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1. 发明授权

US08980217B2 Method of manufacturing graphene substrate, and graphene substrate 有权
标题翻译：制造石墨烯基板和石墨烯基板的方法
公开(公告)号：US08980217B2
公开(公告)日：2015-03-17
申请号：US13995809
申请日：2011-11-25
申请人： Hidefumi Hiura , Kazuhito Tsukagoshi
发明人： Hidefumi Hiura , Kazuhito Tsukagoshi
IPC分类号： C01B31/02 , H01L21/02 , H01L29/16 , C01B31/04 , H01L29/66 , H01L29/786 , B82Y30/00 , B82Y40/00
CPC分类号： H01L21/02527 , B82Y30/00 , B82Y40/00 , C01B32/184 , H01L21/0237 , H01L21/02491 , H01L21/02573 , H01L21/02612 , H01L21/02656 , H01L29/1606 , H01L29/66742 , H01L29/78603 , H01L29/78684 , Y10S977/775
摘要： Provided is a graphene substrate, which is manufactured by: bringing a metal layer into contact with a carbon-containing layer and heating the metal layer to dissolve carbon in the carbon-containing layer into the metal layer; and cooling the metal layer to precipitate the carbon in the metal layer as graphene on any substrate surface.
摘要翻译：提供了一种石墨烯基材，其通过以下方法制造：使金属层与含碳层接触并加热金属层以将碳在含碳层中溶解到金属层中; 并且将金属层冷却以将金属层中的碳沉淀在任何基板表面上的石墨烯。

2. 发明申请

US20130272951A1 METHOD OF MANUFACTURING GRAPHENE SUBSTRATE, AND GRAPHENE SUBSTRATE 有权
标题翻译：制造石墨基板和石墨基板的方法
公开(公告)号：US20130272951A1
公开(公告)日：2013-10-17
申请号：US13995809
申请日：2011-11-25
申请人： Hidefumi Hiura , Kazuhito Tsukagoshi
发明人： Hidefumi Hiura , Kazuhito Tsukagoshi
IPC分类号： H01L21/02
CPC分类号： H01L21/02527 , B82Y30/00 , B82Y40/00 , C01B32/184 , H01L21/0237 , H01L21/02491 , H01L21/02573 , H01L21/02612 , H01L21/02656 , H01L29/1606 , H01L29/66742 , H01L29/78603 , H01L29/78684 , Y10S977/775
摘要： Provided is a graphene substrate, which is manufactured by: bringing a metal layer into contact with a carbon-containing layer and heating the metal layer to dissolve carbon in the carbon-containing layer into the metal layer; and cooling the metal layer to precipitate the carbon in the metal layer as graphene on any substrate surface.
摘要翻译：提供了一种石墨烯基材，其通过以下方法制造：使金属层与含碳层接触并加热金属层以将含碳层中的碳溶解到金属层中; 并且将金属层冷却以将金属层中的碳沉淀在任何基板表面上的石墨烯。

3. 发明申请

US20090039563A1 METHOD OF FORMING FINE PATTERN 审中-公开
标题翻译：形成精细图案的方法
公开(公告)号：US20090039563A1
公开(公告)日：2009-02-12
申请号：US12065246
申请日：2006-08-25
申请人： Motoki Okinaka , Kazuhito Tsukagoshi , Yoshinobu Aoyagi
发明人： Motoki Okinaka , Kazuhito Tsukagoshi , Yoshinobu Aoyagi
IPC分类号： B29C59/16
CPC分类号： G03F7/0002 , B81C1/00031 , B81C1/00111 , B81C2201/0152 , B81C2201/0153 , B82Y10/00 , B82Y40/00 , H01L21/31 , H01L21/3121 , H01L21/316 , H01L21/76817
摘要： A method of fine-pattern formation in which in forming a pattern, a fine pattern formed in a mold can be transferred to a pattering material in a short time at a low temperature and low pressure and, after the transfer of the fine pattern to the patterning material, the fine pattern formed in the patterning material does not readily deform. The method for fine-pattern formation comprises: a first step in which a mold having a fine structure with recesses/protrusions is pressed against a pattering material comprising a polysilane; a second step in which the patterning material is irradiated with ultraviolet to photooxidize the patterning material; a third in which the pressing of the mold against the patterning material is relieved and the mold is drawn from the pattering material; and a fourth step in which that surface of the patterning material to which the fine pattern has been transferred is irradiated with an oxygen plasma to oxidize the surface.
摘要翻译：精细图案形成方法在形成图案时，在模具中形成的精细图案可以在低温低压下在短时间内转印到图案材料，并且在精细图案转印到图案形成材料中形成的微细图案不容易变形。精细图案形成方法包括：第一步骤，其中具有凹陷/突起的精细结构的模具被压在包含聚硅烷的图案材料上; 第二步骤，其中图案形成材料被紫外线照射以对图案材料进行光氧化; 第三，其中将模具压靠在图案形成材料上被释放并且模具从图案材料中拉出; 以及第四步骤，其中已经转印有精细图案的图案形成材料的表面用氧等离子体照射以氧化该表面。

