1a), is described. The apparatus includes an electrochemical coating bath (13), which has a coating tank (12) filled with an electrochemical coating liquid (14). The apparatus also includes a conveying device (15) for transporting the substrate through the coating bath (13), a light source circuit (60) with light sources (64) for irradiating the substrate (1) and an electrolytic cell rectifier circuit (50) for the substrate with anodes (54). The apparatus is characterized by a device for generating synchronous current pulses and light pulses, so that during a time interval between the current pulses the irradiating of the substrate or substrates is interrupted. A process for electrochemical plating of the surface of the substrate or substrates is also described.
摘要翻译：描述了用于在一个或多个基板（1），特别是太阳能电池（1a）上电镀一个或多个表面（2,3）的装置。该设备包括电化学涂层浴（13），其具有填充有电化学涂覆液体（14）的涂料槽（12）。该设备还包括用于将衬底输送通过涂浴（13）的输送装置（15），具有用于照射衬底（1）的光源（64）和电解池整流电路（50）的光源电路（60））用于具有阳极（54）的衬底。该装置的特征在于用于产生同步电流脉冲和光脉冲的装置，使得在电流脉冲之间的时间间隔期间，中断衬底或衬底的照射。还描述了用于基板或基板的表面的电化学电镀的方法。

2. 发明授权

US08758579B2 Chamber for physical vapour deposition and door for a physical vapour deposition chamber 失效
标题翻译：物理气相沉积室和物理气相沉积室门
公开(公告)号：US08758579B2
公开(公告)日：2014-06-24
申请号：US12781723
申请日：2010-05-17
申请人： Reiner Hinterschuster , Lothar Lippert
发明人： Reiner Hinterschuster , Lothar Lippert
IPC分类号： C23C14/50
CPC分类号： H01L21/67098 , C23C14/3407 , H01J37/34 , H01L21/67103 , H01L21/67109
摘要： A chamber for physical vapor deposition is provided. The chamber includes a housing, a door for opening and closing the housing, and a bearing for receiving a target, wherein the bearing is oriented in a first direction. Further, the chamber is adapted so that the target is at least partially removable from the chamber in the first direction. According to an embodiment, a chamber for physical vapor deposition is provided. The chamber is adapted for receiving at least one target and a substrate. The chamber includes a housing, a door, and at least one bearing for mounting the target, wherein the bearing is attached to the door.
摘要翻译：提供了用于物理气相沉积的室。所述室包括壳体，用于打开和关闭壳体的门以及用于接收目标的轴承，其中轴承沿第一方向定向。此外，腔室适于使靶材在第一方向上至少部分地可从腔室移除。根据实施例，提供了用于物理气相沉积的室。该腔适于接收至少一个靶和基底。该室包括壳体，门和用于安装目标的至少一个轴承，其中轴承附接到门。

3. 发明申请

US20110062030A1 ELECTROLYTE COMPOSITION 审中-公开
标题翻译：电解质组合物
公开(公告)号：US20110062030A1
公开(公告)日：2011-03-17
申请号：US12878207
申请日：2010-09-09
申请人： Lothar Lippert , Stefan Dauwe
发明人： Lothar Lippert , Stefan Dauwe
IPC分类号： C25D7/12 , C25D3/02 , C25D3/10 , C25D3/12 , C25D3/20 , C25D3/38 , C25D3/46 , C25D3/54
CPC分类号： C25D3/02 , C25D3/46 , H01L31/022425 , Y02E10/50
摘要： The electrolyte composition is used in a method of depositing metals, in particular, onto substrates, especially solar cells. The electrolyte composition is particularly suitable for the deposition of metals, in particular silver, onto solar cells. The electrolyte composition is preferably free of cyanides and contains at least one metal, preferably silver, and an iminodisuccinate derivative, preferably a sodium or postassium iminodisuccinate.
摘要翻译：电解质组合物用于沉积金属，特别是沉积在基材，特别是太阳能电池上的方法。电解质组合物特别适用于将金属，特别是银沉积到太阳能电池上。电解质组合物优选不含氰化物，并且含有至少一种金属，优选银，亚氨基二琥珀酸衍生物，优选亚氨基二琥珀酸钠或钾。

4. 发明申请

US20120037503A1 ROTATABLE SPUTTER TARGET BASE, ROTATABLE SPUTTER TARGET, COATING INSTALLATION, METHOD OF PRODUCING A ROTATABLE SPUTTER TARGET, TARGET BASE CONNECTION MEANS, AND METHOD OF CONNECTING A ROTATABLE TARGET BASE DEVICE FOR SPUTTERING INSTALLATIONS TO A TARGET BASE SUPPORT 审中-公开
标题翻译：可旋转飞溅器目标基座，可旋转飞溅器目标，涂层安装，生产可旋转飞溅器目标的方法，目标基座连接装置以及将可旋转的目标基座装置连接到目标基座支撑的喷射装置的方法
公开(公告)号：US20120037503A1
公开(公告)日：2012-02-16
申请号：US13125784
申请日：2009-10-23
申请人： Lothar Lippert , Oliver Heimel
发明人： Lothar Lippert , Oliver Heimel
IPC分类号： C23C14/34 , F16B7/18 , B23P11/00
CPC分类号： C23C14/3407 , H01J37/3405 , H01J37/3435 , Y10T29/49826 , Y10T403/68
摘要： A rotatable target base device for sputtering installations is provided, wherein the target base device is adapted for receiving thereon a solid target cylinder, the rotatable target base device comprising a target base cylinder (4) having a lateral surface (3), a middle part (12), a first end region (7) and a second end region (9) opposite to the first end region, wherein at least one of the first and the second end regions has a maximum outer diameter substantially equal to or less than the outer diameter of the middle part.
摘要翻译：提供了一种用于溅射装置的可旋转目标基座装置，其中目标基座装置适于在其上接收固体目标气缸，该可旋转目标基座装置包括具有侧面（3）的目标基座圆筒（4）（12），与第一端部区域相对的第一端部区域（7）和第二端部区域（9），其中第一和第二端部区域中的至少一个具有基本上等于或小于中间部分的外径。

