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1. 发明授权

US06725098B2 Semiconductor run-to-run control system with missing and out-of-order measurement handling 失效
标题翻译：半导体运行控制系统，具有丢失和无序测量处理
公开(公告)号：US06725098B2
公开(公告)日：2004-04-20
申请号：US10046359
申请日：2001-10-23
申请人： Keith A. Edwards , Jianping Zou , James A. Mullins
发明人： Keith A. Edwards , Jianping Zou , James A. Mullins
IPC分类号： G05B1302
CPC分类号： H01L22/20 , G05B13/042 , G05B13/048 , G05B15/02 , G05B17/02
摘要： A method for a run-to-run (R2R) control system includes processing materials using a process input and producing a process output, storing the process input in a database, the storing including using a timestamp, storing at least one measurement of the process output in the database aligned with each process input using the timestamp, iterating over the data from the database to estimate a process state, and, if one or more of the measurements is missing from the database, predicting the missing measurements for the database based on a model, and determining an error for calculating a next process input, the error based on the data in the database.
摘要翻译：运行（R2R）控制系统的方法包括使用过程输入处理材料并产生过程输出，将过程输入存储在数据库中，存储包括使用时间戳，存储至少一个过程的测量数据库中的输出与使用时间戳记的每个进程输入对齐，迭代数据库中的数据以估计进程状态，并且如果数据库中缺少一个或多个测量，则基于模型，并确定计算下一个进程输入的错误，基于数据库中的数据的错误。

2. 发明授权

US06179688B2 Method and apparatus for detecting the endpoint of a chemical-mechanical polishing operation 有权
标题翻译：用于检测化学机械抛光操作的终点的方法和装置
公开(公告)号：US06179688B2
公开(公告)日：2001-01-30
申请号：US09271072
申请日：1999-03-17
申请人： Peter J. Beckage , Keith A. Edwards , Ralf B. Lukner , Wonhui Cho
发明人： Peter J. Beckage , Keith A. Edwards , Ralf B. Lukner , Wonhui Cho
IPC分类号： B24B4900
CPC分类号： B24B37/013
摘要： The invention, in a first aspect, includes a method and apparatus for detecting the endpoint in a chemical-mechanical polishing process. The first aspect includes a chemical-mechanical polishing tool modified to receive a first and a second data signal; combine the first and second data signals to generate a combined data signal; and detect a peak in the combined data signal, wherein the peak indicates the process endpoint. In a second aspect, the invention is a method and an apparatus for detecting the endpoint in a chemical-mechanical polishing process. The second aspect includes an apparatus implementing a method in which a data signal is received. The data signal is analyzed to detect a peak indicative of the process endpoint in the received data signal. The peak detection includes determining a high value for an initial peak; determining a low value for a following trough; estimating a value for the endpoint process from the high value and the low value; performing a least squares fit on the received data signal to identify subsequent peaks therein; filtering out a subsequent peak less than the estimated value; and identifying a remaining subsequent peak as the process endpoint. One particular embodiment includes both of these aspects.
摘要翻译：本发明在第一方面包括一种用于在化学机械抛光工艺中检测端点的方法和装置。第一方面包括经修改以接收第一和第二数据信号的化学机械抛光工具; 组合第一和第二数据信号以产生组合数据信号; 并检测组合数据信号中的峰值，其中峰值表示过程端点。在第二方面，本发明是用于在化学机械抛光工艺中检测端点的方法和装置。第二方面包括实现接收数据信号的方法的装置。分析数据信号以检测指示接收数据信号中的处理端点的峰值。峰值检测包括确定初始峰值的高值; 确定下一个槽的低值; 从高值和低值估计端点过程的值; 对所接收的数据信号执行最小二乘法拟合以识别其中的随后的峰值; 滤除小于估计值的后续峰值; 并识别剩余的后续峰值作为过程端点。一个具体实施例包括这两个方面。

