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1. 发明授权

US07084407B2 Ion beam extractor with counterbore 失效
公开(公告)号：US07084407B2
公开(公告)日：2006-08-01
申请号：US10367664
申请日：2003-02-13
申请人： Qing Ji , Keith Standiford , Tsu-Jae King , Ka-Ngo Leung
发明人： Qing Ji , Keith Standiford , Tsu-Jae King , Ka-Ngo Leung
IPC分类号： H01J27/00 , H01J7/24
CPC分类号： H01J27/022
摘要： An extractor system for a plasma ion source has a single (first) electrode with one or more apertures, or a pair of spaced electrodes, a first or plasma forming electrode and a second or extraction electrode, with one or more aligned apertures. The aperture(s) in the first electrode (or the second electrode or both) have a counterbore on the downstream side (i.e. away from the plasma ion source or facing the second electrode). The counterbored extraction system reduces aberrations and improves focusing. The invention also includes an ion source with the counterbored extraction system, and a method of improving focusing in an extraction system by providing a counterbore.

2. 发明授权

US08063365B1 Non-shot-noise-limited source for electron beam lithography or inspection 有权
标题翻译：用于电子束光刻或检查的无喷射噪声限制源
公开(公告)号：US08063365B1
公开(公告)日：2011-11-22
申请号：US12326518
申请日：2008-12-02
申请人： Keith Standiford , Alan Brodie
发明人： Keith Standiford , Alan Brodie
IPC分类号： G01N23/00
CPC分类号： G01N23/04 , B82Y10/00 , B82Y40/00 , G01N2223/102 , G01N2223/3301 , G01N2223/6116 , H01J37/063 , H01J37/3174 , H01J2237/31789
摘要： One embodiment relates to an electron source apparatus for an electron beam lithography tool or an electron beam inspection tool. A cathode is configured to emit electrons, and an anode is configured to accelerate the electrons so as to create an electron beam. There are no beam apertures in the electron source apparatus that are positioned at non-focal planes. An electron lens may be configured to focus the electron beam to form a cathode image at a focal plane, and a beam aperture may positioned at the focal plane. Other embodiments, aspects and features are also disclosed.
摘要翻译：一个实施例涉及一种用于电子束光刻工具或电子束检查工具的电子源装置。阴极被配置为发射电子，并且阳极被配置为加速电子以产生电子束。电子源装置中没有光束孔位于非焦平面。电子透镜可以被配置为聚焦电子束以在焦平面处形成阴极图像，并且光束孔径可以位于焦平面处。还公开了其它实施例，方面和特征。

3. 发明授权

US09040942B1 Electron beam lithography with linear column array and rotary stage 有权
标题翻译：具有线性柱阵列和旋转台的电子束光刻
公开(公告)号：US09040942B1
公开(公告)日：2015-05-26
申请号：US12008517
申请日：2008-01-11
申请人： Keith Standiford , Alan D. Brodie
发明人： Keith Standiford , Alan D. Brodie
IPC分类号： G21K5/04 , H01J37/04
CPC分类号： H01J37/04 , H01J37/3007 , H01J37/3177 , H01J2237/201 , H01J2237/31789
摘要： One embodiment relates to an apparatus for electron beam lithography which includes a linear array of reflection electron beam lithography columns and a rotary stage. Each column is separately controllable to write a portion of a lithographic pattern onto a substrate. The rotary stage is configured to hold multiple substrates and to be rotated under the linear array of reflection electron beam lithography columns. Another embodiment relates to a method of electron beam lithography which includes simultaneously rotating and linearly translating a stage holding a plurality of wafers, and writing a lithography pattern using a linear array of reflection electron beam lithography columns over the stage. Each said column traverses a spiral path over the stage as the stage is rotated and linearly translated. Other embodiments, aspects and feature are also disclosed.
摘要翻译：一个实施例涉及一种用于电子束光刻的装置，其包括反射电子束光刻柱和旋转台的线性阵列。每列可分开控制，以将一部分平版印刷图案写入基板上。旋转台被配置为保持多个基板并且在反射电子束光刻柱的线性阵列下旋转。另一实施例涉及电子束光刻的方法，其包括同时旋转和线性平移保持多个晶片的台，以及使用反射电子束光刻柱的线性阵列在平台上书写光刻图案。当舞台旋转并线性平移时，每个所述列横过舞台上的螺旋路径。还公开了其它实施例，方面和特征。

4. 发明授权

US07241991B1 Region-of-interest based electron beam metrology 有权
标题翻译：基于感兴趣区域的电子束计量
公开(公告)号：US07241991B1
公开(公告)日：2007-07-10
申请号：US11271122
申请日：2005-11-09
申请人： Keith Standiford , Mark A. Neil
发明人： Keith Standiford , Mark A. Neil
IPC分类号： H01L21/00 , H01J37/26
CPC分类号： H01J37/28 , H01J2237/2814 , H01J2237/2817
摘要： One embodiment relates to a method for metrology using an electron beam apparatus. At least one region of interest is selected in a field of view at a magnification level. Scanning parameters are determined to selectively scan over the at least one regions of interest under the magnification level of the field of view. The electron beam is selectively scanned over the at least one region of interest to capture image data from the at least one region of interest while maintaining the magnification level of the field of view. Other embodiments are also disclosed.
摘要翻译：一个实施例涉及使用电子束装置的计量方法。在放大级别的视场中选择至少一个感兴趣区域。确定扫描参数以在视场的放大级别下选择性地扫描感兴趣的至少一个区域。在所述至少一个感兴趣区域上选择性地扫描电子束以从所述至少一个感兴趣区域捕获图像数据，同时保持视场的放大水平。还公开了其他实施例。

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