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1. 发明申请

US20110049548A1 Patterning method of metal oxide thin film using nanoimprinting, and manufacturing method of light emitting diode 有权
标题翻译：使用纳米压印的金属氧化物薄膜的图案化方法和发光二极管的制造方法
公开(公告)号：US20110049548A1
公开(公告)日：2011-03-03
申请号：US12655435
申请日：2009-12-30
申请人： Hyeong-Ho Park , Dae-Geun Choi , Jun-Ho Jeong , Ki-Don Kim , Jun-Hyuk Choi , Ji-hye Lee , Seong-Je Park , So-Hee Jeon , Sa-Rah Kim
发明人： Hyeong-Ho Park , Dae-Geun Choi , Jun-Ho Jeong , Ki-Don Kim , Jun-Hyuk Choi , Ji-hye Lee , Seong-Je Park , So-Hee Jeon , Sa-Rah Kim
IPC分类号： H01L33/00 , H01L21/30 , B05D3/06
CPC分类号： H01L33/44 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L2933/0083
摘要： A method for forming a metal oxide thin film pattern using nanoimprinting according to one embodiment of the present invention includes: coating a photosensitive metal-organic material precursor solution on a substrate; pressurizing the photosensitive metal-organic material precursor coating layer to a mold patterned to have a protrusion and depression structure; forming the metal oxide thin film pattern by irradiating ultraviolet rays to the pressurized photosensitive metal-organic material precursor coating layer to cure it; and removing the patterned mold from the metal oxide thin film pattern.
摘要翻译：根据本发明的一个实施方案，使用纳米压印形成金属氧化物薄膜图案的方法包括：将感光金属 - 有机材料前体溶液涂布在基底上; 将感光金属 - 有机材料前体涂层加压至图案化以具有突出和凹陷结构的模具; 通过向加压感光金属 - 有机材料前体涂层照射紫外线以使其固化来形成金属氧化物薄膜图案; 以及从所述金属氧化物薄膜图案移除所述图案化模具。

2. 发明授权

US08486753B2 Patterning method of metal oxide thin film using nanoimprinting, and manufacturing method of light emitting diode 有权
标题翻译：使用纳米压印的金属氧化物薄膜的图案化方法和发光二极管的制造方法
公开(公告)号：US08486753B2
公开(公告)日：2013-07-16
申请号：US12698194
申请日：2010-02-02
申请人： Hyeong Ho Park , Jun Ho Jeong , Ki Don Kim , Dae Geun Choi , Jun Hyuk Choi , Ji Hye Lee , Soon Won Lee
发明人： Hyeong Ho Park , Jun Ho Jeong , Ki Don Kim , Dae Geun Choi , Jun Hyuk Choi , Ji Hye Lee , Soon Won Lee
IPC分类号： H01L21/00
CPC分类号： H01L33/42 , H01L2924/0002 , H01L2933/0016 , Y10T428/24802 , H01L2924/00
摘要： Disclosed are a patterning method of a metal oxide thin film using nanoimprinting, and a manufacturing method of a light emitting diode (LED). The method for forming a metal oxide thin film pattern using nanoimprinting includes: coating a photosensitive metal-organic material precursor solution on a substrate; preparing a mold patterned to have a protrusion and depression structure; pressurizing the photosensitive metal-organic material precursor coating layer with the patterned mold; forming a cured metal oxide thin film pattern by heating the pressurized photosensitive metal-organic material precursor coating layer or by irradiating ultraviolet rays to the pressurized photosensitive metal-organic material precursor coating layer while being heated; and removing the patterned mold from the metal oxide thin film pattern, and selectively further includes annealing the metal oxide thin film pattern. Within this, there is provided a method for forming a metal dioxe thin film pattern using nano imprinting, which makes it possible to simplify the process for forming the pattern since the process of separately applying the ultraviolet resin to be used as the resist can be omitted, and forms a micro/nano composite pattern through a single imprint process.
摘要翻译：公开了使用纳米压印的金属氧化物薄膜的图案化方法和发光二极管（LED）的制造方法。使用纳米压印形成金属氧化物薄膜图案的方法包括：将光敏金属 - 有机材料前体溶液涂覆在基底上; 制备图案化的具有突起和凹陷结构的模具; 用图案化的模具对感光金属 - 有机材料前体涂层进行加压; 通过加热加压的感光金属 - 有机材料前体涂层或通过在被加热时向加压的感光金属 - 有机材料前体涂层照射紫外线来形成固化的金属氧化物薄膜图案; 并且从金属氧化物薄膜图案移除图案化的模具，并且还包括退火金属氧化物薄膜图案。其中，提供了使用纳米压印形成金属二氧化物薄膜图案的方法，由于可以省略分离施加用作抗蚀剂的紫外线树脂的工艺，所以可以简化形成图案的工艺，并通过单个压印工艺形成微/纳复合图案。

