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1. 发明授权

US07554095B2 Static electricity deflecting device, electron beam irradiating apparatus, substrate processing apparatus, substrate processing method, and method of manufacturing substrate 失效
标题翻译：静电偏转装置，电子束照射装置，基板处理装置，基板处理方法以及基板的制造方法
公开(公告)号：US07554095B2
公开(公告)日：2009-06-30
申请号：US11932625
申请日：2007-10-31
申请人： Takashi Fuse , Tadashi Kotsugi , Kyo Tsuboi , Koji Takeya
发明人： Takashi Fuse , Tadashi Kotsugi , Kyo Tsuboi , Koji Takeya
IPC分类号： H01J37/147 , H01J3/26
CPC分类号： H01J37/1474 , B82Y10/00 , B82Y40/00 , H01J37/026 , H01J37/147 , H01J37/3174 , H01J2237/03 , H01J2237/151 , H01L21/67017 , H01L21/67213 , Y10T29/49117 , Y10T29/49204 , Y10T29/49224 , Y10T29/49885
摘要： A substrate processing apparatus which irradiates a substrate under processing with an electron beam and processes the substrate with the electron beam is disclosed. The substrate processing apparatus includes an electron beam generation mechanism which generates the electron beam, first area having a plurality of first static electricity deflecting devices whose thicknesses gradually increase in a traveling direction of the electron beam, and a second area disposed on a downstream side of the electron beam of the first area and having a plurality of second static electricity deflecting devices whose thicknesses are nearly same in the traveling direction of the electron beam. The substrate processing apparatus may further include a plurality of lenses whose thicknesses gradually decrease in the traveling direction of the electron beam, at least one of the plurality of lenses being disposed in each of the first area and the second area.
摘要翻译：公开了一种用电子束照射处理基板并用电子束处理基板的基板处理装置。基板处理装置包括：电子束发生机构，其产生电子束，第一区域具有多个第一静电偏转装置，其厚度在电子束的行进方向上逐渐增加，第二区域设置在电子束的下游侧第一区域的电子束，并且具有多个第二静电偏转装置，其厚度在电子束的行进方向上几乎相同。基板处理装置还可以包括其厚度在电子束的行进方向上逐渐减小的多个透镜，多个透镜中的至少一个设置在第一区域和第二区域中的每一个中。

2. 发明授权

US07550739B2 Static electricity deflecting device, electron beam irradiating apparatus, substrate processing apparatus, substrate processing method and method of manufacturing substrate 失效
公开(公告)号：US07550739B2
公开(公告)日：2009-06-23
申请号：US11615485
申请日：2006-12-22
申请人： Takashi Fuse , Tadashi Kotsugi , Kyo Tsuboi , Koji Takeya
发明人： Takashi Fuse , Tadashi Kotsugi , Kyo Tsuboi , Koji Takeya
IPC分类号： H01J49/22 , H01J49/06
CPC分类号： H01J37/1474 , B82Y10/00 , B82Y40/00 , H01J37/026 , H01J37/147 , H01J37/3174 , H01J2237/03 , H01J2237/151 , H01L21/67017 , H01L21/67213 , Y10T29/49117 , Y10T29/49204 , Y10T29/49224 , Y10T29/49885
摘要： A substrate processing apparatus which irradiates a substrate under processing with an electron beam and processes the substrate with the electron beam is disclosed. The substrate processing apparatus includes an electron beam generation mechanism which generates the electron beam, first area having a plurality of first static electricity deflecting devices whose thicknesses gradually increase in a traveling direction of the electron beam, and a second area disposed on a downstream side of the electron beam of the first area and having a plurality of second static electricity deflecting devices whose thicknesses are nearly same in the traveling direction of the electron beam. The substrate processing apparatus may further include a plurality of lenses whose thicknesses gradually decrease in the traveling direction of the electron beam, at least one of the plurality of lenses being disposed in each of the first area and the second area.

