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1. 发明授权

US08794257B2 Liquid storage device 有权
标题翻译：液体储存装置
公开(公告)号：US08794257B2
公开(公告)日：2014-08-05
申请号：US13701903
申请日：2012-06-13
申请人： Jinqun He , Likun Pei , Yi Wu , Wei Zan
发明人： Jinqun He , Likun Pei , Yi Wu , Wei Zan
IPC分类号： B67D7/72 , G05D16/16 , G05D16/00
CPC分类号： G05D16/16 , G05D16/00 , G05D16/103 , Y10T137/3115 , Y10T137/3118 , Y10T137/3127 , Y10T137/313 , Y10T137/86324
摘要： The present invention provides a liquid storage device relates to the field of semiconductor manufacturing technology comprising: a liquid storage tank, a liquid intake tube, a liquid discharge tube and a gas discharge tube; the liquid intake tube, the liquid discharge tube and the gas discharge tube are all connected with the liquid storage tank; the liquid storage device also comprises a gas compensating tube connected with the liquid storage tank; the gas compensating tube comprises a differential pressure mechanism and a gas storage tank; one end of the differential pressure mechanism is connected with the liquid storage tank, and the other end is connected with the gas storage tank; the differential pressure mechanism is used for controlling the connection or disconnection between the liquid storage tank and the gas storage tank according to the pressure difference therebetween.
摘要翻译：本发明提供一种与半导体制造技术领域相关的液体储存装置，包括：液体储存箱，液体进入管，液体排出管和气体放电管; 液体吸入管，液体排出管和气体放电管均与储液罐连接; 液体储存装置还包括与液体储存罐连接的气体补偿管; 气体补偿管包括压差机构和储气罐; 差压机构的一端与储液箱连接，另一端与储气罐连接; 差压机构用于根据它们之间的压力差来控制储液箱与储气罐之间的连接或断开。

2. 发明申请

US20130174919A1 LIQUID STORAGE DEVICE 有权
标题翻译：液体储存装置
公开(公告)号：US20130174919A1
公开(公告)日：2013-07-11
申请号：US13701903
申请日：2012-06-13
申请人： Jinqun He , Likun Pei , Yi Wu , Wei Zan
发明人： Jinqun He , Likun Pei , Yi Wu , Wei Zan
IPC分类号： G05D16/16
CPC分类号： G05D16/16 , G05D16/00 , G05D16/103 , Y10T137/3115 , Y10T137/3118 , Y10T137/3127 , Y10T137/313 , Y10T137/86324
摘要： The present invention provides a liquid storage device relates to the field of semiconductor manufacturing technology comprising: a liquid storage tank, a liquid intake tube, a liquid discharge tube and a gas discharge tube; the liquid intake tube, the liquid discharge tube and the gas discharge tube are all connected with the liquid storage tank; the liquid storage device also comprises a gas compensating tube connected with the liquid storage tank; the gas compensating tube comprises a differential pressure mechanism and a gas storage tank; one end of the differential pressure mechanism is connected with the liquid storage tank, and the other end is connected with the gas storage tank; the differential pressure mechanism is used for controlling the connection or disconnection between the liquid storage tank and the gas storage tank according to the pressure difference therebetween.
摘要翻译：本发明提供一种与半导体制造技术领域相关的液体储存装置，包括：液体储存箱，液体进入管，液体排出管和气体放电管; 液体吸入管，液体排出管和气体放电管均与储液罐连接; 液体储存装置还包括与液体储存罐连接的气体补偿管; 气体补偿管包括压差机构和储气罐; 差压机构的一端与储液箱连接，另一端与储气罐连接; 差压机构用于根据它们之间的压力差来控制储液箱与储气罐之间的连接或断开。

