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1. 发明申请

US20080062609A1 ELECTROSTATIC CHUCK DEVICE 审中-公开
标题翻译：静电切割装置
公开(公告)号：US20080062609A1
公开(公告)日：2008-03-13
申请号：US11834957
申请日：2007-08-07
申请人： Shinji HIMORI , Shoichiro MATSUYAMA , Atsushi MATSUURA , Hiroshi INAZUMACHI , Mamoru KOSAKAI
发明人： Shinji HIMORI , Shoichiro MATSUYAMA , Atsushi MATSUURA , Hiroshi INAZUMACHI , Mamoru KOSAKAI
IPC分类号： H01L21/683
CPC分类号： H01L21/6833
摘要： An electrostatic chuck device includes: an electrostatic chuck section including a substrate, which has a main surface serving as a mounting surface on which a plate-like sample is mounted and an electrostatic-adsorption inner electrode built therein, and a power supply terminal for applying a DC voltage to the electrostatic-adsorption inner electrode; and a metal base section that is fixed to the other main surface of the electrostatic chuck section so as to be incorporated into a body and that serves as a high frequency generating electrode. Here, the electrostatic-adsorption inner electrode has one or more electrode portions, and a resistance value of a distance between a point corresponding to a center axis of the substrate or a point closest to the center axis and a point most distant from the center axis among distances between two points in the electrode portion is in the range of 102Ω to 1010Ω.
摘要翻译：静电吸盘装置包括：静电吸盘部，其具有基板，其具有作为安装有板状试样的安装面的主面和内置有静电吸附内部电极的基板，以及用于施加电力的端子到静电吸附内部电极的DC电压; 以及固定在静电卡盘部的另一个主面上的金属基部，以结合到主体中并作为高频发生电极。这里，静电吸附内电极具有一个或多个电极部分，并且与基板的中心轴线相对应的点或最靠近中心轴线的点之间的距离的电阻值和最远离中心轴线的点在电极部分的两点之间的距离之间的距离在10欧姆到10微米的范围内。

2. 发明授权

US06838646B2 Susceptor device 有权
标题翻译：受体装置
公开(公告)号：US06838646B2
公开(公告)日：2005-01-04
申请号：US10644292
申请日：2003-08-20
申请人： Hiroshi Inazumachi , Mamoru Kosakai
发明人： Hiroshi Inazumachi , Mamoru Kosakai
IPC分类号： H01L21/00 , H01L21/687 , H05B3/68 , G23C16/00
CPC分类号： H01L21/67109 , H01J37/32724 , H01J2237/2001 , H01L21/67103 , H01L21/68785
摘要： A susceptor device comprises a susceptor base body, a temperature controlling section, an adhesive layer which attaches the susceptor base body and the temperature controlling section unitarily, an O-ring which is disposed near a peripheral section of the adhesive layer, a circular O-ring which is disposed on a bottom surface of the temperature controlling section, an O-ring supporting section which surrounds the temperature controlling section and compresses the O-rings on the temperature controlling section, and pushup screws which push up and fix the O-ring supporting section toward the temperature controlling section. By doing this, it is possible to protect the adhesive layer from an external environment. Also, it is possible to provide a susceptor device having a superior temperature controlling characteristics for the plate sample, operational stability, and durability.
摘要翻译：感受器装置包括基座主体，温度控制部，将基座主体和温度控制部一体地安装的粘合层，设置在粘合剂层的周边部附近的O形环，圆形O形环，环，设置在温度控制部的底面上，O形环支撑部，其围绕温度控制部并压缩温度控制部上的O形环;以及推压螺钉，其向上并固定O形环支撑部分朝向温度控制部分。通过这样做，可以保护粘合剂层免受外部环境的影响。此外，可以提供一种具有优异的板样品温度控制特性的基座装置，操作稳定性和耐久性。

