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1. 发明授权

US08225745B2 Chemical vaporizer for material deposition systems and associated methods 失效
标题翻译：用于材料沉积系统和相关方法的化学蒸发器
公开(公告)号：US08225745B2
公开(公告)日：2012-07-24
申请号：US13019885
申请日：2011-02-02
申请人： Eugene P. Marsh , David R. Atwell
发明人： Eugene P. Marsh , David R. Atwell
IPC分类号： C23C16/448 , C23C16/52 , C23F1/00 , H01L21/306 , G05B15/00 , B05D7/22 , B05D5/00 , C23C16/06 , C23C16/22
CPC分类号： C23C16/4405 , C23C16/4402 , C23C16/4481 , C23C16/52 , Y10T137/0357
摘要： System and method for operating a material deposition system are disclosed. In one embodiment, the method can include periodically injecting a precursor into a vaporizer through an injector at the vaporizer, vaporizing the precursor in the vaporizer and supplying the vaporized precursor to a reaction chamber in fluid communication with the vaporizer, and shutting down the vaporizer and the reaction chamber after a period of time. The method can also include conducting maintenance of the injector at the vaporizer by using a vapor solvent rinse.
摘要翻译：公开了用于操作材料沉积系统的系统和方法。在一个实施方案中，该方法可以包括通过蒸发器处的注射器周期性地将前体注入蒸发器中，蒸发蒸发器中的前体并将蒸发的前体供应到与蒸发器流体连通的反应室，并且关闭蒸发器和反应室经过一段时间。该方法还可以包括通过使用蒸气溶剂冲洗在蒸发器处进行喷射器的维护。

2. 发明申请

US20070266941A1 SYSTEM AND METHOD FOR RECIRCULATING FLUID SUPPLY FOR AN INJECTOR FOR A SEMICONDUCTOR FABRICATION CHAMBER 有权
标题翻译：用于半导体制造室的注射器的流体供给系统和方法
公开(公告)号：US20070266941A1
公开(公告)日：2007-11-22
申请号：US11383923
申请日：2006-05-17
申请人： Eugene P. Marsh , David R. Atwell
发明人： Eugene P. Marsh , David R. Atwell
IPC分类号： C23C16/00 , F16K11/065
CPC分类号： C23C16/45593 , Y10T137/8667
摘要： One embodiment of the present subject matter includes a system which includes a tank, a conduit is adapted to carry a recirculating supply of fluid from the tank and into the tank, and at least one injector adapted to dispense fluid from the recirculating supply of fluid into a chamber.
摘要翻译：本主题的一个实施例包括一个系统，该系统包括一个罐，一个导管适用于承载来自罐和再循环的流体供应罐，以及至少一个喷射器，适用于将流体从再循环流体供应到一个房间

3. 发明授权

US06540407B2 Rolling element bearing arrangement 失效
公开(公告)号：US06540407B2
公开(公告)日：2003-04-01
申请号：US09879355
申请日：2001-06-12
申请人： Pieter Van Dine , David R. Atwell , Stewart Peil , Vladimir Odessky
发明人： Pieter Van Dine , David R. Atwell , Stewart Peil , Vladimir Odessky
IPC分类号： F16C3338
CPC分类号： F16C33/3806 , F16C19/14 , F16C19/163 , F16C19/527 , F16C27/04 , F16C33/3843 , F16C33/605 , F16C33/7853 , F16C2202/30 , F16C2300/02
摘要： In the typical embodiments described in the specification, a rolling element bearing arrangement includes an inner raceway with a curved outer surface facing in one lateral direction, an outer raceway with a curved inner surface facing in the opposite lateral direction, an array of rolling elements such as balls engaging the curved surfaces of the inner and outer raceways, a retaining ring in which the array of balls is received, and a retaining ring stabilizer urging the retaining ring in a lateral direction with respect to one of the raceways to inhibit vibration of the components. In addition, a vibration inhibiting outer ring member which may contain a heavy metal or a resilient material, is retained against the outer surface of the outer raceway by a composite wrap which may be a fiber-reinforced organic or inorganic polymer composite made by a dry layup, resin transfer molding, wet filament winding or preimpreganted filament winding technique.

