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1. 发明授权

US07955765B2 Adjustment method, exposure method, device manufacturing method, and exposure apparatus 失效
标题翻译：调整方法，曝光方法，装置制造方法和曝光装置
公开(公告)号：US07955765B2
公开(公告)日：2011-06-07
申请号：US12177557
申请日：2008-07-22
申请人： Ken-ichiro Shinoda
发明人： Ken-ichiro Shinoda
IPC分类号： G03F9/00
CPC分类号： G03F7/70566 , G01J4/04 , G03F7/70191 , G03F7/7085
摘要： An adjustment method for adjusting an illumination condition in illuminating an original plate using an illumination optical system and projecting an image of a pattern formed on the original plate onto a substrate through a projection optical system includes measuring a polarization state of light that has passed through the illumination optical system, the original plate, and the projection optical system in a state where the original plate is located on an object plane of the projection optical system, and adjusting the polarization state based on the measured polarization state.
摘要翻译：一种调整方法，用于调整使用照明光学系统照射原版的照明条件，并通过投影光学系统将形成在原版上的图案的图像投影到基板上，包括测量已经通过照明光学系统，原版和投影光学系统，其中原版位于投影光学系统的物平面上，并且基于所测量的偏振状态来调节偏振状态。

2. 发明申请

US20090035671A1 ADJUSTMENT METHOD, EXPOSURE METHOD, DEVICE MANUFACTURING METHOD, AND EXPOSURE APPARATUS 失效
标题翻译：调整方法，曝光方法，装置制造方法和曝光装置
公开(公告)号：US20090035671A1
公开(公告)日：2009-02-05
申请号：US12177557
申请日：2008-07-22
申请人： Ken-ichiro Shinoda
发明人： Ken-ichiro Shinoda
IPC分类号： G03C5/00 , G03B27/72
CPC分类号： G03F7/70566 , G01J4/04 , G03F7/70191 , G03F7/7085
摘要： An adjustment method for adjusting an illumination condition in illuminating an original plate using an illumination optical system and projecting an image of a pattern formed on the original plate onto a substrate through a projection optical system includes measuring a polarization state of light that has passed through the illumination optical system, the original plate, and the projection optical system in a state where the original plate is located on an object plane of the projection optical system, and adjusting the polarization state based on the measured polarization state.
摘要翻译：一种调整方法，用于调整使用照明光学系统照射原版的照明条件，并通过投影光学系统将形成在原版上的图案的图像投影到基板上，包括测量已经通过照明光学系统，原版和投影光学系统，其中原版位于投影光学系统的物平面上，并且基于所测量的偏振状态来调节偏振状态。

3. 发明申请

US20070024839A1 EXPOSURE APPARATUS AND METHOD FOR MANUFACTURING DEVICE USING THE EXPOSURE APPARATUS 有权
标题翻译：曝光装置和使用曝光装置制造装置的方法
公开(公告)号：US20070024839A1
公开(公告)日：2007-02-01
申请号：US11460354
申请日：2006-07-27
申请人： Tomoaki Kawakami , Ken-ichiro Shinoda
发明人： Tomoaki Kawakami , Ken-ichiro Shinoda
IPC分类号： G03B27/72
CPC分类号： G03B27/72 , G03F7/70091
摘要： At least one exemplary embodiment is directed to an exposure apparatus which includes an illumination optical system configured to irradiate a mask with light from a light source, and a projecting optical system configured to project a pattern image of the mask onto a substrate. The illumination optical system provides a first light intensity which can be altered by an optical unit forming a second light intensity. The second light intensity can be further altered by an optical unit changing the dimension of the second light intensity forming a third light intensity, where the third light intensity can be used in the lithographic process for forming devices.
摘要翻译：至少一个示例性实施例涉及一种曝光装置，其包括被配置为用来从光源照射光的照明光学系统，以及被配置为将掩模的图案图像投影到基板上的投影光学系统。照明光学系统提供可以由形成第二光强度的光学单元改变的第一光强度。可以通过改变形成第三光强度的第二光强度的尺寸的光学单元进一步改变第二光强度，其中可以在用于形成器件的光刻工艺中使用第三光强度。

4. 发明授权

US06674514B2 Illumination optical system in exposure apparatus 失效
标题翻译：曝光装置中的照明光学系统
公开(公告)号：US06674514B2
公开(公告)日：2004-01-06
申请号：US09809056
申请日：2001-03-16
申请人： Ken-ichiro Shinoda
发明人： Ken-ichiro Shinoda
IPC分类号： G03B2772
CPC分类号： G02B27/286 , G02B5/04 , G02B5/3066 , G02B17/045 , G03F7/70066 , G03F7/702 , G03F7/70566
摘要： An optical system includes an internal reflection type optical member for changing a direction of advancement of an approximately linearly polarized light on the basis of total reflection and a depolarizing member for dissolving linear polarization of light emitted from the optical member.
摘要翻译：光学系统包括内反射型光学构件，用于基于全反射改变近似线性偏振光的前进方向，以及用于溶解从光学构件发射的光的线偏振的去偏振构件。

