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1. 发明授权

US07198820B2 Deposition of carbon- and transition metal-containing thin films 有权
标题翻译：沉积含碳和过渡金属的薄膜
公开(公告)号：US07198820B2
公开(公告)日：2007-04-03
申请号：US10642426
申请日：2003-08-15
申请人： Kari Härkönen , Mark Doczy , Teemu Lang , Nathan E. Baxter
发明人： Kari Härkönen , Mark Doczy , Teemu Lang , Nathan E. Baxter
IPC分类号： C23C16/32
CPC分类号： C23C16/32 , C23C16/45527 , C23C16/45531 , C23C16/4554 , Y10T428/12625
摘要： A process depositing a carbon- and transition metal-containing thin film on a substrate involves placing a substrate within a reaction space and sequentially pulsing into the reaction space a transition metal chemical and an organometallic chemical. Following each chemical pulse, the reaction space is purged, and the pulse and purge sequence is repeated until a desired film thickness is obtained. A preferred deposition process uses atomic layer deposition techniques and may result in an electrically conductive thin carbide film having uniform thickness over a large substrate area and excellent adhesion and step coverage properties.
摘要翻译：将含碳和过渡金属的薄膜沉积在衬底上的工艺包括将衬底放置在反应空间内，并顺序地将过渡金属化学品和有机金属化学物质脉冲入反应空间。在每个化学脉冲之后，清除反应空间，重复脉冲和吹扫顺序，直到获得所需的膜厚度。优选的沉积工艺使用原子层沉积技术，并且可以导致在大的衬底区域上具有均匀厚度的导电薄膜碳化物膜和优异的粘附性和阶梯覆盖性。

2. 发明授权

US07191793B2 Diaphragm valve for atomic layer deposition 有权
标题翻译：用于原子层沉积的隔膜阀
公开(公告)号：US07191793B2
公开(公告)日：2007-03-20
申请号：US11278482
申请日：2006-04-03
申请人： Jarmo Ilmari Maula , Hannu Leskinen , Teemu Lang , Pekka Kuosmanen , Kari Härkönen , Bradley J. Aitchison
发明人： Jarmo Ilmari Maula , Hannu Leskinen , Teemu Lang , Pekka Kuosmanen , Kari Härkönen , Bradley J. Aitchison
IPC分类号： F16K7/12
CPC分类号： F16K31/0693 , F16K7/14 , F16K31/06 , F16K49/002 , Y10T137/6606
摘要： A shut-off type diaphragm valve adapted for use in an atomic layer deposition system includes a flexible diaphragm operable to flex between an open position whereby a valve passage is at least partially open and a closed position whereby a substantial portion of a first side of the diaphragm is pressed against a valve seat to thereby block the valve passage and facilitate heat transfer between the valve seat and the diaphragm. In some embodiments, a heating body thermally contacts the valve body and extends proximal to a second side of the diaphragm opposite the first side thereof to form a thermally conductive pathway that facilitates maintaining an operating temperature at the diaphragm. A thermally resistive member may be interposed between the valve passage and an actuator, such as a solenoid, for attenuating heat transfer between the valve passage and the actuator.
摘要翻译：适于在原子层沉积系统中使用的截止型隔膜阀包括可操作以在打开位置之间弯曲的柔性隔膜，由此阀通道至少部分打开，并且闭合位置，从而使第隔膜被压靠在阀座上，从而阻塞阀通道并促进阀座与隔膜之间的热传递。在一些实施例中，加热体与阀体热接触并且在隔膜的与其第一侧相对的第二侧附近延伸，以形成便于维持隔膜处的工作温度的导热通路。可以在阀通道和诸如螺线管的致动器之间插入热阻构件，用于减弱阀通道和致动器之间的热传递。

