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1. 发明授权

US08986783B2 Method of forming thin film from multiple deposition sources 有权
标题翻译：从多个沉积源形成薄膜的方法
公开(公告)号：US08986783B2
公开(公告)日：2015-03-24
申请号：US12926587
申请日：2010-11-29
申请人： Suk-Won Jung , Seung-Ho Choi , Kang-Il Lee , Hyun-Keun Song , Cheol-Lae Roh
发明人： Suk-Won Jung , Seung-Ho Choi , Kang-Il Lee , Hyun-Keun Song , Cheol-Lae Roh
IPC分类号： C23C16/448 , C23C14/24 , H01L51/00 , H01L51/56
CPC分类号： C23C14/243 , C23C14/24 , H01L51/001 , H01L51/56
摘要： A method of depositing a material on a substrate is provided for use in manufacturing electronic and display devices such as semiconductors, liquid crystal displays, and organic light emitting diode displays. A deposition material stored in a first deposition source section is heated to evaporate the deposition material. A second deposition source section, which is separate from the first deposition source section, is cooled. The first deposition source section is cooled, and deposition material stored in a second deposition source section is heated so as to alternately supply evaporated deposition material from the first and second deposition source sections to a feed section. The evaporated deposition material from the feed section is supplied to a nozzle section. A substrate can be provided to receive the evaporated deposition material from the nozzle section. A thin film of deposition material can then be formed on the substrate.
摘要翻译：提供了一种在衬底上沉积材料的方法，用于制造诸如半导体，液晶显示器和有机发光二极管显示器的电子和显示装置。存储在第一沉积源部分中的沉积材料被加热以蒸发沉积材料。与第一沉积源部分分开的第二沉积源部分被冷却。第一沉积源部分被冷却，并且存储在第二沉积源部分中的沉积材料被加热，从而将蒸发的沉积材料从第一和第二沉积源部分交替地供应到进料部分。来自进料部分的蒸发的沉积材料被供应到喷嘴部分。可以提供衬底以从喷嘴部分接收蒸发的沉积材料。然后可以在衬底上形成沉积材料的薄膜。

2. 发明授权

US08889214B2 Deposition amount measuring apparatus, depositing apparatus including the same, and method for manufacturing light emitting display 有权
标题翻译：沉积量测量装置，包括该沉积量的沉积装置以及制造发光显示器的方法
公开(公告)号：US08889214B2
公开(公告)日：2014-11-18
申请号：US13889756
申请日：2013-05-08
申请人： Kyung-Soo Kim , Seong-Ho Jeong , Hyun-Keun Song , Eu-Gene Kang
发明人： Kyung-Soo Kim , Seong-Ho Jeong , Hyun-Keun Song , Eu-Gene Kang
IPC分类号： C23C14/54 , B05C11/00 , C23C16/00 , H01L21/00 , H01L21/66 , H01L51/00 , C23C16/52 , H01L21/67 , B05B12/08
CPC分类号： H01L22/12 , B05B12/084 , C23C14/542 , C23C14/543 , C23C14/546 , C23C16/52 , H01L21/67253 , H01L22/20 , H01L22/26 , H01L51/0008
摘要： A deposition amount measuring apparatus includes a plate-shaped body having a rotating shaft, a plurality of deposition amount sensors along side surfaces of the body, the deposition amount sensors being configured to measure an amount of deposition material, and a housing surrounding the body, the housing including an inflow port that exposes one of the deposition amount sensors.
摘要翻译：沉积量测量装置包括具有旋转轴的板状体，沿着主体的侧面的多个沉积量传感器，沉积量传感器被配置为测量沉积材料的量，以及围绕身体的壳体，壳体包括暴露一个沉积量传感器的流入口。

3. 发明申请

US20140127833A1 DEPOSITION AMOUNT MEASURING APPARATUS, DEPOSITING APPARATUS INCLUDING THE SAME, AND METHOD FOR MANUFACTURING LIGHT EMITTING DISPLAY 有权
标题翻译：沉积量测量装置，包括其的沉积装置和制造发光显示器的方法
公开(公告)号：US20140127833A1
公开(公告)日：2014-05-08
申请号：US13889756
申请日：2013-05-08
申请人： Kyung-Soo KIM , Seong-Ho JEONG , Hyun-Keun SONG , Eu-Gene KANG
发明人： Kyung-Soo KIM , Seong-Ho JEONG , Hyun-Keun SONG , Eu-Gene KANG
IPC分类号： H01L21/66 , H01L51/00 , G01N33/00
CPC分类号： H01L22/12 , B05B12/084 , C23C14/542 , C23C14/543 , C23C14/546 , C23C16/52 , H01L21/67253 , H01L22/20 , H01L22/26 , H01L51/0008
摘要： A deposition amount measuring apparatus includes a plate-shaped body having a rotating shaft, a plurality of deposition amount sensors along side surfaces of the body, the deposition amount sensors being configured to measure an amount of deposition material, and a housing surrounding the body, the housing including an inflow port that exposes one of the deposition amount sensors.
摘要翻译：沉积量测量装置包括：具有旋转轴的板状体，沿着体的侧面的多个沉积量传感器，沉积量传感器构造成测量沉积材料的量，以及围绕身体的壳体，壳体包括暴露一个沉积量传感器的流入口。