4. 发明授权

US5943471A Solid precursor injector apparatus and method 失效
标题翻译：固体前体注射装置及方法
公开(公告)号：US5943471A
公开(公告)日：1999-08-24
申请号：US080827
申请日：1998-05-18
申请人： David R. Atwell
发明人： David R. Atwell
IPC分类号： C23C16/16 , C23C16/18 , C23C16/448 , A01G13/06 , C23C16/00
CPC分类号： C23C16/4485 , C23C16/16 , C23C16/18 , C23C16/4481 , Y10S505/73
摘要： An apparatus and method are provided for effectively and controllably vaporizing solid material, in general, and specifically, solid precursor material for chemical phase deposition processes. The apparatus includes a hollow container member, capable of retaining solid material and having a longitudinal axis passing through a substantially open first end, that is reciprocally injected at a controlled rate through a heater capable of vaporizing the solid material so that vaporized material passes through the first end along the longitudinal axis of the container member and into the reaction chamber. Preferably, the apparatus includes a hollow body capable of pressure containment that is in fluid communication with the reaction chamber and an rod-shaped injector slidably disposed through the hollow body suitable for injecting the container member through the body and the injector is driven external to the body using a stepper motor. It is also preferred that the body have first and second sections consisting of a load lock and a tubing member, respectively, that can be isolated through the use of a gate valve. Preferably, the container member also includes a removable cap that is capable of sealing and retaining solid CVD precursor material in the container member and a moveable arm is provided through the load lock for engaging the cap to allow for its removal from the container member. Preferably, the container member is horizontally injected through a heater chamber into an inlet port in a reaction chamber.
摘要翻译：提供了一种用于有效和可控地蒸发固体材料的装置和方法，一般而言，具体地，用于化学相沉积工艺的固体前体材料。该装置包括中空容器构件，其能够保持固体材料并且具有穿过基本上敞开的第一端的纵向轴线，该纵向轴线以受控的速率通过能够蒸发固体材料的加热器往复地注入，使得气化材料通过第一端沿着容器构件的纵向轴线并进入反应室。优选地，该装置包括能够与反应室流体连通的压力容纳的空心体和可滑动地设置穿过中空体的棒状喷射器，其适合于通过主体注入容器构件，并且喷射器被驱动到身体使用步进电机。还优选的是，主体具有分别由负载锁和管件构成的第一和第二部分，其可以通过使用闸阀来隔离。优选地，容器构件还包括能够将固体CVD前体材料密封并保持在容器构件中的可拆卸盖，并且可移动臂通过装载锁提供，用于接合盖以允许其从容器构件移除。优选地，容器构件通过加热器室水平地注入到反应室中的入口中。

5. 发明授权

US08551564B2 Chemical vaporizer for material deposition systems and associated methods 有权
标题翻译：用于材料沉积系统和相关方法的化学蒸发器
公开(公告)号：US08551564B2
公开(公告)日：2013-10-08
申请号：US13554265
申请日：2012-07-20
申请人： Eugene P. Marsh , David R. Atwell
发明人： Eugene P. Marsh , David R. Atwell
IPC分类号： C23C16/00
CPC分类号： C23C16/4405 , C23C16/4402 , C23C16/4481 , C23C16/52 , Y10T137/0357
摘要： Methods for operating a material deposition system are disclosed. In one embodiment, the method can include periodically injecting a precursor into a vaporizer through an injector at the vaporizer, vaporizing the precursor in the vaporizer and supplying the vaporized precursor to a reaction chamber in fluid communication with the vaporizer, and shutting down the vaporizer and the reaction chamber after a period of time. The method can also include conducting maintenance of the injector at the vaporizer by using a vapor solvent rinse.
摘要翻译：公开了用于操作材料沉积系统的方法。在一个实施方案中，该方法可以包括通过蒸发器处的注射器周期性地将前体注入蒸发器中，蒸发蒸发器中的前体并将蒸发的前体供应到与蒸发器流体连通的反应室，并且关闭蒸发器和反应室经过一段时间。该方法还可以包括通过使用蒸气溶剂冲洗在蒸发器处进行喷射器的维护。

6. 发明授权

US07789319B2 System and method for recirculating fluid supply for an injector for a semiconductor fabrication chamber 有权
标题翻译：用于半导体制造室的注射器的再循环流体供应系统和方法
公开(公告)号：US07789319B2
公开(公告)日：2010-09-07
申请号：US11383923
申请日：2006-05-17
申请人： Eugene P. Marsh , David R. Atwell
发明人： Eugene P. Marsh , David R. Atwell
IPC分类号： B05B17/00
CPC分类号： C23C16/45593 , Y10T137/8667
摘要： One embodiment of the present subject matter includes a system which includes a tank, a conduit is adapted to carry a recirculating supply of fluid from the tank and into the tank, and at least one injector adapted to dispense fluid from the recirculating supply of fluid into a chamber.
摘要翻译：本主题的一个实施例包括一个系统，该系统包括一个罐，一个导管适用于承载来自罐和再循环的流体供应罐，以及至少一个喷射器，适用于将流体从再循环流体供应到一个房间