4. 发明申请

US20080203620A1 METHOD OF FORMING MINUTE PATTERN 审中-公开
标题翻译：形成分钟图案的方法
公开(公告)号：US20080203620A1
公开(公告)日：2008-08-28
申请号：US11845618
申请日：2007-08-27
申请人： Motoki Okinaka , Kazuhito Tsukagoshi , Yoshinobu Aoyagi , Hiroshi Tsushima
发明人： Motoki Okinaka , Kazuhito Tsukagoshi , Yoshinobu Aoyagi , Hiroshi Tsushima
IPC分类号： B29C35/08
CPC分类号： B29C35/0888 , B29C37/0053 , B29C2035/0827
摘要： There is provided a method for forming minute patterns ranging from nanometer scale to micrometer scale with high aspect ratio at one time under a single condition of low temperature, low pressure, and a short period of time. A method of forming a minute pattern according to the present invention includes: applying, onto a substrate, a patterning material containing a polysilane and a silicone compound; pressing a mold on which a predetermined minute pattern has been formed to the patterning material which has been applied onto the substrate; irradiating energy rays from a side of the substrate while the mold is contacted by press with the patterning material; releasing the mold; and irradiating the patterning material with energy rays from a side to which the mold has been pressed.
摘要翻译：提供一种在低温，低压和短时间的单一条件下一次形成从纳米尺度到微米级的高纵横比的微小图案的方法。根据本发明的形成微细图案的方法包括：在基材上涂布含有聚硅烷和硅氧烷化合物的图案形成材料; 将已经形成有预定的微小图案的模具按压到已经施加到基板上的图案形成材料上; 在模具与图案形成材料接触的同时，从基板侧照射能量射线; 释放模具; 并用能量射线照射图案形成材料，该能量射线从模具被按压的一侧。

5. 发明授权

US07301159B2 Charged particle beam apparatus and method of forming electrodes having narrow gap therebetween by using the same 失效
标题翻译：带电粒子束装置和通过使用它们形成具有窄间隙的电极的方法
公开(公告)号：US07301159B2
公开(公告)日：2007-11-27
申请号：US11196094
申请日：2005-08-03
申请人： Toshiaki Fujii , Masao Abe , Kunji Shigeto , Minuru Kawamura , Alekber Yu Kasumov , Kazuhito Tsukagoshi , Yoshinobu Aoyagi
发明人： Toshiaki Fujii , Masao Abe , Kunji Shigeto , Minuru Kawamura , Alekber Yu Kasumov , Kazuhito Tsukagoshi , Yoshinobu Aoyagi
IPC分类号： A61N5/00
CPC分类号： H01J37/3056 , H01J37/304 , H01J2237/043 , H01J2237/30466 , H01J2237/31732 , H01J2237/31737 , H01J2237/31749
摘要： A focused ion beam apparatus having two pieces of probers brought into contact with two points of a surface of a sample, a voltage source for applying a constant voltage between the two points with which the probers are brought into contact, and an ammeter for measuring a current flowing between the two points, in which a conductive film is formed to narrow a gap thereof between the two points by operating a deflection electrode and a gas gun and the current flowing between the two points is monitored, and when the current becomes a predetermined value, a focused charged particle beam irradiated to the surface of the sample is made OFF by the blanking electrode.
摘要翻译：一种聚焦离子束装置，其具有与样品表面的两个点接触的两个探测器，用于在与探测器接触的两个点之间施加恒定电压的电压源，以及用于测量在两点之间流动的电流，其中通过操作偏转电极和气枪来形成导电膜以使两点间的间隙变窄，并且监测在两点之间流动的电流，并且当电流变为预定的通过消隐电极使照射到样品表面的聚焦带电粒子束截止。

