会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 2. 发明授权
    • Semiconductor chip package having one or more sealing screws
    • 具有一个或多个密封螺钉的半导体芯片封装
    • US06608380B2
    • 2003-08-19
    • US09975470
    • 2001-10-09
    • Young-Hoon RoJung-Hwan ChunHeung-Kyu Kwon
    • Young-Hoon RoJung-Hwan ChunHeung-Kyu Kwon
    • H01L2334
    • H01L23/4006H01L23/10H01L2023/405H01L2023/4087H01L2224/73253H01L2924/15312H01L2924/16152H01L2924/19105
    • A semiconductor chip package comprising a chip with a lid having venting holes hermetically sealed with screws and a manufacturing method thereof are provided. The semiconductor chip package of the present invention comprises a chip such as a central processing unit (CPU) chip generating a large amount of heat; a substrate having upper and lower surfaces, the chip attached to the upper surface of the substrate; external connection terminals extending from the lower surface of the substrate and electrically connected to the chip; a lid attached to the upper surface of the substrate. The lid has a cavity for receiving the chip on a lower surface and venting holes penetrating the lid. The package includes sealing screws for hermetically sealing the venting holes. With the present invention, the venting holes formed through the lid are hermetically sealed without creating any voids or cracks in the sealant as in the prior art.
    • 提供一种半导体芯片封装,其包括具有盖子的芯片,所述盖子具有用螺钉密封的通气孔及其制造方法。 本发明的半导体芯片封装包括产生大量热量的中央处理单元(CPU)芯片等芯片; 具有上表面和下表面的衬底,所述芯片附接到衬底的上表面; 外部连接端子从基板的下表面延伸并电连接到芯片; 附接到基板的上表面的盖。 盖具有用于在下表面上接收芯片并且穿透穿透盖的通孔的空腔。 该包装包括用于密封通风孔的密封螺钉。 利用本发明,通过盖子形成的排气孔如现有技术那样气密地密封,而不产生密封剂中的任何空隙或裂缝。
    • 3. 发明授权
    • Wafer through silicon via forming method and equipment therefor
    • 通过其形成方法和设备通过硅晶片
    • US08202744B2
    • 2012-06-19
    • US12512813
    • 2009-07-30
    • Jung Hwan ChunGyu Han Kim
    • Jung Hwan ChunGyu Han Kim
    • H01L21/00
    • H01L21/76898
    • Provided are a wafer through silicon via (TSV) forming method and equipment therefor. The wafer TSV forming method includes the operations of arranging a wafer having a front surface having a circuit area patterned thereon; recognizing locations of bond pads in the circuit area of the front surface of the wafer by using an image recognition camera, and converting the recognition of the locations into bond pad location information with respect to a back surface of the wafer; flipping the wafer; forming etching holes with middle depth in the back surface of the wafer by using a laser in a manner to match the locations of the bond pads by using the bond pad location information from the image recognition camera; and performing a plasma isotropic etching on the back surface having formed therein the etching holes with middle depth, thereby forming TSVs penetrating the bond pads.
    • 提供了一种晶片通过硅通孔(TSV)的形成方法及其设备。 晶片TSV形成方法包括布置具有其上形成有电路区域的正面的晶片的操作; 通过使用图像识别照相机识别晶片正面的电路区域中的接合焊盘的位置,并且将位置的识别转换为相对于晶片的背面的接合焊盘位置信息; 翻转晶片; 通过使用激光以通过使用来自图像识别照相机的接合焊盘位置信息来匹配接合焊盘的位置的方式在晶片的后表面中形成具有中间深度的蚀刻孔; 并且在其中形成有具有中间深度的蚀刻孔的背表面上进行等离子体各向同性蚀刻,从而形成贯穿接合焊盘的TSV。
    • 4. 发明申请
    • Wafer Through Silicon Via Forming Method And Equipment Therefor
    • 通过硅片通过成型方法和设备来晶圆
    • US20100279511A1
    • 2010-11-04
    • US12512813
    • 2009-07-30
    • Jung Hwan CHUNGyu Han KIM
    • Jung Hwan CHUNGyu Han KIM
    • H01L21/3065H01L21/306H01L21/465C23F1/08
    • H01L21/76898
    • Provided are a wafer through silicon via (TSV) forming method and equipment therefor. The wafer TSV forming method includes the operations of arranging a wafer having a front surface having a circuit area patterned thereon; recognizing locations of bond pads in the circuit area of the front surface of the wafer by using an image recognition camera, and converting the recognition of the locations into bond pad location information with respect to a back surface of the wafer; flipping the wafer; forming etching holes with middle depth in the back surface of the wafer by using a laser in a manner to match the locations of the bond pads by using the bond pad location information from the image recognition camera; and performing a plasma isotropic etching on the back surface having formed therein the etching holes with middle depth, thereby forming TSVs penetrating the bond pads.
