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    • 1. 发明授权
    • Method for making filled epoxy resin compositions
    • 填充环氧树脂组合物的制备方法
    • US07381359B2
    • 2008-06-03
    • US10967646
    • 2004-10-14
    • Yongan YanDouglas MeyersMark MorrisD. Laurence MeixnerSatyabrata Raychaudhuri
    • Yongan YanDouglas MeyersMark MorrisD. Laurence MeixnerSatyabrata Raychaudhuri
    • H01L21/56C08L63/00H01L23/29B32B27/04B32B27/20B32B27/38
    • C08G59/24C08G59/4215C08G59/688C08K9/06C08L63/00Y10T428/31511
    • An encapsulant is described for an optoelectronic device or optical component, which provides a coefficient of thermal expansion of less than 50 ppm/° C., with a variation of less than ±30%, and further provides an optical transmittance of at least 20% at a wavelength in the range of 400 to 900 nm, at an encapsulant thickness of about 1 mm. The encapsulant includes a filler consisting essentially of glass particles having diameters smaller than 500 μm, being essentially free of titania and lead oxide, and having a refractive index in the range of 1.48 to 1.60, with a variance of less than about 0.001. A method for making the encapsulant also is described, the method including steps of (1) processing the glass to form particles having diameters between 1 and 500 μm, (2) preparing an epoxy resin composition having at a cured stage a refractive index close to that of the glass filler particles, (3) mixing the epoxy resin composition with the filler particles to form a filled epoxy resin composition, (4) encapsulating an optoelectronic device with the filled epoxy resin composition, and (5) curing the filled epoxy resin composition.
    • 对于光电器件或光学部件描述了一种密封剂,其提供小于50ppm /℃的热膨胀系数,其变化小于±30%,并进一步提供至少20%的光透射率, 在400至900nm范围内的波长处,密封剂厚度约为1mm。 密封剂包括基本上由直径小于500μm的玻璃颗粒组成的填料,其基本上不含二氧化钛和氧化铅,并且折射率在1.48至1.60范围内,其变化小于约0.001。 还描述了制造密封剂的方法,该方法包括以下步骤:(1)处理玻璃以形成直径在1至500μm之间的颗粒;(2)制备环氧树脂组合物,其在固化阶段的折射率接近 (3)将环氧树脂组合物与填料颗粒混合以形成填充的环氧树脂组合物,(4)用填充的环氧树脂组合物封装光电子器件,和(5)固化填充的环氧树脂 组成。
    • 3. 发明授权
    • Filled epoxy resin compositions
    • 填充环氧树脂组合物
    • US07311972B2
    • 2007-12-25
    • US10967115
    • 2004-10-14
    • Yongan YanDouglas MeyersMark MorrisD. Laurence MeixnerSatyabrata Raychaudhuri
    • Yongan YanDouglas MeyersMark MorrisD. Laurence MeixnerSatyabrata Raychaudhuri
    • B32B27/38B32B27/04B32B27/20H01L21/56C08L63/00
    • H01L31/0203C08G59/226C08G59/4215C08G59/686C08K3/40C08K9/06C08L63/00H01L23/293H01L2924/0002Y10T428/31511H01L2924/00
    • An encapsulant is described for an optoelectronic device or optical component, which provides a coefficient of thermal expansion of less than 50 ppm/° C., with a variation of less than ±30%, and further provides an optical transmittance of at least 20% at a wavelength in the range of 400 to 900 nm, at an encapsulant thickness of about 1 mm. The encapsulant includes a filler consisting essentially of glass particles having diameters smaller than 500 μm, being essentially free of titania and lead oxide, and having a refractive index in the range of 1.48 to 1.60, with a variance of less than about 0.001. A method for making the encapsulant also is described, the method including steps of (1) processing the glass to form particles having diameters between 1 and 500 μm, (2) preparing an epoxy resin composition having at a cured stage a refractive index close to that of the glass filler particles, (3) mixing the epoxy resin composition with the filler particles to form a filled epoxy resin composition, (4) encapsulating an optoelectronic device with the filled epoxy resin composition, and (5) curing the filled epoxy resin composition.
    • 对于光电器件或光学部件描述了一种密封剂,其提供小于50ppm /℃的热膨胀系数,其变化小于±30%,并进一步提供至少20%的光透射率, 在400至900nm范围内的波长处,密封剂厚度约为1mm。 密封剂包括基本上由直径小于500μm的玻璃颗粒组成的填料,其基本上不含二氧化钛和氧化铅,并且折射率在1.48至1.60范围内,其变化小于约0.001。 还描述了制造密封剂的方法,该方法包括以下步骤:(1)处理玻璃以形成直径在1至500μm之间的颗粒;(2)制备环氧树脂组合物,其在固化阶段的折射率接近 (3)将环氧树脂组合物与填料颗粒混合以形成填充的环氧树脂组合物,(4)用填充的环氧树脂组合物封装光电子器件,和(5)固化填充的环氧树脂 组成。
    • 4. 发明授权
    • Photomask assembly incorporating a porous frame
    • 包含多孔框架的光掩模组合
    • US07014961B2
    • 2006-03-21
    • US10646356
    • 2003-08-22
    • Rahul GanguliTroy RobinsonD. Laurence Meixner
    • Rahul GanguliTroy RobinsonD. Laurence Meixner
    • G03F1/14G03B27/62
    • G03F1/64C03B19/12Y02P40/57
    • A photomask assembly is described having a frame for supporting a transparent pellicle above a photomask substrate, defining a closed pellicle space overlaying the substrate. The frame is formed of a porous material configured to allow the pellicle space to be purged with an inert gas within a reasonable processing time period, thereby removing any harmful chemicals that might be present. The frame preferably is made by a method that includes preparing a gel by a sol-gel process, drying the gel, and partially densifying the dry gel. The resulting frame has a gas permeability to oxygen or nitrogen higher than about 10 ml.mm/cm2.min.MPa, an average pore size between 0.001 micrometer and 10 micrometers, and a coefficient of thermal expansion between 0.01 ppm/° C. and 10 ppm/° C.
    • 描述了一种光掩模组件,其具有用于在光掩模基板上方支撑透明防护薄膜的框架,限定覆盖基板的封闭的薄膜空间。 框架由多孔材料形成,其被配置为允许防护薄膜空间在合理的处理时间段内用惰性气体吹扫,从而去除可能存在的任何有害化学物质。 框架优选通过包括通过溶胶 - 凝胶法制备凝胶,干燥凝胶并部分致密化干凝胶的方法制备。 所得到的框架对氧气或氮气的气体渗透性高于约10毫升/厘米3·秒/秒/秒·秒·分钟·MPa,平均孔径在0.001微米至10微米之间,并且热膨胀系数 在0.01ppm /℃和10ppm /℃之间。