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1. 发明授权

US07012678B2 Inspection method and inspection apparatus for detecting defects 有权
标题翻译：用于检测缺陷的检查方法和检查装置
公开(公告)号：US07012678B2
公开(公告)日：2006-03-14
申请号：US10258961
申请日：2002-02-12
申请人： Akio Enomoto , Kouichi Miyashita
发明人： Akio Enomoto , Kouichi Miyashita
IPC分类号： G01N21/00
CPC分类号： B01D46/442 , B01D46/0086 , B01D65/102 , B01D65/104 , B01D2273/18 , G01M3/20 , G01M3/38 , G01N15/0826 , G01N21/88 , G01N21/95 , G01N21/95692
摘要： An inspection method for detecting a defect in a test object. A particulate is generated, then the generated particulate is introduced into a test object. Subsequently, light having high directivity is emitted such that the light passes in the vicinity of the test object to irradiate the particulate discharged from the test object, thereby making the particulate visible. An inspection apparatus for detecting a defect in a test object, including a particulate generator, a particulate introducing device which introduces the particulate into a test object, and a high directional light emitter emitting light passing in the vicinity of the test object and irradiating the particulate discharged from the test object to visualize the particulate. The inspection method and apparatus can detect a defect with high sensitivity and shorten an inspection time and a post-treatment time.
摘要翻译：一种用于检测测试对象缺陷的检查方法。产生颗粒，然后将所产生的颗粒引入测试对象。随后，发射具有高方向性的光，使得光在测试对象附近通过，以照射从被检体排出的颗粒，从而使颗粒可见。一种用于检测测试对象缺陷的检查装置，包括颗粒发生器，将颗粒引入测试对象的颗粒引入装置，以及发射穿过被测物体附近的光的高定向发光体，从测试对象排出以显现颗粒物。检查方法和装置可以高灵敏度地检测缺陷，缩短检查时间和后处理时间。

2. 发明授权

US08422014B2 Method for inspecting defect of article to be inspected 有权
标题翻译：检查待检物品缺陷的方法
公开(公告)号：US08422014B2
公开(公告)日：2013-04-16
申请号：US12712419
申请日：2010-02-25
申请人： Tatsuhiko Hatano , Kouichi Miyashita , Isao Shikata
发明人： Tatsuhiko Hatano , Kouichi Miyashita , Isao Shikata
IPC分类号： G01N21/00
CPC分类号： G01M3/38 , G01N21/4738 , G01N21/88 , G01N21/95692 , G01N2015/0846
摘要： A method of inspecting defects in an inspection target includes (1) a step of supplying a particle-containing gas to one end face of the inspection target under pressure, applying in parallel a first laser beam to the vicinity of the other end face of the inspection target, and photographing such end face from a position vertical to such end face, (2) a step of supplying a particle-containing gas to the one end face of the inspection target under pressure, applying in parallel a second laser beam to the vicinity of the other end face of the inspection target, and photographing such end face from a position vertical to such end face, and (3) a step of specifying defects in the inspection target from photographic results obtained by the steps (1) and (2).
摘要翻译：检查对象中的缺陷检查方法包括：（1）在压力下向检测对象物的一个端面供给含颗粒的气体的步骤，将第一激光束平行地施加到所述检查对象的另一端面附近检查目标，并且从垂直于该端面的位置拍摄该端面，（2）在压力下向检查对象的一个端面供给含颗粒的气体的步骤，将第二激光束平行地施加到并且从垂直于该端面的位置拍摄该端面，以及（3）通过步骤（1）和（1）获得的照相结果来指定检查对象中的缺陷的步骤 2）。

3. 发明授权

US08966959B2 Filter inspection method and filter inspection apparatus 有权
标题翻译：过滤器检查方法和过滤器检查装置
公开(公告)号：US08966959B2
公开(公告)日：2015-03-03
申请号：US13431096
申请日：2012-03-27
申请人： Kouichi Miyashita , Yusuke Okuma
发明人： Kouichi Miyashita , Yusuke Okuma
IPC分类号： G01N15/08 , G01M3/20 , B01D65/10 , B01D46/24 , G01F1/00
CPC分类号： G01M3/20 , B01D46/2418 , B01D65/10 , B01D2273/18
摘要： There is disclosed a filter inspection method which is excellent in sensitivity to detect defects of a filter and in operation efficiency. The filter inspection method includes a humidifying step of exposing a porous filter to moisture-containing air; and a detecting step of introducing water particles into the filter in a wet state through the humidifying step, to detect the water particles which pass through and flow out of the filter, thereby detecting defects of the filter.
摘要翻译：公开了一种检测过滤器的缺陷的灵敏度和操作效率的过滤器检查方法。过滤器检查方法包括将多孔过滤器暴露于含湿空气的加湿步骤; 以及检测步骤，通过加湿步骤将水粒子以湿状态引入过滤器，以检测通过并流出过滤器的水粒子，从而检测过滤器的缺陷。

