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    • 5. 发明申请
    • SIOx AND VAPOR DEPOSITION MATERIAL FOR BARRIER FILM AND NEGATIVE ELECTRODE ACTIVE MATERIAL FOR LITHIUM-ION SECONDARY BATTERY EACH USING THE SAME
    • 用于锂离子电池和负极电极活性材料的氧化物和蒸气沉积材料用于每次使用锂离子电池的锂离子二次电池
    • US20120181477A1
    • 2012-07-19
    • US13498731
    • 2010-10-04
    • Hideaki KannoShingo Kizaki
    • Hideaki KannoShingo Kizaki
    • H01M4/62
    • H01M4/62C01B33/113H01M4/131H01M4/485H01M10/0525
    • Provided is SiOx, wherein the amount of generated H2O gas detected in a temperature range of 200 to 800° C. in a temperature-programmed desorption gas analysis is 680 ppm or less. The amount of the generated H2O is desirably 420 ppm or less. In addition, in a graph obtained by X-ray diffraction, the peak intensity P1 at a Si peak point exhibited near 2θ=28° and the base intensity P2 at a peak point interpolated from the gradient of average intensities in the fore and aft positions near the peak point desirably satisfy (P1−P2)/P2≦0.2. This SiOx is used as a vapor deposition material, whereby the generation of splashing is suppressed in forming a film, and a vapor-deposited film having excellent gas barrier properties can be formed. In addition, this SiOx is used as a negative electrode active material, whereby high initial efficiency of a lithium-ion secondary battery can be maintained.
    • 提供SiOx,其中在温度程序化解吸气体分析中在200〜800℃的温度范围内检测到的产生的H 2 O气体的量为680ppm以下。 生成的H 2 O的量优选为420ppm以下。 此外,在通过X射线衍射获得的曲线图中,Si峰值处的峰强度P1表现为近似2θ= 28°,在从前后平均强度的梯度内插的峰值处的基极强度P2 峰值附近的位置优选满足(P1-P2)/P2≦̸0.2。 该SiO x用作气相沉积材料,从而在形成膜时抑制飞溅的产生,并且可以形成具有优异阻气性的气相沉积膜。 此外,该SiO x用作负极活性物质,由此可以保持锂离子二次电池的初始效率高。