6. 发明申请

US20060043276A1 Probe for near-field microscope, the method for manufacturing the probe and scanning probe microscope using the probe 有权
标题翻译：用于近场显微镜的探头，使用探头制造探头和扫描探针显微镜的方法
公开(公告)号：US20060043276A1
公开(公告)日：2006-03-02
申请号：US11196104
申请日：2005-08-03
申请人： Yuika Saito , Takashi Nurakami , Satoshi Kawata , Yasushi Inoue , Kazuhito Tsukagoshi , Masato Iyoki
发明人： Yuika Saito , Takashi Nurakami , Satoshi Kawata , Yasushi Inoue , Kazuhito Tsukagoshi , Masato Iyoki
IPC分类号： H01J3/14
CPC分类号： G01N21/658 , G01N2021/656 , G01Q60/22 , Y10S977/849 , Y10S977/862
摘要： In a manufacture of a probe for a scattering type near-field microscope, there is provided a method of coating, with a high reproducibility, uniform metal particles efficiently inducing a surface enhanced Raman scattering. It has been adapted such that, in the probe for the scattering type near-field microscope, one part or all of the probe due to an interaction of at least an evanescent field is coated by metal particles which don't mutually adhere and have a particle diameter of 10 nm or larger and 50 nm or smaller in radius of curvature.
摘要翻译：在用于散射型近场显微镜的探针的制造中，提供了一种以高再现性涂覆均匀的金属颗粒有效地引起表面增强的拉曼散射的方法。已经适应使得在用于散射型近场显微镜的探针中，由于至少一个消逝场的相互作用而导致的探针的一部分或全部被不相互粘附的金属颗粒涂覆，并且具有粒径为10nm以上且50nm以下的曲率半径。

7. 发明授权

US08835286B2 Manufacturing method of graphene substrate and graphene substrate 有权
标题翻译：石墨烯衬底和石墨烯衬底的制造方法
公开(公告)号：US08835286B2
公开(公告)日：2014-09-16
申请号：US13882317
申请日：2011-11-02
申请人： Hidefumi Hiura , Kazuhito Tsukagoshi
发明人： Hidefumi Hiura , Kazuhito Tsukagoshi
IPC分类号： H01L21/20 , H01L21/36 , C01B31/04 , H01L21/02 , H01L29/16
CPC分类号： H01L21/02376 , B82Y30/00 , B82Y40/00 , C01B32/184 , H01L21/0237 , H01L21/02527 , H01L21/02612 , H01L21/02664 , H01L29/1606 , H01L29/66742 , H01L29/78603 , H01L29/78684
摘要： The invention provides a manufacturing method of a graphene-on-insulator substrate which is mass productive, of high quality, and yet is directly usable for manufacture of semiconductor devices at a low manufacturing cost. According to the manufacturing method of a graphene substrate of the invention, a metal layer and a carbide layer are heated with the metal layer in contact with the carbide layer so that carbon in the carbide layer is dissolved into the metal layer, and then the metal layer and the carbide layer are cooled so that the carbon in the metal layer is segregated as graphene on the surface of the carbide layer.
摘要翻译：本发明提供了一种高质量的批量生产石英烯绝缘子基板的制造方法，并且可以以低制造成本直接用于制造半导体器件。根据本发明的石墨烯基板的制造方法，金属层和碳化物层与碳化物层接触的金属层被加热，使得碳化物层中的碳溶解在金属层中，然后金属层和碳化物层被冷却，使得金属层中的碳作为石墨烯分离在碳化物层的表面上。

8. 发明申请

US20130087705A1 METHOD FOR DETERMINING NUMBER OF LAYERS OF TWO-DIMENSIONAL THIN FILM ATOMIC STRUCTURE AND DEVICE FOR DETERMINING NUMBER OF LAYERS OF TWO-DIMENSIONAL THIN FILM ATOMIC STRUCTURE 有权
标题翻译：用于确定二维薄膜原子结构层数的方法和用于确定二维薄膜原子结构层数的装置
公开(公告)号：US20130087705A1
公开(公告)日：2013-04-11
申请号：US13704670
申请日：2011-06-22
申请人： Hidefumi Hiura , Kazuhito Tsukagoshi , Hisao Miyazaki
发明人： Hidefumi Hiura , Kazuhito Tsukagoshi , Hisao Miyazaki
IPC分类号： G01N23/225
CPC分类号： G01N23/225 , G01N23/2251 , G01N2223/61 , G01N2223/633
摘要： Provided is a versatile method of determining the number of layers of a two-dimensional atomic layer thin film as compared with conventional methods. An electron beam is radiated to a two-dimensional thin film atomic structure having an unknown number of layers to determine the number of layers based on an intensity of reflected electrons or secondary electrons generated thereby. In particular, this method is effective for determining the number of layers of graphene.
摘要翻译：与常规方法相比，提供了确定二维原子层薄膜的层数的通用方法。将电子束照射到具有未知数量层的二维薄膜原子结构，以基于由此产生的反射电子或二次电子的强度确定层数。特别地，该方法对于确定石墨烯的层数是有效的。