7. 发明授权

US06206970B1 Semiconductor wafer processor, semiconductor processor gas filtering system and semiconductor processing methods 失效
标题翻译：半导体晶圆处理器，半导体处理器气体过滤系统和半导体处理方法
公开(公告)号：US06206970B1
公开(公告)日：2001-03-27
申请号：US08922948
申请日：1997-09-03
申请人： David R. Atwell
发明人： David R. Atwell
IPC分类号： C23C1600
CPC分类号： C23C16/45572 , B03C3/017 , B03C3/12 , C23C16/4412
摘要： Particle traps for semiconductor wafer vapor processors and methods of filtering particles in a semiconductor wafer processor are described. In accordance with a preferred implementation, a semiconductor wafer processor includes a processing chamber for containing a gas during processing of a semiconductor wafer. A particle trap is positioned within the reaction chamber and is operative for removing particles within the processing chamber. In one version, the particle trap is an electrostatic precipitator charged for removing particles from the gas. In accordance with another implementation, a semiconductor wafer vapor processor includes a processing chamber for containing a gas during processing of a semiconductor wafer. A wafer holder is provided within the processing chamber. A particle trap comprising at least two chargeable elements is positioned within the processing chamber and is spaced from the wafer holder. In one version, the processing chamber is a reaction chamber. In another version, the processing chamber is a vacuum chamber. In accordance with yet another aspect, a method of filtering particles in a semiconductor wafer processor includes: causing processing gases to flow through a processing chamber of a semiconductor wafer processor; filtering particles from within a processing reactor of the processing chamber.
摘要翻译：描述了用于半导体晶片蒸气处理器的颗粒捕集器和过滤半导体晶片处理器中的颗粒的方法。根据优选的实施方式，半导体晶片处理器包括处理半导体晶片的处理室，用于在半导体晶片的处理期间容纳气体。颗粒捕集器位于反应室内并用于除去处理室内的颗粒。在一个版本中，颗粒捕集器是用于从气体中除去颗粒的静电除尘器。根据另一实施方案，半导体晶片蒸汽处理器包括在半导体晶片的处理期间容纳气体的处理室。晶片保持器设置在处理室内。包括至少两个可充电元件的颗粒捕集器位于处理室内并与晶片保持器间隔开。在一个版本中，处理室是反应室。在另一个版本中，处理室是真空室。根据另一方面，一种在半导体晶片处理器中过滤颗粒的方法包括：使处理气体流过半导体晶片处理器的处理室; 从处理室的处理反应器内过滤颗粒。

8. 发明授权

US5674574A Vapor delivery system for solid precursors and method regarding same 失效
标题翻译：固体前体的蒸气输送系统及其相关方法
公开(公告)号：US5674574A
公开(公告)日：1997-10-07
申请号：US650743
申请日：1996-05-20
申请人： David R. Atwell , Donald L. Westmoreland
发明人： David R. Atwell , Donald L. Westmoreland
IPC分类号： C23C16/448 , C23C16/00
CPC分类号： C23C16/4481
摘要： A vapor delivery system for vaporization and delivery of a solid precursor includes a housing having an inlet for receiving a carrier gas. A rotatable substrate surface is contained in the housing having a solid precursor material applied thereon. A focused thermal beam is positioned for impingement on the solid precursor material. A drive mechanism moves one of the rotatable surface and the focused thermal beam relative to the other such that with rotation of the rotatable substrate surface the focused thermal beam continuously impinges on a different contact area of the solid precursor material for vaporization thereof. The housing further has an outlet for transport of the vaporized precursor material therefrom. The rotatable surface may be a cylindrical surface or a circular platen surface. A CVD system having a vapor delivery system is also provided along with a device for use in the delivery system. A method for delivering the vaporized solid precursor to a CVD process chamber includes providing a surface having a solid precursor material applied thereon. A focused thermal beam is directed at the surface. The surface is rotated and one of the rotating surface and the focused thermal beam are indexed relative to the other such that the directed beam is repetitively moved from impinging upon one path of solid precursor material to a next path of solid precursor material to vaporize the solid precursor material on the surface. The vaporized solid precursor material is then transported to the process chamber.
摘要翻译：用于蒸发和递送固体前体的蒸汽输送系统包括具有用于接收载气的入口的壳体。可旋转的基板表面容纳在壳体中，其上施加有固体前体材料。聚焦热束被定位成冲击在固体前体材料上。驱动机构相对于另一个驱动机构移动可旋转表面和聚焦热束中的一个，使得随着可旋转基板表面的旋转，聚焦的热束连续地撞击固体前体材料的不同接触面积，用于汽化。壳体还具有用于从其输送蒸发的前体材料的出口。可旋转表面可以是圆柱形表面或圆形压板表面。具有蒸气输送系统的CVD系统还与用于输送系统的装置一起提供。将蒸发的固体前体输送到CVD处理室的方法包括提供其上施加有固体前体材料的表面。聚焦的热束指向表面。旋转表面并且旋转表面和聚焦热束中的一个相对于另一个被转位，使得定向光束重复地移动到撞击在固体前体材料的一个路径上的下一个固体前体材料路径上，以使固体表面上的前体材料。然后将汽化的固体前体材料输送到处理室。