3. 发明申请

US20130160261A1 APPARATUS FOR MANUFACTURING SEMICONDUCTOR WAFER 有权
标题翻译：制造半导体波形的装置
公开(公告)号：US20130160261A1
公开(公告)日：2013-06-27
申请号：US13701880
申请日：2012-06-13
申请人： Hongyu Zhao , Xiaohong Zhang , Likun Pei , Bao Zhang , Ruiting Wang
发明人： Hongyu Zhao , Xiaohong Zhang , Likun Pei , Bao Zhang , Ruiting Wang
IPC分类号： H01L21/677
CPC分类号： H01L21/67769 , H01L21/67017 , H01L21/67742 , H01L21/67766 , Y10T29/41
摘要： The present invention provides an apparatus for manufacturing semiconductor wafer comprising at least two manipulators, at least one set of chemical gas/liquid distribution unit and an air circulating and filtering unit. The air circulating and filtering unit is separated into three regions, including the front region, the middle region, and the side region, which are controlled by respective control electric motors to achieve uniform air flow and uniform pressure in the respective regions. The cleaning degree in the internal of the apparatus can be improved by the regional control of the air circulating and filtering unit; the wafer transport efficiency can be enhanced by the double-armed manipulators having multiple degrees of freedom; and the product yield per unit area can be increased by the chemical gas/liquid distribution unit providing stable and uniform gas/liquid flow and pressure.
摘要翻译：本发明提供了一种用于制造半导体晶片的装置，其包括至少两个操纵器，至少一组化学气体/液体分配单元和空气循环和过滤单元。空气循环和过滤单元被分为包括前区域，中间区域和侧区域的三个区域，这三个区域由相应的控制电动机控制，以在各个区域中实现均匀的气流和均匀的压力。通过空气循环和过滤单元的区域控制可以改善设备内部的清洁度; 可以通过具有多个自由度的双臂操纵器来提高晶片输送效率; 可以通过化学气体/液体分配单元提高单位面积的产品产量，提供稳定和均匀的气/液流量和压力。

4. 发明授权

US08834582B2 Apparatus for manufacturing semiconductor wafer 有权
标题翻译：半导体晶片制造装置
公开(公告)号：US08834582B2
公开(公告)日：2014-09-16
申请号：US13701880
申请日：2012-06-13
申请人： Hongyu Zhao , Xiaohong Zhang , Likun Pei , Bao Zhang , Ruiting Wang
发明人： Hongyu Zhao , Xiaohong Zhang , Likun Pei , Bao Zhang , Ruiting Wang
IPC分类号： H01L29/00 , H01L21/67 , H01L21/677
CPC分类号： H01L21/67769 , H01L21/67017 , H01L21/67742 , H01L21/67766 , Y10T29/41
摘要： The present invention provides an apparatus for manufacturing semiconductor wafer comprising at least two manipulators, at least one set of chemical gas/liquid distribution unit and an air circulating and filtering unit. The air circulating and filtering unit is separated into three regions, including the front region, the middle region, and the side region, which are controlled by respective control electric motors to achieve uniform air flow and uniform pressure in the respective regions. The cleaning degree in the internal of the apparatus can be improved by the regional control of the air circulating and filtering unit; the wafer transport efficiency can be enhanced by the double-armed manipulators having multiple degrees of freedom; and the product yield per unit area can be increased by the chemical gas/liquid distribution unit providing stable and uniform gas/liquid flow and pressure.
摘要翻译：本发明提供了一种用于制造半导体晶片的装置，其包括至少两个操纵器，至少一组化学气体/液体分配单元和空气循环和过滤单元。空气循环和过滤单元被分为包括前区域，中间区域和侧区域的三个区域，这三个区域由相应的控制电动机控制，以在各个区域中实现均匀的气流和均匀的压力。通过空气循环和过滤单元的区域控制可以改善设备内部的清洁度; 可以通过具有多个自由度的双臂操纵器来提高晶片输送效率; 可以通过化学气体/液体分配单元提高单位面积的产品产量，提供稳定和均匀的气/液流量和压力。

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