9. 发明申请

US20090139752A1 ELECTRONIC DEVICE AND METHOD FOR PRODUCING ELECTRONIC DEVICE 失效
标题翻译：电子设备和用于生产电子设备的方法
公开(公告)号：US20090139752A1
公开(公告)日：2009-06-04
申请号：US12194106
申请日：2008-08-19
申请人： Hisao Miyazaki , Kazuhito Tsukagoshi , Syunsuke Odaka , Yoshinobu Aoyagi
发明人： Hisao Miyazaki , Kazuhito Tsukagoshi , Syunsuke Odaka , Yoshinobu Aoyagi
IPC分类号： H05K1/00 , B05D5/00
CPC分类号： H01L29/78684 , B82Y10/00 , H01L29/0665 , H01L29/0673 , H01L29/1606 , H01L29/4908 , H01L29/7781
摘要： Provided is a novel electronic device that comprises graphite, graphene or the like.An electronic device having a substrate, a layer comprising a 6-member ring-structured carbon homologue as the main ingredient, a pair of electrodes, a layer comprising aluminium oxide as the main ingredient and disposed between the pair of electrodes, and a layer comprising aluminium as the main ingredient, wherein the layer comprising aluminium oxide as the main ingredient is disposed between the layer comprising a 6-member ring-structured carbon homologue as the main ingredient and the layer comprising aluminium as the main ingredient so as to be in contact with the two layers.
摘要翻译：提供了一种包括石墨，石墨烯等的新型电子器件。具有基板的电子设备，以6元环结构的碳同系物为主要成分的层，一对电极，以氧化铝为主要成分并设置在该对电极之间的层，以及包含铝作为主要成分，其中以氧化铝为主要成分的层设置在包含6元环结构的碳同系物作为主要成分的层和包含铝作为主要成分的层之间以便接触与两层。

10. 发明申请

US20080203271A1 METHOD OF MANUFACTURING A REPLICA MOLD AND A REPLICA MOLD 审中-公开
标题翻译：制造复原模和复制模的方法
公开(公告)号：US20080203271A1
公开(公告)日：2008-08-28
申请号：US11845621
申请日：2007-08-27
申请人： Motoki Okinaka , Kazuhito Tsukagoshi , Yoshinobu Aoyagi , Hiroshi Tsushima
发明人： Motoki Okinaka , Kazuhito Tsukagoshi , Yoshinobu Aoyagi , Hiroshi Tsushima
IPC分类号： B29C39/10 , B29C33/08 , B29C35/08
CPC分类号： B29C33/3857 , B29C2035/0827 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： There are provided a replica mold which is excellent in transferring a pattern of a master mold, and also has notably excellent hardness, transparency, heat resistance and chemical resistance, and a simple and inexpensive method of manufacturing the replica mold. A method of manufacturing a replica mold according to the present invention includes the steps of: applying, to a substrate, a replica mold material containing a polysilane and a silicone compound; pressing a master mold on which a predetermined minute pattern has been formed to the replica mold material which has been applied to the substrate; irradiating energy rays from a side of the substrate while the master mold is contacted by press with the replica mold material; releasing the master mold; and irradiating the replica mold material with energy rays from a side to which the master mold has been pressed.
摘要翻译：提供了转印母模图案的复制模具，并且还具有显着优异的硬度，透明度，耐热性和耐化学性，以及制造复制模具的简单且便宜的方法。根据本发明的制造复制模具的方法包括以下步骤：向基材施加含有聚硅烷和硅氧烷化合物的复制模具材料; 将已经形成预定微小图案的母模按压到已经施加到基底的复制模具材料; 在母模与复制模具材料接触的同时，从基板的一侧照射能量射线; 释放主模具; 并从原模被压制的一侧向能量射线照射复制模具材料。

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