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1. 发明授权

US08979469B2 Heat treatment apparatus and method of transferring substrates to the same 有权
标题翻译：热处理装置和将基板转印到其上的方法
公开(公告)号：US08979469B2
公开(公告)日：2015-03-17
申请号：US13559084
申请日：2012-07-26
申请人： Kiichi Takahashi , Terumi Kamada , Ittetsu Oikawa
发明人： Kiichi Takahashi , Terumi Kamada , Ittetsu Oikawa
IPC分类号： H01L21/677 , H01L21/687
CPC分类号： H01L21/67766 , H01L21/67757 , H01L21/67781 , H01L21/68707 , Y10S414/137 , Y10S414/14
摘要： A heat treatment apparatus includes a vessel loading unit on which a substrate vessel configured to accommodate a plurality of substrates at a first interval is loaded, a substrate holder configured to hold the plurality of substrates at a second interval which is smaller than the first interval, a substrate transfer unit capable of supporting the substrates and configured to transfer the plurality of substrates between the substrate holder and the substrate vessel and includes at least two substrate supporting parts stacked with the first interval therebetween and configured to be simultaneously advanced and retreated relative to the substrate vessel and individually advanced and retreated relative to the substrate holder, and a control unit configured to control an upper one of the at least two substrate supporting parts to be in an inoperative state when a lower one is supporting the substrate.
摘要翻译：热处理装置包括：容器装载单元，载置配置成以第一间隔容纳多个基板的基板容器;衬底保持器，其构造成以比第一间隔小的第二间隔保持多个基板; 基板传送单元，其能够支撑所述基板并且被配置为在所述基板保持器和所述基板容器之间传送所述多个基板，并且包括至少两个基板支撑部分，所述至少两个基板支撑部分以其间的第一间隔堆叠并且被构造成相对于所述基板保持器衬底容器，并且相对于衬底保持器单独地前进和后退;以及控制单元，被配置为当下部衬底支撑衬底时，控制所述至少两个衬底支撑部件中的上部衬底支撑部件处于非工作状态。

2. 发明申请

US20130028687A1 HEAT TREATMENT APPARATUS AND METHOD OF TRANSFERRING SUBSTRATES TO THE SAME 有权
标题翻译：热处理装置和将基板转移到其上的方法
公开(公告)号：US20130028687A1
公开(公告)日：2013-01-31
申请号：US13559084
申请日：2012-07-26
申请人： Kiichi TAKAHASHI , Terumi KAMADA , Ittetsu OIKAWA
发明人： Kiichi TAKAHASHI , Terumi KAMADA , Ittetsu OIKAWA
IPC分类号： H01L21/677
CPC分类号： H01L21/67766 , H01L21/67757 , H01L21/67781 , H01L21/68707 , Y10S414/137 , Y10S414/14
摘要： A heat treatment apparatus includes a vessel loading unit on which a substrate vessel configured to accommodate a plurality of substrates at a first interval is loaded, a substrate holder configured to hold the plurality of substrates at a second interval which is smaller than the first interval, a substrate transfer unit capable of supporting the substrates and configured to transfer the plurality of substrates between the substrate holder and the substrate vessel and includes at least two substrate supporting parts stacked with the first interval therebetween and configured to be simultaneously advanced and retreated relative to the substrate vessel and individually advanced and retreated relative to the substrate holder, and a control unit configured to control an upper one of the at least two substrate supporting parts to be in an inoperative state when a lower one is supporting the substrate.
摘要翻译：热处理装置包括：容器装载单元，载置配置成以第一间隔容纳多个基板的基板容器;衬底保持器，其构造成以比第一间隔小的第二间隔保持多个基板; 基板传送单元，其能够支撑所述基板并且被配置为在所述基板保持器和所述基板容器之间传送所述多个基板，并且包括至少两个基板支撑部分，所述至少两个基板支撑部分以其间的第一间隔堆叠并且被构造成相对于所述基板保持器衬底容器，并且相对于衬底保持器单独地前进和后退;以及控制单元，被配置为当下部衬底支撑衬底时，控制所述至少两个衬底支撑部件中的上部衬底支撑部件处于非工作状态。

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