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    • 3. 发明授权
    • Electron source apparatus and image forming apparatus
    • 电子源装置和图像形成装置
    • US06847338B2
    • 2005-01-25
    • US09726020
    • 2000-11-30
    • Naoto AbeHideaki Mitsutake
    • Naoto AbeHideaki Mitsutake
    • G09G3/22H01J31/12G09G3/28
    • G09G3/22H01J31/127H01J2201/3165H01J2329/864H01J2329/8645H01J2329/8655
    • There are provided an electron source apparatus capable of suppressing variations in electron emission state from electron-emitting devices even with an arrangement using spacers (9), and an image forming apparatus using the electron source apparatus. A plurality of row-direction wiring lines (8) and a plurality of column-direction wiring lines (6) are formed on a substrate (1) so as to cross each other. An electron-emitting device made up of device electrodes (2, 3), a conductive film (4), and an electron-emitting portion 5 is formed at each intersection between the row-direction wiring line (8) and the column-direction wiring line (6). The spacers (9) are arranged on some of the row-direction wiring lines (8). The column-direction wiring lines (6) are respectively connected to controlled constant current sources (221a, 221b, 221c) serving as current sources capable of outputting desired current values. The respective row-direction wiring lines (8) are connected to a voltage application means constituted by a voltage source (223) and a switching circuit (222) for selecting the row-direction wiring lines (8) while sequentially scanning them.
    • 提供了即使使用间隔物(9)的布置也能够抑制电子发射状态的电子发射状态的变化的电子源装置,以及使用该电子源装置的图像形成装置。 多个行方向布线(8)和多个列方向布线(6)形成在基板(1)上以便彼此交叉。 在行方向布线(8)和列方向(B)之​​间的每个交点处形成由器件电极(2,3),导电膜(4)和电子发射部分5构成的电子发射器件 接线(6)。 间隔件(9)布置在一些行方向布线(8)上。 列方向布线(6)分别与能够输出所需电流值的电流源的受控恒流源(221a,221b,221c)相连。 相应的行方向布线(8)连接到由电压源(223)和切换电路(222)构成的电压施加装置,用于在顺序地扫描行方向布线(8)的同时选择行方向布线(8)。
    • 4. 发明授权
    • Spacer structure having a surface which can reduce secondaries
    • 间隔结构具有可以减少二次的表面
    • US06809469B1
    • 2004-10-26
    • US09413774
    • 1999-10-07
    • Nobuhiro ItoHideaki Mitsutake
    • Nobuhiro ItoHideaki Mitsutake
    • H01J162
    • H01J9/242H01J29/028H01J29/864H01J31/127H01J2329/863H01J2329/8635H01J2329/864H01J2329/8645H01J2329/8655H01J2329/866
    • A spacer on which static electricity is restricted and an electron beam apparatus in which the spacer is provided. In the electron beam apparatus comprising an electron source provided with electron emission devices, a face plate provided with anodes and spacers installed between the electron source and the face plate, unevenness is formed on the surface of the spacer substrate, and further a thin film which has a smaller thickness than a roughness. This makes possible the restriction of incident angle multiplication coefficient for the primary electrons whose energy is lower than the second cross-point energy of a resistive film. The electron beam apparatus provided with the above spacer is excellent in display definition and long-term reliability since the displacement of light emission points and the creeping discharge accompanying the static electricity can be restricted due to the spacer.
    • 静电受限制的间隔物和设置间隔物的电子束装置。 在包括设置有电子发射装置的电子源的电子束装置中,设置有设置在电子源和面板之间的阳极和间隔物的面板在间隔基板的表面上形成不均匀性, 具有比粗糙度更小的厚度。 这使得对于能量低于电阻膜的第二交叉点能量的一次电子的入射角倍增系数的限制成为可能。 设置有上述间隔物的电子束装置由于间隔件而可以限制发光点的位移和伴随静电的沿面放电的显示定义和长期可靠性。
    • 5. 发明授权
    • Image forming apparatus for forming image by electron irradiation
    • 用于通过电子照射形成图像的图像形成装置
    • US06351065B2
    • 2002-02-26
    • US09049922
    • 1998-03-30
    • Koji YamazakiMasahiro FushimiHideaki Mitsutake
    • Koji YamazakiMasahiro FushimiHideaki Mitsutake
    • H01J162
    • H01J29/028H01J29/467H01J29/864H01J31/127H01J2329/864H01J2329/8645H01J2329/8655
    • A support member (20) for maintaining the distance between a face plate (30) and a rear plate (31) is interposed between the face plate (30) and the rear plate (31). An insulating film is formed on the support member (20) or its surface. An intermediate layer (21) is formed at a portion near the rear plate (31). The intermediate layer (21) is set at a low resistance and the same potential as that of the rear plate (31). As a result, an electron beam emitted from an electron-emitting portion near the support member (20) follows an orbit which is directed temporarily away from the support member and then comes close to the support member near the face plate (30) due to the steady charge-up of the support member. Then, the electron beam is irradiated on a defined position on the face plate (30).
    • 用于保持面板(30)和后板(31)之间的距离的支撑构件(20)插入在面板(30)和后板(31)之间。 在支撑构件(20)或其表面上形成绝缘膜。 中间层(21)形成在靠近后板(31)的部分。 中间层(21)被设定为与后板(31)相同的电阻和相同的电位。 结果,从支撑构件(20)附近的电子发射部分发射的电子束跟随着一个轨道,该轨道临时远离支撑构件,然后靠近靠近面板(30)的支撑构件,由于 支撑构件的稳定充电。 然后,将电子束照射在面板(30)上的限定位置上。