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1. 发明申请

US20120281334A1 ELECTROSTATIC CHUCK APPARATUS 有权
标题翻译：静电卡装置
公开(公告)号：US20120281334A1
公开(公告)日：2012-11-08
申请号：US13513380
申请日：2010-12-08
申请人： Yasuharu Sasaki , Kenji Masuzawa , Toshiyuki Makabe , Mamoru Kosakai , Takashi Satou , Kazunori Ishimura , Ryuuji Hayahara , Hitoshi Kouno
发明人： Yasuharu Sasaki , Kenji Masuzawa , Toshiyuki Makabe , Mamoru Kosakai , Takashi Satou , Kazunori Ishimura , Ryuuji Hayahara , Hitoshi Kouno
IPC分类号： H02N13/00
CPC分类号： H01L21/6831 , H01J37/32642 , H01J2237/332 , H01J2237/338 , H01L21/67069 , H01L21/67103 , H01L21/67109 , H01L21/67248
摘要： Disclosed is an electrostatic chuck apparatus which is configured of: an electrostatic chuck section; an annular focus ring section provided to surround the electrostatic chuck section; and a cooling base section which cools the electrostatic chuck section and the focus ring section. The focus ring section is provided with an annular focus ring, an annular heat conducting sheet, an annular ceramic ring, a nonmagnetic heater, and an electrode section that supplies power to the heater.
摘要翻译：公开了一种静电卡盘装置，其包括：静电卡盘部; 设置成围绕静电吸盘部分的环形聚焦环部分; 以及冷却静电吸盘部和聚焦环部的冷却基部。聚焦环部分设置有环形聚焦环，环形导热片，环形陶瓷环，非磁性加热器和向加热器供电的电极部分。

2. 发明授权

US08981263B2 Electrostatic chuck apparatus 有权
标题翻译：静电吸盘装置
公开(公告)号：US08981263B2
公开(公告)日：2015-03-17
申请号：US13513380
申请日：2010-12-08
申请人： Yasuharu Sasaki , Kenji Masuzawa , Toshiyuki Makabe , Mamoru Kosakai , Takashi Satou , Kazunori Ishimura , Ryuuji Hayahara , Hitoshi Kouno
发明人： Yasuharu Sasaki , Kenji Masuzawa , Toshiyuki Makabe , Mamoru Kosakai , Takashi Satou , Kazunori Ishimura , Ryuuji Hayahara , Hitoshi Kouno
IPC分类号： H05B3/68 , C23C16/00 , H01L21/683 , H01L21/67
CPC分类号： H01L21/6831 , H01J37/32642 , H01J2237/332 , H01J2237/338 , H01L21/67069 , H01L21/67103 , H01L21/67109 , H01L21/67248
摘要： Disclosed is an electrostatic chuck apparatus which is configured of: an electrostatic chuck section; an annular focus ring section provided to surround the electrostatic chuck section; and a cooling base section which cools the electrostatic chuck section and the focus ring section. The focus ring section is provided with an annular focus ring, an annular heat conducting sheet, an annular ceramic ring, a nonmagnetic heater, and an electrode section that supplies power to the heater.
摘要翻译：公开了一种静电卡盘装置，其包括：静电卡盘部; 设置成围绕静电吸盘部分的环形聚焦环部分; 以及冷却静电吸盘部和聚焦环部的冷却基部。聚焦环部分设置有环形聚焦环，环形导热片，环形陶瓷环，非磁性加热器和向加热器供电的电极部分。

