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1. 发明授权

US4518415A 1-(Tetrahydrofurylmethyl)azoles 失效
标题翻译： 1-（四氢呋喃基甲基）唑
公开(公告)号：US4518415A
公开(公告)日：1985-05-21
申请号：US459966
申请日：1983-01-21
申请人： Anthony F. Marchington , Timothy Lewis , John M. Clough , Paul A. Worthington , John Dalziel
发明人： Anthony F. Marchington , Timothy Lewis , John M. Clough , Paul A. Worthington , John Dalziel
IPC分类号： C07C29/14 , C07C29/147 , C07C29/36 , C07C29/40 , C07C45/29 , C07C45/60 , C07C45/68 , C07C47/24 , C07C51/347 , C07C59/88 , C07D233/60 , C07D249/08 , C07D303/40 , C07D307/10 , C07D319/06 , C07D521/00 , A01N43/50 , A01N43/64 , C07D405/06 , C07F1/00
CPC分类号： C07D307/10 , C07C29/14 , C07C29/147 , C07C29/36 , C07C29/40 , C07C45/292 , C07C45/60 , C07C45/68 , C07C47/24 , C07C51/347 , C07C59/88 , C07D231/12 , C07D233/56 , C07D249/08 , C07D303/40 , C07D319/06
摘要： Compounds useful as plant growth regulators and fungicides and having the formula ##STR1## and stereoisomers thereof, wherein W is --CH.dbd. or .dbd.N--; Q is optionally substituted aryl, especially optionally substituted phenyl, or optionally substituted aralkyl or alkyl; R.sup.1, R.sup.2, R.sup.3, R.sup.4, R.sup.5 and R.sup.6, which may be the same or different, are H, optionally substituted alkyl, cycloalkyl, aralkyl or phenyl; R.sup.7 and R.sup.8 are H, alkyl or optionally substituted phenyl; and acid addition salts and metal complexes thereof, and processes and intermediates for their preparation.
摘要翻译：可用作植物生长调节剂和杀真菌剂并具有式（I）的式（I）及其立体异构体的化合物，其中W为-CH =或= N-; Q是任选取代的芳基，特别是任选取代的苯基，或任选取代的芳烷基或烷基; R 1，R 2，R 3，R 4，R 5和R 6可以相同或不同，为H，任选取代的烷基，环烷基，芳烷基或苯基; R 7和R 8是H，烷基或任选取代的苯基; 及其加成盐及其金属络合物，以及其制备方法和中间体。

2. 发明授权

US08359579B2 Monitoring dynamic aspect oriented applications at execution time 失效
标题翻译：在执行时监控动态面向方面的应用程序
公开(公告)号：US08359579B2
公开(公告)日：2013-01-22
申请号：US11556768
申请日：2006-11-06
申请人： Matthew Paul Chapman , Adrian Mark Colyer , Benjamin John Dalziel
发明人： Matthew Paul Chapman , Adrian Mark Colyer , Benjamin John Dalziel
IPC分类号： G06F9/44
CPC分类号： G06F8/316
摘要： A method for generating one or more satisfaction records for an expression in a software application, the expression including at least one criterion relating to the application wherein the satisfaction of the criterion can be determined only at application execution time, the method comprising: analyzing the application to generate a first set of locations in the application where the at least one criterion is potentially satisfied; executing the application; monitoring the application to generate a second set of locations in the application where the at least one criterion is actually satisfied; for each location in the second set of locations generating a satisfaction record indicating that the application satisfied the at least one criterion at the location; and for each location in the first set not in the second set generating a satisfaction record indicating that the application did not satisfy the at least one criterion at the location.
摘要翻译：一种用于为软件应用中的表达生成一个或多个满意度记录的方法，所述表达包括与应用有关的至少一个准则，其中可以仅在应用执行时确定标准的满足度，该方法包括：分析应用以在所述应用中生成可能满足所述至少一个准则的第一组位置; 执行应用程序; 监视所述应用以在所述应用中生成所述至少一个准则被实际满足的第二组位置; 对于所述第二组位置中的每个位置产生满足记录，指示所述应用满足所述位置处的所述至少一个准则; 并且对于不在第二组中的第一组中的每个位置，生成表示应用程序不满足该位置处的至少一个标准的满足记录。

3. 发明授权

US4999043A Triazolylmethyl tert-butyl carbinol derivatives which have plant growth regulating properties 失效
标题翻译：具有植物生长调节性质的三唑基甲基叔丁基甲醇衍生物
公开(公告)号：US4999043A
公开(公告)日：1991-03-12
申请号：US307174
申请日：1989-02-06
申请人： Raymond Elliott , John Dalziel , Raymond L. Sunley
发明人： Raymond Elliott , John Dalziel , Raymond L. Sunley
IPC分类号： A01N43/653 , A01N49/00 , C07D249/08 , C07D521/00
CPC分类号： C07D231/12 , A01N43/653 , A01N49/00 , C07D233/56 , C07D249/08
摘要： Triazole compounds useful as plant growth regulators of the formula ##STR1## and stereoisomers thereof, wherein R.sup.1 is selected from alkyl and haloalkyl groups, R.sup.2 is hydrogen, and R.sup.3 is a tertiary butyl group optionally substituted by halogen; and acid addition salts, and metal complexes thereof.
摘要翻译：用作下式的植物生长调节剂的三唑化合物及其立体异构体，其中R 1选自烷基和卤代烷基，R 2是氢，R 3是任选被卤素取代的叔丁基; 和酸加成盐及其金属络合物。

