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1. 发明授权

US08411252B2 Lithographic apparatus and device manufacturing method utilizing a substrate handler 有权
标题翻译：利用基板处理器的平版印刷设备和器件制造方法
公开(公告)号：US08411252B2
公开(公告)日：2013-04-02
申请号：US12639457
申请日：2009-12-16
申请人： Hernes Jacobs , Bernardus Antonius Johannes Luttikhuis , Harmen Klaas Van Der Schoot , Petrus Matthijs Henricus Vosters
发明人： Hernes Jacobs , Bernardus Antonius Johannes Luttikhuis , Harmen Klaas Van Der Schoot , Petrus Matthijs Henricus Vosters
IPC分类号： G03B27/58 , G03B27/52
CPC分类号： G03F7/7075 , G03F7/70691 , G03F7/70733 , G03F7/70791
摘要： A substrate handler is provided. The substrate handler includes a support surface configured to carry a substrate and a pre-conditioning unit configured to pre-condition the substrate. The substrate handler is configured to move the substrate relative to a substrate table.
摘要翻译：提供衬底处理器。衬底处理器包括被配置为承载衬底的支撑表面和被配置为预处理衬底的预调节单元。衬底处理器被配置为相对于衬底台移动衬底。

2. 发明授权

US08174680B2 Substrate handler, lithographic apparatus and device manufacturing method 有权
标题翻译：基板处理器，光刻设备和器件制造方法
公开(公告)号：US08174680B2
公开(公告)日：2012-05-08
申请号：US12512220
申请日：2009-07-30
申请人： Harmen Klaas Van Der Schoot , Hernes Jacobs , Bernardus Antonius Johannes Luttikhuis , Petrus Matthijs Henricus Vosters , Johannes Martinus Andreas Hazenberg , Aart Adrianus Van Beuzekom
发明人： Harmen Klaas Van Der Schoot , Hernes Jacobs , Bernardus Antonius Johannes Luttikhuis , Petrus Matthijs Henricus Vosters , Johannes Martinus Andreas Hazenberg , Aart Adrianus Van Beuzekom
IPC分类号： G03B27/58 , G03B27/52
CPC分类号： G03F7/70875 , G03F7/7075
摘要： An apparatus, method, and system is provided to condition a substrate. The apparatus can include a substrate handler, an array of diodes, and a projection system. The substrate handler can include a conditioning device, a float device, and a displacing device. The array of diodes can be configured to provide a patterned radiation beam, where the projection system projects the patterned radiation beam onto a target portion of a conditioned substrate.
摘要翻译：提供了一种装置，方法和系统来调节基板。该装置可以包括基板处理器，二极管阵列和投影系统。衬底处理器可以包括调节装置，浮子装置和置换装置。二极管阵列可以被配置为提供图案化的辐射束，其中投影系统将图案化的辐射束投影到经调理的基底的目标部分上。

3. 发明申请

US20100165319A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20100165319A1
公开(公告)日：2010-07-01
申请号：US12642627
申请日：2009-12-18
申请人： Hernes Jacobs , Noud Jan Gilissen , Hans Jansen , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Harmen Klaas Van Der Schoot , Marco Koert Stavenga , Bob Streefkerk , Peter Paul Steijaert , Marcus Martinus Petrus Adrianus Vermeulen , Jan Cornelis Van Der Hoeven
发明人： Hernes Jacobs , Noud Jan Gilissen , Hans Jansen , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Harmen Klaas Van Der Schoot , Marco Koert Stavenga , Bob Streefkerk , Peter Paul Steijaert , Marcus Martinus Petrus Adrianus Vermeulen , Jan Cornelis Van Der Hoeven
IPC分类号： G03B27/32
CPC分类号： G03F7/70341
摘要： An immersion lithographic projection apparatus is disclosed in which a liquid removal system surrounds a liquid supply system which provides liquid to a space between a projection system and a substrate. The liquid removal system is moveable relative to the liquid supply system and is controlled to have substantially zero velocity relative to the moving substrate table. The gap between the liquid supply system and the liquid removal system may be covered and the atmosphere between the liquid supply system and the liquid removal system above the substrate table may be maintained such that the vapor pressure of liquid is relatively high.
摘要翻译：公开了一种浸没式光刻投影装置，其中液体移除系统围绕向投影系统和基板之间的空间提供液体的液体供应系统。液体移除系统相对于液体供应系统是可移动的，并且被控制为相对于移动的基板台具有基本上零的速度。可以覆盖液体供应系统和液体移除系统之间的间隙，并且可以保持液体供应系统和衬底台之上的液体去除系统之间的气氛，使得液体的蒸汽压力相对较高。