3. 发明申请

US20140204975A1 PLATE-SHAPED BODY FOR TEMPERATURE MEASUREMENT AND TEMPERATURE MEASURING APPARATUS PROVIDED WITH THE SAME 审中-公开
标题翻译：用于温度测量和温度测量装置的板形体
公开(公告)号：US20140204975A1
公开(公告)日：2014-07-24
申请号：US14239352
申请日：2012-08-22
申请人： Mamoru Kosakai , Kazunori Ishimura , Takeshi Watanabe , Hitoshi Kouno , Ryuuji Hayahara
发明人： Mamoru Kosakai , Kazunori Ishimura , Takeshi Watanabe , Hitoshi Kouno , Ryuuji Hayahara
IPC分类号： G01K13/00 , H01L21/66
CPC分类号： G01K13/00 , H01L21/67248 , H01L21/6833 , H01L22/12 , H01L2924/0002 , H05B1/0233 , H05B3/265 , H05B2203/002 , H01L2924/00
摘要： There are provided a plate-shaped body for temperature measurement which, simply by being mounted on a mounting surface of an electrostatic chuck apparatus and without using a semiconductor wafer itself which is a product, is able to easily optimize the in-plane temperature distribution of the mounting surface of the electrostatic chuck apparatus, the temperature rising characteristics, and the cooling characteristics during decreases in temperature, and a temperature measuring apparatus provided with the same. In such a wafer for temperature measurement (plate-shaped body for temperature measurement) (1), an insulating adhesive (3) is bonded to the entirety of a surface (2a) of a wafer (2), a heater element (4) is provided on the insulating adhesive (3), a temperature measurement region (5) is provided used to measure the temperature of the surface (2a) of the wafer (2) in a region excluding the heater element (4) on the surface (3a) of the insulating adhesive (3), and the heater element (4) and the temperature measurement region (5) are coated with an insulating film (6).
摘要翻译：提供了一种用于温度测量的板状体，其简单地通过安装在静电卡盘装置的安装表面上而不使用作为产品的半导体晶片本身，能够容易地优化面内温度分布静电吸盘装置的安装面，升温特性以及降温时的冷却特性，以及设置有该温度的温度测定装置。在这种用于温度测量的晶片（温度测量用板状体）（1））中，绝缘性粘合剂（3）与晶片（2）的表面（2a）的整体，加热元件（4）设置在绝缘粘合剂（3）上，设置用于测量在表面上的除了加热器元件（4）之外的区域中的晶片（2）的表面（2a）的温度的温度测量区域（5）绝缘胶（3）的表面（3a），以及加热元件（4）和温度测量区域（5）都涂覆有绝缘膜（6）。

4. 发明申请

US20120299253A1 ELECTROSTATIC CHUCK APPARATUS 有权
标题翻译：静电卡装置
公开(公告)号：US20120299253A1
公开(公告)日：2012-11-29
申请号：US13575545
申请日：2011-01-28
申请人： Mamoru Kosakai , Kazunori Ishimura , Takashi Satou , Ryuuji Hayahara , Takeshi Watanabe , Yoshiaki Moriya , Kei Furuuchi
发明人： Mamoru Kosakai , Kazunori Ishimura , Takashi Satou , Ryuuji Hayahara , Takeshi Watanabe , Yoshiaki Moriya , Kei Furuuchi
IPC分类号： H01L21/683
CPC分类号： H01L21/6831 , H01L21/67103 , Y10T279/23
摘要： The present invention provides an electrostatic chuck apparatus including: an electrostatic chuck section having one main surface that is a mounting surface on which a plate specimen is mounted, and being equipped with an electrostatic adsorbing internal electrode; and a temperature adjusting base section that adjusts the electrostatic chuck section to a desired temperature, wherein a heating member is bonded to a main surface of the electrostatic chuck section, which is opposite to the mounting surface, via an adhesive material, the whole or a part of the main surface of the temperature adjusting base section, which is on the side of the electrostatic chuck section, is covered with a sheet-like or film-like insulating material, and the electrostatic chuck section bonded with the heating member and the temperature adjusting base section covered with the sheet-like or the film-like insulating material are bonded and integrated via an insulating organic adhesive layer formed by curing a liquid adhesive.
摘要翻译：本发明提供一种静电卡盘装置，其特征在于，包括：静电吸盘部，具有作为安装有试样的安装面的一个主面，并具有静电吸附内部电极; 以及温度调节基部，其将静电吸盘部调节到期望的温度，其中，加热部件经由粘合剂材料，整体或一个或多个部分结合到与安装表面相对的静电卡盘部分的主表面上位于静电卡盘部分一侧的温度调节基部的主表面的一部分被片状或薄膜状绝缘材料覆盖，并且与加热构件接合的静电卡盘部分和温度由片状或薄膜状绝缘材料覆盖的调整基座部分通过固化液体粘合剂形成的绝缘有机粘合剂层而结合并整合。

