专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20060060991A1 Method and apparatus for controlled transient cavitation 审中-公开
标题翻译：用于控制瞬态空化的方法和装置
公开(公告)号：US20060060991A1
公开(公告)日：2006-03-23
申请号：US11233437
申请日：2005-09-21
申请人： Frank Holsteyns , Kuntack Lee
发明人： Frank Holsteyns , Kuntack Lee
IPC分类号： B01F3/04
CPC分类号： B08B3/02 , B08B3/12 , B08B2203/0288 , G10K15/043 , H01L21/02052 , H01L21/67051 , H01L21/67057 , Y10S134/902
摘要： The invention relates to a method for creating transient cavitation comprising the steps of creating gas bubbles having a range of bubble sizes in a liquid, creating an acoustic field and subjecting the liquid to the acoustic field, characterized in that the range of bubble sizes and/or the characteristics of the acoustic field are selected to tune them to each other, thereby controlling transient cavitation in the selected range of bubble sizes. It also relates to an apparatus suitable for performing the method according to the invention.
摘要翻译：本发明涉及一种用于产生瞬时空化的方法，包括以下步骤：产生具有液体中气泡尺寸范围的气泡，产生声场并使液体经受声场，其特征在于，气泡尺寸和/ 或者选择声场的特性来使它们彼此调谐，从而控制在所选择的气泡尺寸范围内的瞬时空化。它还涉及适用于执行根据本发明的方法的装置。

2. 发明申请

US20130019893A1 ULTRASONIC CLEANING METHOD AND APPARATUS 有权
标题翻译：超声波清洗方法和装置
公开(公告)号：US20130019893A1
公开(公告)日：2013-01-24
申请号：US13188688
申请日：2011-07-22
申请人： Frank HOLSTEYNS , Alexander LIPPERT , Christian DEGEL , Anette JAKOB , Franz Josef BECKER
发明人： Frank HOLSTEYNS , Alexander LIPPERT , Christian DEGEL , Anette JAKOB , Franz Josef BECKER
IPC分类号： B08B3/12 , H01L21/00
CPC分类号： B08B3/12 , B06B3/00 , H01L21/02052 , H01L21/67051 , H01L21/67057
摘要： A device and method for treating the surface of a semiconductor wafer provides a treatment fluid in the form of a dispersion of gas bubbles in a treatment liquid generated at acoustic pressures less than those required to induce cavitation in the treatment liquid. A resonator supplies ultrasonic or megasonic energy to the treatment fluid and is configured to create an interference pattern in the treatment fluid comprising regions of pressure amplitude minima and maxima at an interface of the treatment fluid and the semiconductor wafer.
摘要翻译：用于处理半导体晶片的表面的装置和方法提供处于以低于在处理液体中引起空化所需的声压下产生的处理液中的气泡分散形式的处理流体。谐振器向处理流体提供超声波或兆声波能量，并且被配置为在处理流体中产生干涉图案，所述干涉图案包括处理流体和半导体晶片的界面处的压力幅度最小值和最大值的区域。

3. 发明授权

US07527698B2 Method and apparatus for removing a liquid from a surface of a substrate 有权
标题翻译：从基板的表面去除液体的方法和装置
公开(公告)号：US07527698B2
公开(公告)日：2009-05-05
申请号：US10430489
申请日：2003-05-06
申请人： Frank Holsteyns , Marc Heyns , Paul W. Mertens
发明人： Frank Holsteyns , Marc Heyns , Paul W. Mertens
IPC分类号： B08B3/04
CPC分类号： H01L21/02052 , H01L21/67051 , H01L21/6708 , Y10S134/902
摘要： A method and apparatus for removing a first liquid from a surface of a substrate is provided. A second liquid is supplied to at least part of a surface of a substrate having a rotary movement. The rotary movement has a center of rotation and an edge of rotation. The second liquid is directed from the center of rotation to the edge of rotation using a nozzle. A dry zone is created on the substrate as the position of the spray moves from the center of rotation to the edge of rotation. As a result, the first liquid and the second liquid are removed from the surface of the substrate.
摘要翻译：提供了从基板的表面去除第一液体的方法和装置。将第二液体供给到具有旋转运动的基板的表面的至少一部分。旋转运动具有旋转中心和旋转边缘。使用喷嘴将第二液体从旋转中心引导到旋转边缘。随着喷雾的位置从旋转中心移动到旋转边缘，在基底上形成干燥区域。结果，从基板的表面去除第一液体和第二液体。