4. 发明授权

US07595496B2 Optimized correction of wafer thermal deformations in a lithographic process 失效
标题翻译：光刻过程中晶片热变形的优化校正
公开(公告)号：US07595496B2
公开(公告)日：2009-09-29
申请号：US11812801
申请日：2007-06-21
申请人： Joost Jeroen Ottens , Harmen Klaas Van Der Schoot , Jeroen Pieter Starreveld , Wouterus Johannes Petrus Maria Maas , Willem Jurrianus Venema , Boris Menchtchikov
发明人： Joost Jeroen Ottens , Harmen Klaas Van Der Schoot , Jeroen Pieter Starreveld , Wouterus Johannes Petrus Maria Maas , Willem Jurrianus Venema , Boris Menchtchikov
IPC分类号： G21K5/00
CPC分类号： G03F7/70616 , G03F7/70783 , G03F7/70875
摘要： A method and apparatus of correcting thermally-induced field deformations of a lithographically exposed substrate, is presented herein. In one embodiment, the method includes exposing a pattern onto a plurality of fields of a substrate in accordance with pre-specified exposure information and measuring attributes of the fields to assess deformation of the fields induced by thermal effects of the exposing process. The method further includes determining corrective information based on the measured attributes, and adjusting the pre-specified exposure information, based on the corrective information, to compensate for the thermally-induced field deformations. Other embodiments include the use of predictive models to predict thermally-induced effects on the fields and thermographic imaging to determine temperature variations across a substrate.
摘要翻译：本文介绍了一种校正光刻曝光的基底的热诱导场变形的方法和装置。在一个实施例中，该方法包括根据预先指定的曝光信息将图案曝光到基板的多个场上，并测量场的属性以评估由曝光过程的热效应引起的场的变形。该方法还包括基于所测量的属性来确定校正信息，并且基于校正信息调整预定曝光信息，以补偿热诱导的场变形。其他实施例包括使用预测模型来预测对场的热诱导效应和热成像以确定跨越衬底的温度变化。

5. 发明授权

US07352438B2 Lithographic apparatus and device manufacturing method 失效
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07352438B2
公开(公告)日：2008-04-01
申请号：US11353232
申请日：2006-02-14
申请人： Bernardus Antonius Johannes Luttikhuis , Erik Roelof Loopsta , Harmen Klaas Van Der Schoot , Fransicus Mathijs Jacobs
发明人： Bernardus Antonius Johannes Luttikhuis , Erik Roelof Loopsta , Harmen Klaas Van Der Schoot , Fransicus Mathijs Jacobs
IPC分类号： G03B27/42 , G03B27/58
CPC分类号： G03B27/42 , G03F7/707 , G03F7/70783
摘要： The mask in a lithographic apparatus is clamped on a first side using a first clamping device and on a second side, different from the first side, using a second clamping device. The clamping forces are preferably applied using thin membranes. The first clamp clamps the substrate in directions parallel to the plane of the patterning device, perpendicular to the plane of the patterning device and rotationally. The second clamping device clamps the patterning device only in directions parallel to the plane of the substrate.
摘要翻译：光刻设备中的掩模使用第一夹紧装置夹紧在第一侧上，并使用第二夹紧装置夹紧在不同于第一侧的第二侧上。夹紧力优选使用薄膜施加。第一夹具将基板平行于图案形成装置的平面垂直于图案形成装置的平面并旋转夹紧基板。第二夹紧装置仅在平行于基板的平面的方向上夹持图案形成装置。

