专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06893793B2 Photosensitive polymer and chemically amplified photoresist composition containing the same 失效
标题翻译：光敏聚合物和含有其的化学放大光致抗蚀剂组合物
公开(公告)号：US06893793B2
公开(公告)日：2005-05-17
申请号：US10383770
申请日：2003-03-10
申请人： Dong-won Jung , Sang-jun Choi , Si-hyeung Lee , Sook Lee
发明人： Dong-won Jung , Sang-jun Choi , Si-hyeung Lee , Sook Lee
IPC分类号： C08F220/18 , C08F222/06 , C08F232/04 , G03F7/004 , G03F7/039 , H01L21/027
CPC分类号： G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/115 , Y10S430/122
摘要： The photosensitive polymer includes a first monomer which is norbornene ester having C1 to C12 aliphatic alcohol as a substituent, and a second monomer which is maleic anhydride. A chemically amplified photoresist composition, containing the photosensitive polymer, has an improved etching resistance and adhesion to underlying layer materials, and exhibits wettability to developing solutions.
摘要翻译：感光性高分子包含作为取代基具有C 1〜C 12脂肪族醇的降冰片烯的第一单体和作为马来酸酐的第二单体。含有光敏聚合物的化学放大光致抗蚀剂组合物具有改进的抗蚀刻性和对下层材料的粘附性，并且显示出对显影液的润湿性。

2. 发明授权

US06596459B1 Photosensitive polymer and resist composition containing the same 失效
标题翻译：含有它们的光敏聚合物和抗蚀剂组合物
公开(公告)号：US06596459B1
公开(公告)日：2003-07-22
申请号：US09716269
申请日：2000-11-21
申请人： Hyun-woo Kim , Ki-young Kwon , Si-hyeung Lee , Dong-won Jung , Sook Lee , Kwang-sub Yoon , Sang-jun Choi , Sang-gyun Woo
发明人： Hyun-woo Kim , Ki-young Kwon , Si-hyeung Lee , Dong-won Jung , Sook Lee , Kwang-sub Yoon , Sang-jun Choi , Sang-gyun Woo
IPC分类号： G03F7004
CPC分类号： G03F7/0395 , G03F7/0397
摘要： There are provided a photosensitive polymer and a photoresist compositing containing the same. The photosensitive polymer is represented by the following formula: wherein R1 is an acid-labile tertiary alkyl ester group, R2 is hydrogen atom, methyl, ethyl, carboxyl, &ggr;-butyrolactone-2-yl ester, &ggr;-butyrolactone-3-yl ester, pantolactone-2-yl ester, mevalonic lactone ester, 3-tetrahydrofuranyl ester, 2,3-propylenecarbonate-1-yl ester, 3-methyl-&ggr;-butyrolactone-3-yl ester or C3 to C20 alicyclic hydrocarbon, a/(a+b+c) is 0.1˜0.7, b/(a+b+c) is 0.1˜0.8, c/(a+b+c) is 0.0˜0.8, and n is an integer in the range of 0 to 2.
摘要翻译：提供光敏聚合物和含有它的光致抗蚀剂复合物。光敏聚合物由下式表示：其中R1是酸不稳定的叔烷基酯基，R2是氢原子，甲基，乙基，羧基，γ-丁内酯-2-基酯，γ-丁内酯-3-基酯，泛酸内酯-2-基酯，甲羟戊酸内酯，3-四氢呋喃基酯，2,3-亚丙基碳酸酯-1-基酯，3-甲基-γ-丁内酯-3-基酯或C 3至C 20脂环族烃，a /（ a + b + c）为0.1〜0.7，b /（a + b + c）为0.1〜0.8，c /（a + b + c）为0.0〜0.8，n为0〜 2。

3. 发明授权

US06593441B2 Photosensitive polymer and chemically amplified photoresist composition containing the same 失效
公开(公告)号：US06593441B2
公开(公告)日：2003-07-15
申请号：US10218637
申请日：2002-08-15
申请人： Dong-won Jung , Sang-jun Choi , Si-hyeung Lee , Sook Lee
发明人： Dong-won Jung , Sang-jun Choi , Si-hyeung Lee , Sook Lee
IPC分类号： C08F3600
CPC分类号： G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/115 , Y10S430/122
摘要： The photosensitive polymer includes a first monomer which is norbornene ester having C1 to C12 aliphatic alcohol as a substituent, and a second monomer which is maleic anhydride. A chemically amplified photoresist composition, containing the photosensitive polymer, has an improved etching resistance and adhesion to underlying layer materials, and exhibits wettability to developing solutions.