3. 发明授权

US07141095B2 Precursor material delivery system for atomic layer deposition 有权
标题翻译：用于原子层沉积的前体材料输送系统
公开(公告)号：US07141095B2
公开(公告)日：2006-11-28
申请号：US10660365
申请日：2003-09-10
申请人： Bradley J. Aitchison , Jarmo Maula , Hannu Leskinen , Teemu Lang , Pekka Kuosmanen , Kari Härkönen , Martti Sonninen
发明人： Bradley J. Aitchison , Jarmo Maula , Hannu Leskinen , Teemu Lang , Pekka Kuosmanen , Kari Härkönen , Martti Sonninen
IPC分类号： B01D45/04 , C23C16/00
CPC分类号： B01D45/06 , C23C16/4402 , C23C16/4404 , C23C16/4412 , C23C16/45525 , C23C16/45544 , C23C16/4557 , C30B25/14 , Y10S55/14
摘要： A precursor delivery system includes a flow path from a precursor container to a reaction space of a thin film deposition system, such as an atomic layer deposition (ALD) reactor. A staging volume is preferably established between the precursor container and the reaction space for receiving at least one dose of the precursor material from the precursor container, from which a series of pulses is released toward the reaction space. The precursor material is typically vaporized after loading it in the precursor container by heating or reducing the pressure inside the precursor container. A vacuum line is preferably coupled to the precursor container and bypasses the reaction space for reducing pressure inside the precursor container without drawing particles into the reaction space. A high conductivity particle filter having inertial traps may be included, preferably between the precursor container and a staging volume, for filtering particles from the precursor material.
摘要翻译：前体递送系统包括从前体容器到诸如原子层沉积（ALD）反应器的薄膜沉积系统的反应空间的流动路径。优选地，在前体容器和反应空间之间建立分级体积，用于从前体容器接收至少一个剂量的前体材料，从该容器中向反应空间释放一系列脉冲。通过加热或降低前体容器内的压力，将前体材料通常在将其加载到前体容器中之后进行蒸发。真空管线优选地连接到前体容器并绕过反应空间，用于减小前体容器内部的压力，而不会将颗粒吸入反应空间。可以包括具有惯性陷阱的高导电性粒子过滤器，优选在前体容器和分级体积之间，用于从前体材料过滤粒子。

4. 发明授权

US07021330B2 Diaphragm valve with reliability enhancements for atomic layer deposition 失效
标题翻译：隔膜阀具有原子层沉积的可靠性增强
公开(公告)号：US07021330B2
公开(公告)日：2006-04-04
申请号：US10609339
申请日：2003-06-26
申请人： Jarmo Ilmari Maula , Hannu Leskinen , Teemu Lang , Pekka Kuosmanen , Kari Härkönen , Bradley J. Aitchison
发明人： Jarmo Ilmari Maula , Hannu Leskinen , Teemu Lang , Pekka Kuosmanen , Kari Härkönen , Bradley J. Aitchison
IPC分类号： F16K49/00 , F16K31/126
CPC分类号： F16K31/0693 , F16K7/14 , F16K31/06 , F16K49/002 , Y10T137/6606
摘要： A shut-off type diaphragm valve adapted for use in an atomic layer deposition system includes a valve seat having an annular seating surface that surrounds an inlet of the valve and extends radially therefrom. The seating surface contacts a substantial portion of the first side of a flexible diaphragm when the diaphragm is closed, to facilitate heat transfer and counteract dissipative cooling of the diaphragm, thereby inhibiting condensation of a medium flowing through the valve passage. The seating surface is preferably flat and smooth, to prevent shearing of an elastomeric diaphragm. For a plastic diaphragm, a ring-shaped seating ridge may extend from the seating surface to cause localized permanent deformation of the diaphragm and enhanced sealing, while still allowing a substantial portion of the diaphragm to contact the seating surface for enhanced heat transfer. Valve speed enhancements and other reliability enhancing features are also described.
摘要翻译：适用于原子层沉积系统的截止型隔膜阀包括阀座，阀座具有围绕阀的入口并从其径向延伸的环形就座表面。当隔膜闭合时，座面接触柔性膜片的第一侧的大部分，以便于传热并抵消隔膜的耗散冷却，从而阻止流过阀通道的介质的冷凝。座面优选是平坦且光滑的，以防止弹性膜片的剪切。对于塑料隔膜，环形的座脊可以从座面延伸，导致隔膜的局部永久变形和增强的密封，同时仍允许隔膜的大部分与座面接触以增强热传递。还描述了阀速度增强和其他可靠性增强特征。

