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1. 发明授权

US5537732A Method for manufacturing a magnetic head core slider 失效
标题翻译：磁头芯片滑块制造方法
公开(公告)号：US5537732A
公开(公告)日：1996-07-23
申请号：US212802
申请日：1994-03-15
申请人： Naoya Fukuda , Soichiro Matsuzawa , Hideto Sandaiji , Eigo Hirotsuji
发明人： Naoya Fukuda , Soichiro Matsuzawa , Hideto Sandaiji , Eigo Hirotsuji
IPC分类号： G11B5/105 , G11B5/17 , G11B5/187 , G11B5/127
CPC分类号： G11B5/1871 , G11B5/105 , G11B5/17 , Y10T29/49041
摘要： A composite type magnetic head core slider including a slider body and a core chip, wherein a slot is formed in the slider body such that the slot is open in an end face of the slider body and located within a width of a central recessed portion between two parallel air-bearing portions formed on a surface of the slider body which is to face a magnetic disk, or within a width of an outer recessed portion disposed on one side of one of the air-bearing portions, which one side is remote from the central recessed portion. The core chip is fixed in the slot such that an upper end portion of the core chip protrudes above a surface of the central or outer recessed portion, and the protruding upper end portion of the core chip is subjected to an operation to form a track portion having a magnetic gap.
摘要翻译：一种复合型磁头芯片滑块，其包括滑块体和芯片，其中，在所述滑块体中形成狭槽，使得所述狭槽在所述滑块体的端面中敞开，并位于所述滑块体的中心凹部的宽度内，两个平行的空气轴承部分形成在滑块体的面对磁盘的表面上，或者在设置在一个空气轴承部分的一个空气轴承部分的一侧的外部凹部的宽度内，中央凹部。芯片固定在槽中，使得芯片的上端部突出于中央或外凹部的表面之上，并且芯片的突出的上端部进行操作以形成轨道部分具有磁隙。

2. 发明授权

US5413672A Method of etching sendust and method of pattern-etching sendust and chromium films 失效
标题翻译：蚀刻铁硅铝粉的方法和图案蚀刻硅铝铁和铬膜的方法
公开(公告)号：US5413672A
公开(公告)日：1995-05-09
申请号：US90939
申请日：1993-07-14
申请人： Eigo Hirotsuji , Naoya Fukuda
发明人： Eigo Hirotsuji , Naoya Fukuda
IPC分类号： C23F1/28 , G11B5/187 , H01F10/14 , H01F41/30 , B44C1/22
CPC分类号： B82Y25/00 , B82Y40/00 , C23F1/28 , G11B5/1878 , H01F10/145 , H01F41/308
摘要： An etching method for etching a sendust film formed on a substrate is disclosed. In this method, a mixture of acid solutions of nitric acid and hydrochloric acid is used as an etching liquid. The etching is desirably effected while the sendust film is directly or indirectly held in electrical connection with a ferrite member, with an area of a portion of the ferrite member which contacts the etching liquid being twice to twelve times a total area of etched portions of the sendust film. Also disclosed is a method for pattern-etching a sendust film, and a chromium base film formed between the sendust film and a substrate, which includes the steps of: (a) etching the sendust film to form a predetermined sendust pattern; and (b) etching the chromium base film to form a chromium pattern which conforms to the predetermined sendust pattern, such that the chromium base film is directly or indirectly held in electrical connection with a chromium bulk.
摘要翻译：公开了一种用于蚀刻形成在基板上的硅铝薄膜的蚀刻方法。在该方法中，使用硝酸和盐酸的酸溶液的混合物作为蚀刻液。希望在硅酸盐膜直接或间接地保持与铁氧体构件电连接时进行蚀刻，铁氧体构件与蚀刻液接触的部分的面积是蚀刻液的蚀刻部分的总面积的两倍至十二倍 sendust电影。还公开了一种用于图案蚀刻铁硅铝膜和在硅铝硅膜与基板之间形成的铬基膜的方法，其包括以下步骤：（a）蚀刻铁硅铝膜以形成预定的铁硅铝磁铁图案; 和（b）蚀刻铬基膜以形成符合预定的硅铝片图案的铬图案，使得铬基膜直接或间接地保持与铬体电连接。

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