6. 再颁专利

USRE40043E1 Positioning device having two object holders 失效
标题翻译：具有两个物体支架的定位装置
公开(公告)号：USRE40043E1
公开(公告)日：2008-02-05
申请号：US10347491
申请日：1998-02-27
申请人： Yim-Bun Patrick Kwan , Gerrit Maarten Bonnema , Erik Roelof Loopstra , Harmen Klaas Van Der Schoot , Gerjan Peter Veldhuis
发明人： Yim-Bun Patrick Kwan , Gerrit Maarten Bonnema , Erik Roelof Loopstra , Harmen Klaas Van Der Schoot , Gerjan Peter Veldhuis
IPC分类号： G03B27/42 , G03B11/00
CPC分类号： G03F7/70733 , B23Q1/621 , B23Q1/623 , B23Q11/0032 , G03F7/70716 , G03F7/70741 , G03F7/7075 , G03F7/709 , H01L21/682
摘要： A positioning device has first and second object holders that are guided over a guiding surface extending parallel to an X-direction and parallel to a Y-direction perpendicular to the X-direction and which are displaceable over the guiding surface from a first position into a second position by means of a displacement system. The displacement system includes a first displacement unit and a second displacement unit to which the object holders can be alternately coupled. The first displacement unit is suitable for carrying out a first series of positioning steps of the first object holder in the first position and for displacing the first object holder from the first position into an intermediate position between the first and second positions. The second displacement unit is suitable for carrying out a second series of positioning steps of the second object holder in the second position, simultaneously with and independently of the first displacement unit, and for displacing the second object holder from the second position into the intermediate position. In the intermediate position, the object holders are exchanged, after which the first series of positioning steps can be carried out by the first displacement unit with the second object holder in the first position and the second series of positioning steps can be carried out by the second displacement unit with the first object holder in the second position. The positioning device is suitable for use in a lithographic device to carry out an exposure process with a first semiconductor substrate in an exposure position and, simultaneously therewith and independently thereof, a characterization process with a second semiconductor substrate in a characterization position.
摘要翻译：定位装置具有第一和第二物体保持器，所述第一和第二物体保持器被引导到平行于X方向并且平行于与X方向垂直的Y方向延伸的引导表面，并且可以在引导表面上从第一位置移动到通过位移系统的第二位置。位移系统包括第一位移单元和第二位移单元，物体保持器可以交替地联接到该位移单元。第一位移单元适于在第一位置执行第一物体保持器的第一系列定位步骤，并且用于将第一物体保持器从第一位置移动到第一位置和第二位置之间的中间位置。第二位移单元适于在与第一位移单元同时且独立于第二位置执行第二对象保持器的第二系列定位步骤，并且用于将第二物体保持器从第二位置移动到中间位置。在中间位置，更换物体保持器，之后可以通过第一位移单元执行第一系列定位步骤，使第二物体保持器处于第一位置，并且第二系列定位步骤可以由第二位移单元，其中第一对象保持器处于第二位置。该定位装置适用于光刻设备，以在曝光位置中与第一半导体衬底进行曝光处理，并且同时进行曝光处理，并且独立于此，具有表征位置的第二半导体衬底的表征过程。