5. 发明申请

US20110278166A1 CHAMBER FOR PHYSICAL VAPOUR DEPOSITION AND DOOR FOR A PHYSICAL VAPOUR DEPOSITION CHAMBER 失效
标题翻译：物理蒸气沉积室和物理蒸气沉积室门
公开(公告)号：US20110278166A1
公开(公告)日：2011-11-17
申请号：US12781723
申请日：2010-05-17
申请人： Reiner HINTERSCHUSTER , Lothar LIPPERT
发明人： Reiner HINTERSCHUSTER , Lothar LIPPERT
IPC分类号： C23C14/34
CPC分类号： H01L21/67098 , C23C14/3407 , H01J37/34 , H01L21/67103 , H01L21/67109
摘要： A chamber for physical vapour deposition is provided. The chamber includes a housing, a door for opening and closing the housing, and a bearing for receiving a target, wherein the bearing is oriented in a first direction. Further, the chamber is adapted so that the target is at least partially removable from the chamber in the first direction. According to an embodiment, a chamber for physical vapour deposition is provided. The chamber is adapted for receiving at least one target and a substrate. The chamber includes a housing, a door, and at least one bearing for mounting the target, wherein the bearing is attached to the door.
摘要翻译：提供了用于物理气相沉积的室。所述室包括壳体，用于打开和关闭壳体的门以及用于接收目标的轴承，其中轴承沿第一方向定向。此外，腔室适于使靶材在第一方向上至少部分地可从腔室移除。根据实施例，提供了用于物理气相沉积的室。该腔适于接收至少一个靶和基底。该室包括壳体，门和用于安装目标的至少一个轴承，其中轴承附接到门。

6. 发明申请

US20110220489A1 ROTATABLE TARGET, BACKING TUBE, SPUTTERING INSTALLATION AND METHOD FOR PRODUCING A ROTATABLE TARGET 审中-公开
标题翻译：可旋转的目标，背衬管，溅射安装和生产可旋转目标的方法
公开(公告)号：US20110220489A1
公开(公告)日：2011-09-15
申请号：US12723490
申请日：2010-03-12
申请人： Lothar Lippert , Wolfgang Buschbeck
发明人： Lothar Lippert , Wolfgang Buschbeck
IPC分类号： C23C14/34 , C23C14/50
CPC分类号： H01J37/3491 , C23C14/3407 , C23C14/3414 , H01J37/3405 , H01J37/3435
摘要： A rotatable target for a sputtering installation and a method for producing a rotatable target are provided. The target includes a backing tube to which a target tube is shrink-fitted. The method includes setting a positive temperature difference between a target tube and a backing tube. The method further includes pulling the target tube over the backing tube while the temperature difference remains positive. Furthermore, a backing tube having a middle part with an outer lateral area and a notch extending in a longitudinal direction on the outer lateral area is provided.
摘要翻译：提供了用于溅射设备的可旋转靶材以及用于制造可旋转靶材的方法。目标包括一个背管，目标管被收缩配合到其上。该方法包括设置目标管和背衬管之间的正温差。该方法还包括在温度差保持为正时将目标管牵拉在背衬管上。此外，提供了具有外侧横向区域的中间部分和在外侧区域上沿纵向方向延伸的凹口的背衬管。

7. 发明申请

US20100101948A1 ROTATABLE SPUTTER TARGET BASE, ROTATABLE SPUTTER TARGET, COATING INSTALLATION, METHOD OF PRODUCING A ROTATABLE SPUTTER TARGET, TARGET BASE CONNECTION MEANS, AND METHOD OF CONNECTING A ROTATABLE TARGET BASE DEVICE FOR SPUTTERING INSTALLATIONS TO A TARGET BASE SUPPORT 审中-公开
标题翻译：可旋转飞溅器目标基座，可旋转飞溅器目标，涂层安装，生产可旋转飞溅器目标的方法，目标基座连接装置以及将可旋转的目标基座装置连接到目标基座支撑的喷射装置的方法
公开(公告)号：US20100101948A1
公开(公告)日：2010-04-29
申请号：US12258243
申请日：2008-10-24
申请人： Lothar LIPPERT , Oliver HEIMEL
发明人： Lothar LIPPERT , Oliver HEIMEL
IPC分类号： C23C14/34 , B23P17/04
CPC分类号： C23C14/3407 , H01J37/3405 , H01J37/3435 , Y10T29/49826
摘要： A rotatable target base device for sputtering installations is provided, wherein the target base device is adapted for receiving thereon a solid target cylinder, the rotatable target base device comprising a target base cylinder having a lateral surface, a middle part, a first end region and a second end region opposite to the first end region, wherein at least one of the first and the second end regions has a maximum outer diameter substantially equal to or less than the outer diameter of the middle part.
摘要翻译：提供了一种用于溅射装置的可旋转目标基座装置，其中，目标基座装置适于在其上容纳固体目标气缸，该可旋转目标基座装置包括具有侧面，目标基座圆筒，中间部分，第一端部区域和与第一端区域相对的第二端区域，其中第一端区域和第二端区域中的至少一个具有基本上等于或小于中间部分的外径的最大外径。

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