4. 发明授权

US08551251B2 Ultrasonic treatment method and apparatus 有权
标题翻译：超声波处理方法及装置
公开(公告)号：US08551251B2
公开(公告)日：2013-10-08
申请号：US13096809
申请日：2011-04-28
申请人： Frank Holsteyns , Alexander Lippert
发明人： Frank Holsteyns , Alexander Lippert
IPC分类号： B08B3/12
CPC分类号： H01L21/02052 , C25D5/20 , C25D7/12 , C25D17/001 , H01L21/2885 , H01L21/67051
摘要： Improved methods and apparatus for cleaning substrates and enhancing diffusion limited reaction at substrate surfaces use piezoelectric transducers operating in the gigasonic domain. The resonator assemblies include plural transducer stacks each including a thin film piezoelectric element coupled to a resonator plate that faces the substrate. At the disclosed frequencies and powers used, Eckart or Rayleigh streaming can be induced in a liquid treatment medium without substantial generation of cavitation.
摘要翻译：用于清洁衬底和增强衬底表面扩散限制反应的改进方法和装置使用在声音域中工作的压电换能器。谐振器组件包括多个换能器堆叠，每个换能器堆叠包括耦合到面向衬底的谐振器板的薄膜压电元件。在所公开的使用的频率和功率下，可以在液体处理介质中诱导Eckart或瑞利流，而不产生大量空化。

5. 发明授权

US08486199B2 Ultrasonic cleaning method and apparatus 有权
标题翻译：超声波清洗方法及装置
公开(公告)号：US08486199B2
公开(公告)日：2013-07-16
申请号：US13188688
申请日：2011-07-22
申请人： Frank Holsteyns , Alexander Lippert , Christian Degel , Anette Jakob , Franz Josef Becker
发明人： Frank Holsteyns , Alexander Lippert , Christian Degel , Anette Jakob , Franz Josef Becker
IPC分类号： B08B3/12
CPC分类号： B08B3/12 , B06B3/00 , H01L21/02052 , H01L21/67051 , H01L21/67057
摘要： A device and method for treating the surface of a semiconductor wafer provides a treatment fluid in the form of a dispersion of gas bubbles in a treatment liquid generated at acoustic pressures less than those required to induce cavitation in the treatment liquid. A resonator supplies ultrasonic or megasonic energy to the treatment fluid and is configured to create an interference pattern in the treatment fluid comprising regions of pressure amplitude minima and maxima at an interface of the treatment fluid and the semiconductor wafer.
摘要翻译：用于处理半导体晶片的表面的装置和方法提供处于以低于在处理液体中引起空化所需的声压下产生的处理液中的气泡分散形式的处理流体。谐振器向处理流体提供超声波或兆声波能量，并且被配置为在处理流体中产生干涉图案，所述干涉图案包括处理流体和半导体晶片的界面处的压力幅度最小值和最大值的区域。

6. 发明申请

US20120273363A1 ULTRASONIC TREATMENT METHOD AND APPARATUS 有权
标题翻译：超声处理方法和装置
公开(公告)号：US20120273363A1
公开(公告)日：2012-11-01
申请号：US13096809
申请日：2011-04-28
申请人： Frank HOLSTEYNS , Alexander LIPPERT
发明人： Frank HOLSTEYNS , Alexander LIPPERT
IPC分类号： H01L21/306 , C25D5/00 , C25D7/12 , B08B3/12
CPC分类号： H01L21/02052 , C25D5/20 , C25D7/12 , C25D17/001 , H01L21/2885 , H01L21/67051
摘要： Improved methods and apparatus for cleaning substrates and enhancing diffusion limited reaction at substrate surfaces use piezoelectric transducers operating in the gigasonic domain. The resonator assemblies include plural transducer stacks each including a thin film piezoelectric element coupled to a resonator plate that faces the substrate. At the disclosed frequencies and powers used, Eckart or Rayleigh streaming can be induced in a liquid treatment medium without substantial generation of cavitation.
摘要翻译：用于清洁衬底和增强衬底表面扩散限制反应的改进方法和装置使用在声音域中工作的压电换能器。谐振器组件包括多个换能器堆叠，每个换能器堆叠包括耦合到面向衬底的谐振器板的薄膜压电元件。在所公开的使用的频率和功率下，可以在液体处理介质中诱导Eckart或瑞利流，而不产生大量空化。