7. 发明授权

US07088428B2 Lithographic actuator mechanism, lithographic apparatus, and device manufacturing method 有权
标题翻译：光刻致动器机构，光刻设备和器件制造方法
公开(公告)号：US07088428B2
公开(公告)日：2006-08-08
申请号：US10797618
申请日：2004-03-11
申请人： Sven Antoin Johan Hol , Edwin Johan Buis , Harmen Klaas Van Der Schoot , Patricia Vreugdewater
发明人： Sven Antoin Johan Hol , Edwin Johan Buis , Harmen Klaas Van Der Schoot , Patricia Vreugdewater
IPC分类号： G03B27/42 , G03B27/62 , G03B27/58
CPC分类号： G03F7/70858 , G03F7/70758 , H02K9/22 , H02K41/0356
摘要： Lorentz actuators generate heat due to electrical dissipation in the field coils. As the field through the coils changes, eddy currents are induced in cooling elements leading to undesirable damping forces and heating. The present invention provides an improved design that reduces eddy currents by incorporating slits in the cooling element. Slits are preferably perpendicular to the induced electric field and parallel to each other, and reduce the magnitude of the eddy currents by forcing them to take paths of higher electrical resistance.
摘要翻译：洛仑兹致动器由于场线圈中的电耗而产生热量。当通过线圈的场变化时，在冷却元件中引起涡流，导致不期望的阻尼力和加热。本发明提供了一种改进的设计，其通过在冷却元件中引入狭缝来减少涡流。狭缝优选垂直于感应电场并且彼此平行，并且通过迫使它们采取更高电阻的路径来减小涡流的大小。

8. 发明授权

US07064808B1 Substrate carrier and method for making a substrate carrier 有权
标题翻译：基板载体和制造基板载体的方法
公开(公告)号：US07064808B1
公开(公告)日：2006-06-20
申请号：US10829462
申请日：2004-04-22
申请人： Noud Jan Gilissen , Joost Jeroen Ottens , Harmen Klaas Van Der Schoot , Petrus Matthijs Henricus Vosters
发明人： Noud Jan Gilissen , Joost Jeroen Ottens , Harmen Klaas Van Der Schoot , Petrus Matthijs Henricus Vosters
IPC分类号： G03B27/58 , G03B27/62
CPC分类号： G03F7/707 , G03F7/70716
摘要： A carrier for carrying a lithographic substrate or a lithographic patterning means. The carrier comprises a first member provided with an open hollow structure that is open to at least one side of the member. The carrier further comprises a second member connected to the first member, such that a closed hollow internal structure is formed between the carrier members.
摘要翻译：用于承载光刻基板或平版印刷图案形成装置的载体。载体包括设置有开口中空结构的第一构件，其向构件的至少一侧开口。载体还包括连接到第一构件的第二构件，使得在载体构件之间形成封闭的中空内部结构。

9. 发明授权

US09395630B2 Lithographic apparatus and method 有权
标题翻译：平版印刷设备和方法
公开(公告)号：US09395630B2
公开(公告)日：2016-07-19
申请号：US13704222
申请日：2011-03-17
申请人： Andrei Mikhailovich Yakunin , Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Harmen Klaas Van Der Schoot , Lucas Henricus Johannes Stevens , Maarten Van Kampen
发明人： Andrei Mikhailovich Yakunin , Vadim Yevgenyevich Banine , Erik Roelof Loopstra , Harmen Klaas Van Der Schoot , Lucas Henricus Johannes Stevens , Maarten Van Kampen
IPC分类号： G03F7/20 , B82Y10/00 , B82Y40/00 , C01B31/04 , G02B5/08 , G02B5/20 , G02B27/00 , G03F1/24 , G03F1/62 , G21K1/06 , H01B1/04 , H01B1/24 , G03B27/54
CPC分类号： G03F1/64 , B82Y10/00 , B82Y40/00 , C01B32/20 , G02B5/0816 , G02B5/0891 , G02B5/204 , G02B5/208 , G02B27/0006 , G03B27/54 , G03F1/24 , G03F1/62 , G03F7/70058 , G03F7/702 , G03F7/70916 , G03F7/70958 , G03F7/70983 , G21K1/062 , G21K2201/061 , H01B1/04 , H01B1/24
摘要： A lithographic apparatus includes a radiation source configured to produce a radiation beam, and a support configured to support a patterning device. The patterning device is configured to impart the radiation beam with a pattern to form a patterned radiation beam. A chamber is located between the radiation source and patterning device. The chamber contains at least one optical component configured to reflect the radiation beam, and is configured to permit radiation from the radiation source to pass therethrough. A membrane is configured to permit the passage of the radiation beam, and to prevent the passage of contamination particles through the membrane. A particle trapping structure is configured to permit gas to flow along an indirect path from inside the chamber to outside the chamber. The indirect path is configured to substantially prevent the passage of contamination particles from inside the chamber to outside the chamber.
摘要翻译：光刻设备包括被配置为产生辐射束的辐射源和被配置为支撑图案形成装置的支撑件。图案形成装置被配置为使辐射束具有图案以形成图案化的辐射束。腔室位于辐射源和图案形成装置之间。所述腔室包括被配置为反射辐射束的至少一个光学部件，并且被配置为允许来自辐射源的辐射通过。膜被配置为允许辐射束的通过，并且防止污染颗粒通过膜的通过。颗粒捕获结构被配置为允许气体沿着室内的间接路径流动到室外。间接路径被配置为基本上防止污染颗粒从腔室内部通到室外。