4. 发明授权

US06300036B1 Photosensitive polymers and chemically amplified photoresist compositions using the same 失效
标题翻译：光敏聚合物和使用其的化学放大光致抗蚀剂组合物
公开(公告)号：US06300036B1
公开(公告)日：2001-10-09
申请号：US09203669
申请日：1998-12-01
申请人： Sang-Jun Choi , Yool Kang , Dong-Won Jung , Chun-Geun Park
发明人： Sang-Jun Choi , Yool Kang , Dong-Won Jung , Chun-Geun Park
IPC分类号： B03F7004
CPC分类号： C08F220/18 , C08F222/06 , G03F7/0045 , G03F7/039 , Y10S430/111 , Y10S430/115
摘要： The compounds are of a class of photosensitive polymers for use in chemically amplified photoresists. These photoresists produce sharp line patterns when exposed with an ArF excimer laser. The polymer composition includes a copolymer and the photoresist composition includes a terpolymer with a photo acid generator. The resulting chemically amplified photoresist compositions have strong resistance to dry etching, possess excellent adhesion to film material, and are capable of being developed using conventional developers.
摘要翻译：这些化合物是用于化学放大光致抗蚀剂的一类光敏聚合物。当用ArF准分子激光器曝光时，这些光致抗蚀剂产生尖锐的线条图案。聚合物组合物包括共聚物，光致抗蚀剂组合物包括具有光酸产生剂的三元共聚物。所得到的化学放大光致抗蚀剂组合物对干蚀刻具有很强的抗性，对薄膜材料具有优异的粘附性，并且能够使用常规显影剂进行显影。

5. 发明授权

US6114084A Chemically amplified resist composition 有权
标题翻译：化学放大抗蚀剂组合物
公开(公告)号：US6114084A
公开(公告)日：2000-09-05
申请号：US165061
申请日：1998-10-02
申请人： Yool Kang , Sang-Jun Choi , Dong-Won Jung , Chun-Geun Park , Young-Bum Koh
发明人： Yool Kang , Sang-Jun Choi , Dong-Won Jung , Chun-Geun Park , Young-Bum Koh
IPC分类号： G03F7/004 , G03F7/039 , G03C1/492
CPC分类号： G03F7/039 , G03F7/0045
摘要： Copolymers and terpolymers are used in chemically amplified resists. The terpolymers are of the formula: ##STR1## wherein R.sub.3 is selected from the group consisting of hydrogen and a C.sub.1 to C.sub.10 aliphatic hydrocarbon, wherein said aliphatic hydrocarbon contains substituents selected from the group consisting of hydrogen, hydroxy, carboxylic acid, carboxylic anhydride, and combinations thereof; R.sub.4 is selected from the group consisting of hydrogen and a C.sub.1 to C.sub.10 aliphatic hydrocarbon, wherein said aliphatic hydrocarbon contains substituents selected from the group consisting of hydrogen, hydroxy, carboxylic acid, carboxylic anhydride, and combinations thereof, R.sub.5 is selected from the group consisting of hydrogen and methyl; R.sub.6 is selected from the group consisting of t-butyl and tetrahydropyranyl; M and n are each integers; and wherein n/(m+n) ranges from about 0.1 to about 0.5. Also, a resist composition for use in a chemically amplified resist, which comprises a photoacid generator and a polymer having the formula: ##STR2## wherein x is selected from the group consisting of C.sub.5 to C.sub.8 cyclic or alicyclic composition, R.sub.7 is selected from the group consisting of hydrogen and methyl; R.sub.4 is selected from the group consisting of t-butyl, tetrahydropyranyl and adamantyl; m and n are each integers; and the ratio n/(m+n) ranges from about 0.1 to about 0.5.
摘要翻译：共聚物和三元共聚物用于化学增强抗蚀剂。三元共聚物具有下式：其中R 3选自氢和C 1至C 10脂族烃，其中所述脂族烃含有选自氢，羟基，羧酸，羧酸酐及其组合的取代基 ; R 4选自氢和C 1至C 10脂族烃，其中所述脂族烃包含选自氢，羟基，羧酸，羧酸酐及其组合的取代基，R 5选自的氢和甲基; R6选自叔丁基和四氢吡喃基; M和n分别是整数; 并且其中n /（m + n）为约0.1至约0.5。另外，用于化学放大抗蚀剂的抗蚀剂组合物，其包含光致酸发生剂和具有下式的聚合物：其中x选自C5至C8环状或脂环族组合物，R7选自由以下组成的组：氢和甲基; R4选自叔丁基，四氢吡喃基和金刚烷基; m和n分别为整数; n /（m + n）的比例为约0.1至约0.5。

