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1. 发明申请

US20100222526A1 METHOD FOR PRODUCING A COPOLYMER FOR PHOTORESIST 有权
标题翻译：用于生产光电聚合物的共聚物的方法
公开(公告)号：US20100222526A1
公开(公告)日：2010-09-02
申请号：US12702356
申请日：2010-02-09
申请人： Tomo Oikawa , Eiichi Ikawa
发明人： Tomo Oikawa , Eiichi Ikawa
IPC分类号： C08F2/00 , C08G63/08 , C08G65/00 , C08G73/00 , C08G65/34 , C08G73/24
CPC分类号： C08F2/06 , C08F2/00 , C08F220/28
摘要： The present invention provides a method for production of a copolymer for photoresists in which the bias of the monomer composition ration is small. This method for production is a method for production of a copolymer for photoresists, which copolymer containing at least two types of repeating units, the method having a supplying step of supplying a monomer solution and a solution containing a polymerization initiator into a polymerization reaction system, wherein the range of fluctuation of the monomer composition ratio of unreacted monomers is within the range between minus 15% and plus 15% or the standard deviation of the monomer composition ratio of unreacted monomers is within 2 in the polymerization reaction system during the period from the start of the polymerization reaction to the end of supplying of the monomer solution.
摘要翻译：本发明提供一种制备光聚合物共聚物的方法，其中单体组成比例的偏差小。该制造方法是制造光致抗蚀剂共聚物的方法，该共聚物含有至少两种重复单元，该方法具有将单体溶液和含有聚合引发剂的溶液供给到聚合反应体系中的供给工序，其中未反应单体的单体组成比的波动范围在-15％和15％之间的范围内，或者在聚合反应体系中未反应单体的单体组成比的标准偏差在2以内的范围内开始聚合反应直到单体溶液的供应结束。

2. 发明授权

US5864475A Power converter 失效
标题翻译：电源转换器
公开(公告)号：US5864475A
公开(公告)日：1999-01-26
申请号：US982354
申请日：1997-12-02
申请人： Eiichi Ikawa , Akira Kawaguchi
发明人： Eiichi Ikawa , Akira Kawaguchi
IPC分类号： H02M1/06 , H02M1/08 , H02M1/088 , H02M7/12 , H02M7/155 , H02M7/515 , H02M1/22 , H02M7/521
CPC分类号： H02M1/34 , H02M1/088 , H02M2001/0006 , H02M2001/346 , H02M2007/4835 , H03K2217/0081 , Y02B70/1491
摘要： The power converter extracts the accumulated energy accumulated in a snubber capacitor (a first capacitor) from the second capacitor in a series circuit, composed of a second capacitor and a diode, which is provided in parallel with that snubber capacitor, and uses it as the driving power source for a self-turn-off-semiconductor device.
摘要翻译：功率转换器从与第二电容器组成的串联电路中的缓冲电容器（第一电容器）中累积的累积能量提取，该串联电路由与该缓冲电容器并联设置的第二电容器和二极管组成，并将其用作用于自关断半导体器件的驱动电源。

3. 发明授权

US09141122B2 Photovoltaic power generation system 有权
标题翻译：光伏发电系统
公开(公告)号：US09141122B2
公开(公告)日：2015-09-22
申请号：US13594020
申请日：2012-08-24
申请人： Eiichi Ikawa , Naoki Fujiwara , Takashi Oozeki , Kyungsoo Lee
发明人： Eiichi Ikawa , Naoki Fujiwara , Takashi Oozeki , Kyungsoo Lee
IPC分类号： G06F1/26 , G05F1/67
CPC分类号： G05F1/67 , Y02E10/58
摘要： A photovoltaic power generation system includes a photovoltaic array including photovoltaic modules, the photovoltaic power generation system further includes a control apparatus configured to display output characteristics of the photovoltaic array and power generating conditions of the photovoltaic array in synchronization.
摘要翻译：光伏发电系统包括包括光伏模块的光伏阵列，光伏发电系统还包括配置成同步显示光伏阵列的输出特性和光电阵列的发电条件的控制装置。

4. 发明申请

US20130054037A1 PHOTOVOLTAIC POWER GENERATION SYSTEM 有权
标题翻译：光伏发电系统
公开(公告)号：US20130054037A1
公开(公告)日：2013-02-28
申请号：US13594020
申请日：2012-08-24
申请人： Eiichi IKAWA , Naoki Fujiwara , Takashi Oozeki , Kyungsoo Lee
发明人： Eiichi IKAWA , Naoki Fujiwara , Takashi Oozeki , Kyungsoo Lee
IPC分类号： G06F1/26
CPC分类号： G05F1/67 , Y02E10/58
摘要： A photovoltaic power generation system includes a photovoltaic array including photovoltaic modules, the photovoltaic power generation system further includes a control apparatus configured to display output characteristics of the photovoltaic array and power generating conditions of the photovoltaic array in synchronization.
摘要翻译：光伏发电系统包括包括光伏模块的光伏阵列，光伏发电系统还包括配置成同步显示光伏阵列的输出特性和光电阵列的发电条件的控制装置。

5. 发明授权

US08455596B2 Method for producing a copolymer for photoresist 有权
标题翻译：光致抗蚀剂共聚物的制造方法
公开(公告)号：US08455596B2
公开(公告)日：2013-06-04
申请号：US12702356
申请日：2010-02-09
申请人： Tomo Oikawa , Eiichi Ikawa
发明人： Tomo Oikawa , Eiichi Ikawa
IPC分类号： C08F2/00
CPC分类号： C08F2/06 , C08F2/00 , C08F220/28
摘要： The present invention provides a method for production of a copolymer for photoresists in which the bias of the monomer composition ration is small. This method for production is a method for production of a copolymer for photoresists, which copolymer containing at least two types of repeating units, the method having a supplying step of supplying a monomer solution and a solution containing a polymerization initiator into a polymerization reaction system, wherein the range of fluctuation of the monomer composition ratio of unreacted monomers is within the range between minus 15% and plus 15% or the standard deviation of the monomer composition ratio of unreacted monomers is within 2 in the polymerization reaction system during the period from the start of the polymerization reaction to the end of supplying of the monomer solution.
摘要翻译：本发明提供一种制备光聚合物共聚物的方法，其中单体组成比例的偏差小。该制造方法是制造光致抗蚀剂共聚物的方法，该共聚物含有至少两种重复单元，该方法具有将单体溶液和含有聚合引发剂的溶液供给到聚合反应体系中的供给工序，其中未反应单体的单体组成比的波动范围在-15％和15％之间的范围内，或者在聚合反应体系中未反应单体的单体组成比的标准偏差在2以内的范围内开始聚合反应直到单体溶液的供应结束。

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