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2. 发明申请

US20100006032A1 CHAMBER COMPONENTS FOR CVD APPLICATIONS 审中-公开
标题翻译：用于CVD应用的CHAMBER组件
公开(公告)号：US20100006032A1
公开(公告)日：2010-01-14
申请号：US12501195
申请日：2009-07-10
申请人： Kimberly Hinckley , Yizhen Zhang , Manuel A. Hernandez , Won B. Bang , Dmitry Lubomirsky
发明人： Kimberly Hinckley , Yizhen Zhang , Manuel A. Hernandez , Won B. Bang , Dmitry Lubomirsky
IPC分类号： C23C16/00
CPC分类号： C23C16/452 , C23C16/4481 , C23C16/45512 , C23C16/45591
摘要： Apparatus for use with a processing chamber are provided. In one aspect a blocker plate is provided including an annular plate having an inner portion of a first thickness and the annular plate having an aperture pattern including a center portion, a first patterned portion concentrically disposed around the center portion and comprising a first plurality of apertures having a first number of apertures, an second patterned portion concentrically disposed around the first patterned portion and comprising a second plurality of apertures having a second number of apertures greater than the first number of apertures, a perimeter portion concentrically disposed around the second patterned portion, and an outer portion comprising a raised concentric portion disposed on a perimeter of the annular plate. In another aspect, a second, third, and fourth blocker plates are provided. Additionally, a mixing apparatus and a liquid evaporating apparatus for use in a processing chamber are provided.
摘要翻译：提供了一种用于处理室的设备。在一个方面，提供了阻挡板，其包括具有第一厚度的内部部分的环形板，并且环形板具有包括中心部分的孔图案，第一图案化部分同心地设置在中心部分周围，并且包括第一多个孔具有第一数量的孔，第二图案部分同心地设置在第一图案化部分周围，并且包括第二多个孔，其具有大于第一数量孔的第二数量的孔，围绕第二图案化部分同心设置的周边部分，以及包括设置在所述环形板的周边上的升高的同心部分的外部部分。另一方面，提供第二，第三和第四阻滞板。此外，提供了一种用于处理室的混合装置和液体蒸发装置。

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