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    • 2. 发明授权
    • Multifaceted reflecting mirror, illumination optical system based on use of the same, and semiconductor exposure apparatus
    • 多面反射镜,基于使用的照明光学系统和半导体曝光装置
    • US06984051B2
    • 2006-01-10
    • US10288337
    • 2002-11-06
    • Hideo Takino
    • Hideo Takino
    • G02B5/08G02B7/182
    • G03F7/70141G02B5/08G02B5/09G02B7/182G02B7/1828G02B26/085G03F7/702G03F7/70958G03F7/70975G21K1/06Y10S359/903
    • A multifaceted reflecting mirror is provided with a plurality of reflecting mirror elements 10 and a base plate 13 for magnet, each of the plurality of reflecting mirror elements 10 comprising a reflecting surface 19 and a magnetic film 17 formed on a bottom surface. The respective reflecting mirror elements 10 can be positioned highly accurately on the base plate 13 by using a positioning guide 15. The maintenance operation is easily performed as well, because the respective reflecting mirror elements 10 are detachable. When the multifaceted reflecting mirror is used in combination with another multifaceted reflecting mirror for an illumination optical system of a reflection type exposure apparatus which uses, as an exposure light beam, a light beam having a short wavelength such as soft X-ray, it is possible to illuminate an exposure area on a substrate with the light beam having an extremely uniform illumination intensity.
    • 多面反射镜设置有多个反射镜元件10和用于磁体的基板13,多个反射镜元件10中的每一个包括反射表面19和形成在底表面上的磁性膜17。 通过使用定位引导件15,能够将各反射镜元件10高精度地定位在基板13上。 因为各个反射镜元件10是可拆卸的,所以也容易进行维护操作。 当多面反射镜与另一种使用作为曝光光束的反射型曝光装置的照明光学系统的多面反射镜结合使用具有短X射线等短波长的光束时,它是 可以用具有非常均匀的照明强度的光束来照亮基板上的曝光区域。