专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06777355B2 Manufacturing apparatus and manufacturing method for semiconductor device 失效
标题翻译：半导体器件的制造装置及其制造方法
公开(公告)号：US06777355B2
公开(公告)日：2004-08-17
申请号：US10718392
申请日：2003-11-20
申请人： Toshiro Kisakibaru , Isao Honbori , Yasushi Kato , Toshikazu Suzuki , Hirohisa Koriyama , Hayato Iwamoto , Hitoshi Abe
发明人： Toshiro Kisakibaru , Isao Honbori , Yasushi Kato , Toshikazu Suzuki , Hirohisa Koriyama , Hayato Iwamoto , Hitoshi Abe
IPC分类号： H01L2131
CPC分类号： H01L21/67017 , Y10S438/907
摘要： A manufacturing apparatus for a semiconductor device comprises: a clean room for installing a plurality of semiconductor manufacturing and processing apparatuses; an external air cleaning device connected to a supply port of the clean room for supplying a cleaned-up outside air into the clean room; a common air duct section installed in the clean room; a first air cleaning and ventilating means connected to said common air duct section for cleaning and ventilating a part of the cleaned-up outside air to the common air duct section; individual air duct section branched off from the common air duct section and connected to each of said semiconductor manufacturing and processing apparatuses; and a second air cleaning and ventilating means interposed between the individual air duct section and each of the semiconductor manufacturing and processing apparatuses for cleaning and ventilating the air to be supplied to each of the semiconductor manufacturing and processing apparatuses.
摘要翻译：一种用于半导体器件的制造设备，包括：用于安装多个半导体制造和处理设备的洁净室; 连接到洁净室的供给口的外部空气净化装置，用于将净化后的外部空气供给到净化室内; 安装在洁净室内的通风道; 连接到所述公共空气管道部分的第一空气净化和通风装置，用于将一部分净化的外部空气清洁和通风到共用空气管道部分; 单独的空气管道部分从公共空气管道部分分支并连接到每个所述半导体制造和处理装置; 以及第二空气净化和通风装置，其插入在单独的空气管道部分和用于清洁和通风供给到每个半导体制造和处理设备的空气的每个半导体制造和处理设备之间。

2. 发明申请

US20120249503A1 DISPLAY AND ELECTRONIC DEVICE 审中-公开
标题翻译：显示和电子设备
公开(公告)号：US20120249503A1
公开(公告)日：2012-10-04
申请号：US13413057
申请日：2012-03-06
申请人： Shinichi Teraguchi , Keisuke Omoto , Hirohisa Koriyama , Yoko Fukunaga , Toshiaki Arai , Kazuyuki Endou
发明人： Shinichi Teraguchi , Keisuke Omoto , Hirohisa Koriyama , Yoko Fukunaga , Toshiaki Arai , Kazuyuki Endou
IPC分类号： G09G3/04 , G09G3/30 , G09G3/36 , G09G5/00
CPC分类号： H01L27/322 , G02F1/133514 , G02F2001/136218 , G09G3/3233 , G09G3/3648 , G09G2300/0426 , G09G2300/043 , G09G2320/0233 , G09G2320/0242 , G09G2330/06 , H01L27/3244
摘要： A display capable of reducing an electric effect of a color filter on a pixel circuit, and thereby suppressing degradation in display quality is provided. The display includes a pixel drive substrate having a color filter, a display function layer provided on the pixel drive substrate, a first electrode and a second electrode to supply a drive voltage to the display function layer, and a third electrode disposed to face the color filter.
摘要翻译：提供了能够降低像素电路上的滤色器的电效应，从而抑制显示质量下降的显示器。显示器包括具有滤色器的像素驱动基板，设置在像素驱动基板上的显示功能层，向显示功能层提供驱动电压的第一电极和第二电极以及面向颜色的第三电极过滤。

3. 发明授权

US06670290B2 Manufacturing apparatus and manufacturing method for semiconductor device 失效
公开(公告)号：US06670290B2
公开(公告)日：2003-12-30
申请号：US09978614
申请日：2001-10-16
申请人： Toshiro Kisakibaru , Isao Honbori , Yasushi Kato , Toshikazu Suzuki , Hirohisa Koriyama , Hayato Iwamoto , Hitoshi Abe
发明人： Toshiro Kisakibaru , Isao Honbori , Yasushi Kato , Toshikazu Suzuki , Hirohisa Koriyama , Hayato Iwamoto , Hitoshi Abe
IPC分类号： H01L2131
CPC分类号： H01L21/67017 , Y10S438/907
摘要： A manufacturing apparatus for a semiconductor device comprises: a clean room for installing a plurality of semiconductor manufacturing and processing apparatuses; an external air cleaning device connected to a supply port of the clean room for supplying a cleaned-up outside air into the clean room; a common air duct section installed in the clean room; a first air cleaning and ventilating means connected to said common air duct section for cleaning and ventilating a part of the cleaned-up outside air to the common air duct section; individual air duct section branched off from the common air duct section and connected to each of said semiconductor manufacturing and processing apparatuses; and a second air cleaning and ventilating means interposed between the individual air duct section and each of the semiconductor manufacturing and processing apparatuses for cleaning and ventilating the air to be supplied to each of the semiconductor manufacturing and processing apparatuses.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式