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    • 4. 发明授权
    • Turbo vacuum pump
    • 涡轮真空泵
    • US08109744B2
    • 2012-02-07
    • US12410780
    • 2009-03-25
    • Hiroyuki KawasakiHiroaki OgaminoHiroshi Sobukawa
    • Hiroyuki KawasakiHiroaki OgaminoHiroshi Sobukawa
    • F04B37/14F04B37/10
    • F04D19/042F04D17/168F04D29/0513F04D29/28
    • An oil-free turbo vacuum pump is capable of evacuating gas in a chamber from atmospheric pressure to high vacuum. The turbo vacuum pump includes a pumping section having rotor blades and stator blades which are disposed alternately in a casing, a main shaft for supporting the rotor blades, and a bearing and motor section having a motor for rotating the main shaft and a bearing mechanism for supporting the main shaft rotatably. A gas bearing is used as a bearing for supporting the main shaft in a thrust direction, spiral grooves are formed in both surfaces of a stationary part of the gas bearing, and the stationary part having the spiral grooves is placed between an upper rotating part and a lower rotating part which are fixed to the main shaft.
    • 无油涡轮真空泵能够将室内的气体从大气压降至高真空。 涡轮真空泵包括具有交替设置在壳体中的转子叶片和定子叶片的泵送部分,用于支撑转子叶片的主轴以及具有用于使主轴旋转的马达的轴承和马达部分以及用于 可旋转地支撑主轴。 气体轴承用作用于沿推力方向支撑主轴的轴承,在气体轴承的静止部分的两个表面上形成螺旋槽,并且具有螺旋槽的固定部分设置在上部旋转部分和 固定在主轴上的下部旋转部。
    • 6. 发明申请
    • Substrate processing system
    • 基板加工系统
    • US20070026150A1
    • 2007-02-01
    • US10559669
    • 2004-06-30
    • Takao HoriuchiAzumi HoriuchiHiroaki OgaminoYasuhiro NiimuraHiroshi Hattori
    • Takao HoriuchiAzumi HoriuchiHiroaki OgaminoYasuhiro NiimuraHiroshi Hattori
    • C23C16/00H01L21/302
    • C23C16/45593C23C16/4412C30B25/02H01L21/67017
    • A substrate processing system is provided, which efficiently utilizes reactive substances or carrier gases necessary for the surface processing of a substrate, simplifies equipment for the gas transfer and effects energy saving. This system comprises a gas supply source 12 for supplying a process gas containing a reactive substance, a reservoir tank 14 connected to the gas supply source 12 for reserving the process gas, a reactor 10 for exposing a substrate placed therein to the process gas, a first circulation pipe 38 for introducing the process gas inside the reactor 10 into the reservoir tank 14, a second circulation pipe 42 for introducing at least part of the process gas in the reservoir tank 14 into the reactor 10, and a flow regulating valve 44 disposed in the second circulation pipe 42 for regulating the amount of process gas to be introduced into the reactor 10.
    • 提供了一种基板处理系统,其有效利用基板表面处理所需的反应物质或载气,简化了用于气体传递的设备并且实现了节能。 该系统包括用于供给含有反应性物质的处理气体的气体供给源12,与气体供给源12连接以用于储存处理气体的储存罐14,将放置在其中的基板暴露于处理气体的反应器10, 用于将反应器10内的处理气体引入储存槽14的第一循环管38,用于将储存罐14中的至少一部分处理气体引入反应器10的第二循环管42和设置在流化床 在第二循环管42中,用于调节要引入反应器10的工艺气体的量。