4. 发明授权

US08799828B2 Scrolling method and apparatus for electronic device 有权
标题翻译：电子设备的滚动方法和装置
公开(公告)号：US08799828B2
公开(公告)日：2014-08-05
申请号：US13329049
申请日：2011-12-16
申请人： Hyun-Keun Song
发明人： Hyun-Keun Song
IPC分类号： G06F3/033 , G06F3/0485 , G06F3/0488
CPC分类号： G06F3/0485 , G06F3/04883
摘要： A method and apparatus scroll a screen in a device with a touchscreen. A method for scrolling a device with a touchscreen includes determining whether a current touch input is a circular drag touch; if the current touch input is the circular drag touch, determining whether a current page is a scrollable screen; and if the current page is a scrollable screen, scrolling the current page according to a circle drawing action of the circular drag touch.
摘要翻译：一种方法和装置利用触摸屏滚动装置中的屏幕。用触摸屏滚动设备的方法包括确定当前触摸输入是圆形拖动触摸; 如果当前触摸输入是圆形拖动触摸，则确定当前页面是否是可滚动屏幕; 如果当前页面是可滚动屏幕，则根据圆形拖动触摸的圆圈绘图动作滚动当前页面。

5. 发明申请

US20110168553A1 SPUTTERING SYSTEM 失效
标题翻译：喷射系统
公开(公告)号：US20110168553A1
公开(公告)日：2011-07-14
申请号：US12825285
申请日：2010-06-28
申请人： Seung-Ho Choi , Suk-Won Jung , Young-Mook Choi , Hyun-Keun Song
发明人： Seung-Ho Choi , Suk-Won Jung , Young-Mook Choi , Hyun-Keun Song
IPC分类号： C23C14/35
CPC分类号： C23C14/352 , H01J37/32449 , H01J37/3405 , H01J37/3417 , H01J37/345 , H01J37/347
摘要： A sputtering system is disclosed. The sputtering system includes: a first sputter unit including: a first deposition material plate, a second deposition material plate, where the first and second deposition material plates face each other, and a first magnetic field generator disposed behind each of the first deposition material plate and the second deposition material plate, configured to generate a magnetic field, a second sputter unit including: a third deposition material plate, disposed next to the first deposition material plate, a fourth deposition material plate, disposed next to the second deposition plate, where the third and fourth deposition material plates face each other, and a second magnetic field generator disposed behind each of the third deposition material plate and the fourth deposition material plate, configured to generate a magnetic field, a first gas supply pipe disposed between the first and third deposition material plates, configured to discharge gas to the second and fourth deposition material plates, a second gas supply pipe disposed between the second fourth deposition material plates, configured to discharge gas to the first and third deposition material plates, a first substrate support unit, configured to support a first deposition substrate, oriented toward outer edges of the first and second deposition material plates, and a second substrate support unit, configured to support a second deposition substrate, oriented toward outer edges of the third and fourth deposition material plates.
摘要翻译：公开了溅射系统。溅射系统包括：第一溅射单元，包括：第一沉积材料板，第二沉积材料板，其中第一和第二沉积材料板彼此面对;以及第一磁场发生器，其布置在每个第一沉积材料板的后面和第二沉积材料板，被配置为产生磁场;第二溅射单元，包括：第三沉积材料板，设置在第一沉积材料板旁边;第四沉积材料板，设置在第二沉积板旁边，其中所述第三和第四沉积材料板彼此面对;以及第二磁场发生器，设置在每个所述第三沉积材料板和所述第四沉积材料板的后面，被配置为产生磁场;第一气体供给管，设置在所述第一和第二沉积材料板之间，第三沉积材料板，被配置为将气体排放到第二和第四沉积物第二气体供给管，设置在第二第四沉积材料板之间，被配置为将气体排放到第一和第三沉积材料板;第一基板支撑单元，被配置为支撑第一沉积基板，第一和第二沉积材料板和第二衬底支撑单元，其被配置为支撑朝向第三和第四沉积材料板的外边缘定向的第二沉积衬底。

