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    • 2. 发明授权
    • Preparation of largely HBr-free HCI gas and largely HBr-free aqueous HCI solution
    • 主要制备无HBr的HCl气体和大部分不含HBr的HCl水溶液
    • US06890508B2
    • 2005-05-10
    • US10309128
    • 2002-12-04
    • Dieter SchläferJosef GuthHans-Ulrich Schlimper
    • Dieter SchläferJosef GuthHans-Ulrich Schlimper
    • B01D53/14B01D53/18C01B7/01C01B7/07
    • C01B7/0731
    • The present invention relates to a process for preparing largely HBr-free HCl gas and largely HBr-free aqueous HCl solution, which comprises the following steps: a) providing HBr-containing HCl gas; b) passing the HBr-containing HCl gas through aqueous HCl solution saturated with HCl; c) separating off HBr-containing aqueous HCl solution saturated with HCl; d) if desired, passing the largely HBr-free HCl gas obtained in step b) into water to obtain largely HBr-free aqueous HCl solution; with largely HBr-free aqueous HCl solution produced in step d) being able, if desired, to be recirculated to step b) of the process. The process of the present invention allows high-purity aqueous HCl solution for use in the semiconductor industry to be prepared inexpensively and on an industrial scale. However, the purified HCl gas obtained by means of steps a) to c) can also be used for any other purposes. The invention likewise provides an apparatus for carrying out the process of the present invention.
    • 本发明涉及一种主要制备无HBr的HCl气体和大部分不含HBr的HCl水溶液的方法,其包括以下步骤:a)提供含HBr的HCl气体; b)将含HBr的HCl气体通过用HCl饱和的HCl水溶液; c)分离出用HCl饱和的含HBr的HCl水溶液; d)如果需要,将步骤b)中获得的大部分无HBr的HCl气体通入水中,以获得大部分不含HBr的HCl水溶液; 在步骤d)中产生的基本上不含HBr的HCl水溶液,如果需要,可以再循环到该方法的步骤b)。 本发明的方法允许廉价地和工业规模地制备用于半导体工业的高纯度HCl水溶液。 然而,通过步骤a)至c)获得的纯化的HCl气体也可用于任何其它目的。 本发明同样提供了一种用于实施本发明方法的装置。