5. 发明授权

US06907897B2 Diaphragm valve for high-temperature precursor supply in atomic layer deposition 失效
标题翻译：隔膜阀用于原子层沉积中的高温前体供应
公开(公告)号：US06907897B2
公开(公告)日：2005-06-21
申请号：US10609136
申请日：2003-06-26
申请人： Jarmo Ilmari Maula , Hannu Leskinen , Teemu Lang , Pekka Kuosmanen , Kari Härkönen , Bradley J. Aitchison
发明人： Jarmo Ilmari Maula , Hannu Leskinen , Teemu Lang , Pekka Kuosmanen , Kari Härkönen , Bradley J. Aitchison
IPC分类号： F16K7/14 , F16K31/06 , F16K49/00 , F16K31/04
CPC分类号： F16K31/0693 , F16K7/14 , F16K49/00 , F16K49/002 , Y10T137/6416
摘要： A diaphragm valve includes a heating body that thermally contacts a valve body of the valve and extends proximal to a diaphragm of the valve opposite a valve passage through which medium flows. The heating body forms a thermally conductive pathway between the valve body and the diaphragm that facilitates maintaining an operating temperature at the diaphragm. When used in an atomic layer deposition (ALD) system, the diaphragm valve inhibits condensation or freezing of high-temperature ALD precursor gases in the valve passage. A plunger including thermally insulating features preferably extends through a central opening in the heating body to operably couple a valve actuator to the diaphragm. In some embodiments, a thermally resistive member may be interposed between the valve passage and the actuator for attenuating heat transfer between the valve passage and the actuator.
摘要翻译：隔膜阀包括加热体，该加热体与阀的阀体热接触并且靠近阀的隔膜延伸，该隔膜与介质流过的阀通道相对。加热体在阀体和隔膜之间形成有助于保持隔膜操作温度的导热通路。当用于原子层沉积（ALD）系统时，隔膜阀阻止阀通道中高温ALD前体气体的冷凝或冷冻。包括隔热特征的柱塞优选地延伸穿过加热体中的中心开口，以将阀致动器可操作地连接到隔膜。在一些实施例中，可以在阀通道和致动器之间插入热阻构件，用于衰减阀通道和致动器之间的热传递。

6. 发明授权

US07901736B2 Multilayer material and method of preparing same 有权
标题翻译：多层材料及其制备方法
公开(公告)号：US07901736B2
公开(公告)日：2011-03-08
申请号：US11305024
申请日：2005-12-19
申请人： Jarmo Maula , Kari Härkönen , Anguel Nikolov
发明人： Jarmo Maula , Kari Härkönen , Anguel Nikolov
IPC分类号： C23C16/00
CPC分类号： G02B1/10 , C03C17/3417 , C03C17/3694 , C03C2217/91 , C23C16/403 , C23C16/405 , C23C16/45525 , C23C16/45529 , C23C16/45555 , H01L21/3141 , Y10T428/31504
摘要： The invention relates to a multilayer material deposited by ALD. A multi-layer structure of a high refractive index material is deposited on a substrate using ALD at a temperature below about 450° C. Advantageous results are obtained when a high refractive index material A is coated with another material B after a certain thickness of material A has been achieved. Thus, the B barrier layer stops the tendency for material A to crystallize. The amorphous structure gives rise to less optical loss. Further, the different stress nature of materials A and B may be utilized to achieve a final optical material with minimal stress. The thickness of each material B layer is less than that of the adjacent A layer(s). The total effective refractive index of the high refractive index material A+B being shall be greater than 2.20 at a wavelength of 600 nm. Titanium oxide and aluminium oxide are preferred A and B materials. The structure is useful for optical coatings.
摘要翻译：本发明涉及由ALD沉积的多层材料。在低于约450℃的温度下，使用ALD将高折射率材料的多层结构沉积在基板上。当高折射率材料A在一定厚度的材料之后用另一种材料B涂覆时，可获得有利的结果 A已经实现。因此，B阻挡层阻止材料A结晶的倾向。非晶结构导致较少的光损耗。此外，可以利用材料A和B的不同应力性质来实现具有最小应力的最终光学材料。每个材料B层的厚度小于相邻A层的厚度。高折射率材料A + B的总有效折射率在600nm波长处应大于2.20。氧化钛和氧化铝优选为A和B材料。该结构对于光学涂层是有用的。