4. 发明申请

US20120247224A1 FILTER INSPECTION METHOD AND FILTER INSPECTION APPARATUS 有权
标题翻译：过滤器检查方法和过滤器检查装置
公开(公告)号：US20120247224A1
公开(公告)日：2012-10-04
申请号：US13431096
申请日：2012-03-27
申请人： Kouichi MIYASHITA , Yusuke Okuma
发明人： Kouichi MIYASHITA , Yusuke Okuma
IPC分类号： G01F1/00
CPC分类号： G01M3/20 , B01D46/2418 , B01D65/10 , B01D2273/18
摘要： There is disclosed a filter inspection method which is excellent in sensitivity to detect defects of a filter and in operation efficiency. The filter inspection method includes a humidifying step of exposing a porous filter to moisture-containing air; and a detecting step of introducing water particles into the filter in a wet state through the humidifying step, to detect the water particles which pass through and flow out of the filter, thereby detecting defects of the filter.
摘要翻译：公开了一种检测过滤器的缺陷的灵敏度和操作效率的过滤器检查方法。过滤器检查方法包括将多孔过滤器暴露于含湿空气的加湿步骤; 以及检测步骤，通过加湿步骤将水粒子以湿状态引入过滤器，以检测通过并流出过滤器的水粒子，从而检测过滤器的缺陷。

5. 发明申请

US20100201983A1 METHOD FOR INSPECTING DEFECT OF ARTICLE TO BE INSPECTED 有权
标题翻译：检查检查物品缺陷的方法
公开(公告)号：US20100201983A1
公开(公告)日：2010-08-12
申请号：US12712419
申请日：2010-02-25
申请人： Tatsuhiko Hatano , Kouichi Miyashita , Isao Shikata
发明人： Tatsuhiko Hatano , Kouichi Miyashita , Isao Shikata
IPC分类号： G01N21/47 , G01N21/00
CPC分类号： G01M3/38 , G01N21/4738 , G01N21/88 , G01N21/95692 , G01N2015/0846
摘要： A method of inspecting defects in an inspection target includes (1) a step of supplying a particle-containing gas to one end face of the inspection target under pressure, applying in parallel a first laser beam to the vicinity of the other end face of the inspection target, and photographing such end face from a position vertical to such end face, (2) a step of supplying a particle-containing gas to the one end face of the inspection target under pressure, applying in parallel a second laser beam to the vicinity of the other end face of the inspection target, and photographing such end face from a position vertical to such end face, and (3) a step of specifying defects in the inspection target from photographic results obtained by the steps (1) and (2).
摘要翻译：检查对象中的缺陷检查方法包括：（1）在压力下向检测对象物的一个端面供给含颗粒的气体的步骤，将第一激光束平行地施加到所述检查对象的另一端面附近检查目标，并且从垂直于该端面的位置拍摄该端面，（2）在压力下向检查对象的一个端面供给含颗粒的气体的步骤，将第二激光束平行地施加到并且从垂直于该端面的位置拍摄该端面，以及（3）通过步骤（1）和（1）获得的照相结果来指定检查对象中的缺陷的步骤 2）。

6. 发明申请

US20120276746A1 MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE AND APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE 审中-公开
标题翻译：半导体器件的制造方法及制造半导体器件的装置
公开(公告)号：US20120276746A1
公开(公告)日：2012-11-01
申请号：US13095048
申请日：2011-04-27
申请人： Yuji HIKIDA , Kouichi Miyashita
发明人： Yuji HIKIDA , Kouichi Miyashita
IPC分类号： H01L21/3065 , C23F1/08
CPC分类号： H01L21/31116 , B81C1/00476 , B81C99/0025 , H01L21/67069
摘要： A manufacturing method for a semiconductor device includes: arranging a plurality of silicon substrates having a sacrifice layer in a reaction chamber in such a manner that surfaces of silicon substrates face each other; introducing an etching gas into the reaction chamber; reacting the etching gas and the sacrifice layer in each silicon substrate so that the sacrifice layer is dry-etched; and arranging a partition member in the reaction chamber to partition a predetermined range between adjacent silicon substrates. The partition member has a property in such a manner that a water molecule hardly penetrates the partition member. The water molecule is a reaction product between the etching gas and the sacrifice layer.
摘要翻译：一种半导体器件的制造方法，其特征在于，在反应室内配置具有牺牲层的多个硅衬底，使得硅衬底的表面彼此面对; 将腐蚀气体引入反应室; 使每个硅衬底中的蚀刻气体和牺牲层反应，使牺牲层被干蚀刻; 并且在所述反应室中布置分隔构件以分隔相邻的硅衬底之间的预定范围。分隔构件具有这样的性质，使得水分子几乎不渗透分隔构件。水分子是蚀刻气体和牺牲层之间的反应产物。

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