    • 提供了一种晶片通过硅通孔(TSV)的形成方法及其设备。 晶片TSV形成方法包括布置具有其上形成有电路区域的正面的晶片的操作; 通过使用图像识别照相机识别晶片正面的电路区域中的接合焊盘的位置,并且将位置的识别转换为相对于晶片的背面的接合焊盘位置信息; 翻转晶片; 通过使用激光以通过使用来自图像识别照相机的接合焊盘位置信息来匹配接合焊盘的位置的方式在晶片的后表面中形成具有中间深度的蚀刻孔; 并且在其中形成有具有中间深度的蚀刻孔的背表面上进行等离子体各向同性蚀刻,从而形成贯穿接合焊盘的TSV。
    • 6. 发明申请
    • Method Of Dicing Wafer Using Plasma
    • 使用等离子体切割晶片的方法
    • US20100311223A1
    • 2010-12-09
    • US12549825
    • 2009-08-28
    • Jung Hwan ChunGyu Han Kim
    • Jung Hwan ChunGyu Han Kim
    • H01L21/302
    • H01L21/78
    • Provided is a method of dicing a wafer that is thin and includes a low-K material using plasma without causing chipping and cracking during sawing without using an etch mask and without performing a separate wafer coating process. The method includes recognizing scribe lines of a front side of the wafer by using an image recognizing unit to obtain recognition information, performing two etching processes, wherein at least one includes plasma etching, on a backside of the wafer by using the recognition information to separate the wafer into a plurality of semiconductor chips, and adhering the plurality of semiconductor chips to an extended tape or a die attach film.
    • 提供了一种使用等离子体切割晶片的方法,其使用等离子体而不会在锯切期间造成切屑和裂纹,而不使用蚀刻掩模并且不执行单独的晶片涂布工艺,从而切割薄的晶片。 该方法包括通过使用图像识别单元来识别晶片的正面的划线以获得识别信息,执行两个蚀刻处理,其中至少一个蚀刻工艺包括通过使用识别信息分离在晶片的背面上的等离子体蚀刻 将晶片分成多个半导体芯片,并将多个半导体芯片粘合到扩展带或芯片附着膜。
    • 9. 发明授权
    • Method of dicing wafer using plasma
    • 使用等离子体切片晶片的方法
    • US08222120B2
    • 2012-07-17
    • US12549825
    • 2009-08-28
    • Jung Hwan ChunGyu Han Kim
    • Jung Hwan ChunGyu Han Kim
    • H01L21/336
    • H01L21/78
    • Provided is a method of dicing a wafer that is thin and includes a low-K material using plasma without causing chipping and cracking during sawing without using an etch mask and without performing a separate wafer coating process. The method includes recognizing scribe lines of a front side of the wafer by using an image recognizing unit to obtain recognition information, performing two etching processes, wherein at least one includes plasma etching, on a backside of the wafer by using the recognition information to separate the wafer into a plurality of semiconductor chips, and adhering the plurality of semiconductor chips to an extended tape or a die attach film.
    • 提供了一种使用等离子体切割晶片的方法,其使用等离子体而不会在锯切期间造成切屑和裂纹,而不使用蚀刻掩模并且不执行单独的晶片涂布工艺,从而切割薄的晶片。 该方法包括通过使用图像识别单元来识别晶片的正面的划线以获得识别信息,执行两个蚀刻处理,其中至少一个蚀刻工艺包括通过使用识别信息分离在晶片的背面上的等离子体蚀刻 将晶片分成多个半导体芯片,并将多个半导体芯片粘合到扩展带或芯片附着膜。