3. 发明申请

US20090008579A1 ELECTRON BEAM LITHOGRAPHY APPARATUS AND DESIGN METHOD OF PATTERNED BEAM-DEFINING APERTURE 审中-公开
标题翻译：电子束光刻设备和图案光束定义孔的设计方法
公开(公告)号：US20090008579A1
公开(公告)日：2009-01-08
申请号：US12209882
申请日：2008-09-12
申请人： Koji TAKEYA , Takashi FUSE , Tadashi KOTSUGI , N. William PARKER
发明人： Koji TAKEYA , Takashi FUSE , Tadashi KOTSUGI , N. William PARKER
IPC分类号： G21K5/00
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/043 , H01J2237/1534
摘要： A current density distribution characteristic within a beam pattern on a target object can be improved by using a simple-structured electron optical system and a single patterned beam-defining aperture. With an aperture layout modified to be physically fabricable, a current density distribution within the beam pattern is obtained (S5). Then, a current density uniformity is determined by applying preset determination threshold values to the current density distribution within the beam pattern BP obtained as described above (S6), and if it is found not to fall within a tolerance range, tentative inner block portions are set in tentative electron ray passing areas (S7 and S8). Subsequently, by appropriately iterating steps S5 to S8 for the aperture layout modified or renewed by the tentative inner block portions as described above, the tentative electron ray passing areas and the tentative inner block portions, satisfying determination criteria, are decided (S8).
摘要翻译：通过使用简单结构的电子光学系统和单个图案化的光束定义孔，可以改善目标物体上的光束图案内的电流密度分布特性。通过将孔径布局修改为物理上可加工的，获得波束图案内的电流密度分布（S5）。然后，通过对如上所述获得的波束图案BP（S6）中的电流密度分布施加预设的确定阈值来确定电流密度均匀性，并且如果发现不在公差范围内，则暂定内部块部分设置在暂定电子射线通过区域（S7和S8）。接下来，通过对如上所述的临时内部块部分修改或更新的孔径布局适当地重复步骤S5至S8，确定满足确定标准的暂定电子射线通过区域和暂定内部块部分（S8）。

4. 发明申请

US20080062608A1 STATIC ELECTRICITY DEFLECTING DEVICE, ELECTRON BEAM IRRADIATING APPARATUS, SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND METHOD OF MANUFACTURING SUBSTRATE 失效
标题翻译：静电电压偏转装置，电子束辐射装置，基板处理装置，基板处理方法及其制造方法
公开(公告)号：US20080062608A1
公开(公告)日：2008-03-13
申请号：US11932625
申请日：2007-10-31
申请人： Takashi FUSE , Tadashi KOTSUGI , Kyo TSUBOI , Koji TAKEYA
发明人： Takashi FUSE , Tadashi KOTSUGI , Kyo TSUBOI , Koji TAKEYA
IPC分类号： H05F3/00
CPC分类号： H01J37/1474 , B82Y10/00 , B82Y40/00 , H01J37/026 , H01J37/147 , H01J37/3174 , H01J2237/03 , H01J2237/151 , H01L21/67017 , H01L21/67213 , Y10T29/49117 , Y10T29/49204 , Y10T29/49224 , Y10T29/49885
摘要： A substrate processing apparatus which irradiates a substrate under processing with an electron beam and processes the substrate with the electron beam is disclosed. The substrate processing apparatus includes an electron beam generation mechanism which generates the electron beam, first area having a plurality of first static electricity deflecting devices whose thicknesses gradually increase in a traveling direction of the electron beam, and a second area disposed on a downstream side of the electron beam of the first area and having a plurality of second static electricity deflecting devices whose thicknesses are nearly same in the traveling direction of the electron beam. The substrate processing apparatus may further include a plurality of lenses whose thicknesses gradually decrease in the traveling direction of the electron beam, at least one of the plurality of lenses being disposed in each of the first area and the second area.
摘要翻译：公开了一种用电子束照射处理基板并用电子束处理基板的基板处理装置。基板处理装置包括：电子束发生机构，其产生电子束，第一区域具有多个第一静电偏转装置，其厚度在电子束的行进方向上逐渐增加，第二区域设置在电子束的下游侧第一区域的电子束，并且具有多个第二静电偏转装置，其厚度在电子束的行进方向上几乎相同。基板处理装置还可以包括其厚度在电子束的行进方向上逐渐减小的多个透镜，多个透镜中的至少一个设置在第一区域和第二区域中的每一个中。

5. 发明申请

US20070228285A1 STATIC ELECTRICITY DEFLECTING DEVICE, ELECTRON BEAM IRRADIATING APPARATUS, SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND METHOD OF MANUFACTURING SUBSTRATE 失效
公开(公告)号：US20070228285A1
公开(公告)日：2007-10-04
申请号：US11615588
申请日：2006-12-22
申请人： Takashi Fuse , Tadashi Kotsugi , Kyo Tsuboi , Koji Takeya
发明人： Takashi Fuse , Tadashi Kotsugi , Kyo Tsuboi , Koji Takeya
IPC分类号： G21K1/08 , H01R43/00
CPC分类号： H01J37/1474 , B82Y10/00 , B82Y40/00 , H01J37/026 , H01J37/147 , H01J37/3174 , H01J2237/03 , H01J2237/151 , H01L21/67017 , H01L21/67213 , Y10T29/49117 , Y10T29/49204 , Y10T29/49224 , Y10T29/49885
摘要： A substrate processing apparatus which irradiates a substrate under processing with an electron beam and processes the substrate with the electron beam is disclosed. The substrate processing apparatus includes an electron beam generation mechanism which generates the electron beam, first area having a plurality of first static electricity deflecting devices whose thicknesses gradually increase in a traveling direction of the electron beam, and a second area disposed on a downstream side of the electron beam of the first area and having a plurality of second static electricity deflecting devices whose thicknesses are nearly same in the traveling direction of the electron beam. The substrate processing apparatus may further include a plurality of lenses whose thicknesses gradually decrease in the traveling direction of the electron beam, at least one of the plurality of lenses being disposed in each of the first area and the second area.