3. 发明授权

US06748280B1 Semiconductor run-to-run control system with state and model parameter estimation 失效
标题翻译：具有状态和模型参数估计的半导体运行控制系统
公开(公告)号：US06748280B1
公开(公告)日：2004-06-08
申请号：US10171758
申请日：2002-06-14
申请人： Jianping Zou , James A. Mullins , Keith A. Edwards
发明人： Jianping Zou , James A. Mullins , Keith A. Edwards
IPC分类号： G05B1302
CPC分类号： H01L22/20 , G05B13/042 , G05B13/048 , G05B15/02 , G05B17/02
摘要： A method for a run-to-run (R2R) control system includes processing materials using a process input and producing a process output, storing the process input in a database, the storing including using a timestamp, and storing at least one measurement of the process output in the database aligned with each process input using the timestamp. The method further includes iterating over the data in the database to estimate one or more coefficients for a model, and, if one or more measurements is missing, replacing the missing measurements based on a prediction from said model. The model is updated with said coefficient estimates. The method additionally includes iterating over the data from the database to estimate a process state, and, if one or more of the measurements is missing from the database, replacing the missing measurements based on prediction from the model. The model is updated with said process state estimate. A controller may receive the updated model and utilize the model to produce the next process input. The updated model may also be utilized to generate an estimate for a measurable process variable, wherein the estimate can be compared to an actual measurement to determine if the estimate is within confidence limits. If the estimate is not within confidence limits, a fault is indicated.
摘要翻译：运行运行（R2R）控制系统的方法包括使用过程输入处理材料并产生过程输出，将过程输入存储在数据库中，存储包括使用时间戳，以及存储至少一个测量值数据库中的进程输出与使用时间戳记的每个进程输入进行对齐。该方法还包括迭代数据库中的数据以估计模型的一个或多个系数，并且如果缺少一个或多个测量，则基于来自所述模型的预测来替换丢失的测量。该模型用所述系数估计更新。该方法另外包括迭代来自数据库的数据以估计过程状态，并且如果数据库中缺少一个或多个测量值，则根据来自模型的预测来替换丢失的测量值。该模型使用所述过程状态估计进行更新。控制器可以接收更新的模型并利用该模型产生下一个过程输入。还可以使用更新的模型来生成可测量过程变量的估计，其中可以将估计与实际测量进行比较，以确定估计是否在置信限度内。如果估计值不在置信限度内，则会显示故障。

4. 发明授权

US06572443B1 Method and apparatus for detecting a process endpoint 有权
标题翻译：用于检测过程终点的方法和装置
公开(公告)号：US06572443B1
公开(公告)日：2003-06-03
申请号：US09633596
申请日：2000-08-07
申请人： Peter J. Beckage , Keith A. Edwards , Ralf B. Lukner , Wonhui Cho
发明人： Peter J. Beckage , Keith A. Edwards , Ralf B. Lukner , Wonhui Cho
IPC分类号： B24B4900
CPC分类号： B24B37/013
摘要： An apparatus and method for detecting a process endpoint. The method includes receiving a first data signal and a second data signal and combining the first data signal and the second data signal to generate a combined data signal. The method also includes detecting a peak in the combined data signal, wherein the peak indicates the process endpoint. The apparatus includes a data collection unit capable of receiving a plurality of data signals and a signal analysis unit. The signal analysis unit is capable of combining the plurality of data signals received through the data collection unit to generate a combined data signal and identifying a peak in the combined data signal indicative of the process endpoint.
摘要翻译：用于检测过程端点的装置和方法。该方法包括接收第一数据信号和第二数据信号，并组合第一数据信号和第二数据信号以产生组合的数据信号。该方法还包括检测组合数据信号中的峰值，其中峰值表示过程端点。该装置包括能够接收多个数据信号的数据收集单元和信号分析单元。信号分析单元能够组合通过数据收集单元接收的多个数据信号，以生成组合数据信号，并且识别指示处理端点的组合数据信号中的峰值。

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