6. 发明授权

US08382966B2 Sputtering system 失效
标题翻译：溅射系统
公开(公告)号：US08382966B2
公开(公告)日：2013-02-26
申请号：US12825285
申请日：2010-06-28
申请人： Seung-Ho Choi , Suk-Won Jung , Young-Mook Choi , Hyun-Keun Song
发明人： Seung-Ho Choi , Suk-Won Jung , Young-Mook Choi , Hyun-Keun Song
IPC分类号： C23C14/35
CPC分类号： C23C14/352 , H01J37/32449 , H01J37/3405 , H01J37/3417 , H01J37/345 , H01J37/347
摘要： A sputtering system is disclosed. The sputtering system includes: a first sputter unit including: a first deposition material plate, a second deposition material plate, where the first and second deposition material plates face each other, and a first magnetic field generator disposed behind each of the first deposition material plate and the second deposition material plate, configured to generate a magnetic field, a second sputter unit including: a third deposition material plate, disposed next to the first deposition material plate, a fourth deposition material plate, disposed next to the second deposition plate, where the third and fourth deposition material plates face each other, and a second magnetic field generator disposed behind each of the third deposition material plate and the fourth deposition material plate, configured to generate a magnetic field, a first gas supply pipe disposed between the first and third deposition material plates, configured to discharge gas to the second and fourth deposition material plates, a second gas supply pipe disposed between the second fourth deposition material plates, configured to discharge gas to the first and third deposition material plates, a first substrate support unit, configured to support a first deposition substrate, oriented toward outer edges of the first and second deposition material plates, and a second substrate support unit, configured to support a second deposition substrate, oriented toward outer edges of the third and fourth deposition material plates.
摘要翻译：公开了溅射系统。溅射系统包括：第一溅射单元，包括：第一沉积材料板，第二沉积材料板，其中第一和第二沉积材料板彼此面对;以及第一磁场发生器，其布置在每个第一沉积材料板的后面和第二沉积材料板，被配置为产生磁场;第二溅射单元，包括：第三沉积材料板，设置在第一沉积材料板旁边;第四沉积材料板，设置在第二沉积板旁边，其中所述第三和第四沉积材料板彼此面对;以及第二磁场发生器，设置在每个所述第三沉积材料板和所述第四沉积材料板的后面，被配置为产生磁场;第一气体供给管，设置在所述第一和第二沉积材料板之间，第三沉积材料板，被配置为将气体排放到第二和第四沉积物第二气体供给管，设置在第二第四沉积材料板之间，被配置为将气体排放到第一和第三沉积材料板;第一基板支撑单元，被配置为支撑第一沉积基板，第一和第二沉积材料板和第二衬底支撑单元，其被配置为支撑朝向第三和第四沉积材料板的外边缘定向的第二沉积衬底。

7. 发明申请

US20120173983A1 SCROLLING METHOD AND APPARATUS FOR ELECTRONIC DEVICE 有权
标题翻译：电子设备的滚动方法和装置
公开(公告)号：US20120173983A1
公开(公告)日：2012-07-05
申请号：US13329049
申请日：2011-12-16
申请人： Hyun-Keun Song
发明人： Hyun-Keun Song
IPC分类号： G06F3/01
CPC分类号： G06F3/0485 , G06F3/04883
摘要： A method and apparatus scroll a screen in a device with a touchscreen. A method for scrolling a device with a touchscreen includes determining whether a current touch input is a circular drag touch; if the current touch input is the circular drag touch, determining whether a current page is a scrollable screen; and if the current page is a scrollable screen, scrolling the current page according to a circle drawing action of the circular drag touch.
摘要翻译：一种方法和装置利用触摸屏滚动装置中的屏幕。用触摸屏滚动设备的方法包括确定当前触摸输入是圆形拖动触摸; 如果当前触摸输入是圆形拖动触摸，则确定当前页面是否是可滚动屏幕; 如果当前页面是可滚动屏幕，则根据圆形拖动触摸的圆圈绘图动作滚动当前页面。

8. 发明申请

US20110129595A1 Deposition source, deposition apparatus having the same, and method of forming thin film 有权
标题翻译：沉积源，具有该沉积源的沉积设备，以及形成薄膜的方法
公开(公告)号：US20110129595A1
公开(公告)日：2011-06-02
申请号：US12926587
申请日：2010-11-29
申请人： Suk-Won Jung , Seung-Ho Choi , Kang-Il Lee , Hyun-Keun Song , Cheol-Lae Roh
发明人： Suk-Won Jung , Seung-Ho Choi , Kang-Il Lee , Hyun-Keun Song , Cheol-Lae Roh
IPC分类号： C23C16/448 , C23C16/04 , B05D5/12
CPC分类号： C23C14/243 , C23C14/24 , H01L51/001 , H01L51/56
摘要： A deposition source includes a first deposition source section, the first deposition source section being configured to store a deposition material, a second deposition source section, the second deposition source section being separate from the first deposition source section and being configured to store the deposition material, the first and second deposition source sections being configured to alternately supply the deposition material while heating or cooling the deposition material, a feed section configured to receive evaporated deposition material from the first and second deposition source sections, and a nozzle section configured to receive the deposition material from the feed section.
摘要翻译：沉积源包括第一沉积源部分，第一沉积源部分被配置为存储沉积材料，第二沉积源部分，第二沉积源部分与第一沉积源部分分离，并被配置为存储沉积材料第一和第二沉积源部分被配置为在加热或冷却沉积材料的同时交替地供应沉积材料;构造成从第一和第二沉积源部分接收蒸发的沉积材料的进料部分和被配置成接收来自进料部分的沉积材料。

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