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    • 4. 发明申请
    • Two-dimensional spectroscopic system and film thickness measuring system
    • 二维光谱系统和膜厚测量系统
    • US20050094160A1
    • 2005-05-05
    • US10938876
    • 2004-09-13
    • Hideyuki MuraiKoichi Ekawa
    • Hideyuki MuraiKoichi Ekawa
    • G01B11/06G01N21/27G01N21/84G02F1/13H01L21/66G01N21/00G01B11/28
    • G01B11/0625G01N21/8422
    • Light horizontally output from a light source 50 passes through a projection lens 51 and reaches a half mirror 52. The light reflected by the half mirror 52 coaxially reaches the measurement object 43 through a objective lens 53. The light reflected by the objective lens 53 provides an image at a image-taking unit 56 through a telecentric optical system on an object side comprising the objective lens 53 and an aperture stop 54. The light to be input to the image-taking unit 56 passes through a spectral filter provided in a multi-spectral filter 55. Here, the light source 50 and the aperture stop 54 are in an image-forming relation and the object 43 and the image-taking unit 56 are in the image-forming relation. In addition, a numerical aperture on an image side in a light-projecting optical system is greater than a numerical aperture on an object side in a light-receiving optical system, and the light source 50 outputs light which has a certain degree of divergence and forms an image having uniform light intensity at the aperture stop 54.
    • 从光源50水平输出的光穿过投影透镜51并到达半反射镜52。 由半反射镜52反射的光通过物镜53同轴地到达测量对象43。 由物镜53反射的光通过物镜侧的远心光学系统在摄像单元56处提供图像,该物镜侧包括物镜53和孔径光阑54。 要输入到摄像单元56的光通过设置在多光谱滤光器55中的光谱滤波器。 这里,光源50和孔径光阑54处于图像形成关系,物体43和摄像单元56处于图像形成关系。 此外,在投光光学系统中的像侧的数值孔径大于光接收光学系统中物体侧的数值孔径,并且光源50输出具有一定程度的发散的光,并且 在孔径光阑54处形成具有均匀光强度的图像。
    • 7. 发明授权
    • Spectrometric measuring instrument
    • 光谱测量仪器
    • US07411685B2
    • 2008-08-12
    • US11288447
    • 2005-11-29
    • Jun TakashimaKoichi EkawaHideyuki Murai
    • Jun TakashimaKoichi EkawaHideyuki Murai
    • G01B11/02
    • G01B11/0641G01B11/0625G01N21/211G01N2021/213
    • Providing a spectrometric measuring instrument suitable for in-line measurement for example in a semiconductor manufacturing process, an FPD manufacturing process, or the like, by realizing size reduction and imparting resistance to distance fluttering, angle fluttering in a horizontal direction, and angle fluttering in a perpendicular direction. A light interference type spectral element for gradually changing a wavelength of transmitted light by means of a transmitted position is provided immediately before the photoelectric transfer part array device, and based upon a light-receiving side optical system having the function of detecting a change in state of polarization of a reflected light from a sample, and a series of light-receiving amount data obtained from each of photoelectric transfer parts of the photoelectric transfer part array device, polarized light is analyzed. By fitting of a measured waveform to a theoretical waveform, a film thickness or film quality is obtained.
    • 提供适用于在线测量的光谱测量仪器,例如在半导体制造工艺,FPD制造工艺等中,通过实现尺寸减小和赋予距离振动的阻力,在水平方向上的角度抖动以及角度抖动 垂直方向。 在光电转移体阵列装置的正前方设置用于通过透射位置逐渐变化透射光的波长的光干涉型光谱元件,并且基于具有检测状态变化的功能的受光侧光学系统 分析来自样品的反射光的偏振光和从光电转移体阵列器件的各光电转移部分获得的一系列光接收量数据,分析偏振光。 通过将测量波形拟合到理论波形,获得膜厚度或膜质量。
    • 8. 发明申请
    • Spectrometric measuring instrument
    • 光谱测量仪器
    • US20060114470A1
    • 2006-06-01
    • US11288447
    • 2005-11-29
    • Jun TakashimaKoichi EkawaHideyuki Murai
    • Jun TakashimaKoichi EkawaHideyuki Murai
    • G01B9/02
    • G01B11/0641G01B11/0625G01N21/211G01N2021/213
    • Providing a spectrometric measuring instrument suitable for in-line measurement for example in a semiconductor manufacturing process, an FPD manufacturing process, or the like, by realizing size reduction and imparting resistance to distance fluttering, angle fluttering in a horizontal direction, and angle fluttering in a perpendicular direction. A light interference type spectral element for gradually changing a wavelength of transmitted light by means of a transmitted position is provided immediately before the photoelectric transfer part array device, and based upon a light-receiving side optical system having the function of detecting a change in state of polarization of a reflected light from a sample, and a series of light-receiving amount data obtained from each of photoelectric transfer parts of the photoelectric transfer part array device, polarized light is analyzed. By fitting of a measured waveform to a theoretical waveform, a film thickness or film quality is obtained.
    • 提供适用于在线测量的光谱测量仪器,例如在半导体制造工艺,FPD制造工艺等中,通过实现尺寸减小和赋予距离振动的阻力,在水平方向上的角度抖动以及角度抖动 垂直方向。 在光电转移体阵列装置的正前方设置用于通过透射位置逐渐变化透射光的波长的光干涉型光谱元件,并且基于具有检测状态变化的功能的受光侧光学系统 分析来自样品的反射光的偏振光和从光电转移体阵列器件的各光电转移部分获得的一系列光接收量数据,分析偏振光。 通过将测量波形拟合到理论波形,获得膜厚度或膜质量。