7. 发明授权

US06941963B2 High-speed diaphragm valve for atomic layer deposition 失效
标题翻译：用于原子层沉积的高速隔膜阀
公开(公告)号：US06941963B2
公开(公告)日：2005-09-13
申请号：US10609134
申请日：2003-06-26
申请人： Jarmo Ilmari Maula , Hannu Leskinen , Teemu Lang , Pekka Kuosmanen , Kari Härkönen , Bradley J. Aitchison
发明人： Jarmo Ilmari Maula , Hannu Leskinen , Teemu Lang , Pekka Kuosmanen , Kari Härkönen , Bradley J. Aitchison
IPC分类号： F16K7/14 , F16K31/06 , F16K49/00 , F16K31/02
CPC分类号： F16K31/0693 , F16K7/14 , F16K49/002 , Y10T137/0318 , Y10T137/6416 , Y10T137/6606
摘要： A diaphragm valve includes a pressure vent communicating with an enclosed space behind the diaphragm for reducing resistance to transitioning of the diaphragm between the open and closed positions. In some implementations, a pump or other source of suction is coupled to the pressure vent to reduce fluid pressure in the enclosed space. When used in an atomic layer deposition (ALD) system, the venting and suction improves the thin film deposition process and prevents leakage through the valve of potentially toxic ALD precursor vapors. Features for thermal management and reliability enhancement are also described.
摘要翻译：隔膜阀包括与隔膜后面的封闭空间连通的压力通风口，用于减小隔膜在打开和关闭位置之间的过渡的阻力。在一些实施方案中，泵或其它吸入源联接到压力通风口以减小封闭空间中的流体压力。当用于原子层沉积（ALD）系统时，排气和抽吸改善了薄膜沉积过程，并且防止潜在的有毒ALD前驱物蒸汽阀的泄漏。还描述了用于热管理和可靠性增强的特征。

8. 发明授权

US06936086B2 High conductivity particle filter 有权
标题翻译：高电导率粒子滤波器
公开(公告)号：US06936086B2
公开(公告)日：2005-08-30
申请号：US10400054
申请日：2003-03-25
申请人： Kari Härkönen , Brad Aitchison
发明人： Kari Härkönen , Brad Aitchison
IPC分类号： C23C16/44 , C30B25/14 , B01D45/04
CPC分类号： B01D45/06 , C23C16/4402 , C23C16/4404 , C23C16/4412 , C23C16/45525 , C23C16/45544 , C23C16/4557 , C30B25/14 , Y10S55/14
摘要： A high conductivity particle filter provides a flow path to subject a fluid stream to a series of turns. The turns require an abrupt directional change for the fluid stream. Traps are positioned in proximity to the turns to capture particles, which have greater inertia than the fluid. The flow path may be a spiral or a series of parallel paths. A cross sectional area of the flow path may be progressively decreased to increase flow velocity and particle inertia.
摘要翻译：高导电性颗粒过滤器提供流体流动以使流体流进行一系列匝。转弯需要液体流的突然方向改变。陷阱位于匝间附近以捕获具有比流体更大的惯性的颗粒。流动路径可以是螺旋形或一系列平行路径。流路的横截面积可以逐渐减小以增加流速和颗粒惯性。

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