3. 发明授权

US07619870B2 Electrostatic chuck 有权
标题翻译：静电吸盘
公开(公告)号：US07619870B2
公开(公告)日：2009-11-17
申请号：US11834994
申请日：2007-08-07
申请人： Shinji Himori , Shoichiro Matsuyama , Atsushi Matsuura , Hiroshi Inazumachi , Mamoru Kosakai , Yukio Miura , Keigo Maki
发明人： Shinji Himori , Shoichiro Matsuyama , Atsushi Matsuura , Hiroshi Inazumachi , Mamoru Kosakai , Yukio Miura , Keigo Maki
IPC分类号： H01T23/00
CPC分类号： H01L21/6833
摘要： An electrostatic chuck device includes an electrostatic chuck section including a substrate and a power supply terminal for applying a DC voltage to an electrostatic-adsorption inner electrode; and a metal base section fixed to the other main surface of the electrostatic chuck section. Here, a concave portion is formed in the main surface of the metal base section facing the electrostatic chuck section and a dielectric plate is fixed to the concave portion. The dielectric plate and the electrostatic chuck section are adhesively bonded to each other with an insulating adhesive bonding layer interposed therebetween. The dielectric plate and the concave portion are adhesively bonded to each other with an insulating adhesive bonding layer interposed therebetween. The dielectric constant of the insulating adhesive bonding layer is smaller than that of any one of the dielectric plate and the substrate.
摘要翻译：静电吸盘装置包括：静电吸盘部，其包括基板和用于向静电吸附内部电极施加直流电压的电源端子; 以及固定在静电吸盘部的另一个主面上的金属基部。这里，在面向静电卡盘部的金属基部的主面上形成有凹部，电介质板固定在凹部。电介质板和静电卡盘部分之间插入绝缘粘合剂粘合层彼此粘合。电介质板和凹部通过绝缘性粘合剂层粘合而彼此接合。绝缘粘合剂接合层的介电常数小于介质板和基板中的任何一种的介电常数。

4. 发明申请

US20080037195A1 ELECTROSTATIC CHUCK 有权
标题翻译：静电卡
公开(公告)号：US20080037195A1
公开(公告)日：2008-02-14
申请号：US11834994
申请日：2007-08-07
申请人： Shinji HIMORI , Shoichiro MATSUYAMA , Atsushi MATSUURA , Hiroshi INAZUMACHI , Mamoru KOSAKAI , Yukio MIURA , Keigo MAKI
发明人： Shinji HIMORI , Shoichiro MATSUYAMA , Atsushi MATSUURA , Hiroshi INAZUMACHI , Mamoru KOSAKAI , Yukio MIURA , Keigo MAKI
IPC分类号： H01L21/683 , H01L21/00
CPC分类号： H01L21/6833
摘要： An electrostatic chuck device includes an electrostatic chuck section including a substrate and a power supply terminal for applying a DC voltage to an electrostatic-adsorption inner electrode; and a metal base section fixed to the other main surface of the electrostatic chuck section. Here, a concave portion is formed in the main surface of the metal base section facing the electrostatic chuck section and a dielectric plate is fixed to the concave portion. The dielectric plate and the electrostatic chuck section are adhesively bonded to each other with an insulating adhesive bonding layer interposed therebetween. The dielectric plate and the concave portion are adhesively bonded to each other with an insulating adhesive bonding layer interposed therebetween. The dielectric constant of the insulating adhesive bonding layer is smaller than that of any one of the dielectric plate and the substrate.
摘要翻译：静电吸盘装置包括：静电吸盘部，其包括基板和用于向静电吸附内部电极施加直流电压的电源端子; 以及固定在静电吸盘部的另一个主面上的金属基部。这里，在面向静电卡盘部的金属基部的主面上形成有凹部，电介质板固定在凹部。电介质板和静电卡盘部分之间插入绝缘粘合剂粘合层彼此粘合。电介质板和凹部通过绝缘性粘合剂层粘合而彼此接合。绝缘粘合剂接合层的介电常数小于介质板和基板中的任何一种的介电常数。