7. 发明授权

US08202369B2 Method and apparatus for controlled transient cavitation 有权
标题翻译：用于控制瞬态空化的方法和装置
公开(公告)号：US08202369B2
公开(公告)日：2012-06-19
申请号：US12119313
申请日：2008-05-12
申请人： Frank Holsteyns , Kuntack Lee
发明人： Frank Holsteyns , Kuntack Lee
IPC分类号： B08B7/04 , B08B7/00 , B08B7/02
CPC分类号： B08B3/02 , B08B3/12 , B08B2203/0288 , G10K15/043 , H01L21/02052 , H01L21/67051 , H01L21/67057 , Y10S134/902
摘要： Methods and apparatus for creating and controlling transient cavitation are disclosed. An example method includes selecting a range of bubble sizes to be created in a liquid and selecting characteristics for an acoustic field to be applied to the liquid. The method further includes creating gas bubbles of the selected range of bubble sizes in the liquid, creating an acoustic field with the selected characteristics and subjecting the liquid to the acoustic field. In the example method, at least one of the range of bubble sizes and the characteristics of the acoustic field is selected in correspondence with the other so as to control transient cavitation in the liquid for the selected range of bubble sizes. Particularly, the methods and apparatus may be used for the cleaning of a surface, such as a semiconductor substrate.
摘要翻译：公开了用于创建和控制瞬时空化的方法和装置。一个示例性方法包括选择要在液体中产生的气泡大小的范围，并选择要施加到液体的声场的特性。该方法还包括在液体中产生气泡尺寸选定范围的气泡，产生具有选定特性的声场并使液体经受声场。在该示例性方法中，气泡尺寸范围和声场的特性中的至少一个与另一个对应地选择，以便在所选择的气泡尺寸范围内控制液体中的瞬时空化。特别地，所述方法和装置可用于清洁表面，例如半导体衬底。

8. 发明申请

US20080276960A1 Method and Apparatus for Controlled Transient Cavitation 有权
标题翻译：控制瞬态气蚀的方法和装置
公开(公告)号：US20080276960A1
公开(公告)日：2008-11-13
申请号：US12119313
申请日：2008-05-12
申请人： Frank Holsteyns , Kuntack Lee
发明人： Frank Holsteyns , Kuntack Lee
IPC分类号： B08B3/12 , C25F3/30 , B01D47/02 , A01G31/06
CPC分类号： B08B3/02 , B08B3/12 , B08B2203/0288 , G10K15/043 , H01L21/02052 , H01L21/67051 , H01L21/67057 , Y10S134/902
摘要： The invention relates to a method for creating transient cavitation comprising the steps of creating gas bubbles having a range of bubble sizes in a liquid, creating an acoustic field and subjecting the liquid to the acoustic field, characterized in that the range of bubble sizes and/or the characteristics of the acoustic field are selected to tune them to each other, thereby controlling transient cavitation in the selected range of bubble sizes. It also relates to an apparatus suitable for performing the method according to the invention.
摘要翻译：本发明涉及一种用于产生瞬时空化的方法，包括以下步骤：产生具有液体中气泡尺寸范围的气泡，产生声场并使液体经受声场，其特征在于，气泡尺寸和/ 或者选择声场的特性来使它们彼此调谐，从而控制在所选择的气泡尺寸范围内的瞬时空化。它还涉及适用于执行根据本发明的方法的装置。

9. 发明授权

US07016028B2 Method and apparatus for defect detection 有权
标题翻译：缺陷检测方法和装置
公开(公告)号：US07016028B2
公开(公告)日：2006-03-21
申请号：US10458405
申请日：2003-06-09
申请人： Frank Holsteyns , Francesca Iacopi , Karen Maex
发明人： Frank Holsteyns , Francesca Iacopi , Karen Maex
IPC分类号： G01N21/88
CPC分类号： H01L22/24 , G01N21/8422 , G01N21/9501
摘要： A method for determining the presence of defects in a covering layer overlying an underlying layer in accordance with an embodiment of the invention comprises providing a substrate comprising the covering layer, where the covering layer is at least partially exposed. The covering layer is subjected to a first substance, such as a solvent, and then subjected to a light beam. An optical property of the covering layer is determined and compared with a threshold value. The presence of defects in the covering layer is determined by the difference of the optical property from the threshold value, where the optical property indicates a level of penetration of the first substance through the covering layer.
摘要翻译：根据本发明的实施例的用于确定覆盖层的覆盖层中的缺陷的存在的方法包括提供包括覆盖层的基底，其中覆盖层至少部分地暴露。将覆盖层经受第一物质，例如溶剂，然后经受光束。确定覆盖层的光学特性并将其与阈值进行比较。覆盖层中的缺陷的存在由光学性质与阈值的差异决定，其中光学特性表示第一物质穿过覆盖层的穿透水平。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式