6. 发明申请

US20050019693A1 Photosensitive polymer and chemically amplified photoresist composition containing the same 失效
标题翻译：光敏聚合物和含有其的化学放大光致抗蚀剂组合物
公开(公告)号：US20050019693A1
公开(公告)日：2005-01-27
申请号：US10925983
申请日：2004-08-26
申请人： Dong-won Jung , Sang-jun Choi , Si-hyeung Lee , Sook Lee
发明人： Dong-won Jung , Sang-jun Choi , Si-hyeung Lee , Sook Lee
IPC分类号： G03F7/039 , G03C1/76
CPC分类号： G03F7/0395
摘要： The photosensitive polymer includes a first monomer which is norbornene ester having C1 to C12 aliphatic alcohol as a substituent, and a second monomer which is maleic anhydride. A chemically amplified photoresist composition, containing the photosensitive polymer, has an improved etching resistance and adhesion to underlying layer materials, and exhibits wettability to developing solutions.
摘要翻译：感光性高分子包含作为取代基具有C1〜C12脂肪族醇的降冰片酯的第一单体和作为马来酸酐的第二单体。含有光敏聚合物的化学放大光致抗蚀剂组合物具有改进的抗蚀刻性和对下层材料的粘附性，并且显示出对显影液的润湿性。

7. 发明授权

US06642336B1 Photosensitive polymer 有权
标题翻译：光敏聚合物
公开(公告)号：US06642336B1
公开(公告)日：2003-11-04
申请号：US09644101
申请日：2000-08-23
申请人： Sook Lee , Ki-young Kwon , Si-hyeung Lee , Kwang-sub Yoon , Hyun-woo Kim , Dong-won Jung , Sang-jun Choi , Sang-gyun Woo
发明人： Sook Lee , Ki-young Kwon , Si-hyeung Lee , Kwang-sub Yoon , Hyun-woo Kim , Dong-won Jung , Sang-jun Choi , Sang-gyun Woo
IPC分类号： C08F1000
CPC分类号： G03F7/039 , C08G61/08 , G03F7/0045
摘要： A photosensitive polymer which maintains transparency even when exposed to a short-wavelength light source of 193 nm or below, exhibits improved adhesiveness to a substrate, improved contrast and improved resistance to dry etching. The photosensitive polymer includes a first monomer which is alicyclic hydrocarbon carboxylate having an acid-labile C6 to C20 tertiary alicyclic hydrocarbon group as a substituent, and a second monomer which is capable of free radical polymerization.
摘要翻译：即使暴露于193nm以下的短波长光源也能够保持透明性的光敏性聚合物表现出改善的对基材的粘合性，改善的对比度和改善的耐干蚀刻性。感光性高分子包括具有酸不稳定性C6〜C20叔脂环族烃基作为取代基的脂环式羧酸酯的第一单体和能够进行自由基聚合的第二单体。

8. 发明授权

US06537727B2 Resist composition comprising photosensitive polymer having loctone in its backbone 有权
标题翻译：抗蚀剂组合物包含其主链中具有洛酮的光敏聚合物
公开(公告)号：US06537727B2
公开(公告)日：2003-03-25
申请号：US09901569
申请日：2001-07-11
申请人： Kwang-sub Yoon , Dong-won Jung , Si-hyeung Lee , Hyun-woo Kim , Sook Lee , Sang-gyun Woo , Sang-jun Choi
发明人： Kwang-sub Yoon , Dong-won Jung , Si-hyeung Lee , Hyun-woo Kim , Sook Lee , Sang-gyun Woo , Sang-jun Choi
IPC分类号： G03F7038
CPC分类号： G03F7/0395 , G03F7/0392 , G03F7/0397 , Y10S430/106
摘要： A resist composition includes a photosensitive polymer having a lactone in its backbone. The photosensitive polymer of the resist composition includes at least one of the monomers having the formulae: where R1 and R2 are independently a hydrogen atom, alkyl, hydroxyalkyl, alkyloxy, carbonyl or ester, and x, y, v and w are independently integers from 1 to 6.
摘要翻译：抗蚀剂组合物包括在其主链中具有内酯的光敏聚合物。抗蚀剂组合物的光敏聚合物包含至少一种具有下式的单体：其中R 1和R 2独立地为氢原子，烷基，羟烷基，烷氧基，羰基或酯，x，y，v和w独立地为 1〜6。

