会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 5. 发明授权
    • Miter circular saw with an improved workpiece support fence
    • 斜切圆锯具有改进的工件支撑围栏
    • US6073529A
    • 2000-06-13
    • US245536
    • 1999-02-05
    • Yoshinori ShibataHisashi HiguchiToshiyuki Kani
    • Yoshinori ShibataHisashi HiguchiToshiyuki Kani
    • B23D45/04B23D45/14B23D47/02B27B5/20B27B27/04B27B27/00
    • B27B27/04B23D45/044
    • A miter circular saw includes a base on which a workpiece is placed, a tiltable saw blade assembly mounted on the base, and a work support fence that includes a fixed element with a first support surface and a movable element with a second support surface, both of which are mounted on the base for supporting the workpiece during cutting. The movable element is hinged to the top end of the fixed element to allow the movable element to pivot between a raised position, above the fixed element, and a lowered position. In the raised position, the movable element engages the fixed element so as to fix the movable element and prevent it from inadvertently falling rearward into the lowered position. In the raised position, the movable element places the second support surface flush with the first support surface of the fixed element. When the movable element is in the lowered position, the work support fence is sufficiently low to avoid interference with the locus of the saw blade assembly in its maximally tilted position.
    • 一个斜切的圆锯包括一个放置工件的基座,一个安装在基座上的可倾斜的锯片组件和一个工件支承围栏,它包括具有第一支撑表面的固定元件和带有第二支撑表面的可移动元件 其安装在基座上,用于在切割期间支撑工件。 可移动元件铰接到固定元件的顶端,以允许可移动元件在固定元件上方的升高位置和下降位置之间枢转。 在升高位置,可移动元件与固定元件接合,以固定可动元件,并防止其不经意地向后落入下降位置。 在升高位置,可移动元件将第二支撑表面与固定元件的第一支撑表面齐平。 当可移动元件处于降低位置时,工作支撑栅栏足够低以避免与锯片组件的位置处于最大倾斜位置的干涉。
    • 6. 发明授权
    • Electrophotographic apparatus having an a-Si photosensitive drum
assembled therein
    • 其中组装有a-Si感光鼓的电子照相设备
    • US5729800A
    • 1998-03-17
    • US332481
    • 1994-10-27
    • Tadashi OhbaNorio TomiieKeiji ItsukushimaHisashi Higuchi
    • Tadashi OhbaNorio TomiieKeiji ItsukushimaHisashi Higuchi
    • G03G5/082G03G13/22G03G15/00G03G15/02
    • G03G15/751G03G13/22G03G5/08235Y10S430/102
    • An electrophotographic apparatus using an a-Si photosensitive drum. The a-Si photosensitive drum has a thickness between 2 and 25 .mu.m. The initial charging potential on the photosensitive drum is set to 450V or below. The center exposure wavelength of an exposure means is set to 700 nm or above. The photosensitive drum includes a photoconductive layer formed as a thin film a-Si layer having a temperature characteristic of 1.0 V/.degree.C. or below. For realizing low charging potential and low electric field development, the thickness d of the photoconductive layer in the photosensitive drum is set to 2 to 24 .mu.m, the relative dielectric constant .epsilon.r is set to 2 or above, and the ratio d/.epsilon.r is set to 9 or below. The photosensitive drum is formed on a conductive support and has a three-layer structure, including a carrier charge blocking layer for blocking the introduction of carrier charge (of the opposite polarity to that of charging) from the conductive support into the photoconductive layer, a photoconductive layer and an insulating or high resistivity layer.
    • 使用a-Si感光鼓的电子照相设备。 a-Si感光鼓的厚度为2至25μm。 感光鼓上的初始充电电位设定为450V以下。 曝光装置的中心曝光波长设定为700nm以上。 感光鼓包括形成为具有1.0V /℃以下的温度特性的薄膜a-Si层的光电导层。 为了实现低充电电位和低电场发展,将感光鼓中的光电导层的厚度d设定为2〜24μm,相对介电常数εr设定为2以上,比率d /ε r设置为9或更低。 感光鼓形成在导电支撑件上并且具有三层结构,包括用于阻止从导电支撑件引入到光电导层中的载流子电荷(与充电相反的极性)的载流子电荷阻挡层, 光电导层和绝缘或高电阻率层。