5. 发明申请

US20100002354A1 ELECTROSTATIC CHUCK DEVICE 有权
标题翻译：静电切割装置
公开(公告)号：US20100002354A1
公开(公告)日：2010-01-07
申请号：US12310094
申请日：2007-08-01
申请人： Hiroshi Inazumachi , Mamoru Kosakai , Miura Yukio , Keigo Maki
发明人： Hiroshi Inazumachi , Mamoru Kosakai , Miura Yukio , Keigo Maki
IPC分类号： H01L21/683
CPC分类号： H01L21/6833 , H02N13/00 , Y10T279/23
摘要： An electrostatic chuck device which enables to perform a plasma process having high in-plane uniformity to a plane-like sample by improving the in-plane uniformity of the electric field intensity in a plasma when applied to a plasma processing apparatus. Specifically disclosed is an electrostatic chuck device (21) including an electrostatic chuck section (22), a metal base section (23) serving as a high-frequency generating electrode, and an insulating plate (24). The electrostatic chuck section (22) is composed of a dielectric plate (31) whose top surface (31a) serves as a mounting surface on which a plate-like sample (W) is placed, a supporting plate (32), an electrostatic-adsorption inner electrode (25), and an insulating layer (33). The electrostatic-adsorption inner electrode (25) is made of a composite sintered body containing an insulating ceramic and silicon carbide, while having a volumetric resistance of not less than 1.0×10−1 Ωcm but not more than 1.0×108 Ωcm.
摘要翻译：一种静电吸盘装置，其能够通过提高施加到等离子体处理装置时等离子体中的电场强度的面内均匀性，而对平面状样品进行具有高面内均匀性的等离子体处理。具体公开了一种静电卡盘装置（21），包括静电卡盘部（22），作为高频发生电极的金属基部（23）和绝缘板（24）。静电吸盘部（22）由电极板（31）构成，电介质板（31）的顶面（31a）作为其上放置有板状样品（W）的安装面，支撑板（32）吸附内电极（25）和绝缘层（33）。静电吸附内部电极（25）由含有绝缘陶瓷和碳化硅的复合烧结体构成，体积电阻为1.0×10 -1Ω〜1.0×10 8Ω·cm以上。

6. 发明申请

US20080062610A1 ELECTROSTATIC CHUCK DEVICE 审中-公开
标题翻译：静电切割装置
公开(公告)号：US20080062610A1
公开(公告)日：2008-03-13
申请号：US11835560
申请日：2007-08-08
申请人： Shinji HIMORI , Shoichiro MATSUYAMA , Atsushi MATSUURA , Hiroshi INAZUMACHI , Mamoru KOSAKAI , Yukio MIURA , Keigo MAKI
发明人： Shinji HIMORI , Shoichiro MATSUYAMA , Atsushi MATSUURA , Hiroshi INAZUMACHI , Mamoru KOSAKAI , Yukio MIURA , Keigo MAKI
IPC分类号： H01L21/683
CPC分类号： H01L21/6833
摘要： An electrostatic chuck device includes: an electrostatic chuck section including a substrate, which has a main surface serving as a mounting surface on which a plate-like sample is mounted and an electrostatic-adsorption inner electrode built therein, and a power supply terminal for applying a DC voltage to the electrostatic-adsorption inner electrode; and a metal base section that is fixed to the other main surface of the electrostatic chuck section so as to be incorporated into a body and that serves as a high frequency generating electrode. Here, the volume resistivity of the electrostatic-adsorption inner electrode is in the range of 1.0×10−1Ωcm to 1.0×108 Ωcm.
摘要翻译：静电吸盘装置包括：静电吸盘部，其具有基板，其具有作为安装有板状试样的安装面的主面和内置有静电吸附内部电极的基板，以及用于施加电力的端子到静电吸附内部电极的DC电压; 以及固定在静电卡盘部的另一个主面上的金属基部，以结合到主体中并作为高频发生电极。这里，静电吸附内部电极的体积电阻率在1.0×10 -1Ω〜1.0×10 8Ωm的范围内。