3. 发明申请

US20110169027A1 Patterning Method of Metal Oxide Thin Film Using Nanoimprinting, and Manufacturing Method of Light Emitting Diode 有权
标题翻译：使用纳米印刷的金属氧化物薄膜的图案化方法和发光二极管的制造方法
公开(公告)号：US20110169027A1
公开(公告)日：2011-07-14
申请号：US12698194
申请日：2010-02-02
申请人： Hyeong-Ho Park , Jun-Ho Jeong , Ki-Don Kim , Dae-Geun Choi , Jun-Hyuk Choi , Ji-Hye Lee , Soon-Won Lee
发明人： Hyeong-Ho Park , Jun-Ho Jeong , Ki-Don Kim , Dae-Geun Choi , Jun-Hyuk Choi , Ji-Hye Lee , Soon-Won Lee
IPC分类号： H01L33/58 , C23C14/28 , D06N7/04 , B29C59/16 , H05B6/00
CPC分类号： H01L33/42 , H01L2924/0002 , H01L2933/0016 , Y10T428/24802 , H01L2924/00
摘要： Disclosed are a patterning method of a metal oxide thin film using nanoimprinting, and a manufacturing method of a light emitting diode (LED). The method for forming a metal oxide thin film pattern using nanoimprinting includes: coating a photosensitive metal-organic material precursor solution on a substrate; preparing a mold patterned to have a protrusion and depression structure; pressurizing the photosensitive metal-organic material precursor coating layer with the patterned mold; forming a cured metal oxide thin film pattern by heating the pressurized photosensitive metal-organic material precursor coating layer or by irradiating ultraviolet rays to the pressurized photosensitive metal-organic material precursor coating layer while being heated; and removing the patterned mold from the metal oxide thin film pattern, and selectively further includes annealing the metal oxide thin film pattern. Within this, there is provided a method for forming a metal dioxe thin film pattern using nano imprinting, which makes it possible to simplify the process for forming the pattern since the process of separately applying the ultraviolet resin to be used as the resist can be omitted, and forms a micro/nano composite pattern through a single imprint process.
摘要翻译：公开了使用纳米压印的金属氧化物薄膜的图案化方法和发光二极管（LED）的制造方法。使用纳米压印形成金属氧化物薄膜图案的方法包括：将光敏金属 - 有机材料前体溶液涂覆在基底上; 制备图案化的具有突起和凹陷结构的模具; 用图案化的模具对感光金属 - 有机材料前体涂层进行加压; 通过加热加压的感光金属 - 有机材料前体涂层或通过在被加热时向加压的感光金属 - 有机材料前体涂层照射紫外线来形成固化的金属氧化物薄膜图案; 并且从金属氧化物薄膜图案移除图案化的模具，并且还包括退火金属氧化物薄膜图案。其中，提供了使用纳米压印形成金属二氧化物薄膜图案的方法，由于可以省略分离施加用作抗蚀剂的紫外线树脂的工艺，所以可以简化形成图案的工艺，并通过单个压印工艺形成微/纳复合图案。

4. 发明授权

US07994053B2 Patterning method of metal oxide thin film using nanoimprinting, and manufacturing method of light emitting diode 有权
公开(公告)号：US07994053B2
公开(公告)日：2011-08-09
申请号：US12655435
申请日：2009-12-30
申请人： Hyeong-Ho Park , Dae-Geun Choi , Jun-Ho Jeong , Ki-Don Kim , Jun-Hyuk Choi , Ji-Hye Lee , Seong-Je Park , So-Hee Jeon , Sa-Rah Kim
发明人： Hyeong-Ho Park , Dae-Geun Choi , Jun-Ho Jeong , Ki-Don Kim , Jun-Hyuk Choi , Ji-Hye Lee , Seong-Je Park , So-Hee Jeon , Sa-Rah Kim
IPC分类号： H01L21/44
CPC分类号： H01L33/44 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L2933/0083
摘要： A method for forming a metal oxide thin film pattern using nanoimprinting according to one embodiment of the present invention includes: coating a photosensitive metal-organic material precursor solution on a substrate; pressurizing the photosensitive metal-organic material precursor coating layer to a mold patterned to have a protrusion and depression structure; forming the metal oxide thin film pattern by irradiating ultraviolet rays to the pressurized photosensitive metal-organic material precursor coating layer to cure it; and removing the patterned mold from the metal oxide thin film pattern.

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