9. 发明授权

US06503687B2 Alicyclic photosensitive polymer, resist composition containing the same and method of preparing the resist composition 失效
标题翻译：脂环族光敏聚合物，含有它们的抗蚀剂组合物和制备抗蚀剂组合物的方法
公开(公告)号：US06503687B2
公开(公告)日：2003-01-07
申请号：US09731896
申请日：2000-12-08
申请人： Hyun-woo Kim , Si-hyueng Lee , Ki-young Kwon , Dong-won Jung , Sang-jun Choi , Sang-gyun Woo
发明人： Hyun-woo Kim , Si-hyueng Lee , Ki-young Kwon , Dong-won Jung , Sang-jun Choi , Sang-gyun Woo
IPC分类号： G03F7004
CPC分类号： G03F7/0045 , G03F7/039
摘要： A photosensitive polymer having a main chain consisting of only norbornene-type alicyclic units, a resist composition containing the photosensitive polymer and a preparation method thereof, wherein the photosensitive polymer is represented by the following formula: wherein R1 is an acid-labile tertiary alkyl group, R2 is &ggr;-butyrolactone-2-yl, &ggr;-butyrolactone-3-yl, pantolactone-2-yl, mevalonic lactone, 3-tetrahydrofuranyl, 2,3-propylenecarbonate-1-yl or 3-methyl-&ggr;-butyrolactone-3-yl, R3 is a hydrogen atom, methyl, ethyl or C3 to C20 alicyclic hydrocarbon, and p/(p+q+r) is 0.1˜0.8, q/(p+q+r) is 0.2˜0.8, and r/(p+q+r) is 0.0˜0.4. To prepare the photosensitive polymer, at least two different norbornene-type compounds having an ester group as a substituent are reacted in the presence of an initiator at a temperature of about 120 to about 150 ° C. without a reaction catalyst.
摘要翻译：具有仅由降冰片烯型脂环族单元构成的主链的光敏性聚合物，含有感光性高分子的抗蚀剂组合物及其制备方法，其中，所述感光性聚合物由下式表示：式中，R1为酸不稳定的叔烷基 R2是γ-丁内酯-2-基，γ-丁内酯-3-基，泛酸内酯-2-基，甲羟戊酸内酯，3-四氢呋喃基，2,3-亚丙基碳酸酯-1-基或3-甲基-γ-丁内酯 - R 3为氢原子，甲基，乙基或C 3〜C 20脂环族烃，p /（p + q + r）为0.1〜0.8，q /（p + q + r）为0.2〜0.8， r /（p + q + r）为0.0〜0.4。为了制备感光性聚合物，在引发剂的存在下，在没有反应催化剂的情况下，在约120〜约150℃的温度下，使具有酯基作为取代基的至少两种不同的降冰片烯型化合物进行反应。

10. 发明授权

US06472120B1 Photosensitive polymer and chemically amplified photoresist composition containing the same 失效
公开(公告)号：US06472120B1
公开(公告)日：2002-10-29
申请号：US09628499
申请日：2000-07-28
申请人： Dong-won Jung , Sang-jun Choi , Si-hyeung Lee , Sook Lee
发明人： Dong-won Jung , Sang-jun Choi , Si-hyeung Lee , Sook Lee
IPC分类号： G03F7004
CPC分类号： G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/115 , Y10S430/122
摘要： The photosensitive polymer includes a first monomer which is norbornene ester having C1 to C12 aliphatic alcohol as a substituent, and a second monomer which is maleic anhydride. A chemically amplified photoresist composition, containing the photosensitive polymer, has an improved etching resistance and adhesion to underlying layer materials, and exhibits wettability to developing solutions.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式