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    • 1. 发明授权
    • CMP retaining ring
    • CMP保持环
    • US07857683B2
    • 2010-12-28
    • US12568497
    • 2009-09-28
    • John BurnsMartin L. ForbesMatthew A. FullerJeffery J. KingMark V. Smith
    • John BurnsMartin L. ForbesMatthew A. FullerJeffery J. KingMark V. Smith
    • B24B29/00
    • B24B37/32Y10T29/49826
    • An improved chemical mechanical polishing retaining ring. A representative embodiment comprises a base portion made from a wear-resistant plastic material, and an upper portion, or backbone portion, made from a stiffer and more wear resistant material. One of the base or backbone portion is preferably overmolded onto the other. The base portion can be generally defined by a flat pad-contacting surface, an outer surface, and an inner surface. The base portion can additionally include channels extending from the outer surface to the inner surface to facilitate transfer of slurry to and from the substrate to be polished during the process. One or both of the base portion or backbone portion further includes a plurality of circular ribs that serve to create additional bonding surface with the overmolded material. The retaining ring may additionally includes a plurality of bosses with threaded insert holes by which the retaining ring is attached to a chemical mechanical polishing system.
    • 改进的化学机械抛光保持环。 代表性的实施例包括由耐磨塑料材料制成的基部,以及由更硬和更耐磨的材料制成的上部或主体部分。 基部或骨架部分中的一个优选地包覆成型在另一个上。 基部一般可以由平垫接触表面,外表面和内表面限定。 基部可以另外包括从外表面延伸到内表面的通道,以便于在该过程期间将浆料转移到待抛光的基底上和从基底转移。 基部或骨架部分中的一个或两个还包括多个圆形肋,其用于与包覆成型的材料产生附加的粘合表面。 保持环可以另外包括具有螺纹插入孔的多个凸台,保持环通过该凸起附接到化学机械抛光系统。
    • 5. 发明授权
    • Composition and method of masking
    • 组合和掩蔽方法
    • US4438227A
    • 1984-03-20
    • US432451
    • 1982-10-04
    • James B. NallJeffery J. King
    • James B. NallJeffery J. King
    • B05D1/32C09D101/18C08L1/18B05D5/00
    • B05D1/32C09D101/18Y10S260/24Y10S524/905
    • A composition and method of application of the composition to produce masks of the type particularly useful in the manufacture of varnished electronic terminals and components is specified. The composition consists of mixing acetone, nitrocellulose, methyl isobutyl ketone (MIBK), arylsulfonamide formaldehyde resin, and tri (b-chloroethyl) phosphate, a fire retardant, under carefully controlled conditions. This masking product is applied, prior to the varnish, on an electronic part and is subjected to heating in the varnish curing oven to about 200.degree. F. whereupon the masking product will carbonize. The resulting carbonized coating is easily removed by brushing to produce a varnish mask where the masking product was applied.
    • 规定组合物的组合物和施用方法,用于生产特别可用于制造清漆电子终端和组分的类型的掩模。 该组合物是在仔细控制的条件下混合丙酮,硝基纤维素,甲基异丁基酮(MIBK),芳基磺酰胺甲醛树脂和三(B-氯乙基)磷酸酯,一种阻燃剂。 该掩蔽产品在清漆之前涂覆在电子部件上,并在清漆固化炉中加热至约200°F,于是掩蔽产物将碳化。 通过刷涂容易地除去所得到的碳化涂层,以产生涂覆掩蔽产品的清漆掩模。
    • 7. 发明授权
    • Kinematic coupling with textured contact surfaces
    • 具有纹理接触表面的运动耦合
    • US07422107B2
    • 2008-09-09
    • US11339462
    • 2006-01-25
    • John BurnsMartin L. ForbesMatthew A. FullerJeffery J. KingMark V. Smith
    • John BurnsMartin L. ForbesMatthew A. FullerJeffery J. KingMark V. Smith
    • B65D85/86
    • H01L21/67379Y10S414/14
    • A substrate kinematic coupling or guide plate for a substrate carrier having textured or patterned surfaces at the points of contact to reduce frictional forces generated between automated processing equipment and the kinematic coupling. The textured surface reduces the contact area between the processing equipment and the contact portion of the kinematic coupling, thereby reducing the resultant frictional force. By reducing the frictional force, the substrate carrier more readily settles on the mounting pins of the processing equipment, thus avoiding intolerable height and angular deviations during automated access to the substrates. Textures include, but are not limited to, a knurl pattern, ridges running laterally along the contact portions, and ridges running longitudinally along the contact portions. The textures may be formed by a blow molding, injection molding or in an overmolding process, or by a machining or imprinting process.
    • 用于衬底载体的衬底运动耦合或引导板,其在接触点处具有纹理化或图案化表面,以减少在自动处理设备和运动耦合之间产生的摩擦力。 纹理表面减小了处理设备与运动联接器的接触部分之间的接触面积,从而减少了所产生的摩擦力。 通过减小摩擦力,基板载体更容易落在加工设备的安装销上,从而在自动进入基板期间避免不可容忍的高度和角度偏差。 纹理包括但不限于滚花图案,沿着接触部横向延伸的脊和沿着接触部分纵向延伸的脊。 纹理可以通过吹塑,注射成型或包覆成型工艺,或通过机械加工或压印加工形成。
    • 9. 发明授权
    • Wafer container and door with cam latching mechanism
    • 晶圆容器和门与凸轮锁定机构
    • US07325693B2
    • 2008-02-05
    • US10988993
    • 2004-11-15
    • John BurnsMatthew A. FullerJeffery J. KingMartin L. ForbesMark V. Smith
    • John BurnsMatthew A. FullerJeffery J. KingMartin L. ForbesMark V. Smith
    • B65D85/30
    • H01L21/67353H01L21/67373Y10T292/1049
    • A container for holding a single wafer includes a door with a latching mechanism having a cam with a pair of opposing wings extending laterally therefrom. The cam is selectively rotatably shiftable between a first favored position wherein the wings are completely within the door enclosure to enable the door to be engaged and disengaged from the door frame, and a second favored position wherein the wings extend laterally outward from the door enclosure so as to engage in the latch recesses in the door frame when the door is engaged in the door frame. The cam wings may include a ramped portion thereon for drawing the door into closer engagement in the door frame when the cam is rotated from the first favored position to the second favored position. Also, the latching mechanism may further include a spring disposed to provide a biasing force for urging the latching mechanism toward each of the first and second favored positions, and soft-stop dampening springs for decelerating the cam in a controlled fashion at the first and second favored positions and for absorbing vibrations resulting from the collision of the cam with a fixed stop on the door chassis.
    • 用于保持单个晶片的容器包括具有闩锁机构的门,所述闩锁机构具有凸轮,所述凸轮具有从其横向延伸的一对相对的翼。 凸轮可选择性地可旋转地在第一有利位置之间移动,其中翼完全在门外壳内,以使门能够与门框接合和脱离,以及第二优选位置,其中翼从门外壳横向向外延伸, 当门接合在门框中时,接合门框中的闩锁凹部。 凸轮翼可以包括其上的斜坡部分,用于当凸轮从第一有利位置旋转到第二优选位置时,将门拉近门框中更紧密的接合。 此外,闩锁机构还可以包括设置成提供用于将闩锁机构朝向第一和第二受惠位置中的每一个推动的偏置力的弹簧,以及用于在第一和第二位置以受控的方式减速凸轮的软停止润滑弹簧 有利的位置和吸收由于凸轮与门底盘上的固定挡块碰撞而产生的振动。