10. 发明授权

US08781775B2 Lithographic apparatus and method for correcting a position of a stage of a lithographic apparatus 有权
标题翻译：用于校正光刻设备的台阶位置的光刻设备和方法
公开(公告)号：US08781775B2
公开(公告)日：2014-07-15
申请号：US13018226
申请日：2011-01-31
申请人： Hans Butler , Emiel Jozef Melanie Eussen , Willem Herman Gertruda Anna Koenen , Engelbertus Antonius Fransiscus Van Der Pasch , Harmen Klaas Van Der Schoot , Marc Wilhelmus Maria Van Der Wijst , Marcus Martinus Petrus Adrianus Vermeulen , Cornelius Adrianus Lambertus De Hoon
发明人： Hans Butler , Emiel Jozef Melanie Eussen , Willem Herman Gertruda Anna Koenen , Engelbertus Antonius Fransiscus Van Der Pasch , Harmen Klaas Van Der Schoot , Marc Wilhelmus Maria Van Der Wijst , Marcus Martinus Petrus Adrianus Vermeulen , Cornelius Adrianus Lambertus De Hoon
IPC分类号： G01C17/38
CPC分类号： G03F7/70775 , G03F7/70516 , G03F7/70758 , G03F7/70783
摘要： A lithographic apparatus includes a stage to hold an object, the stage being moveable relative to a reference structure in a motion range; a magnet structure to provide a spatially varying magnetic field in at least a part of the motion range, the magnet structure being moveable relative to the reference structure and the stage; a first position measurement system to provide a first measurement signal corresponding to a position of the stage and/or the object in a measurement direction relative to the reference structure; a second position measurement system to provide a second measurement signal corresponding to a position of the stage relative to the magnet structure; and a data processor to correct the first measurement signal with a value dependent on the second measurement signal to provide a corrected first measurement signal representative of the position of the stage and/or the object relative to the reference structure in the measurement direction.
摘要翻译：光刻设备包括用于保持物体的平台，所述平台相对于基准结构在运动范围内可移动; 磁体结构，用于在所述运动范围的至少一部分中提供空间变化的磁场，所述磁体结构可相对于所述参考结构和所述平台移动; 第一位置测量系统，用于相对于参考结构在测量方向上提供对应于舞台和/或物体的位置的第一测量信号; 第二位置测量系统，用于提供对应于舞台相对于磁体结构的位置的第二测量信号; 以及数据处理器，用取决于所述第二测量信号的值来校正所述第一测量信号，以在所述测量方向上提供表示所述平台和/或所述对象相对于所述参考结构的位置的校正的第一测量信号。

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