7. 发明授权

US06863281B2 Chucking apparatus and production method for the same 有权
标题翻译：夹头装置及其制作方法相同
公开(公告)号：US06863281B2
公开(公告)日：2005-03-08
申请号：US10235585
申请日：2002-09-05
申请人： Kazunori Endou , Hiroshi Inazumachi
发明人： Kazunori Endou , Hiroshi Inazumachi
IPC分类号： B23Q3/08 , B23Q3/15 , B23Q3/154 , H01L21/68 , H01L21/683 , H02N13/00
CPC分类号： B23Q3/154 , Y10T279/23
摘要： One object of the present invention is to provide a chucking apparatus and its production method that is capable of carrying out holding, alignment, transport and so forth without causing problems such as the generation of particles. In order to achieve this object, the present invention provides a chucking apparatus provided with a base in which protrusions or grooves are formed on one of its faces to form an irregular surface, and the apical surfaces of protrusions of the irregular surface serve as a chucking surface for chucking and holding a plate-shaped sample, wherein the apical and lateral surfaces of the above protrusions, and the bottom surfaces of the above indentations, are all polished.
摘要翻译：本发明的一个目的是提供一种能够进行保持，对准，运输等的夹持装置及其制造方法，而不会产生诸如颗粒的产生的问题。为了达到上述目的，本发明提供了一种夹持装置，其具有在其一个面上形成突起或槽的基部，形成不规则的表面，并且不规则表面的突起的顶端面用作夹紧用于夹紧和保持板状样品的表面，其中上述突起的顶部和侧表面以及上述凹陷的底表面都被抛光。

8. 发明授权

US08284538B2 Electrostatic chuck device 有权
标题翻译：静电吸盘装置
公开(公告)号：US08284538B2
公开(公告)日：2012-10-09
申请号：US11835743
申请日：2007-08-08
申请人： Shinji Himori , Shoichiro Matsuyama , Atsushi Matsuura , Hiroshi Inazumachi , Mamoru Kosakai , Yukio Miura , Keigo Maki
发明人： Shinji Himori , Shoichiro Matsuyama , Atsushi Matsuura , Hiroshi Inazumachi , Mamoru Kosakai , Yukio Miura , Keigo Maki
IPC分类号： H01L21/687
CPC分类号： H01L21/6833
摘要： An electrostatic chuck device includes an electrostatic chuck section, a metal base section, and a dielectric plate. The electrostatic chuck section has a substrate, a main surface of which serves as a mounting surface for a plate-like sample, an electrostatic-adsorption inner electrode built in the substrate, and a power supply terminal for applying a DC voltage to the electrostatic-adsorption inner electrode. Here, a dielectric plate is fixed to a concave portion formed in the metal base section. The dielectric plate and the electrostatic chuck section are adhesively bonded to each other with an insulating adhesive bonding layer interposed therebetween. The dielectric plate and the concave portion are adhesively bonded to each other with a conductive adhesive bonding layer interposed therebetween, the volume resistivity of which is 1.0×10−2 Ωcm or less.
摘要翻译：静电吸盘装置包括静电吸盘部，金属基部和电介质板。静电吸盘部具有基板，其主面作为板状试样的安装面，内置于基板的静电吸附内部电极，以及向静电吸引部施加直流电压的电源端子，吸附内电极。这里，电介质板被固定到形成在金属基部中的凹部。电介质板和静电卡盘部分之间插入绝缘粘合剂粘合层彼此粘合。电介质板和凹部之间以导电性粘合剂层粘合地结合，其体积电阻率为1.0×10-2＆OHgr·cm以下。