9. 发明授权

US07883745B2 Chemical vaporizer for material deposition systems and associated methods 失效
标题翻译：用于材料沉积系统和相关方法的化学蒸发器
公开(公告)号：US07883745B2
公开(公告)日：2011-02-08
申请号：US11830688
申请日：2007-07-30
申请人： Eugene P. Marsh , David R. Atwell
发明人： Eugene P. Marsh , David R. Atwell
IPC分类号： C23C16/455
CPC分类号： C23C16/4405 , C23C16/4402 , C23C16/4481 , C23C16/52 , Y10T137/0357
摘要： System and method for operating a material deposition system are disclosed. In one embodiment, the method can include periodically injecting a precursor into a vaporizer through an injector at the vaporizer, vaporizing the precursor in the vaporizer and supplying the vaporized precursor to a reaction chamber in fluid communication with the vaporizer, and shutting down the vaporizer and the reaction chamber after a period of time. The method can also include conducting maintenance of the injector at the vaporizer by using a vapor solvent rinse.
摘要翻译：公开了用于操作材料沉积系统的系统和方法。在一个实施方案中，该方法可以包括通过蒸发器处的注射器周期性地将前体注入蒸发器中，蒸发蒸发器中的前体并将蒸发的前体供应到与蒸发器流体连通的反应室，并且关闭蒸发器和反应室经过一段时间。该方法还可以包括通过使用蒸气溶剂冲洗在蒸发器处进行喷射器的维护。

10. 发明授权

US6072939A Solid precursor injector apparatus 有权
标题翻译：固体前体注射器装置
公开(公告)号：US6072939A
公开(公告)日：2000-06-06
申请号：US375077
申请日：1999-08-16
申请人： David R. Atwell
发明人： David R. Atwell
IPC分类号： C23C16/16 , C23C16/18 , C23C16/448 , A01G13/06 , C23C16/00
CPC分类号： C23C16/4485 , C23C16/16 , C23C16/18 , C23C16/4481 , Y10S505/73
摘要： An apparatus and method are provided for effectively and controllably vaporizing solid material, in general, and specifically, solid precursor material for chemical phase deposition processes. The apparatus includes a hollow container member, capable of retaining solid material and having a longitudinal axis passing through a substantially open first end, that is reciprocally injected at a controlled rate through a heater capable of vaporizing the solid material so that vaporized material passes through the first end along the longitudinal axis of the container member and into the reaction chamber. Preferably, the apparatus includes a hollow body capable of pressure containment that is in fluid communication with the reaction chamber and an rod-shaped injector slidably disposed through the hollow body suitable for injecting the container member through the body and the injector is driven external to the body using a stepper motor. It is also preferred that the body have first and second sections consisting of a load lock and a tubing member, respectively, that can be isolated through the use of a gate valve. Preferably, the container member also includes a removable cap that is capable of sealing and retaining solid CVD precursor material in the container member and a moveable arm is provided through the load lock for engaging the cap to allow for its removal from the container member. Preferably, the container member is horizontally injected through a heater chamber into an inlet port in a reaction chamber.
摘要翻译：提供了一种用于有效和可控地蒸发固体材料的装置和方法，一般而言，具体地，用于化学相沉积工艺的固体前体材料。该装置包括中空容器构件，其能够保持固体材料并且具有穿过基本上敞开的第一端的纵向轴线，该纵向轴线以受控的速率通过能够蒸发固体材料的加热器往复地注入，使得气化材料通过第一端沿着容器构件的纵向轴线并进入反应室。优选地，该装置包括能够与反应室流体连通的压力容纳的空心体和可滑动地设置穿过中空体的棒状喷射器，其适合于通过主体注入容器构件，并且喷射器被驱动到身体使用步进电机。还优选的是，主体具有分别由负载锁和管件构成的第一和第二部分，其可以通过使用闸阀来隔离。优选地，容器构件还包括能够将固体CVD前体材料密封并保持在容器构件中的可拆卸盖，并且可移动臂通过装载锁提供，用于接合盖以允许其从容器构件移除。优选地，容器构件通过加热器室水平地注入到反应室中的入口中。

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