6. 发明授权

US07521687B2 Static electricity deflecting device, electron beam irradiating apparatus, substrate processing apparatus, substrate processing method and method of manufacturing substrate 失效
标题翻译：静电偏转装置，电子束照射装置，基板处理装置，基板处理方法以及基板的制造方法
公开(公告)号：US07521687B2
公开(公告)日：2009-04-21
申请号：US11615588
申请日：2006-12-22
申请人： Takashi Fuse , Tadashi Kotsugi , Kyo Tsuboi , Koji Takeya
发明人： Takashi Fuse , Tadashi Kotsugi , Kyo Tsuboi , Koji Takeya
IPC分类号： H01J37/147 , H01J3/26
CPC分类号： H01J37/1474 , B82Y10/00 , B82Y40/00 , H01J37/026 , H01J37/147 , H01J37/3174 , H01J2237/03 , H01J2237/151 , H01L21/67017 , H01L21/67213 , Y10T29/49117 , Y10T29/49204 , Y10T29/49224 , Y10T29/49885
摘要： A substrate processing apparatus which irradiates a substrate under processing with an electron beam and processes the substrate with the electron beam is disclosed. The substrate processing apparatus includes an electron beam generation mechanism which generates the electron beam, first area having a plurality of first static electricity deflecting devices whose thicknesses gradually increase in a traveling direction of the electron beam, and a second area disposed on a downstream side of the electron beam of the first area and having a plurality of second static electricity deflecting devices whose thicknesses are nearly same in the traveling direction of the electron beam. The substrate processing apparatus may further include a plurality of lenses whose thicknesses gradually decrease in the traveling direction of the electron beam, at least one of the plurality of lenses being disposed in each of the first area and the second area.
摘要翻译：公开了一种用电子束照射处理基板并用电子束处理基板的基板处理装置。基板处理装置包括：电子束发生机构，其产生电子束，第一区域具有多个第一静电偏转装置，其厚度在电子束的行进方向上逐渐增加，第二区域设置在电子束的下游侧第一区域的电子束，并且具有多个第二静电偏转装置，其厚度在电子束的行进方向上几乎相同。基板处理装置还可以包括其厚度在电子束的行进方向上逐渐减小的多个透镜，多个透镜中的至少一个设置在第一区域和第二区域中的每一个中。

7. 发明申请

US20070228275A1 STATIC ELECTRICITY DEFLECTING DEVICE, ELECTRON BEAM IRRADIATING APPARATUS, SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND METHOD OF MANUFACTURING SUBSTRATE 失效
标题翻译：静电电压偏移装置，电子束辐射装置，基板处理装置，基板处理方法及制造基板的方法
公开(公告)号：US20070228275A1
公开(公告)日：2007-10-04
申请号：US11615485
申请日：2006-12-22
申请人： Takashi FUSE , Tadashi Kotsugi , Kyo Tsuboi , Koji Takeya
发明人： Takashi FUSE , Tadashi Kotsugi , Kyo Tsuboi , Koji Takeya
IPC分类号： G21K7/00
CPC分类号： H01J37/1474 , B82Y10/00 , B82Y40/00 , H01J37/026 , H01J37/147 , H01J37/3174 , H01J2237/03 , H01J2237/151 , H01L21/67017 , H01L21/67213 , Y10T29/49117 , Y10T29/49204 , Y10T29/49224 , Y10T29/49885
摘要： A substrate processing apparatus which irradiates a substrate under processing with an electron beam and processes the substrate with the electron beam is disclosed. The substrate processing apparatus includes an electron beam generation mechanism which generates the electron beam, first area having a plurality of first static electricity deflecting devices whose thicknesses gradually increase in a traveling direction of the electron beam, and a second area disposed on a downstream side of the electron beam of the first area and having a plurality of second static electricity deflecting devices whose thicknesses are nearly same in the traveling direction of the electron beam. The substrate processing apparatus may further include a plurality of lenses whose thicknesses gradually decrease in the traveling direction of the electron beam, at least one of the plurality of lenses being disposed in each of the first area and the second area.
摘要翻译：公开了一种用电子束照射处理基板并用电子束处理基板的基板处理装置。基板处理装置包括：电子束发生机构，其产生电子束，第一区域具有多个第一静电偏转装置，其厚度在电子束的行进方向上逐渐增加，第二区域设置在电子束的下游侧第一区域的电子束，并且具有多个第二静电偏转装置，其厚度在电子束的行进方向上几乎相同。基板处理装置还可以包括其厚度在电子束的行进方向上逐渐减小的多个透镜，多个透镜中的至少一个设置在第一区域和第二区域中的每一个中。