4. 发明授权

US4895589A Heterocyclic compounds 失效
标题翻译：杂环化合物
公开(公告)号：US4895589A
公开(公告)日：1990-01-23
申请号：US892364
申请日：1986-08-04
申请人： Raymond Elliott , John Dalziel
发明人： Raymond Elliott , John Dalziel
IPC分类号： A01N43/653 , C07D249/08 , C07D521/00
CPC分类号： C07D231/12 , A01N43/653 , C07D233/56 , C07D249/08
摘要： A triazole derivative having the general formula (I): ##STR1## and stereoisomers thereof, wherein R.sup.1 is an alkyl group containing from 3 to 6 carbon atoms, or a haloalkyl group containing from 2 to 5 carbon atoms, or a group --CH.sub.2 --Z where in Z is a cycloalkyl group containing from 3 to 5 carbon atoms, R.sup.1 containing primary or secondary carbon atoms only; R.sup.2 is hydrogen or an alkyl group containing from 1 to 4 carbon atoms; and R.sup.3 is a tertiary butyl group optionally substituted by halogen; and salts, esters and metal complexes of the compound of formula (I) wherein R.sup.2 is hydrogen. These compounds are useful as plant growth regulating agents.
摘要翻译：具有通式（I）的三唑衍生物及其立体异构体，其中R 1为含有3至6个碳原子的烷基或含有2至5个碳原子的卤代烷基或-CH 2 - Z其中Z是含有3至5个碳原子的环烷基，R1仅含有伯或仲碳原子; R2是氢或含1至4个碳原子的烷基; R3是任选被卤素取代的叔丁基; 和其中R 2是氢的式（I）化合物的盐，酯和金属络合物。这些化合物可用作植物生长调节剂。

5. 发明授权

US5496438A Method of removing photo resist 失效
标题翻译：去除光刻胶的方法
公开(公告)号：US5496438A
公开(公告)日：1996-03-05
申请号：US353472
申请日：1994-12-09
申请人： Phil Wootton , Graeme Morland , Karl E. Mautz , John Dalziel
发明人： Phil Wootton , Graeme Morland , Karl E. Mautz , John Dalziel
IPC分类号： H01L21/027 , G03F7/42 , H01L21/02 , H01L21/304 , H01L21/3213 , H01L21/00
CPC分类号： H01L21/02071 , G03F7/427
摘要： A method of removing photoresist (20) from a metal layer (16) formed on a substrate (1) and having a pattern defined by means of a corrosive gas plasma etch. The method consists of etching the resist (20) in an oxygen gas plasma for a period of time and at a sufficiently high temperature to remove all residual corrosive gas absorbed in the photoresist and below the temperature at which the metal beings to flow. An etching time of 3 minutes at 300.degree. C. is typically used.
摘要翻译：从形成在基板（1）上的金属层（16）去除光致抗蚀剂（20）并具有通过腐蚀性气体等离子体刻蚀限定的图案的方法。该方法包括在氧气等离子体中蚀刻抗蚀剂（20）一段时间并且在足够高的温度下，以除去吸收在光刻胶中的所有残留的腐蚀性气体，并低于金属流动的温度。通常使用在300℃下3分钟的蚀刻时间。

6. 发明授权

US4602929A Azolylalkyl phosphonic acid herbicides 失效
标题翻译：唑基烷基膦酸除草剂
公开(公告)号：US4602929A
公开(公告)日：1986-07-29
申请号：US585414
申请日：1984-03-02
申请人： John Dalziel , Paul A. Worthington , Balasubramanyan Sugavanam
发明人： John Dalziel , Paul A. Worthington , Balasubramanyan Sugavanam
IPC分类号： A01N57/24 , C07F9/6506 , C07F9/6518 , C07F9/65
CPC分类号： A01N57/24 , C07F9/65061 , C07F9/65181
摘要： Compounds having the general formula (I): ##STR1## and stereoisomers thereof, wherein R.sup.1 and R.sup.2 are each hydrogen, a cation, alkyl, cycloalkyl, aryl or aralkyl optionally substituted with halogen, nitro, alkyl, haloalkyl, alkoxy, haloalkoxy, phenyl, phenoxy, halophenyl or halophenoxy, or together form a ring; R.sup.3 and R.sup.4 are each hydrogen, alkyl, cycloalkyl, heterocyclyl, aryl or aralkyl optionally substituted with halogen, nitro, alkyl, haloalkyl, alkoxy, haloalkoxy, phenyl, phenoxy, halophenyl or halophenoxy; W is N or CH; X is oxygen or sulphur; ester and ether derivatives of the alcohol; and its acid addition salts and metal complexes. The compounds are useful as fungicides and for plant growth regulation.
摘要翻译：具有通式（I）的化合物及其立体异构体，其中R 1和R 2各自为氢，任选被卤素，硝基，烷基，卤代烷基，烷氧基取代的阳离子，烷基，环烷基，芳基或芳烷基，卤代烷氧基，苯基，苯氧基，卤代苯基或卤代苯氧基，或一起形成环; 任选被卤素，硝基，烷基，卤代烷基，烷氧基，卤代烷氧基，苯基，苯氧基，卤代苯基或卤代苯氧基取代的氢，烷基，环烷基，杂环基，芳基或芳烷基。 W是N或CH; X是氧或硫; 醇的酯和醚衍生物; 及其酸加成盐和金属络合物。这些化合物可用作杀真菌剂和植物生长调节剂。

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