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    • 2. 发明申请
    • EMBEDDED MEMORY SYSTEM
    • 嵌入式存储系统
    • US20120233401A1
    • 2012-09-13
    • US13043334
    • 2011-03-08
    • Hsingho LIUFuja SHONEChuang CHENGYu-Shuen TANG
    • Hsingho LIUFuja SHONEChuang CHENGYu-Shuen TANG
    • G06F12/00
    • G06F13/1605
    • An embedded memory system is disclosed. A main interface is configured to communicate with an electronic system via a main bus. A memory-sharing auxiliary interface is configured to communicate with the electronic system via a memory-sharing auxiliary bus. An arbiter is configured to arbitrate among the main interface, the memory-sharing auxiliary interface, a primary memory, and a secondary memory. Accordingly, the electronic system is capable of sharing either the primary memory or the secondary memory via the memory-sharing auxiliary interface and the memory-sharing auxiliary bus, and the embedded memory system is capable of sharing a system memory of the electronic system via the memory-sharing auxiliary interface and the memory-sharing auxiliary bus.
    • 公开了一种嵌入式存储器系统。 主界面被配置为经由主总线与电子系统进行通信。 存储器共享辅助接口被配置为经由存储器共享辅助总线与电子系统通信。 仲裁器被配置为在主界面,存储器共享辅助接口,主存储器和辅助存储器之间进行仲裁。 因此,电子系统能够经由存储器共享辅助接口和存储器共享辅助总线共享主存储器或辅助存储器,并且嵌入式存储器系统能够经由该存储器共享辅助总线共享电子系统的系统存储器 内存共享辅助接口和内存共享辅助总线。
    • 6. 发明申请
    • METHOD OF WEAR LEVELING FOR NON-VOLATILE MEMORY
    • 非易失性存储器的磨损方法
    • US20090259819A1
    • 2009-10-15
    • US12100136
    • 2008-04-09
    • YEN MING CHENSHIH CHIEH TAIYUNG LI JICHIH NAN YENFUJA SHONE
    • YEN MING CHENSHIH CHIEH TAIYUNG LI JICHIH NAN YENFUJA SHONE
    • G06F12/02G06F13/00G06F12/00
    • G06F13/4239
    • A method of wear leveling for a non-volatile memory is performed as follows. First, the non-volatile memory is divided into a plurality of zones including at least a first zone and a second zone. The first zone is written and/or erased in which one or more logical blocks have higher writing hit rate, and therefore the corresponding physical blocks in the first zone will be written more often. The next step is to find one or more free physical blocks in second zone. The physical blocks of the first zone are replaced by the physical blocks of the second zone if the number of write and/or erase to the first zone exceeds a threshold number. The replacement of physical blocks in the first zone by the physical blocks in the second zone may include the steps of copying data from the physical blocks in the first zone to the physical block in the second zone, and changing the pointer of logical blocks to point to the physical blocks in the second zone.
    • 如下执行用于非易失性存储器的磨损均衡的方法。 首先,非易失性存储器被分成包括至少第一区域和第二区域的多个区域。 写入和/或擦除第一区域,其中一个或多个逻辑块具有较高的写入命中率,因此第一区域中相应的物理块将被更频繁地写入。 下一步是在第二个区域中找到一个或多个空闲的物理块。 如果第一区的写入次数和/或擦除次数超过阈值,则第一区的物理块被第二区的物理块替换。 通过第二区域中的物理块来替换第一区域中的物理块可以包括以下步骤:将数据从第一区域中的物理块复制到第二区域中的物理块,并将逻辑块的指针改变为点 到第二区的物理块。
    • 7. 发明授权
    • Method of programming a nonvolatile memory cell and related memory array
    • 非易失性存储单元和相关存储器阵列的编程方法
    • US07499336B2
    • 2009-03-03
    • US11748459
    • 2007-05-14
    • Yi-Ching LiuI-Long LeeMing-Hung ChouFuja Shone
    • Yi-Ching LiuI-Long LeeMing-Hung ChouFuja Shone
    • G11C16/04
    • G11C16/0458G11C16/12
    • A programming method for programming stored bits in floating gates of a flash memory cell or selected flash memory cells of a flash memory array is utilized for applying SSI injection on said flash memory cell or said selected flash memory cells of a flash memory array is disclosed. Constant charges at the drain regions of said flash memory cell or said selected flash memory cells of the flash memory array is implemented with a capacitor and a related switch for suppressing variant injected-charges-related properties in applying the SSI injection. A constant biasing current, which may be implemented with a constant current source or a current mirror equipped with a constant current source, is applied on source regions of said flash memory cell or said selected flash memory cells of the flash memory array for enhancing the suppression of said variant biasing properties.
    • 用于对闪速存储器单元的浮动栅极中的存储位进行编程的闪存存储器阵列的选定闪存单元的编程方法被用于在所述闪速存储器单元上施加SSI注入或者闪存阵列的所选闪存单元。 闪速存储器阵列的所述闪速存储器单元或所选闪存单元的漏极区域的恒定电荷用电容器和相关开关来实现,用于在应用SSI注入时抑制变型注入电荷相关的特性。 可以用恒定电流源或配备有恒定电流源的电流镜来实现的恒定偏置电流被施加在闪速存储器单元的所述闪速存储器单元的所述闪存单元的所述源区域上,或者用于增强抑制 的所述变体偏置属性。
    • 9. 发明申请
    • Non-volatile memory array having vertical transistors and manufacturing method thereof
    • 具有垂直晶体管的非易失性存储器阵列及其制造方法
    • US20050148173A1
    • 2005-07-07
    • US10750893
    • 2004-01-05
    • Fuja Shone
    • Fuja Shone
    • H01L21/44H01L21/8246H01L21/8247H01L27/115
    • H01L27/112H01L27/115H01L27/11556
    • A method of manufacturing a non-volatile memory array having vertical field effect transistors is revealed. First, a semiconductor substrate having multiple trenches is provided, and then dopants are implanted into the semiconductor substrate to form first doping regions and second doping regions respectively serving as source and drain bit lines at different heights. Secondly, a gate dielectric including at least one nitride film, e.g., an oxide/nitride/oxide (ONO) layer, is formed onto the surface of the semiconductor substrate, and polysilicon plugs serving as gate electrodes are filled up the multiple trenches afterward. After that, a polysilicon layer and a tungsten silicide (WiSix) layer are sequentially deposited followed by masking and etching processes to form parallel polycide lines serving as word lines, and then an oxide layer is deposited therebetween and planarized for isolation.
    • 揭示了制造具有垂直场效应晶体管的非易失性存储器阵列的方法。 首先,提供具有多个沟槽的半导体衬底,然后将掺杂剂注入到半导体衬底中,以形成分别用作不同高度的源极和漏极位线的第一掺杂区域和第二掺杂区域。 其次,在半导体衬底的表面上形成包括至少一个氮化物膜,例如氧化物/氮化物/氧化物(ONO)层的栅极电介质,并且用作栅电极的多晶硅栓随后填充多个沟槽。 之后,依次沉积多晶硅层和硅化钨(WiSix)层,然后进行掩模和蚀刻工艺,以形成平行的多余线,用作字线,然后在其间沉积氧化物层并进行平面化以进行隔离。