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    • 1. 发明授权
    • Method for making flexible circuits
    • 制造柔性电路的方法
    • US06177357B1
    • 2001-01-23
    • US09303168
    • 1999-04-30
    • David D. Lu
    • David D. Lu
    • H01L2700
    • H01L21/31133H05K3/002H05K2201/0145H05K2201/0154H05K2201/0166H05K2203/0793
    • A process for making flexible circuits wherein the etching of a polymeric film is accomplished by dissolving portions thereof with concentrated aqueous base using a UV-curable 100% active liquid photoresist as a mask, comprising the steps of laminating the resist on a polymeric film, exposing a pattern into the resist, developing the resist with a dilute aqueous solution until desired image is obtained, etching portions of the polymeric film not covered by the crosslinked resist with a concentrated base at a temperature of from about 50° C. to about 120° C., and then stripping the resist off the polymeric film.
    • 一种用于制造柔性电路的方法,其中通过使用可UV固化的100%活性液体光致抗蚀剂作为掩模将其部分用浓缩的水性碱溶解,从而实现聚合物膜的蚀刻,其包括以下步骤:将抗蚀剂层压在聚合物膜上, 将抗蚀剂图案印刷到抗蚀剂中,用稀的水溶液显影抗蚀剂,直到获得所需的图像,在浓度为约50℃至约120℃的温度下,用聚集的碱蚀刻未被交联抗蚀剂覆盖的聚合物膜的部分 然后从聚合物膜剥离抗蚀剂。