9. 发明授权

US08264813B2 Electrostatic chuck device 有权
标题翻译：静电吸盘装置
公开(公告)号：US08264813B2
公开(公告)日：2012-09-11
申请号：US12310094
申请日：2007-08-01
申请人： Hiroshi Inazumachi , Mamoru Kosakai , Yukio Miura , Keigo Maki
发明人： Hiroshi Inazumachi , Mamoru Kosakai , Yukio Miura , Keigo Maki
IPC分类号： H02H1/00
CPC分类号： H01L21/6833 , H02N13/00 , Y10T279/23
摘要： An electrostatic chuck device which enables to perform a plasma process having high in-plane uniformity to a plane-like sample by improving the in-plane uniformity of the electric field intensity in a plasma when applied to a plasma processing apparatus. Specifically disclosed is an electrostatic chuck device (21) including an electrostatic chuck section (22), a metal base section (23) serving as a high-frequency generating electrode, and an insulating plate (24). The electrostatic chuck section (22) is composed of a dielectric plate (31) whose top surface (31a) serves as a mounting surface on which a plate-like sample (W) is placed, a supporting plate (32), an electrostatic-adsorption inner electrode (25), and an insulating layer (33). The electrostatic-adsorption inner electrode (25) is made of a composite sintered body containing an insulating ceramic and silicon carbide, while having a volumetric resistance of not less than 1.0×10−1 Ωcm but not more than 1.0×108 Ωcm.
摘要翻译：一种静电吸盘装置，其能够通过提高施加到等离子体处理装置时等离子体中的电场强度的面内均匀性，而对平面状样品进行具有高面内均匀性的等离子体处理。具体公开了一种静电卡盘装置（21），包括静电卡盘部（22），作为高频发生电极的金属基部（23）和绝缘板（24）。静电吸盘部（22）由电极板（31）构成，电介质板（31）的顶面（31a）作为其上放置有板状样品（W）的安装面，支撑板（32）吸附内电极（25）和绝缘层（33）。静电吸附内部电极（25）由含有绝缘陶瓷和碳化硅的复合烧结体构成，体积电阻为1.0×10 -1以上且OHgr cm以上且1.0×10 8Ω以下。厘米。

10. 发明申请

US20080062611A1 ELECTROSTATIC CHUCK DEVICE 有权
标题翻译：静电切割装置
公开(公告)号：US20080062611A1
公开(公告)日：2008-03-13
申请号：US11835743
申请日：2007-08-08
申请人： Shinji HIMORI , Shoichiro MATSUYAMA , Atsushi MATSUURA , Hiroshi INAZUMACHI , Mamoru KOSAKAI , Yukio MIURA , Keigo MAKI
发明人： Shinji HIMORI , Shoichiro MATSUYAMA , Atsushi MATSUURA , Hiroshi INAZUMACHI , Mamoru KOSAKAI , Yukio MIURA , Keigo MAKI
IPC分类号： H01L21/683
CPC分类号： H01L21/6833
摘要： An electrostatic chuck device includes an electrostatic chuck section, a metal base section, and a dielectric plate. The electrostatic chuck section has a substrate, a main surface of which serves as a mounting surface for a plate-like sample, an electrostatic-adsorption inner electrode built in the substrate, and a power supply terminal for applying a DC voltage to the electrostatic-adsorption inner electrode. Here, a dielectric plate is fixed to a concave portion formed in the metal base section. The dielectric plate and the electrostatic chuck section are adhesively bonded to each other with an insulating adhesive bonding layer interposed therebetween. The dielectric plate and the concave portion are adhesively bonded to each other with a conductive adhesive bonding layer interposed therebetween, the volume resistivity of which is 1.0×10−2Ωcm or less.
摘要翻译：静电吸盘装置包括静电吸盘部，金属基部和电介质板。静电吸盘部具有基板，其主面作为板状试样的安装面，内置于基板的静电吸附内部电极，以及向静电吸引部施加直流电压的电源端子，吸附内电极。这里，电介质板被固定到形成在金属基部中的凹部。电介质板和静电卡盘部分之间插入绝缘粘合剂粘合层彼此粘合。电介质板和凹部通过导电性粘合剂层彼此粘合，体积电阻率为1.0×10 -2Ω·cm以下。

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