5. 发明授权

US08208126B2 Exposure apparatus and device fabrication method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US08208126B2
公开(公告)日：2012-06-26
申请号：US12100034
申请日：2008-04-09
申请人： Ken-ichiro Shinoda
发明人： Ken-ichiro Shinoda
IPC分类号： G03B27/32 , G03B27/42 , G03B27/54 , G03B27/72 , G03B27/74
CPC分类号： G03F7/7085 , G03F7/70058 , G03F7/70558 , G03F7/70566
摘要： The present invention provides an exposure apparatus comprising an illumination optical system configured to illuminate a reticle with a light beam from a light source, and a projection optical system configured to project a pattern of the reticle onto a substrate, the illumination optical system including a light amount adjusting unit configured to adjust an amount of the light beam, a polarization adjusting unit configured to adjust a polarization state of the light beam, and a beam splitter configured to split the incident light beam into two light beams, wherein the light amount adjusting unit, the polarization adjusting unit, and the beam splitter are set in an order from the light source side.
摘要翻译：本发明提供了一种曝光装置，包括：照明光学系统，被配置为用来自光源的光束照射光罩;以及投影光学系统，其配置成将所述标线图案投影到基板上，所述照明光学系统包括光配置为调整光束量的量调节单元，被配置为调整光束的偏振态的偏振调节单元和被配置为将入射光束分成两束光束的分束器，其中光量调节单元，偏光调整单元和分束器以从光源侧开始的顺序设置。

6. 发明授权

US07209218B2 Exposure apparatus and method for manufacturing device using the exposure apparatus 有权
标题翻译：曝光装置及使用该曝光装置的装置的制造方法
公开(公告)号：US07209218B2
公开(公告)日：2007-04-24
申请号：US11460354
申请日：2006-07-27
申请人： Tomoaki Kawakami , Ken-ichiro Shinoda
发明人： Tomoaki Kawakami , Ken-ichiro Shinoda
IPC分类号： G03B27/74 , G03B27/42 , G03B27/54
CPC分类号： G03B27/72 , G03F7/70091
摘要： At least one exemplary embodiment is directed to an exposure apparatus which includes an illumination optical system configured to irradiate a mask with light from a light source, and a projecting optical system configured to project a pattern image of the mask onto a substrate. The illumination optical system provides a first light intensity which can be altered by an optical unit forming a second light intensity. The second light intensity can be further altered by an optical unit changing the dimension of the second light intensity forming a third light intensity, where the third light intensity can be used in the lithographic process for forming devices.
摘要翻译：至少一个示例性实施例涉及一种曝光装置，其包括被配置为用来从光源照射光的照明光学系统，以及被配置为将掩模的图案图像投影到基板上的投影光学系统。照明光学系统提供可以由形成第二光强度的光学单元改变的第一光强度。可以通过改变形成第三光强度的第二光强度的尺寸的光学单元进一步改变第二光强度，其中可以在用于形成器件的光刻工艺中使用第三光强度。

7. 发明申请

US20090002673A1 EXPOSURE APPARATUS AND DEVICE FABRICATION METHOD 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20090002673A1
公开(公告)日：2009-01-01
申请号：US12100034
申请日：2008-04-09
申请人： Ken-ichiro Shinoda
发明人： Ken-ichiro Shinoda
IPC分类号： G03B27/72
CPC分类号： G03F7/7085 , G03F7/70058 , G03F7/70558 , G03F7/70566
摘要： The present invention provides an exposure apparatus comprising an illumination optical system configured to illuminate a reticle with a light beam from a light source, and a projection optical system configured to project a pattern of the reticle onto a substrate, the illumination optical system including a light amount adjusting unit configured to adjust an amount of the light beam, a polarization adjusting unit configured to adjust a polarization state of the light beam, and a beam splitter configured to split the incident light beam into two light beams, wherein the light amount adjusting unit, the polarization adjusting unit, and the beam splitter are set in an order from the light source side.
摘要翻译：本发明提供了一种曝光装置，包括：照明光学系统，被配置为用来自光源的光束照射光罩;以及投影光学系统，其配置成将所述标线图案投影到基板上，所述照明光学系统包括光配置为调整光束量的量调节单元，被配置为调整光束的偏振态的偏振调节单元和被配置为将入射光束分成两束光束的分束器，其中光量调节单元，偏光调整单元和分束器以从光源侧开始的顺序设置。