5. 发明授权

US06730276B2 Plastic film electrostatic adsorption apparatus and electrostatic adsorption method 失效
标题翻译：塑料膜静电吸附装置及静电吸附法
公开(公告)号：US06730276B2
公开(公告)日：2004-05-04
申请号：US09909075
申请日：2001-07-18
申请人： Mamoru Kosakai , Kazunori Ishimura , Teruyasu Fujita
发明人： Mamoru Kosakai , Kazunori Ishimura , Teruyasu Fujita
IPC分类号： B01J1908
CPC分类号： B29C59/106 , B29K2105/256 , H02N13/00
摘要： The plastic film electrostatic adsorption apparatus of the present invention comprises an electrostatic adsorption electrode, an insulated dielectric layer that covers the electrostatic adsorption electrode and has a center line average roughness of an adsorption surface on which a plastic film is placed of 0.5 micrometers or less, and a power supply electrode that applies a voltage to the electrostatic adsorption electrode. According to this plastic film electrostatic adsorption apparatus, surface treatment can be performed even in a vacuum without requiring tedious work such as application or removal of adhesive. In addition, even if the plastic film expands and deforms due to heat treatment and plasma treatment performed during surface treatment, there is no occurrence of wrinkling, deformation or separation in the plastic film due to the difference in thermal expansion between the electrostatic adsorption surface and plastic film.
摘要翻译：本发明的塑料膜静电吸附装置包括静电吸附电极，覆盖静电吸附电极的绝缘电介质层，其中放置塑料膜的吸附面的中心线平均粗糙度为0.5微米以下，以及向静电吸附电极施加电压的电源电极。根据该塑料膜静电吸附装置，即使在真空中也可以进行表面处理，而不需要繁琐的工作，例如施加或去除粘合剂。此外，即使由于表面处理中进行的热处理和等离子体处理而导致的塑料膜膨胀变形，也不会由于静电吸附面和静电吸附面之间的热膨胀差异而导致塑料膜起皱，变形或分离塑料薄膜。

6. 发明授权

US09343346B2 Electrostatic chuck apparatus 有权
标题翻译：静电吸盘装置
公开(公告)号：US09343346B2
公开(公告)日：2016-05-17
申请号：US13575545
申请日：2011-01-28
申请人： Mamoru Kosakai , Kazunori Ishimura , Takashi Satou , Ryuuji Hayahara , Takeshi Watanabe , Yoshiaki Moriya , Kei Furuuchi
发明人： Mamoru Kosakai , Kazunori Ishimura , Takashi Satou , Ryuuji Hayahara , Takeshi Watanabe , Yoshiaki Moriya , Kei Furuuchi
IPC分类号： H05B3/68 , H01L21/683 , H01L21/67
CPC分类号： H01L21/6831 , H01L21/67103 , Y10T279/23
摘要： An electrostatic chuck apparatus including: an electrostatic chuck section having one main surface that is a mounting surface on which a plate specimen is mounted, and being equipped with an electrostatic adsorbing internal electrode; and a temperature adjusting base section that adjusts the electrostatic chuck section to a desired temperature, wherein a heating member is bonded to a main surface of the electrostatic chuck section, which is opposite to the mounting surface, via an adhesive material, the whole or a part of the main surface of the temperature adjusting base section, which is on the side of the electrostatic chuck section, is covered with a sheet or film of insulating material, and the electrostatic chuck section bonded with the heating member and the temperature adjusting base section covered with the insulating material are bonded and integrated via an insulating organic adhesive layer formed by curing a liquid adhesive.
摘要翻译：一种静电吸盘装置，包括：静电吸盘部，其具有作为安装有板试样的安装面的一个主面，并具有静电吸附内部电极; 以及温度调节基部，其将静电吸盘部调节到期望的温度，其中，加热部件经由粘合剂材料，整体或一个或多个部分结合到与安装表面相对的静电卡盘部分的主表面上位于静电卡盘部一侧的温度调节基部的主表面的一部分被绝缘材料的薄片或膜覆盖，并且与加热部件和温度调节基部分接合的静电吸盘部分被绝缘材料覆盖的绝缘材料通过通过固化液体粘合剂形成的绝缘有机粘合剂层而结合并整合。

