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    • 3. 发明授权
    • Apparatus and method for calibrating lithography process
    • 用于校准光刻工艺的设备和方法
    • US09293354B2
    • 2016-03-22
    • US12891738
    • 2010-09-27
    • Sai Hung LamWei ZhuChin Yu Chen
    • Chun Chi ChenSai Hung LamWei ZhuChin Yu Chen
    • G03B27/42H01L21/67G03F7/20H01L23/544
    • H01L21/67253G03F7/70516H01L23/544H01L2223/54433H01L2924/0002H01L2924/00
    • A calibration wafer may bear one or more different mark types to facilitate inspection of a lithography process. A first mark type may be located on the outer peripheral portion of the wafer to indicate the desired boundary of an edge bead removal (EBR) region. A second mark type may be located on an outer peripheral portion of the wafer to indicate the desired boundary of a wafer edge expose region (WEE). A third mark type may indicate the border of a portion of the wafer expected to bear a wafer identification mark. A fourth mark type may be located at the center of the wafer to allow for precise and uniform application of liquid photoresist material to the calibration wafer. The calibration wafer may be employed in methods of rapidly and easily assessing the accuracy of various phases of photolithography processes.
    • 校准晶片可以承载一种或多种不同的标记类型,以便于光刻工艺的检查。 第一标记类型可以位于晶片的外周部分上,以指示边缘珠去除(EBR)区域的期望边界。 第二标记类型可以位于晶片的外周部分上,以指示晶片边缘曝光区域(WEE)的期望边界。 第三标记类型可以指示期望承载晶片识别标记的晶片的一部分的边界。 第四标记类型可以位于晶片的中心,以允许液体光致抗蚀剂材料精确和均匀地施加到校准晶片。 校准晶片可以用于快速且容易地评估光刻工艺的各个阶段的精度的方法。
    • 7. 发明申请
    • REMOTE NON-INVASIVE PARAMETER SENSING SYSTEM AND METHOD
    • 远程非入侵参数传感系统及方法
    • US20120283575A1
    • 2012-11-08
    • US13501081
    • 2010-10-12
    • Govind RaoYordan KostovLeah TolosaHung Lam
    • Govind RaoYordan KostovLeah TolosaHung Lam
    • A61B5/01A61B6/00
    • A61B5/015
    • A remote parameter sensing system is provide that includes a gel sensor, a light source, a detector and a controller 140. The gel sensor is in contact with a surface where the parameter is to be measured, and is preferably a gel that is embedded with a chemical that emits light 160 (via, for example, fluorescence) when it is excited by excitation light from the light source at an appropriate excitation frequency. The chemical properties of the gel sensor are such that at least one characteristic of the emission light (such as, for example, emission intensity) varies as a function of variations in the parameter being measured. The system is particularly suited for use as remote body temperature sensing system in incubators and radiant warmers for infant and neonatal care.
    • 提供了一种远程参数感测系统,其包括凝胶传感器,光源,检测器和控制器140.凝胶传感器与要测量参数的表面接触,并且优选地是嵌入 当通过来自光源的激发光以适当的激发频率激发时,发出光160(通过例如荧光)的化学品。 凝胶传感器的化学性质使得发射光(例如发光强度)的至少一个特性随着被测参数的变化而变化。 该系统特别适用于孵化器中的远程体温感测系统和用于婴儿和新生儿护理的辐射加热器。
    • 9. 发明申请
    • Methods and Apparatuses for Tucking Side Panels of Absorbent Articles
    • 吸收制品侧板的方法和装置
    • US20110247747A1
    • 2011-10-13
    • US13051241
    • 2011-03-18
    • Uwe SchneiderJoseph Hung Lam
    • Uwe SchneiderJoseph Hung Lam
    • B32B3/04
    • A61F13/55115A61F13/15747A61F13/15764Y10T156/1034
    • Aspects of the present disclosure relate to tucking opposing side panels into a chassis of a pant diaper. The apparatuses and methods may utilize one or more conveyors that advance the chassis along a machine direction. Each conveyor may have a vacuum zone that applies a vacuum force to hold the chassis. The chassis may be positioned between a first conveyor having a first vacuum zone and a second conveyor having a second vacuum zone. The conveyors may apply opposing vacuum forces to hold the first waist region apart from the second waist region while the chassis advances in the machine direction toward a tucking device. The tucking device may discharge air to push the side panels into the chassis and create longitudinal fold lines along edges of the absorbent core of the diaper.
    • 本公开的方面涉及将相对的侧板折叠到短裤尿布的底架中。 这些装置和方法可以利用沿机器方向推进底盘的一个或多个输送机。 每个输送机可以具有施加真空力以保持底盘的真空区域。 底盘可以位于具有第一真空区的第一输送机和具有第二真空区的第二输送机之间。 输送机可以施加相反的真空力以将第一腰围区域与第二腰部区域分开,同时机架朝机器方向前进到卷起装置。 折叠装置可以排出空气以将侧板推入底盘并沿着尿布的吸收芯的边缘产生纵向折叠线。
    • 10. 发明申请
    • DRAINAGE TRAPPING CARTRIDGE AND A DRAINAGE TRAPPING DEVICE FOR PREVENTING BACKFLOW OF GAS
    • 用于防止气体回流的排水抓斗和排水装置
    • US20110023228A1
    • 2011-02-03
    • US12627993
    • 2009-11-30
    • Yiu Kwok TongKwai Hung Lam
    • Yiu Kwok TongKwai Hung Lam
    • E03C1/12
    • E03C1/288
    • The present invention provides a drainage trapping device which can prevent waste gas or poisonous gas containing bacteria from flowing backwards. The drainage trapping device comprises a water inlet pipe, a drainage trapping cartridge, a water outlet pipe, a float valve and a retaining component. The drainage trapping cartridge is provided with a water outlet which is connected to the water outlet pipe. A lower end of the drainage trapping cartridge is connected with the water inlet pipe. The float valve is disposed inside the drainage trapping cartridge and hermetically engages with a lower part of the drainage trapping cartridge when the drainage trapping cartridge is devoid of water. The retaining component is disposed at the water outlet of the drainage trapping cartridge or in the water outlet pipe, for preventing the float valve from running out.
    • 本发明提供一种能够防止含有废气的有毒气体向后流动的排水捕集装置。 排水捕集装置包括进水管,排水捕集筒,出水管,浮阀和保持部件。 排水捕集筒设有与出水管连接的出水口。 排水捕集筒的下端与进水管连接。 当排水捕集筒没有水时,浮阀设置在排水捕集筒内部并与排水捕集筒的下部气密地接合。 保持部件设置在排水捕集筒的出水口处或出水管中,以防止浮阀流出。