8. 发明授权

US07385672B2 Exposure apparatus and method 有权
标题翻译：曝光装置和方法
公开(公告)号：US07385672B2
公开(公告)日：2008-06-10
申请号：US11064635
申请日：2005-02-24
申请人： Ken-ichiro Shinoda
发明人： Ken-ichiro Shinoda
IPC分类号： G03B27/42 , G03B27/54
CPC分类号： G03F7/70108 , G03F7/70258
摘要： An exposure apparatus for exposing a pattern of a reticle onto an object to be exposed, via a projection optical system, utilizing exposure light, includes an optical element for determining a shape of an effective light source on a predetermined surface that substantially has a Fourier transformation relationship with the reticle, a detector for detecting the shape of the effective light source and a light intensity on the object, and a corrector for correcting a variance of performance of the projection optical system, and a controller for controlling the corrector based on a detection result of the detector.
摘要翻译：一种曝光装置，用于通过使用曝光光的投影光学系统将掩模版的图案曝光到待曝光的物体上，包括用于确定基本上具有傅里叶变换的预定表面上的有效光源的形状的光学元件与掩模版的关系，用于检测有效光源的形状的检测器和物体上的光强度，以及用于校正投影光学系统的性能差异的校正器，以及用于基于检测来控制校正器的控制器检测器的结果。

9. 发明授权

US06560044B2 Illumination optical system in exposure apparatus 失效
标题翻译：曝光装置中的照明光学系统
公开(公告)号：US06560044B2
公开(公告)日：2003-05-06
申请号：US09797847
申请日：2001-03-05
申请人： Ken-ichiro Shinoda
发明人： Ken-ichiro Shinoda
IPC分类号： G02B2702
CPC分类号： G03F7/70141 , G02B19/0014 , G02B19/0085 , G02B27/18 , G03F7/70066
摘要： An illumination optical system includes an optical integrator for forming a secondary light source by use of light from a light source, an optical system for directing light from the light source toward the integrator, and a condensing optical system for condensing light from the optical integrator upon a surface to be illuminated. The condensing optical system includes (i) a first lens group having plural lenses movable along an optical axis direction, for adjusting an illuminance distribution of light from the secondary light source upon the surface to be illuminated, without changing an angular distribution of the light from the secondary light source upon the surface to be illuminated, and (ii) a second lens group having plural lenses movable along the optical axis direction, for adjusting the angular distribution of the light from the secondary light source upon the surface to be illuminated, without changing the illuminance distribution of the light from the secondary light source upon the surface to be illuminated.
摘要翻译：照明光学系统包括用于通过使用来自光源的光形成二次光源的光学积分器，用于将来自光源的光引向积分器的光学系统，以及用于将来自光学积分器的光聚光到要照亮的表面。聚光光学系统包括：（i）具有沿着光轴方向可移动的多个透镜的第一透镜组，用于调节来自二次光源的光在照明表面上的照度分布，而不改变来自待被照射的表面上的次级光源，以及（ii）具有沿着光轴方向可移动的多个透镜的第二透镜组，用于调节来自二次光源的光在被照射的表面上的角度分布，而没有将来自二次光源的光的照度分布改变为要被照射的表面。

10. 发明授权

US07242457B2 Exposure apparatus and exposure method, and device manufacturing method using the same 失效
标题翻译：曝光装置和曝光方法以及使用其的装置制造方法
公开(公告)号：US07242457B2
公开(公告)日：2007-07-10
申请号：US11110350
申请日：2005-04-19
申请人： Ken-ichiro Shinoda
发明人： Ken-ichiro Shinoda
IPC分类号： G03B27/54 , G03B27/42
CPC分类号： G03F7/70958 , G03F7/70075
摘要： Disclosed is an exposure apparatus and method, and a device manufacturing method using the same. An exposure apparatus according to one preferred form of the invention includes an illumination optical system for illuminating an original with light from a light source, and a projection optical system for projecting a pattern of the original onto a substrate, wherein the illumination optical system includes an optical integrator for forming a secondary light source by use of light from the light source and a condenser optical system for directing light from the optical integrator to the original, and wherein the projection optical system includes an optical element such as a lens, made of a glass material of quartz and being disposed adjacent a pupil plane of the projection optical system.
摘要翻译：公开了一种曝光装置和方法，以及使用其的装置制造方法。根据本发明的一个优选形式的曝光装置包括用于利用来自光源的光照射原稿的照明光学系统和用于将原稿的图案投影到基板上的投影光学系统，其中照明光学系统包括：用于通过使用来自光源的光形成二次光源的光学积分器和用于将来自光学积分器的光引导到原稿的聚光镜系统，并且其中投影光学系统包括诸如透镜的光学元件，并配置在投影光学系统的光瞳平面附近。

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