7. 发明授权

US09269600B2 Electrostatic chuck device 有权
标题翻译：静电吸盘装置
公开(公告)号：US09269600B2
公开(公告)日：2016-02-23
申请号：US14113765
申请日：2012-04-27
申请人： Yukio Miura , Kazunori Ishimura , Mamoru Kosakai
发明人： Yukio Miura , Kazunori Ishimura , Mamoru Kosakai
IPC分类号： H05B3/68 , H05B3/06 , H01L21/683 , H01L21/67
CPC分类号： H01L21/6833 , H01L21/67103 , H01L21/6831 , Y10T279/23
摘要： An electrostatic chuck device includes an electrostatic chuck section (2), which has a principal surface that is a mounting surface on which a plate-like sample (W) is placed, and has an internal electrode for electrostatic adsorption (13) incorporated in the section, and a temperature adjustment base section (3) which adjusts the temperature of the electrostatic chuck section (2); wherein a part or all of a surface of the temperature adjustment base section (3) is covered by a sheet-like or film-like insulating material (4) wherein the surface faces the side where the electrostatic chuck section is located; a thin plate-like heater element (5) is bonded on the insulating material (4); and the electrostatic chuck section (2) and the temperature adjustment base section (3) are integrated with each other via an organic insulating adhesive layer (6) formed by curing a liquid adhesive.
摘要翻译：静电吸盘装置包括静电吸盘部分（2），该静电吸盘部分（2）具有主表面，该主表面是其上放置板状样品（W）的安装表面，并且具有用于静电吸附的内部电极（13）调节静电吸盘部（2）的温度的温度调节基部（3）。其中所述温度调节基部（3）的表面的一部分或全部被片状或薄膜状绝缘材料（4）覆盖，所述片状或薄膜状的绝缘材料（4）表面与所述静电卡盘部所在的一侧相对; 绝缘材料（4）上接合有薄板状的加热元件（5）。并且静电吸盘部分（2）和温度调节基部分（3）通过固化液体粘合剂形成的有机绝缘粘合剂层（6）彼此一体化。

8. 发明申请

US20140042716A1 ELECTROSTATIC CHUCK DEVICE 有权
标题翻译：静电切割装置
公开(公告)号：US20140042716A1
公开(公告)日：2014-02-13
申请号：US14113765
申请日：2012-04-27
申请人： Yukio Miura , Kazunori Ishimura , Mamoru Kosakai
发明人： Yukio Miura , Kazunori Ishimura , Mamoru Kosakai
IPC分类号： H01L21/683
CPC分类号： H01L21/6833 , H01L21/67103 , H01L21/6831 , Y10T279/23
摘要： An electrostatic chuck device includes an electrostatic chuck section (2), which has a principal surface that is a mounting surface on which a plate-like sample (W) is placed, and has an internal electrode for electrostatic adsorption (13) incorporated in the section, and a temperature adjustment base section (3) which adjusts the temperature of the electrostatic chuck section (2); wherein a part or all of a surface of the temperature adjustment base section (3) is covered by a sheet-like or film-like insulating material (4) wherein the surface faces the side where the electrostatic chuck section is located; a thin plate-like heater element (5) is bonded on the insulating material (4); and the electrostatic chuck section (2) and the temperature adjustment base section (3) are integrated with each other via an organic insulating adhesive layer (6) formed by curing a liquid adhesive.
摘要翻译：静电吸盘装置包括静电吸盘部分（2），该静电吸盘部分（2）具有主表面，该主表面是其上放置板状样品（W）的安装表面，并且具有用于静电吸附的内部电极（13）调节静电吸盘部（2）的温度的温度调节基部（3）。其中所述温度调节基部（3）的表面的一部分或全部被片状或薄膜状绝缘材料（4）覆盖，所述片状或薄膜状的绝缘材料（4）表面与所述静电卡盘部所在的一侧相对; 绝缘材料（4）上接合有薄板状的加热元件（5）。并且静电吸盘部分（2）和温度调节基部分（3）通过固化液体粘合剂形成的有机绝缘粘合剂层（6）彼此一体化。

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