8. 发明申请

US20080067429A1 STATIC ELECTRICITY DEFLECTING DEVICE, ELECTRON BEAM IRRADIATING APPARATUS, SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND METHOD OF MANUFACTURING SUBSTRATE 审中-公开
标题翻译：静电电压偏移装置，电子束辐射装置，基板处理装置，基板处理方法及制造基板的方法
公开(公告)号：US20080067429A1
公开(公告)日：2008-03-20
申请号：US11932770
申请日：2007-10-31
申请人： Takashi Fuse , Tadashi Kotsugi , Kyo Tsuboi , Koji Takeya
发明人： Takashi Fuse , Tadashi Kotsugi , Kyo Tsuboi , Koji Takeya
IPC分类号： H01L21/30
CPC分类号： H01J37/1474 , B82Y10/00 , B82Y40/00 , H01J37/026 , H01J37/147 , H01J37/3174 , H01J2237/03 , H01J2237/151 , H01L21/67017 , H01L21/67213 , Y10T29/49117 , Y10T29/49204 , Y10T29/49224 , Y10T29/49885
摘要： A substrate processing apparatus which irradiates a substrate under processing with an electron beam and processes the substrate with the electron beam is disclosed. The substrate processing apparatus includes an electron beam generation mechanism which generates the electron beam, first area having a plurality of first static electricity deflecting devices whose thicknesses gradually increase in a traveling direction of the electron beam, and a second area disposed on a downstream side of the electron beam of the first area and having a plurality of second static electricity deflecting devices whose thicknesses are nearly same in the traveling direction of the electron beam. The substrate processing apparatus may further include a plurality of lenses whose thicknesses gradually decrease in the traveling direction of the electron beam, at least one of the plurality of lenses being disposed in each of the first area and the second area.
摘要翻译：公开了一种用电子束照射处理基板并用电子束处理基板的基板处理装置。基板处理装置包括：电子束发生机构，其产生电子束，第一区域具有多个第一静电偏转装置，其厚度在电子束的行进方向上逐渐增加，第二区域设置在电子束的下游侧第一区域的电子束，并且具有多个第二静电偏转装置，其厚度在电子束的行进方向上几乎相同。基板处理装置还可以包括其厚度在电子束的行进方向上逐渐减小的多个透镜，多个透镜中的至少一个设置在第一区域和第二区域中的每一个中。

9. 发明授权

US5262182A Breadmaking dough conditioner 失效
标题翻译：面包面包调理剂
公开(公告)号：US5262182A
公开(公告)日：1993-11-16
申请号：US923476
申请日：1992-08-03
申请人： Akira Kasahara , Koji Takeya , Hiroshi Takeshima , Ryuji Uemura
发明人： Akira Kasahara , Koji Takeya , Hiroshi Takeshima , Ryuji Uemura
IPC分类号： A21D2/02 , A21D2/16 , A21D2/18 , A21D2/22 , A21D2/24 , A21D6/00 , A21D8/02
CPC分类号： A21D2/16 , A21D2/02 , A21D2/22 , A21D2/245 , A21D6/001
摘要： A breadmaking dough conditioner is disclosed which comprises (a) an ascorbic acid, (b) at least one amino acid or salts thereof selected from the group consisting of cystine, methionine, asparagic acid, alanine, glycine and salts thereof, (c) an alum and (d) at least one emulsifier selected from the group consisting of a glycerol fatty acid monoester and a sucrose fatty acid ester having an HLB value of 5 to 10. The dough conditioners are especially suitable for the manufacture of bread using a frozen or chilled bread dough. They can prepare breads which have no fisheyes on the surface of the baked bread, have large bread volume and are good in all respects of appearance, inner phase, taste and flavor.
摘要翻译：公开了一种面包制作面团调理剂，其包含（a）抗坏血酸，（b）至少一种选自胱氨酸，甲硫氨酸，天冬酰胺酸，丙氨酸，甘氨酸及其盐的氨基酸或其盐，（c）明矾和（d）至少一种选自HLB值为5至10的甘油脂肪酸单酯和蔗糖脂肪酸酯的乳化剂。面团调理剂特别适用于使用冷冻或冷面包面团他们可以在烤面包的表面上制备没有鱼眼的面包，面包的体积大，在外观，内相，味道和风味方面都很好。

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